Laser-solid Interactions and Transient Thermal Processing of Materials

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (251 download)

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Book Synopsis Laser-solid Interactions and Transient Thermal Processing of Materials by :

Download or read book Laser-solid Interactions and Transient Thermal Processing of Materials written by and published by . This book was released on 1983 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Energy Research Abstracts

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Publisher :
ISBN 13 :
Total Pages : 1684 pages
Book Rating : 4.U/5 (183 download)

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Book Synopsis Energy Research Abstracts by :

Download or read book Energy Research Abstracts written by and published by . This book was released on 1988 with total page 1684 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Oriented Crystallization on Amorphous Substrates

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Publisher : Springer Science & Business Media
ISBN 13 : 1489925600
Total Pages : 377 pages
Book Rating : 4.4/5 (899 download)

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Book Synopsis Oriented Crystallization on Amorphous Substrates by : E.I. Givargizov

Download or read book Oriented Crystallization on Amorphous Substrates written by E.I. Givargizov and published by Springer Science & Business Media. This book was released on 2013-11-21 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: Present-day scienceand technology have become increasingly based on studies and applications of thin films. This is especiallytrue of solid-state physics, semiconduc tor electronics, integrated optics, computer science, and the like. In these fields, it is necessary to use filmswith an ordered structure, especiallysingle-crystallinefilms, because physical phenomena and effects in such films are most reproducible. Also, active parts of semiconductor and other devices and circuits are created, as a rule, in single-crystal bodies. To date, single-crystallinefilms have been mainly epitaxial (or heteroepitaxial); i.e., they have been grown on a single-crystalline substrate, and principal trends, e.g., in the evolution of integrated circuits (lCs), have been based on continuing reduction in feature size and increase in the number of components per chip. However, as the size decreases into the submicrometer range, technological and physical limitations in integrated electronics become more and more severe. It is generally believed that a feature size of about 0.1um will have a crucial character. In other words, the present two-dimensional ICs are anticipated to reach their limit of minimization in the near future, and it is realized that further increase of packing density and/or functions might depend on three-dimensional integration. To solve the problem, techniques for preparation of single-crystalline films on arbitrary (including amorphous) substrates are essential.

Laser Processing and Diagnostics

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Publisher : Springer Science & Business Media
ISBN 13 : 3642823815
Total Pages : 561 pages
Book Rating : 4.6/5 (428 download)

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Book Synopsis Laser Processing and Diagnostics by : D. Bäuerle

Download or read book Laser Processing and Diagnostics written by D. Bäuerle and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 561 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser processing is now a rapidly increasing field with many real and potential applications in different areas of technology such as micromecha nics, metallurgy, integrated optics, and semiconductor device fabrication. The neces s ity for such soph i st i cated 1 i ght sources as 1 asers is based on the spatial coherence and the monochromaticity of laser light. The spatial coherence permits extreme focussing of the laser light resulting in the availability of high energy densities which can be used for strongly loca lized heat- and chemical-treatment of materials, with a resolution down to 1 ess than 1 lJIll. When us i ng pul sed or scanned cw-l asers, 1 oca 1 i zat i on in time is also possible. Additionally, the monochromaticity of laser light allows for control of the depth of heat treatment and/or selective, nonthermal bond breaking - within the surface of the material or within the molecules of the surrounding reactive atmosphere - simply by tuning the laser wavelength. These inherent advantages of laser light permit micromachining of materials (drilling, cutting, welding etc.) and also allow single-step controlled area processing of thin films and surfaces. Processes include structural transformation (removal of residual damage, grain growth in polycrystalline material, amorphization, surface hardening etc.), etching, doping, alloying, or deposition. In addition, laser processing is not 1 imited to planar substrates.

Rapid Thermal Processing of Semiconductors

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Publisher : Springer Science & Business Media
ISBN 13 : 1489918043
Total Pages : 374 pages
Book Rating : 4.4/5 (899 download)

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Book Synopsis Rapid Thermal Processing of Semiconductors by : Victor E. Borisenko

Download or read book Rapid Thermal Processing of Semiconductors written by Victor E. Borisenko and published by Springer Science & Business Media. This book was released on 2013-11-22 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt: Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

Growth of Crystals

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Publisher : Springer Science & Business Media
ISBN 13 : 146153660X
Total Pages : 213 pages
Book Rating : 4.4/5 (615 download)

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Book Synopsis Growth of Crystals by : E.I. Givargizov

Download or read book Growth of Crystals written by E.I. Givargizov and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume, as the previous ones, consists primarily of review artic1es. However, it also contains a large quantity of original material on the growth of crystals and films. Priority is given to experimental work. Only two artic1es are concerned exc1usively with the theory of crystal growth. Theoretical aspects are treated in several others. This volume is divided into three parts. Part I, "Epitaxy and Transformations in Thin Films," stems from the current broad application of lasers and optical effects in general to crystal growth (in particular, the growth of thin films). The first three artic1es of the book are devoted to this topic. In particular, the laser pulse vaporization method, for which a comparatively slow deposition rate is typical (which should not always be viewed as a drawback), is distinguished by the unique kinetics of the initial growth stages. These are not entirely explained. However, this method is completely suitable for oriented or generally ordered growth of films under otherwise equal conditions. Another artic1e of this section is based on use of ultrashort (down to picosecond) laser pulses. It emphasizes the nonequilibrium processes of crystallization and decrystallization that are characteristic for such influences. In particular, material heated above its melting point and metastable states in the semiconductor melt exhibit these qualities.

Silicon-on-Insulator Technology: Materials to VLSI

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Publisher : Springer Science & Business Media
ISBN 13 : 1441991069
Total Pages : 375 pages
Book Rating : 4.4/5 (419 download)

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Book Synopsis Silicon-on-Insulator Technology: Materials to VLSI by : J.-P. Colinge

Download or read book Silicon-on-Insulator Technology: Materials to VLSI written by J.-P. Colinge and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 375 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon-on-Insulator Technology: Materials to VLSI, Third Edition, retraces the evolution of SOI materials, devices and circuits over a period of roughly twenty years. Twenty years of progress, research and development during which SOI material fabrication techniques have been born and abandoned, devices have been invented and forgotten, but, most importantly, twenty years during which SOI Technology has little by little proven it could outperform bulk silicon in every possible way. The turn of the century turned out to be a milestone for the semiconductor industry, as high-quality SOI wafers suddenly became available in large quantities. From then on, it took only a few years to witness the use of SOI technology in a wealth of applications ranging from audio amplifiers and wristwatches to 64-bit microprocessors. This book presents a complete and state-of-the-art review of SOI materials, devices and circuits. SOI fabrication and characterization techniques, SOI CMOS processing, and the physics of the SOI MOSFET receive an in-depth analysis.

Semiconductors and Semimetals

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Publisher : Academic Press
ISBN 13 : 0080864074
Total Pages : 471 pages
Book Rating : 4.0/5 (88 download)

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Book Synopsis Semiconductors and Semimetals by :

Download or read book Semiconductors and Semimetals written by and published by Academic Press. This book was released on 1984-12-20 with total page 471 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors and Semimetals

Chemical Processing with Lasers

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Publisher : Springer Science & Business Media
ISBN 13 : 3662025051
Total Pages : 253 pages
Book Rating : 4.6/5 (62 download)

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Book Synopsis Chemical Processing with Lasers by : Dieter Bäuerle

Download or read book Chemical Processing with Lasers written by Dieter Bäuerle and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 253 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials processing with lasers is a rapidly expanding field which is increasingly captivating the attention of scientists, engineers and manufacturers alike. The aspect of most interest to scientists is provided by the basic interaction mechanisms between the intense light of a laser and materials exposed to a chemically reactive or nonreactive surrounding medium. Engineers and manufacturers see in the laser a new tool which will not only make manufacturing cheaper, faster, cleaner and more accurate but which also opens up entirely new technologies and manufacturing methods that are simply not available using existing techniques. Actual and potential applications range from laser machining to laser-induced materials transformation, coating, patterning, etc. , opening up the prospect of exciting new processing methods for micromechanics, metallurgy, integrated optics, semiconductor manufacture and chemical engineering. This book concentrates on the new and interdisciplinary field of 1 aser-i nduced chemicaZ process i ng of materi als. The techni que permits maskless single-step deposition of thin films of metals, semiconductors or insulators with lateral dimensions ranging from a few tenths of a micrometer up to several centimeters. Moreover, materials removal or synthesis, or surface modifications, such as oxidation, nitridation, reduction, metallization and doping, are also possible within similar dimensions. This book is meant as an introduction. It attempts to cater for the very broad range of specific interests which different groups of readers will have, and this thinking underlies the way in which the material has been arranged.

Laser Science and Technology

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Publisher : Springer Science & Business Media
ISBN 13 : 1475703783
Total Pages : 449 pages
Book Rating : 4.4/5 (757 download)

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Book Synopsis Laser Science and Technology by : A.N. Chester

Download or read book Laser Science and Technology written by A.N. Chester and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 449 pages. Available in PDF, EPUB and Kindle. Book excerpt: The conference "Laser Science and Technology" was held May 11-19, 1987 in Erice, Sicily. This was the 12th conference organized by the Internatio nal School of Quantum Electronics, under the auspices of the "Ettore Majorana" Center for Scientific Culture. This volume contains both the in vited and contributed papers presented at the conference, covering current research work in two areas: new laser sources, and laser applications. The operation of the first laser by Dr. Theodore Maiman in 1960 initia ted a decade of scientific exploration of new laser sources. This was fol lowed by the decade of the 1970s, which was characterized by "technology push" in which the discoveries of the 1960s were seeking practical applica tion. In the 1980s we are instead seeking "applications pull," in which the success and rapid maturing of laser applications provides both inspiration and financial resources to stimulate additional work both on laser sources and applications. The papers presented in these Proceedings attest to the great vitali ty of research in both these areas: New Laser Sources. The papers describe current developments in ultra violet excimer lasers, X-ray lasers, and free electron lasers. These new lasers share several characteristics: each is a potentially important coher ent source; each is at a relatively short wavelength (below 1 micrometer); and each is receiving significant development attention today.

Resonances - A Volume In Honor Of The 70th Birthday Of Nicolaas Bloembergen

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Publisher : World Scientific
ISBN 13 : 9814611433
Total Pages : 514 pages
Book Rating : 4.8/5 (146 download)

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Book Synopsis Resonances - A Volume In Honor Of The 70th Birthday Of Nicolaas Bloembergen by : M D Levenson

Download or read book Resonances - A Volume In Honor Of The 70th Birthday Of Nicolaas Bloembergen written by M D Levenson and published by World Scientific. This book was released on 1990-10-29 with total page 514 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authors are former students and research fellows of Prof Nicolaas Bloembergen, winner of the Nobel Prize, who has pioneered three distinct fields of science: NMR, masers and nonlinear optics. Each author has contributed a paper of current interest inspired by some aspect of Prof Bloembergen's 50-year career. This volume contains a historical record of one of the great scientists of the 20th century, including a complete bibliography of his papers, four of his most significant publications and evidence of his impact on generations of scientists.

Interfaces Under Laser Irradiation

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Publisher : Springer Science & Business Media
ISBN 13 : 9401719152
Total Pages : 435 pages
Book Rating : 4.4/5 (17 download)

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Book Synopsis Interfaces Under Laser Irradiation by : L.D. Laude

Download or read book Interfaces Under Laser Irradiation written by L.D. Laude and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 435 pages. Available in PDF, EPUB and Kindle. Book excerpt: Known and developed over the past twenty five years, lasers have been experimented in a variety of processes with an uneven success. Apart from fundamental physics experiments in which the various aspects of coherence are systematically exploited, applications in the field of Materials Science have been scattered recently over so many situations that it is apparently difficult today to conceive a comprehensive interpretation of all physical processes encountered. In some domains of research like photochemistry, development has been fast and rather self-supporting. In others, like solid-state processing, progress has been either very specific or deviated towards marginal applications, or else emerged as a joint-venture between physicists and chemists. This yielded a number of professional meetings, where day-to-day research activities are presented. In 1982, the Cargese ASI on "Cohesive properties of semiconductors under laser irradiation" was one of such meetings at which a prospective of the field was discussed at length in ebullient round-table sessions. Quoted from the proceedings, "the Institute helped to discern clearly the limits of existing theoretical approaches and the directions along which work is urgently needed within the next few years". Four years have passed and the field has literally explo ded. It must be mentioned that some of the most striking developments over the past two years were accurately predicted at the Institute in Cargese.

Reduced Thermal Processing for ULSI

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Publisher : Springer Science & Business Media
ISBN 13 : 1461305411
Total Pages : 444 pages
Book Rating : 4.4/5 (613 download)

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Book Synopsis Reduced Thermal Processing for ULSI by : R.A. Levy

Download or read book Reduced Thermal Processing for ULSI written by R.A. Levy and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt: As feature dimensions of integrated circuits shrink, the associated geometrical constraints on junction depth impose severe restrictions on the thermal budget for processing such devices. Furthermore, due to the relatively low melting point of the first aluminum metallization level, such restrictions extend to the fabrication of multilevel structures that are now essential in increasing packing density of interconnect lines. The fabrication of ultra large scale integrated (ULSI) devices under thermal budget restrictions requires the reassessment of existing and the development of new microelectronic materials and processes. This book addresses three broad but interrelated areas. The first area focuses on the subject of rapid thermal processing (RTP), a technology that allows minimization of processing time while relaxing the constraints on high temperature. Initially developed to limit dopant redistribution, current applications of RTP are shown here to encompass annealing, oxidation, nitridation, silicidation, glass reflow, and contact sintering. In a second but complementary area, advances in equipment design and performance of rapid thermal processing equipment are presented in conjunction with associated issues of temperature measurement and control. Defect mechanisms are assessed together with the resulting properties of rapidly deposited and processed films. The concept of RTP integration for a full CMOS device process is also examined together with its impact on device characteristics.

Laser Surface Treatment of Metals

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Publisher : Springer Science & Business Media
ISBN 13 : 9400944683
Total Pages : 670 pages
Book Rating : 4.4/5 (9 download)

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Book Synopsis Laser Surface Treatment of Metals by : C.W. Draper

Download or read book Laser Surface Treatment of Metals written by C.W. Draper and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 670 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of the NATO Advanced Study Institute, San Miniato, Italy, September 2-13, 1985

Pulsed Laser Ablation of Solids

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Publisher : Springer Science & Business Media
ISBN 13 : 3642409784
Total Pages : 241 pages
Book Rating : 4.6/5 (424 download)

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Book Synopsis Pulsed Laser Ablation of Solids by : Mihai Stafe

Download or read book Pulsed Laser Ablation of Solids written by Mihai Stafe and published by Springer Science & Business Media. This book was released on 2013-11-09 with total page 241 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book introduces ‘the state of the art' of pulsed laser ablation and its applications. It is based on recent theoretical and experimental studies. The book reaches from the basics to advanced topics of pulsed laser ablation. Theoretical and experimental fundamental phenomena involved in pulsed laser ablation are discussed with respect to material properties, laser wavelength, fluence and intensity regime of the light absorbed linearly or non-linearly in the target material. The energy absorbed by the electrons leads to atom/molecule excitation, ionization and/or direct chemical bond breaking and is also transferred to the lattice leading to material heating and phase transitions. Experimental non-invasive optical methods for analyzing these phenomena in real time are described. Theoretical models for pulsed laser ablation and phase transitions induced by laser beams and laser-vapour/plasma interaction during the plume expansion above the target are also presented. Calculations of the ablation speed and dimensions of the ablated micro- and nano-structures are performed. The validity and required refinement of different models in different experimental conditions is provided. The pulsed laser deposition process which bases on collecting the ablated particles on a surface is analyzed in terms of efficiency and quality of the deposited films as a function of ambient conditions, target material, laser parameters and substrate characteristics. The interaction between the incident laser and the ablation plasma is analyzed with respect to its influence on the structures of the deposited films and its capacity to generate high harmonics and single attosecond pulses which are highly desirable in pump-probe experiments.

Silicon Integrated Circuits

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Publisher : Academic Press
ISBN 13 : 1483214788
Total Pages : 371 pages
Book Rating : 4.4/5 (832 download)

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Book Synopsis Silicon Integrated Circuits by : Dawon Kahng

Download or read book Silicon Integrated Circuits written by Dawon Kahng and published by Academic Press. This book was released on 2013-10-22 with total page 371 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon Integrated Circuits, Part 2 covers some of the most promising approaches along with the new understanding of processing-related areas of physics and chemistry. The first chapter is about the transient thermal processing of silicon, including annealing with directed-energy beams and rapid isothermal annealing; adiabatic annealing with laser and electron beams; pulsed melting; thermal flux annealing; rapid isothermal annealing; and several applications stemming from rapid annealing and semiconductor processing with directed-energy beams. The second chapter is concerned with the use of electron cyclotron resonance plasmas in two important materials processing techniques: reactive ion-beam etching and plasma deposition. The last chapter of the book deals with the exploding area of very large scale integration processing and process simulation. Physicists, chemists, and engineers involved in silicon integrated circuits will find the book invaluable.

VLSI Science and Technology

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Publisher :
ISBN 13 :
Total Pages : 526 pages
Book Rating : 4.0/5 ( download)

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Book Synopsis VLSI Science and Technology by :

Download or read book VLSI Science and Technology written by and published by . This book was released on 1984 with total page 526 pages. Available in PDF, EPUB and Kindle. Book excerpt: