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Ion Implantation For Materials Processing
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Book Synopsis Ion Implantation for Materials Processing by : F. A. Smidt
Download or read book Ion Implantation for Materials Processing written by F. A. Smidt and published by William Andrew. This book was released on 1983 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt: Good,No Highlights,No Markup,all pages are intact, Slight Shelfwear,may have the corners slightly dented, may have slight color changes/slightly damaged spine.
Book Synopsis Ion Implantation and Synthesis of Materials by : Michael Nastasi
Download or read book Ion Implantation and Synthesis of Materials written by Michael Nastasi and published by Springer Science & Business Media. This book was released on 2007-05-16 with total page 271 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.
Book Synopsis Ion Beams in Materials Processing and Analysis by : Bernd Schmidt
Download or read book Ion Beams in Materials Processing and Analysis written by Bernd Schmidt and published by Springer Science & Business Media. This book was released on 2012-12-13 with total page 425 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
Book Synopsis The Use of Ion Implantation for Materials Processing by : F. A. Smidt
Download or read book The Use of Ion Implantation for Materials Processing written by F. A. Smidt and published by . This book was released on 1984 with total page 189 pages. Available in PDF, EPUB and Kindle. Book excerpt: An interdisciplinary program on the use of ion implantation for materials processing is being conducted at NRL. This report describes the important factors in ion implantation science and technology and reports progress in the use of ion implantation to modify friction, wear, fatigue, corrosion, optical and magnetic properties of materials. (Author).
Book Synopsis Ion Implantation and Beam Processing by : J. S. Williams
Download or read book Ion Implantation and Beam Processing written by J. S. Williams and published by Academic Press. This book was released on 2014-06-28 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.
Book Synopsis Ion Implantation: Basics to Device Fabrication by : Emanuele Rimini
Download or read book Ion Implantation: Basics to Device Fabrication written by Emanuele Rimini and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.
Book Synopsis Ion Implantation in Diamond, Graphite and Related Materials by : M.S. Dresselhaus
Download or read book Ion Implantation in Diamond, Graphite and Related Materials written by M.S. Dresselhaus and published by Springer Science & Business Media. This book was released on 2013-03-08 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt: Carbon has always been a unique and intriguing material from a funda mental standpoint and, at the same time, a material with many technological uses. Carbon-based materials, diamond, graphite and their many deriva tives, have attracted much attention in recent years for many reasons. Ion implantation, which has proven to be most useful in modifying the near surface properties of many kinds of materials, in particular semiconductors, has also been applied to carbon-based materials. This has yielded, mainly in the last decade, many scientifically interesting and technologically impor tant results. Reports on these studies have been published in a wide variety of journals and topical conferences, which often have little disciplinary overlap, and which often address very different audiences. The need for a review to cover in an integrated way the various diverse aspects of the field has become increasingly obvious. Such a review should allow the reader to get an overview of the research that has been done thus far, to gain an ap preciation of the common features in the response of the various carbon to ion impact, and to become aware of current research oppor allotropes tunities and unresolved questions waiting to be addressed. Realizing this, and having ourselves both contributed to the field, we decided to write a review paper summarizing the experimental and theoretical status of ion implantation into diamond, graphite and related materials.
Book Synopsis Ion-Solid Interactions by : Michael Nastasi
Download or read book Ion-Solid Interactions written by Michael Nastasi and published by Cambridge University Press. This book was released on 1996-03-29 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: Comprehensive guide to an important materials science technique for students and researchers.
Download or read book Ion Implantation written by Ishaq Ahmad and published by BoD – Books on Demand. This book was released on 2017-06-14 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation is one of the promising areas of sciences and technologies. It has been observed as a continuously evolving technology. In this book, there is a detailed overview of the recent ion implantation research and innovation along with the existing ion implantation technological issues especially in microelectronics. The book also reviews the basic knowledge of the radiation-induced defects production during the ion implantation in case of a semiconductor structure for fabrication and development of the required perfect microelectronic devices. The improvement of the biocompatibility of biomaterials by ion implantation, which is a hot research topic, has been summarized in the book as well. Moreover, advanced materials characterization techniques are also covered in this book to evaluate the ion implantation impact on the materials.
Book Synopsis Materials and Process Characterization of Ion Implantation by : Michael I. Current
Download or read book Materials and Process Characterization of Ion Implantation written by Michael I. Current and published by . This book was released on 1997 with total page 487 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ion Implantation in Semiconductors and Other Materials by : Billy Crowder
Download or read book Ion Implantation in Semiconductors and Other Materials written by Billy Crowder and published by Springer Science & Business Media. This book was released on 2013-03-13 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt: During the years since the first conference in this series was held at Thousand Oaks, California, in 1970, ion implantation has been an expanding and exciting research area. The advances in this field were so rapid that a second conference convened at Garmisch Partenkirchen, Germany, in 1971. At the present time, our under standing of the ion implantation process in semiconductors such as Si and Ge has reached a stage of maturity and ion implantation techniques are firmly established in semiconductor device technology. The advances in compound semiconductors have not been as rapid. There has also been a shift in emphasis in ion implanta tion research from semiconductors to other materials such as metals and insulators. It was appropriate to increase the scope of the conference and the IIIrd International Conference on Ion Implanta tion in Semiconductors and Other Materials was held at Yorktown Heights, New York, December 11 to 14, 1972. A significant number of the papers presented at this conference dealt with ion implanta tion in metals, insulators, and compound semiconductors. The International Committee responsible for organizing this conference consisted of B. L. Crowder, J. A. Davies, F. H. Eisen, Ph. Glotin, T. Itoh, A. U. MacRae, J. W. Mayer, G. Dearnaley, and I. Ruge. The Conference attracted 180 participants from twelve countries. The success of the Conference was due in large measure to the financial support of our sponsors, Air Force Cambridge Research Laboratories and the Office of Naval Research.
Book Synopsis The Basics of Ion Implantation by : Michael I. Current
Download or read book The Basics of Ion Implantation written by Michael I. Current and published by . This book was released on 1997 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Materials Processing Diamond: Etching, Doping by Ion Implantation and Contact Formation by : Wei-Kan Chu
Download or read book Materials Processing Diamond: Etching, Doping by Ion Implantation and Contact Formation written by Wei-Kan Chu and published by . This book was released on 1988 with total page 43 pages. Available in PDF, EPUB and Kindle. Book excerpt: We have doped natural diamond with B or P ion implantation at liquid nitrogen temperature. Ions of C were implanted prior to the dopant implants, in order to enhance the vacancy concentration in the diamond, thereby increasing the likelihood that the dopant atoms would occupy substitutional lattice sites, and thus be electrically active. Various post-implantation annealing methods were employed to reduce the residual damage in the crystals. Type IIa diamond crystals were implanted with boron ions with or without prior carbon ion implantation. The samples were kept at liquid nitrogen temperature during both implantation steps. A strong near-edge optical absorption band appeared after implantation, and partially recovered during annealing at 800 C. For the highest B implantation fluence, optical absorption peaks at 2800 to 3000 reciprocal centimeters were observed that were in the same vicinity as the absorption peaks attributed to substitutional boron atoms in natural p-type diamond. (JES).
Book Synopsis Materials Processing by Cluster Ion Beams by : Isao Yamada
Download or read book Materials Processing by Cluster Ion Beams written by Isao Yamada and published by CRC Press. This book was released on 2015-08-20 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing. Written by the originator of the gas cluster ion beam (GCIB) concept, this book:Offers an overview of ion beam technologies, f
Book Synopsis Ion Implantation and Ion Beam Processing of Materials by : G. K. Hubler
Download or read book Ion Implantation and Ion Beam Processing of Materials written by G. K. Hubler and published by North Holland. This book was released on 1984 with total page 816 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Materials Surface Processing by Directed Energy Techniques by : Yves Pauleau
Download or read book Materials Surface Processing by Directed Energy Techniques written by Yves Pauleau and published by Elsevier. This book was released on 2006-04-25 with total page 745 pages. Available in PDF, EPUB and Kindle. Book excerpt: The current status of the science and technology related to coatings, thin films and surface modifications produced by directed energy techniques is assessed in Materials Surface Processing by Directed Energy Techniques. The subject matter is divided into 20 chapters - each presented at a tutorial level – rich with fundamental science and experimental results. New trends and new results are also evoked to give an overview of future developments and applications. Provides a broad overview on modern coating and thin film deposition techniques, and their applications Presents and discusses various problems of physics and chemistry involved in the production, characterization and applications of coatings and thin films Each chapter includes experimental results illustrating various models, mechanisms or theories
Book Synopsis Materials Processing of Diamond: Etching, Doping by Ion Implantation and Contact Formation by :
Download or read book Materials Processing of Diamond: Etching, Doping by Ion Implantation and Contact Formation written by and published by . This book was released on 1992 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt: A summary of work achieved under this grant is given, including ion implantation doping of natural diamond, annealing of implantation damage, characterization methods, contact formation using a sputtering method, and plasma etching.
