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Author : James Karsten Hirvonen
Publisher :
ISBN 13 :
Total Pages : 59 pages
Book Rating : 4.:/5 (355 download)
Download or read book Ion Beam Assisted Thin Film Deposition written by James Karsten Hirvonen and published by . This book was released on 1991 with total page 59 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Agustin Gonzalez-elipe
Publisher : World Scientific
ISBN 13 : 1783261048
Total Pages : 299 pages
Book Rating : 4.7/5 (832 download)
Download or read book Low Energy Ion Assisted Film Growth written by Agustin Gonzalez-elipe and published by World Scientific. This book was released on 2003-03-21 with total page 299 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.
Author : T. Itoh
Publisher : Elsevier
ISBN 13 : 0444599088
Total Pages : 458 pages
Book Rating : 4.4/5 (445 download)
Download or read book Ion Beam Assisted Film Growth written by T. Itoh and published by Elsevier. This book was released on 2012-12-02 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides up to date information on the experimental, theoretical and technological aspects of film growth assisted by ion beams. Ion beam assisted film growth is one of the most effective techniques in aiding the growth of high-quality thin solid films in a controlled way. Moreover, ion beams play a dominant role in the reduction of the growth temperature of thin films of high melting point materials. In this way, ion beams make a considerable and complex contribution to film growth. The volume will be essential reading for scientists, engineers and students working in this field.
Author : Michael Nastasi
Publisher : Cambridge University Press
ISBN 13 : 052137376X
Total Pages : 572 pages
Book Rating : 4.5/5 (213 download)
Download or read book Ion-Solid Interactions written by Michael Nastasi and published by Cambridge University Press. This book was released on 1996-03-29 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: Comprehensive guide to an important materials science technique for students and researchers.
Author : Tejaswini Miryala
Publisher :
ISBN 13 :
Total Pages : 88 pages
Book Rating : 4.:/5 (12 download)
Download or read book Deposition of Silicon Thin Films by Ion Beam Assisted Deposition written by Tejaswini Miryala and published by . This book was released on 2017 with total page 88 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 68 pages
Book Rating : 4.:/5 (924 download)
Download or read book Use of Ion Beam Assisted Deposition to Modify Microscructure and Properties of Thin Films written by and published by . This book was released on 1990 with total page 68 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : D. M. Mattox
Publisher : Cambridge University Press
ISBN 13 : 0080946585
Total Pages : 947 pages
Book Rating : 4.0/5 (89 download)
Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Author : Bentao Cui
Publisher :
ISBN 13 :
Total Pages : 426 pages
Book Rating : 4.:/5 (319 download)
Download or read book Study of Ion Beam Assisted Deposition of Low Dislocation Density GaN Thin Films Using Molecular Beam Epitaxy written by Bentao Cui and published by . This book was released on 2005 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Jerome J. Cuomo
Publisher : William Andrew
ISBN 13 :
Total Pages : 464 pages
Book Rating : 4.3/5 (91 download)
Download or read book Handbook of Ion Beam Processing Technology written by Jerome J. Cuomo and published by William Andrew. This book was released on 1989 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.
Author : Y. Pauleau
Publisher : Springer Science & Business Media
ISBN 13 : 940100353X
Total Pages : 372 pages
Book Rating : 4.4/5 (1 download)
Download or read book Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Author : Bernd Rauschenbach
Publisher : Springer Nature
ISBN 13 : 3030972771
Total Pages : 763 pages
Book Rating : 4.0/5 (39 download)
Download or read book Low-Energy Ion Irradiation of Materials written by Bernd Rauschenbach and published by Springer Nature. This book was released on 2022-08-19 with total page 763 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive introduction to all aspects of low-energy ion–solid interaction from basic principles to advanced applications in materials science. It features a balanced and insightful approach to the fundamentals of the low-energy ion–solid surface interaction, focusing on relevant topics such as interaction potentials, kinetics of binary collisions, ion range, radiation damages, and sputtering. Additionally, the book incorporates key updates reflecting the latest relevant results of modern research on topics such as topography evolution and thin-film deposition under ion bombardment, ion beam figuring and smoothing, generation of nanostructures, and ion beam-controlled glancing angle deposition. Filling a gap of almost 20 years of relevant research activity, this book offers a wealth of information and up-to-date results for graduate students, academic researchers, and industrial scientists working in these areas.
Author : Krishna Seshan
Publisher : William Andrew
ISBN 13 : 0815517785
Total Pages : 430 pages
Book Rating : 4.8/5 (155 download)
Download or read book Handbook of Thin Film Deposition Processes and Techniques written by Krishna Seshan and published by William Andrew. This book was released on 2001-02-01 with total page 430 pages. Available in PDF, EPUB and Kindle. Book excerpt: New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Author :
Publisher :
ISBN 13 :
Total Pages : 29 pages
Book Rating : 4.:/5 (727 download)
Download or read book Uses of Ion Bombardment in Thin-film Deposition written by and published by . This book was released on 1990 with total page 29 pages. Available in PDF, EPUB and Kindle. Book excerpt: Use of plasma- and ion-beam-modified surfaces and surface coatings in continually expanding in engineering disciplines. The purpose of these modifications and treatments is to impart favorable properties, such as wear resistance and lubricity, to the surfaces, while at the same time retaining the strength or toughness of the bulk materials. Energetic-ion bombardment can be used to modify the structural and chemical properties of surfaces or applied coatings. Ion-implantation has been used for many years, and recently, other surface-modification techniques, among them ion-beam mixing and ion-beam-assisted deposition, have attracted attention because they permit application of highly adherent lubricious and wear-resistant films. In this paper, ion-beam techniques are described from the viewpoint of ion-surface interactions, and some avenues for the engineering of tribological surfaces are presented. 100 refs., 4 figs.
Author : Peter M. Martin
Publisher : William Andrew
ISBN 13 : 0815520328
Total Pages : 932 pages
Book Rating : 4.8/5 (155 download)
Download or read book Handbook of Deposition Technologies for Films and Coatings written by Peter M. Martin and published by William Andrew. This book was released on 2009-12-01 with total page 932 pages. Available in PDF, EPUB and Kindle. Book excerpt: This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Author : Liang Dong
Publisher :
ISBN 13 :
Total Pages : 302 pages
Book Rating : 4.3/5 (91 download)
Download or read book Molecular Dynamics Study of Texture Control Under Ion Beam Assisted Deposition written by Liang Dong and published by . This book was released on 2000 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Brian M. Stout
Publisher :
ISBN 13 :
Total Pages : 114 pages
Book Rating : 4.:/5 (89 download)
Download or read book Synthesis and Characterization of Diamond-like Carbon Coatings Deposited by Plasma Source Ion Implantation and Conventional Ion Beam Assisted Deposition Processes written by Brian M. Stout and published by . This book was released on 1999 with total page 114 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diamond-like carbon coatings produced by Plasma Source Ion Implantation (PSII) and beamline Ion Beam Assisted Deposition (IBAD) were synthesized and studied. Gas pressure and electrical current were used as variables to design four independent PSII test sets. Beamline IBAD samples were produced with a pre-optimized set of parameters. Profilometry measurements showed the films to have thicknesses between 1.44 +/- 09 and 1.64 +/- 04 microns and to possess very low roughness averages, ranging from 14 +/- 3 to 28 +/- 3 nm, which correlate with substrate surface roughness. Atomic Force Microscopy revealed that diamond-like carbon crystal sizes varied significantly with chamber pressure. Crystals were generally spherical in shape suggesting that films were highly amorphous. Microhardness and nanohardness test results showed the hardest films to be greater than 3 times the hardness of untreated steel. The elastic modulus of the films, measured during the nanohardness test, was directly related to film hardness. Fretting wear and Pin-on-Disk tests were performed to quantitatively assess the ability of films to resist wear. Fretting wear tests showed a dramatic decrease in friction for diamond-like carbon films with friction levels ranging from 10% to 30% of that of untreated steel. Pin-on-Disk tests revealed a significant improvement in wear resistance prior to stylus penetration into the substrate.
Author : Donald M. Mattox
Publisher : William Andrew
ISBN 13 : 0128130857
Total Pages : 383 pages
Book Rating : 4.1/5 (281 download)
Download or read book The Foundations of Vacuum Coating Technology written by Donald M. Mattox and published by William Andrew. This book was released on 2018-08-21 with total page 383 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. History and detailed descriptions of Vacuum Deposition Technologies Review of Enabling Technologies and their importance to current applications Extensively referenced text Patents are referenced as part of the history Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology Glossary of Terms for vacuum coating
