Integration and Characterization of Atomic Layer Deposited TiO2 Thin Films for Resistive Switching Applications

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Publisher :
ISBN 13 : 9783893369706
Total Pages : 166 pages
Book Rating : 4.3/5 (697 download)

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Book Synopsis Integration and Characterization of Atomic Layer Deposited TiO2 Thin Films for Resistive Switching Applications by : Marcel Reiners

Download or read book Integration and Characterization of Atomic Layer Deposited TiO2 Thin Films for Resistive Switching Applications written by Marcel Reiners and published by . This book was released on 2014 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Resistive Switching in TiO2 Thin Films

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Publisher : Forschungszentrum Jülich
ISBN 13 : 3893367071
Total Pages : 141 pages
Book Rating : 4.8/5 (933 download)

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Book Synopsis Resistive Switching in TiO2 Thin Films by : Lin Yang

Download or read book Resistive Switching in TiO2 Thin Films written by Lin Yang and published by Forschungszentrum Jülich. This book was released on 2011 with total page 141 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Resistive switching in ZrO2 based metal-oxide-metal structures

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Publisher : Forschungszentrum Jülich
ISBN 13 : 3893369716
Total Pages : 151 pages
Book Rating : 4.8/5 (933 download)

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Book Synopsis Resistive switching in ZrO2 based metal-oxide-metal structures by : Irina Kärkkänen

Download or read book Resistive switching in ZrO2 based metal-oxide-metal structures written by Irina Kärkkänen and published by Forschungszentrum Jülich. This book was released on 2014 with total page 151 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Titanium Dioxide (TiO2) and Its Applications

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Publisher : Elsevier
ISBN 13 : 0128204346
Total Pages : 735 pages
Book Rating : 4.1/5 (282 download)

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Book Synopsis Titanium Dioxide (TiO2) and Its Applications by : Francesco Parrino

Download or read book Titanium Dioxide (TiO2) and Its Applications written by Francesco Parrino and published by Elsevier. This book was released on 2020-11-29 with total page 735 pages. Available in PDF, EPUB and Kindle. Book excerpt: Scientific interest in TiO2-based materials has exponentially grown in the last few decades. Titanium Dioxide (TiO2) and Its Applications introduces the main physicochemical properties of TiO2 which are the basis of its applications in various fields. While the basic principles of the TiO2 properties have been the subject of various previous publications, this book is mainly devoted to TiO2 applications. The book includes contributions written by experts from a wide range of disciplines in order to address titanium dioxide's utilization in energy, consumer, materials, devices, and catalytic applications. The various applications identified include: photocatalysis, catalysis, optics, electronics, energy storage and production, ceramics, pigments, cosmetics, sensors, and heat transfer. Titanium Dioxide (TiO2) and Its Applications is suitable for a wide readership in the disciplines of materials science, chemistry, and engineering in both academia and industry. Includes a wide range of current and emerging applications of titanium dioxide in the fields of energy, consumer applications, materials, and devices Provides a brief overview of titanium dioxide and its properties, as well as techniques to design, deposit, and study the material Discusses the relevant properties, preparation methods, and other apposite considerations in each application-focused chapter

Atomic Layer Deposition and Characterization of Metal Oxide Thin Films

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Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (135 download)

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Book Synopsis Atomic Layer Deposition and Characterization of Metal Oxide Thin Films by : Ali Mahmoodinezhad

Download or read book Atomic Layer Deposition and Characterization of Metal Oxide Thin Films written by Ali Mahmoodinezhad and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Deposition for Semiconductors

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Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)

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Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Memristor Technology: Synthesis and Modeling for Sensing and Security Applications

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Publisher : Springer
ISBN 13 : 3319656996
Total Pages : 118 pages
Book Rating : 4.3/5 (196 download)

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Book Synopsis Memristor Technology: Synthesis and Modeling for Sensing and Security Applications by : Heba Abunahla

Download or read book Memristor Technology: Synthesis and Modeling for Sensing and Security Applications written by Heba Abunahla and published by Springer. This book was released on 2017-09-18 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides readers with a single-source guide to fabricate, characterize and model memristor devices for sensing applications. The authors describe a correlated, physics-based model to simulate and predict the behavior of devices fabricated with different oxide materials, active layer thickness, and operating temperature. They discuss memristors from various perspectives, including working mechanisms, different synthesis methods, characterization procedures, and device employment in radiation sensing and security applications.

Deposition and Characterization of Multi-functional, Complex Thin Films Using Atomic Layer Deposition for Copper Corrosion Protection

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Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (134 download)

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Book Synopsis Deposition and Characterization of Multi-functional, Complex Thin Films Using Atomic Layer Deposition for Copper Corrosion Protection by : Gül Dogan

Download or read book Deposition and Characterization of Multi-functional, Complex Thin Films Using Atomic Layer Deposition for Copper Corrosion Protection written by Gül Dogan and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Optical and Mechanical Characterization of Spin-On Deposited Silicon and Titanium Dioxide Films

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Publisher :
ISBN 13 :
Total Pages : 5 pages
Book Rating : 4.:/5 (228 download)

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Book Synopsis Optical and Mechanical Characterization of Spin-On Deposited Silicon and Titanium Dioxide Films by : P. Shen

Download or read book Optical and Mechanical Characterization of Spin-On Deposited Silicon and Titanium Dioxide Films written by P. Shen and published by . This book was released on 1992 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt: Spin-on deposited Sio2-TiO2 thin films (pure and doped with dyes) are produced. Their optical and mechanical properties are determined and their use for a number of applications is investigated. The spin-on deposited SiO2 film has been successfully doped with coumarin as a colour center and characterized as a waveguide overlay. Solution deposited thin films of silicon and titanium dioxide, and their mixtures, are suitable for a number of applications such as antireflection coating and waveguides for integrated optics. Both dipping and spinning methods can be used to obtain good quality films 1 2. For the dipping process, processing standardization ensures good reproducibility of refractive index and thickness 1. In this paper, we use a spin-on and baking process to produce pure and doped SiO2 and TiO2 films and we study some of their optical and mechanical properties. The solution we used is commercially available E. Merck liquicoat solutions 3. They are metal alkoxide colloidal solutions containing 7% and 9% SiO2 and TiO2 respectively. By varying the volume ratio of the two component solutions, films of various thickness (80-250 nm) and refractive index (1.4-2.0) can be obtained. We used 0.02 inch thick P-doped 100 silicon, Coming 0211 glass, and 1 mm thick Fisher microscope slides as three substrate materials. We use standard silicon and glass cleaning procedures and carried out the film deposition in a class 100 clean room. The solution were mixed immediately before coating to ensure.

Nanoelectronics and Information Technology

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Publisher : Wiley-VCH
ISBN 13 : 9783527403639
Total Pages : 0 pages
Book Rating : 4.4/5 (36 download)

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Book Synopsis Nanoelectronics and Information Technology by : Rainer Waser

Download or read book Nanoelectronics and Information Technology written by Rainer Waser and published by Wiley-VCH. This book was released on 2003-04-09 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Providing an introduction to electronic materials and device concepts for the major areas of current and future information technology, the value of this book lies in its focus on the underlying principles. Illustrated by contemporary examples, these basic principles will hold, despite the rapid developments in this field, especially emphasizing nanoelectronics. There is hardly any field where the links between basic science and application are tighter than in nanoelectronics & information technology. As an example, the design of resonant tunneling transistors, single electron devices or molecular electronic structures is simply inconceivable without delving deep into quantum mechanics. This textbook is primarily aimed at students of physics, electrical engineering and information technology, as well as material science in their 3rd year and higher. It is equally of interest to professionals wanting a broader overview of this hot topic. "Nanoelectronics and Information Technology" by Rainer Waser and his colleagues is an outstanding compendium of information about an exciting new field. Owing to its high quality and complete coverage of the many topics in this area, this well referenced book will have a long and very useful life as a primary text for students experienced and new in nanoelectronics. It is a very impressive book." (Richard Siegel)

Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization

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Publisher :
ISBN 13 :
Total Pages : 37 pages
Book Rating : 4.:/5 (227 download)

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Book Synopsis Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization by :

Download or read book Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization written by and published by . This book was released on 1995 with total page 37 pages. Available in PDF, EPUB and Kindle. Book excerpt: The ALE technique has been employed to deposit monocrystalline 3C-SiC thin films at 860 + or - 10 deg C. Wafers containing heterojunction bipolar transistor structures have been completely processed and characterized. No transistor activity was detected in any of the HBT structures. Post growth oxidation anneals in argon followed or proceeded by oxygen environments improved both properties. However, the anneals in oxygen also resulted in the growth of a SiO2 layer at the silicon interface which reduced the capacitance of the structure. An expression for the optimum oxidation time, tau, was developed as a function of the initial thicknesses of the deposited film. The films have large MOS capacitance but also have larger leakage currents compared to those of epitaxial CeO2 films on Si(111) substrates. However, improved leakage and breakdown characteristics were obtained with annealing in forming gas. The growth parameter, alpha, the ratio of the growth rates on?100! and?111! facets for diamond films deposited on Si and Ti by microwave plasma CVD has been studied using SEM micrographs. Different morphologies were generated on Si under different deposition conditions. The value of alpha increased with decreasing temperature and increasing methane concentration, as expected. A value of alpha for Ti was not obtained due to the heavily twinned particles.

Design and Development of Nanostructured Thin Films

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Publisher : MDPI
ISBN 13 : 3039287389
Total Pages : 386 pages
Book Rating : 4.0/5 (392 download)

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Book Synopsis Design and Development of Nanostructured Thin Films by : Antonella Macagnano

Download or read book Design and Development of Nanostructured Thin Films written by Antonella Macagnano and published by MDPI. This book was released on 2020-05-13 with total page 386 pages. Available in PDF, EPUB and Kindle. Book excerpt: Due to their unique size-dependent physicochemical properties, nanostructured thin films are used in a wide range of applications from smart coating and drug delivery to electrocatalysis and highly-sensitive sensors. Depending on the targeted application and the deposition technique, these materials have been designed and developed by tuning their atomic-molecular 2D- and/or 3D-aggregation, thickness, crystallinity, and porosity, having effects on their optical, mechanical, catalytic, and conductive properties. Several open questions remain about the impact of nanomaterial production and use on environment and health. Many efforts are currently being made not only to prevent nanotechnologies and nanomaterials from contributing to environmental pollution but also to design nanomaterials to support, control, and protect the environment. This Special Issue aims to cover the recent advances in designing nanostructured films focusing on environmental issues related to their fabrication processes (e.g., low power and low cost technologies, the use of environmentally friendly solvents), their precursors (e.g., waste-recycled, bio-based, biodegradable, and natural materials), their applications (e.g., controlled release of chemicals, mimicking of natural processes, and clean energy conversion and storage), and their use in monitoring environment pollution (e.g., sensors optically- or electrically-sensitive to pollutants)

Chemical Solution Deposition of Functional Oxide Thin Films

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Publisher : Springer Science & Business Media
ISBN 13 : 3211993118
Total Pages : 801 pages
Book Rating : 4.2/5 (119 download)

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Book Synopsis Chemical Solution Deposition of Functional Oxide Thin Films by : Theodor Schneller

Download or read book Chemical Solution Deposition of Functional Oxide Thin Films written by Theodor Schneller and published by Springer Science & Business Media. This book was released on 2014-01-24 with total page 801 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.

Spectroscopic Ellipsometry

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Publisher : John Wiley & Sons
ISBN 13 : 9780470060186
Total Pages : 388 pages
Book Rating : 4.0/5 (61 download)

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Book Synopsis Spectroscopic Ellipsometry by : Hiroyuki Fujiwara

Download or read book Spectroscopic Ellipsometry written by Hiroyuki Fujiwara and published by John Wiley & Sons. This book was released on 2007-09-27 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.

Thin Film Processes

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Publisher : BoD – Books on Demand
ISBN 13 : 9535130676
Total Pages : 222 pages
Book Rating : 4.5/5 (351 download)

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Book Synopsis Thin Film Processes by : Jagannathan Thirumalai

Download or read book Thin Film Processes written by Jagannathan Thirumalai and published by BoD – Books on Demand. This book was released on 2017-04-12 with total page 222 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets presents topics on global advancements in theoretical and experimental facts, instrumentation and practical applications of thin-film material perspectives and its applications. The aspect of this book is associated with the thin-film physics, the methods of deposition, optimization parameters and its wide technological applications. This book is divided into three main sections: Thin Film Deposition Methods: A Synthesis Perspective; Optimization Parameters in the Thin Film Science and Application of Thin Films: A Synergistic Outlook. Collected chapters provide applicable knowledge for a wide range of readers: common men, students and researchers. It was constructed by experts in diverse fields of thin-film science and technology from over 15 research institutes across the globe.

Chemically Deposited Nanocrystalline Metal Oxide Thin Films

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Publisher : Springer Nature
ISBN 13 : 3030684628
Total Pages : 926 pages
Book Rating : 4.0/5 (36 download)

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Book Synopsis Chemically Deposited Nanocrystalline Metal Oxide Thin Films by : Fabian I. Ezema

Download or read book Chemically Deposited Nanocrystalline Metal Oxide Thin Films written by Fabian I. Ezema and published by Springer Nature. This book was released on 2021-06-26 with total page 926 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book guides beginners in the areas of thin film preparation, characterization, and device making, while providing insight into these areas for experts. As chemically deposited metal oxides are currently gaining attention in development of devices such as solar cells, supercapacitors, batteries, sensors, etc., the book illustrates how the chemical deposition route is emerging as a relatively inexpensive, simple, and convenient solution for large area deposition. The advancement in the nanostructured materials for the development of devices is fully discussed.

Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications

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Publisher : Forschungszentrum Jülich
ISBN 13 : 3893368981
Total Pages : 199 pages
Book Rating : 4.8/5 (933 download)

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Book Synopsis Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications by : Alexander Nichau

Download or read book Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications written by Alexander Nichau and published by Forschungszentrum Jülich. This book was released on 2014-04-03 with total page 199 pages. Available in PDF, EPUB and Kindle. Book excerpt: