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Ieee Ucs Semi International Symposium On Semiconductor Manufacturing
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Book Synopsis Handbook of Semiconductor Manufacturing Technology by : Yoshio Nishi
Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2017-12-19 with total page 3276 pages. Available in PDF, EPUB and Kindle. Book excerpt: Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Book Synopsis Crystalline Defects and Contamination by : Bernd O. Kolbesen
Download or read book Crystalline Defects and Contamination written by Bernd O. Kolbesen and published by The Electrochemical Society. This book was released on 2001 with total page 380 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis IEEE/SEMI International Semiconductor Manufacturing Science Symposium by : IEEE/SEMI International Semiconductor Manufacturing Science Symposium
Download or read book IEEE/SEMI International Semiconductor Manufacturing Science Symposium written by IEEE/SEMI International Semiconductor Manufacturing Science Symposium and published by . This book was released on 1992 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book New Serial Titles written by and published by . This book was released on 1996 with total page 1480 pages. Available in PDF, EPUB and Kindle. Book excerpt: A union list of serials commencing publication after Dec. 31, 1949.
Book Synopsis Handbook for Cleaning for Semiconductor Manufacturing by : Karen A. Reinhardt
Download or read book Handbook for Cleaning for Semiconductor Manufacturing written by Karen A. Reinhardt and published by John Wiley & Sons. This book was released on 2011-04-12 with total page 596 pages. Available in PDF, EPUB and Kindle. Book excerpt: Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.
Book Synopsis Formal Methods in Manufacturing by : Javier Campos
Download or read book Formal Methods in Manufacturing written by Javier Campos and published by CRC Press. This book was released on 2018-09-03 with total page 719 pages. Available in PDF, EPUB and Kindle. Book excerpt: Illustrated with real-life manufacturing examples, Formal Methods in Manufacturing provides state-of-the-art solutions to common problems in manufacturing systems. Assuming some knowledge of discrete event systems theory, the book first delivers a detailed introduction to the most important formalisms used for the modeling, analysis, and control of manufacturing systems (including Petri nets, automata, and max-plus algebra), explaining the advantages of each formal method. It then employs the different formalisms to solve specific problems taken from today’s industrial world, such as modeling and simulation, supervisory control (including deadlock prevention) in a distributed and/or decentralized environment, performance evaluation (including scheduling and optimization), fault diagnosis and diagnosability analysis, and reconfiguration. Containing chapters written by leading experts in their respective fields, Formal Methods in Manufacturing helps researchers and application engineers handle fundamental principles and deal with typical quality goals in the design and operation of manufacturing systems.
Download or read book Proceedings written by and published by . This book was released on 1995 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Run-to-Run Control in Semiconductor Manufacturing by : James Moyne
Download or read book Run-to-Run Control in Semiconductor Manufacturing written by James Moyne and published by CRC Press. This book was released on 2018-10-08 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt: Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
Book Synopsis IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop by :
Download or read book IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop written by and published by Institute of Electrical & Electronics Engineers(IEEE). This book was released on 1992 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Modeling of Film Deposition for Microelectronic Applications by : Stephen M. Rossnagel
Download or read book Modeling of Film Deposition for Microelectronic Applications written by Stephen M. Rossnagel and published by . This book was released on 1996 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the properties of various thin filmsmaterials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
Book Synopsis Handbook of Cost Management by : Roman L. Weil
Download or read book Handbook of Cost Management written by Roman L. Weil and published by John Wiley & Sons. This book was released on 2005-05-31 with total page 866 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Cost Management, Second Edition covers all of the essential topics in cost management and accounting. It includes conventional topics, such as job costing and cost allocation, as well as such current topics as balanced scorecard, economic value added, logistics and marketing cost, theory of constraints, inter-organizational costing, and the cost of quality.
Download or read book JPRS Report written by and published by . This book was released on 1994-07-21 with total page 430 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :VLSI Society of India Publisher :Institute of Electrical & Electronics Engineers(IEEE) ISBN 13 :9780769500133 Total Pages :682 pages Book Rating :4.5/5 (1 download)
Book Synopsis Twelfth International Conference on VLSI Design by : VLSI Society of India
Download or read book Twelfth International Conference on VLSI Design written by VLSI Society of India and published by Institute of Electrical & Electronics Engineers(IEEE). This book was released on 1999 with total page 682 pages. Available in PDF, EPUB and Kindle. Book excerpt: The proceedings of the January 1999 conference consist of 103 papers, 11 talks, and six tutorials. The papers are grouped under the headings of TCAD to ECAD, low power, testing, co-design and synthesis, analog design, multi-valued logic, verification, digital signal processor (DSP), logic synthesis,
Book Synopsis Directory of Published Proceedings by :
Download or read book Directory of Published Proceedings written by and published by . This book was released on 1997 with total page 422 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ultraclean Surface Processing of Silicon Wafers by : Takeshi Hattori
Download or read book Ultraclean Surface Processing of Silicon Wafers written by Takeshi Hattori and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt: A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Book Synopsis Inspection and Metrology Capacity Allocation in the Full Production and Ramp Phases of Semiconductor Manufacturing by : Dadi Gudmundsson
Download or read book Inspection and Metrology Capacity Allocation in the Full Production and Ramp Phases of Semiconductor Manufacturing written by Dadi Gudmundsson and published by . This book was released on 2005 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing by : Tadahiro Ohmi
Download or read book Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing written by Tadahiro Ohmi and published by CRC Press. This book was released on 2018-10-03 with total page 569 pages. Available in PDF, EPUB and Kindle. Book excerpt: As science pushes closer toward the atomic size scale, new challenges arise to slow the pace of the miniaturization that has transformed our society and fueled the information age. New technologies are necessary to surpass these obstacles and realize the tremendous growth predicted by Moore's law. Assembled from the works of pioneering researchers, Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing presents new developments and technologies for producing the next generation of electronic circuits and displays. This book introduces radical-reaction-based semiconductor manufacturing technologies that overcome the limitations of the existing molecule-reaction-based technologies. It systematically details the procedures and underlying concepts involved in wet process technologies and applications. Following an introduction to semiconductor surface chemical electronics, expert contributors discuss the principles and technology of high-performance wet cleaning; etching technologies and processes; antistatic technology; wet vapor resist stripping technology; and process and safety technologies including waste reclamation, chemical composition control, and ultrapure water and liquid chemical supply systems and materials for fluctuation-free facilities. Currently, large production runs are needed to balance the costs of acquiring and tuning equipment for specialized operating conditions. Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing explains the technologies and processes used to meet the demand for variety and low volumes that exists in today's digital electronics marketplace.
