Read Books Online and Download eBooks, EPub, PDF, Mobi, Kindle, Text Full Free.
Growth Mechanisms And Characterization Of Hydrogenated Amorphous Silicon Alloy Films
Download Growth Mechanisms And Characterization Of Hydrogenated Amorphous Silicon Alloy Films full books in PDF, epub, and Kindle. Read online Growth Mechanisms And Characterization Of Hydrogenated Amorphous Silicon Alloy Films ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Book Synopsis Growth Mechanisms and Characterization of Hydrogenated Amorphous- Silicon-alloy Films by :
Download or read book Growth Mechanisms and Characterization of Hydrogenated Amorphous- Silicon-alloy Films written by and published by . This book was released on 1993 with total page 17 pages. Available in PDF, EPUB and Kindle. Book excerpt: This report describes an apparatus, constructed and tested, that allows measurement of the surface morphology of as-grown hydrogenated amorphous silicon films with atomic resolution using a scanning tunneling microscope. Surface topologies of 100-[degree][Lambda]-thick intrinsic films, deposited on atomically flat, crystalline Si and GaAs, are reported. These films surfaces are relatively flat on the atomic scale, indicating fairly homogeneous, compact initial film growth. The effect of probe-tip size on the observed topology and the development of atomically sharp probes is discussed. 17 refs, 9 figs.
Book Synopsis Growth Mechanisms and Characterization of Hydrogenated Amorphous-Silicon-Alloy Films: Final Subcontract Report, 15 February 1991 - 14 April 1994 by :
Download or read book Growth Mechanisms and Characterization of Hydrogenated Amorphous-Silicon-Alloy Films: Final Subcontract Report, 15 February 1991 - 14 April 1994 written by and published by . This book was released on 1994 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Growth Mechanisms and Characterization of Hydrogenated Amorphous-silicon-alloy Films. Annual Subcontract Report, 14 February 1992--13 February 1993 by :
Download or read book Growth Mechanisms and Characterization of Hydrogenated Amorphous-silicon-alloy Films. Annual Subcontract Report, 14 February 1992--13 February 1993 written by and published by . This book was released on 1993 with total page 25 pages. Available in PDF, EPUB and Kindle. Book excerpt: This report describes work performed to better understand the atomic-scale structure of glow-discharge-produced a-Si:H, a Ge:H, and a-Si:Ge:H films; its effect on film quality; and its dependence on deposition discharge conditions. Hydrogenated a- Si films are deposited from a silane rf discharge onto atomically flat crystal Si and GaAs substrates. The substrates are then transferred in vacuum to a scanning tunneling microscope, where the atomic-scale surface morphology is measured. The films were deposited at T{sub s} = 30°C and 250°C from a silane rf glow discharge using device-quality deposition conditions of 2.66 Pa (0.5 Torr) silane pressure, 1.7 Å/s deposition rate, and small power/flow; IR absorption, [sigma]{sub L}, and [sigma]{sub D} indicate high-quality intrinsic films. From the thickness dependence of the surface morphology, we determined that the films initially conform smoothly to an atomically flat Si or GaAs substrate, but as the thickness increases the roughness steadily increases to approximately 10% of the length of the scanned region. The surface of 100-400-nm-thick films is highly inhomogeneous, with steep hills and canyons in some areas and large atomically smooth regions in others. These unexpectedly large surface irregularities indicate severe and often connected void structures in the growing film, as well as relatively limited-range surface diffusion of the incorporating SiH3 radicals. On the other hand, large areas of atomically flat surface were occasionally found, indicating the possibility of growing a homogeneous and compact amorphous film if appropriate growth conditions could be discovered.
Book Synopsis Growth Mechanisms and Characterization of Hydrogenated Amorphous-silicon-alloy Films by : Alan C. Gallagher
Download or read book Growth Mechanisms and Characterization of Hydrogenated Amorphous-silicon-alloy Films written by Alan C. Gallagher and published by . This book was released on 1994 with total page 21 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Growth Mechanisms and Characterization of Hydrogenated Amorphous- Silicon-alloy Films. Annual Subcontract Report, 14 February 1991--13 February 1992 by :
Download or read book Growth Mechanisms and Characterization of Hydrogenated Amorphous- Silicon-alloy Films. Annual Subcontract Report, 14 February 1991--13 February 1992 written by and published by . This book was released on 1993 with total page 17 pages. Available in PDF, EPUB and Kindle. Book excerpt: This report describes an apparatus, constructed and tested, that allows measurement of the surface morphology of as-grown hydrogenated amorphous silicon films with atomic resolution using a scanning tunneling microscope. Surface topologies of 100-°[Lambda]-thick intrinsic films, deposited on atomically flat, crystalline Si and GaAs, are reported. These films surfaces are relatively flat on the atomic scale, indicating fairly homogeneous, compact initial film growth. The effect of probe-tip size on the observed topology and the development of atomically sharp probes is discussed. 17 refs, 9 figs.
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Study on the growth mechanism of hydrogenated amorphous silicon films by infrared reflection absorption spectroscopy by : Yasutake Toyoshima
Download or read book Study on the growth mechanism of hydrogenated amorphous silicon films by infrared reflection absorption spectroscopy written by Yasutake Toyoshima and published by . This book was released on 1996 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Energy Research Abstracts written by and published by . This book was released on 1995 with total page 782 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Deposition and Characterization of Hydrogenated Amorphous Silicon, Microcrystalline Silicon and Silicon Based Alloy Thin Films by : Cheng Wang
Download or read book Deposition and Characterization of Hydrogenated Amorphous Silicon, Microcrystalline Silicon and Silicon Based Alloy Thin Films written by Cheng Wang and published by . This book was released on 1991 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Growth and Characterization of Hydrogenated Amorphous Silicon Prepared Using a Combined Hot Wire and Electron Cyclotron Resonance Plasma Deposition Technique by : Matthew Alan Ring
Download or read book Growth and Characterization of Hydrogenated Amorphous Silicon Prepared Using a Combined Hot Wire and Electron Cyclotron Resonance Plasma Deposition Technique written by Matthew Alan Ring and published by . This book was released on 2003 with total page 94 pages. Available in PDF, EPUB and Kindle. Book excerpt: Hot Wire Chemical Vapor Deposition (HWCVD) is an emerging technology in semiconductor materials thin film deposition due to the high growth rates and reasonable electronic properties attainable using this method. To improve the electronic characteristics of material grown by the HWCVD method, neutral ion bombardment during growth was introduced as it is shown to be beneficial in Plasma Enhanced Chemical Vapor Deposition (PECVD). Neutral ion bombardment was accomplished by using remote Electron Cyclotron Resonance (ECR) plasma and the entire deposition technique is termed ECR-HWCVD. The ECR-HWCVD films were compared to HWCVD materials deposited without ion bombardment grown at similar conditions in the same reactor using a 10.5 cm filament to substrate distance to minimize substrate heating by radiation during deposition. The growth rate is halved when ion bombardment is added to HWCVD, however it remains four times greater than the highest quality ECR-PECVD films. Also, ECR-HWCVD material exhibited better electronic properties as shown by Urbach energy, photosensitivity, hydrogen content, microstructure parameters, and space charge limited current defect measurements. In addition, the effect of substrate temperature on hydrogen content and material microstructure was investigated. Both hydrogen content and the microstructure parameter R decreased as substrate temperature increased; and when ion bombardment was added to the deposition conditions, the microstructure parameter decreased regardless of substrate temperature.
Book Synopsis Characterization of Hydrogenated Amorphous Silicon Films by : Ernest Gerald Bylander
Download or read book Characterization of Hydrogenated Amorphous Silicon Films written by Ernest Gerald Bylander and published by . This book was released on 1988 with total page 332 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Solar Energy Update written by and published by . This book was released on 1984 with total page 884 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Surface Structure and Growth Mechanisms of Hydrogenated Amorphous Silicon by :
Download or read book Surface Structure and Growth Mechanisms of Hydrogenated Amorphous Silicon written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis SERI Photovoltaic Advanced Research and Development Bibliography, 1982-1985 by :
Download or read book SERI Photovoltaic Advanced Research and Development Bibliography, 1982-1985 written by and published by . This book was released on 1986 with total page 186 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Preparation and Characterization of Hydrogenated Amorphous Silicon Films by : Hwa Chao
Download or read book Preparation and Characterization of Hydrogenated Amorphous Silicon Films written by Hwa Chao and published by . This book was released on 1987 with total page 81 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis New Amorphous Silicon Alloy Systems by : Mridula N. Kapur
Download or read book New Amorphous Silicon Alloy Systems written by Mridula N. Kapur and published by . This book was released on 1990 with total page 640 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Small Scale Structures by : N.F. de Rooij
Download or read book Small Scale Structures written by N.F. de Rooij and published by Elsevier. This book was released on 2012-12-02 with total page 559 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book contains the proceedings of 3 symposia dealing with various aspects of small scale structures. Symposium A deals with the development of new materials, including ceramics, polymers, metals, etc., their microstructuring as well as their potential for application in microsystems. All kinds of microsystems are considered, e.g. mechanical, magnetic, optical, chemical, biochemical and issues related to assembly and packaging were also covered. Symposium B deals with four topics: synthesis and preparation of nanostructured ceramics and composites with well-controlled geometric order and chemical composition; coupling of these structures to transducers for current and future chemical and biochemical devices based upon microoptics, microelectronics, microionics, microelectrodes or molecular cages; planar thin film structures and the control of covalent thin film/transducer couplings, the control of selective, stable and sensitive recognition centers at the surface, at grain boundaries or in the bulk of selected nanostructured materials with extremely narrow particle size distributions; analysis of these structures and sensor functions by means of techniques utilizing photons, electrons, ions, or atomic particle beam probes. Symposium E examines the structure-property relationships in thin films and multilayers, from the point of view of both fundamental studies and practical applications.
