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Experimental Investigation Of Beryllium Based Multilayer Coatings For Extreme Ultraviolet Lithography
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Book Synopsis Experimental Investigation of Beryllium-based Multilayer Coatings for Extreme Ultraviolet Lithography by :
Download or read book Experimental Investigation of Beryllium-based Multilayer Coatings for Extreme Ultraviolet Lithography written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The performance of beryllium-based multilayer coatings designed to reflect light of wavelengths near 11 nm, at normal incidence, is presented. These multilayer coatings are of special interest for extreme ultraviolet lithography (EUVL). The beryllium-based multilayers investigated were Mo/Be, Ru/Be and a new material combination Mo, CiBe. The highest reflectivity achieved so far is 70% at 11.3 mn with 70 bilayers of Mo/Be. However, even though high reflectivity is very important, there are other parameters to satisfy the requirements for an EUVL production tool. Multilayer stress, thermal stability, radiation stability and long term reflectance stability are of equal or greater importance. An experimental characterization of several coatings was carried out to determine the reflectivity, stress, microstructure, and long term stability of these coatings. Theoretically calculated reflectivities are compared with experimental results for different material pairs; differences between experimental and theoretical reflectivities and bandwidths are addressed. Keywords: Extreme ultraviolet (EUV) lithography, reflective coatings, multilayer deposition, beryllium.
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Book Synopsis Beryllium Based Multilayers for Normal Incidence Extreme Ultraviolet Reflectivity by :
Download or read book Beryllium Based Multilayers for Normal Incidence Extreme Ultraviolet Reflectivity written by and published by . This book was released on 1994 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: The need for normal incidence mirrors maintaining reflectivity greater than 60% for an industrially competitive Extreme Ultraviolet Lithography (EUV) system has been well documented. The Molybdenum/Silicon system has emerged as the de-facto standard, where researchers are now routinely fabricating mirrors demonstrating 63% reflectivity near 130 Angstroms. However, multilayer mirrors using beryllium as the low atomic number (low-Z) spacer could potentially show similar or better reflectivity, and operate at wavelengths down to the beryllium K-edge at 111 Angstroms. Besides offering potentially greater reflectivity, the shorter wavelength light offers increased dissolution depth in photoresists, and offers potentially better resolution and depth of focus. We will report our latest results from beryllium based multilayers. The mirrors were fabricated at the Lawrence Livermore National Laboratory (LLNL) and tested at the Center for X-Ray Optics at Lawrence Berkeley Laboratory (CXRO/LBL).
Book Synopsis X-Ray Spectrometry by : Kouichi Tsuji
Download or read book X-Ray Spectrometry written by Kouichi Tsuji and published by John Wiley & Sons. This book was released on 2005-08-19 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: X-Ray Spectrometry: Recent Technological Advances covers the latest developments and areas of research in the methodological and instrumental aspects of x-ray spectrometry. Includes the most advanced and high-tech aspects of the chemical analysis techniques based on x-rays Introduces new types of X-ray optics and X-ray detectors, covering history, principles, characteristics and future trends Written by internationally recognized scientists, all of whom are eminent specialists in each of the sub-fields Sections include: X-Ray Sources, X-Ray Optics, X-Ray Detectors, Special Configurations, New Computerization Methods, New Applications This valuable book will assist all analytical chemists and other users of x-ray spectrometry to fully exploit the capabilities of this set of powerful analytical tools and to further expand applications in such fields as material and environmental sciences, medicine, toxicology, forensics, archaeometry and many others.
Download or read book Lifetime Studies of Mo written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor industry in the production of sub-100 nm feature sizes in integrated circuits. Using multilayer reflective coatings optimized at wavelengths ranging from 11 to 14 nm, EUVL represents a potential successor to currently existing optical lithography techniques. In order to assess lifetimes of the multilayer coatings under realistic conditions, a series of radiation stability tests has been performed. In each run a dose of EUV radiation equivalent to several months of lithographic operation was applied to Mo/Si and MO/Be multilayer coatings within a few days. Depending on the residual gas concentration in the vacuum environment, surface deposition of carbon during the exposure lead to losses in the multilayer reflectivity. However, in none of the experimental runs was structural damage within the bulk of the multilayers observed. Mo/Si multilayer coatings recovered their full original reflectivity after removal of the carbon layer by an ozone cleaning method. Auger depth profiling on MO/Be multilayers indicate that carbon penetrated into the Be top layer during illumination with high doses of EUV radiation. Subsequent ozone cleaning fully removed the carbon, but revealed enhanced oxidation of the area illuminated, which led to an irreversible loss in reflectance on the order of 1%. Keywords: Extreme ultraviolet (EUV) lithography, multilayer reflective coatings, radiation stability, surface contamination.
Download or read book Optical Engineering written by and published by . This book was released on 2001 with total page 510 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publishes papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.
Book Synopsis Synchrotron Radiation Instrumentation by : Piero Pianetta
Download or read book Synchrotron Radiation Instrumentation written by Piero Pianetta and published by Springer. This book was released on 2000 with total page 520 pages. Available in PDF, EPUB and Kindle. Book excerpt: This conference presents invited and contributed papers by international experts devoted to explosive phenomena in cosmic settings as diverse as stellar flares, X-ray bursts, jets, novae, supernovae, hypernovae, and gamma-ray bursts. The conference considered not only the origins of explosive behavior, but also information about the host systems that the explosive phenomena might yield. For example, X-ray bursts can be used to determine structural parameters of neutron stars, and specific types of supernovae can be used as standard candles to study the deceleration of the Hubble expansion.
Book Synopsis もはや、石すらも黙しえぬ : 滋賀・平和のための画と写真のあるアンソロジー by :
Download or read book もはや、石すらも黙しえぬ : 滋賀・平和のための画と写真のあるアンソロジー written by and published by . This book was released on 1982 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Damage to VUV, EUV, and X-ray Optics by : Libor Juha
Download or read book Damage to VUV, EUV, and X-ray Optics written by Libor Juha and published by SPIE-International Society for Optical Engineering. This book was released on 2007 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Book Synopsis High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography by :
Download or read book High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Synchrotron-based reflectometry is an important technique for the precise determination of optical properties of reflective multilayer coatings for Extreme Ultraviolet Lithography (EUVL). Multilayer coatings enable normal incidence reflectances of more than 65% in the wavelength range between 11 and 15 nm. In order to achieve high resolution and throughput of EUVL systems, stringent requirements not only apply to their mechanical and optical layout, but also apply to the optical properties of the multilayer coatings. Therefore, multilayer deposition on near-normal incidence optical surfaces of projection optics, condenser optics and reflective masks requires suitable high-precision metrology. Most important, due to their small bandpass on the order of only 0.5 nm, all reflective multilayer coatings in EUVL systems must be wavelength-matched to within "0.05 nm. In some cases, a gradient of the coating thickness is necessary for wavelength matching at variable average angle of incidence in different locations on the optical surfaces. Furthermore, in order to preserve the geometrical figure of the optical substrates, reflective multilayer coatings need to be uniform to within 0.01 nm in their center wavelength. This requirement can only be fulfilled with suitable metrology, which provides a precision of a fraction of this value. In addition, for the detailed understanding and the further development of reflective multilayer coatings a precision in the determination of peak reflectances is desirable on the order of 0.1%. Substrates up to 200 mm in diameter and 15 kg in mass need to be accommodated. Above requirements are fulfilled at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley. This beamline proved to be precise within 0.2% (ms) for reflectance and 0.002 nm (rms) for wavelength.
Book Synopsis Passivating Overcoat Bilayer for Multilayer Reflective Coatings for Extreme Ultraviolet Lithography by :
Download or read book Passivating Overcoat Bilayer for Multilayer Reflective Coatings for Extreme Ultraviolet Lithography written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corrosion of the multilayer coating, thereby improving the EUV optical performance. The overcoat bilayer comprises a layer of silicon or beryllium underneath at least one top layer of an elemental or a compound material that resists oxidation and corrosion. Materials for the top layer include carbon, palladium, carbides, borides, nitrides, and oxides. The thicknesses of the two layers that make up the overcoat bilayer are optimized to produce the highest reflectance at the wavelength range of operation. Protective overcoat systems comprising three or more layers are also possible.
Book Synopsis Multilayer Coatings of 10x Projection for Extreme-ultraviolet Lithography by :
Download or read book Multilayer Coatings of 10x Projection for Extreme-ultraviolet Lithography written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Two new sets of projections optics for the prototype 10X reduction EUV lithography system were coated with Mo/Si multilayers. The coating thickness was graded across the optics by using shadow masks to ensure maximum throughput at all incidence angles in the camera. The overall deviation of the (normalized) wavelength response across the clear aperture of each mirror is below 0.01% RMS. However, the wavelength mismatch between two optics coated in different runs is up to 0.07 nm. Nevertheless, this is still within the allowed tolerances, and the predicted optical throughput loss in the camera due to such wavelength mismatch is about 4%. EUV reflectances of 63-65% were measured around 13.40 nm for the secondary optics, which is in good agreement with the expected reflectance based on the substrate finish as measured with AFM.
Book Synopsis Multilayer Reflective Coatings for Extreme-ultraviolet Lithography by :
Download or read book Multilayer Reflective Coatings for Extreme-ultraviolet Lithography written by and published by . This book was released on 1998 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching among the seven multilayer-coated mirrors used in the present lithography system design. Uniformity of coating was improved to better than 0.5% across 150 mm diameter substrates. These improvements in EUV multilayer mirror technology will enable us to meet the stringent specifications for coating the large optical substrates for our next-generation EUV lithography system.
Book Synopsis Method for Fabricating Beryllium-based Multilayer Structures by :
Download or read book Method for Fabricating Beryllium-based Multilayer Structures written by and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Beryllium-based multilayer structures and a process for fabricating beryllium-based multilayer mirrors, useful in the wavelength region greater than the beryllium K-edge (111 .ANG. or 11.1 nm). The process includes alternating sputter deposition of beryllium and a metal, typically from the fifth row of the periodic table, such as niobium (Nb), molybdenum (Mo), ruthenium (Ru), and rhodium (Rh). The process includes not only the method of sputtering the materials, but the industrial hygiene controls for safe handling of beryllium. The mirrors made in accordance with the process may be utilized in soft x-ray and extreme-ultraviolet projection lithography, which requires mirrors of high reflectivity (>60%) for x-rays in the range of 60-140 .ANG. (60-14.0 nm).
Book Synopsis Characterization of Multilayer Reflective Coatings for Extreme Ultraviolet Lithography by :
Download or read book Characterization of Multilayer Reflective Coatings for Extreme Ultraviolet Lithography written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The synchrotron-based reflectometer at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley is an important metrology tool within the current Extreme Ultraviolet Lithography (EUVL) program. This program is a joint activity of three National Laboratories and a consortium of leading semiconductor manufacturers. Its goal is the development of a technology for routine production of sub-100 nm feature sizes for microelectronic circuits. Multilayer-coated normal-incidence optical surfaces reflecting in the Extreme Ultraviolet (EUV) spectral range near 13 nm are the basis for this emerging technology. All optical components of EUV lithographic steppers need to be characterized at-wavelength during their development and manufacturing process. Multilayer coating uniformity and gradient, accurate wavelength matching and high peak reflectances are the main parameters to be optimized. The mechanical and optical properties of the reflectometer at ALS beamline 6.3.2 proved to be well suited for the needs of the current EUVL program. In particular the facility is highly precise in its wavelength calibration and the determination of absolute EUV reflectance. The reproducibility of results of measurements at ALS beamline 6.3.2 is 0.2 % for reflectivity and 0.002 nm for wavelength.
Book Synopsis Design and Performance of Capping Layers for EUV Multilayer Mirrors by : J. C. Robinson
Download or read book Design and Performance of Capping Layers for EUV Multilayer Mirrors written by J. C. Robinson and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of uttermost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in designing the protective capping layer coatings, understanding their performance and estimating their lifetimes based on accelerated electron beam and EUV exposure studies. Our current capping layer coatings have about 40 times longer lifetimes than Si-capped multilayer optics. Nevertheless, the lifetime of current Ru-capped multilayers is too short to satisfy commercial tool requirements and further improvements are essential.
Book Synopsis Sub-diffraction-limited Multilayer Coatings for the 0.3-NA Micro-Exposure Tool for Extreme Ultraviolet Lithography by :
Download or read book Sub-diffraction-limited Multilayer Coatings for the 0.3-NA Micro-Exposure Tool for Extreme Ultraviolet Lithography written by and published by . This book was released on 2007 with total page 38 pages. Available in PDF, EPUB and Kindle. Book excerpt: This manuscript discusses the multilayer coating results for the primary and secondary mirrors of the Micro Exposure Tool (MET): a 0.30-numerical aperture (NA) lithographic imaging system with 200 x 600 [mu]m2 field of view at the wafer plane, operating in the extreme ultraviolet (EUV) wavelength region. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates, and a velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms to achieve sub-diffraction-limited performance. This work represents the first experimental demonstration of sub-diffraction-limited multilayer coatings for high-NA EUV imaging systems.
