Author :
Publisher :
ISBN 13 :
Total Pages : 8 pages
Book Rating : 4.:/5 (893 download)
Book Synopsis Electron Induced Depassivation of H and D Terminated Si/SiO2 Interfaces by :
Download or read book Electron Induced Depassivation of H and D Terminated Si/SiO2 Interfaces written by and published by . This book was released on 1997 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authors have performed electron spin resonance and electrical measurements on SiO2/Si structures subjected to anneals in 5% H2/N2 or 5% D2/N2 gases and subsequently injected with electrons using corona ions and ultra-violet radiation. Threshold voltage and transconductance measurements have also been made on 0.25 [mu]m metal-oxide-semiconductor transistors subjected to 400 C anneals in the same gases and subsequently aged by hot electron injection. The electrical data on SiO2/Si structures indicates that the density of interface states increases as a result of electron injection but that there are only minor differences between H and D passivated interfaces. The data on P{sub b}, trivalent Si dangling bond, centers at the same interfaces observed by electron spin resonance is insufficiently accurate to enable them to observe any significant differences. The hot electron injection experiments on transistors, consistent with other authors, indicate that, for the limited number of measurements they have made, the transistor aging resulting from the generation of interface states is significantly reduced for devices annealed in the D containing gas as compared to those annealed in the H containing gas. The origins of some potential differences in annealing behavior between the SiO2/Si structures and the 0.25 [mu]m transistors are suggested.