Electron Beam Technology In Microelectronic Fabrication

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Electron-Beam Technology in Microelectronic Fabrication

Author : George Brewer
Publisher : Elsevier
ISBN 13 : 0323153410
Total Pages : 377 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Electron-Beam Technology in Microelectronic Fabrication by : George Brewer

Download or read book Electron-Beam Technology in Microelectronic Fabrication written by George Brewer and published by Elsevier. This book was released on 2012-12-02 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.

The Physics of Microfabrication

Author : Ivor Brodie
Publisher : Springer Science & Business Media
ISBN 13 : 1489921605
Total Pages : 518 pages
Book Rating : 4.4/5 (899 download)

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Book Synopsis The Physics of Microfabrication by : Ivor Brodie

Download or read book The Physics of Microfabrication written by Ivor Brodie and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 518 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Physical Electronics Department of SRI International (formerly Stanford Research Institute) has been pioneering the development of devices fabricated to submicron tolerances for well over 20 years. In 1961, a landmark paper on electron-beam lithography and its associated technologies was published by K. R. Shoulderst (then at SRI), which set the stage for our subsequent efforts in this field. He had the foresight to believe that the building of such small devices was actually within the range of human capabilities. As a result of this initial momentum, our experience in the technologies associated with microfabrication has become remarkably comprehensive, despite the relatively small size of our research activity. We have frequently been asked to deliver seminars or provide reviews on various aspects of micro fabrication. These activities made us aware of the need for a comprehensive overview of the physics of microfabrication. We hope that this book will fill that need.

Beam Technologies for Integrated Processing

Author : National Research Council
Publisher : National Academies Press
ISBN 13 : 0309046351
Total Pages : 102 pages
Book Rating : 4.3/5 (9 download)

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Book Synopsis Beam Technologies for Integrated Processing by : National Research Council

Download or read book Beam Technologies for Integrated Processing written by National Research Council and published by National Academies Press. This book was released on 1992-02-01 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt: Beam technologies play an important role in microelectronic component fabrication and offer opportunities for application in other manufacturing schemes. Emerging beam technologies that incorporate potential for sensors, control, and information processing have created new opportunities for integrated processing of materials and components. This volume identifies various beam technologies and their applications in electronics and other potential manufacturing processes. Recommendations for research and development to enhance the understanding, capabilities, and applications of beam technologies are presented.

Methods and Materials in Microelectronic Technology

Author : Joachim Bargon
Publisher : Springer
ISBN 13 :
Total Pages : 384 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Methods and Materials in Microelectronic Technology by : Joachim Bargon

Download or read book Methods and Materials in Microelectronic Technology written by Joachim Bargon and published by Springer. This book was released on 1984-11-30 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt: The papers collected in this volume were presented at the International Symposium on Methods and Materials in Microelectronic Technology. This symposium was sponsored by IBM Germany, and it was held September 29 - October 1, 1982, in Bad Neuenahr, West Germany. The progress of semiconductor and microelectronic technology has become so rapid and the field so sophisticated that it is imperative to exchange the latest insight gained as frequently as it can be accomplished. In addition, it is peculiar for this field that the bulk of the investigations are carried out at industrial research and development laboratories, which makes some of the results less readily accessible. Because of these circumstances, the academic community, which among other things, is supposed to communicate the prog ress in this field to students of different disciplines, finds it rather difficult to stay properly informed. It was the intent of this IBM sponsored symposium to bring together key scientists from academic institutions, primarily from Europe, with principal investigators of the industrial scene. Accordingly, this symposium exposed technologists to scientists and vice versa. Scientific advances often lead directly to technological innovations. In turn, new technologies are often arrived at empirically and, because of that, are initially poorly understood. Scientific inquiry then attempts to probe these processes and phenomena in order to achieve a better understanding. Thus science and technology are intricately interconnected, and it is important that technical exchange between technolo gists and scientists is facilitated, since the problems are typically interdiscipli nary in nature.

Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology

Author : Saburo Nonogaki
Publisher : CRC Press
ISBN 13 : 1482273764
Total Pages : 336 pages
Book Rating : 4.4/5 (822 download)

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Book Synopsis Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology by : Saburo Nonogaki

Download or read book Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology written by Saburo Nonogaki and published by CRC Press. This book was released on 2018-10-08 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."

Microlithography: High Integration In Microelectronics - Proceedings Of The First Workshop

Author : Vitor Baranauskas
Publisher : World Scientific
ISBN 13 : 9814611905
Total Pages : 194 pages
Book Rating : 4.8/5 (146 download)

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Book Synopsis Microlithography: High Integration In Microelectronics - Proceedings Of The First Workshop by : Vitor Baranauskas

Download or read book Microlithography: High Integration In Microelectronics - Proceedings Of The First Workshop written by Vitor Baranauskas and published by World Scientific. This book was released on 1990-05-01 with total page 194 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume is a collection of classical and recent empirical studies of currency options and their implications for issues of exchange rate economics, such as exchange rate risk premium, volatility, market expectations, and credibility of exchange rate regimes. It contains applications on how to extract useful information from option market data for financial forecasting policy purposes. The subjects are discussed in a self-contained, user-friendly format, with introductory chapters on currency option theory and currency option markets.The book can be used as supplementary reading for graduate finance and international economics courses, as training material for central bank and regulatory authorities, or as a reference book for financial analysts.

The Physics of Micro/Nano-Fabrication

Author : Ivor Brodie
Publisher : Springer Science & Business Media
ISBN 13 : 1475767757
Total Pages : 661 pages
Book Rating : 4.4/5 (757 download)

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Book Synopsis The Physics of Micro/Nano-Fabrication by : Ivor Brodie

Download or read book The Physics of Micro/Nano-Fabrication written by Ivor Brodie and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 661 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.

Fundamentals of Semiconductor Processing Technology

Author : Badih El-Kareh
Publisher : Springer Science & Business Media
ISBN 13 : 1461522099
Total Pages : 605 pages
Book Rating : 4.4/5 (615 download)

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Book Synopsis Fundamentals of Semiconductor Processing Technology by : Badih El-Kareh

Download or read book Fundamentals of Semiconductor Processing Technology written by Badih El-Kareh and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 605 pages. Available in PDF, EPUB and Kindle. Book excerpt: The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.

Lithography

Author : Stefan Landis
Publisher : John Wiley & Sons
ISBN 13 : 1118621182
Total Pages : 311 pages
Book Rating : 4.1/5 (186 download)

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Book Synopsis Lithography by : Stefan Landis

Download or read book Lithography written by Stefan Landis and published by John Wiley & Sons. This book was released on 2013-03-04 with total page 311 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components.

BioNanoFluidic MEMS

Author : Peter J. Hesketh
Publisher : Springer Science & Business Media
ISBN 13 : 038746283X
Total Pages : 300 pages
Book Rating : 4.3/5 (874 download)

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Book Synopsis BioNanoFluidic MEMS by : Peter J. Hesketh

Download or read book BioNanoFluidic MEMS written by Peter J. Hesketh and published by Springer Science & Business Media. This book was released on 2007-11-15 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book explains biosensor development fundamentals. It also initiates awareness in engineers and scientists who would like to develop and implement novel biosensors for agriculture, biomedicine, homeland security, environmental needs, and disease identification. In addition, the book introduces and lays the basic foundation for design, fabrication, testing, and implementation of next generation biosensors through hands-on learning.

Nanofabrication

Author : Maria Stepanova
Publisher : Springer Science & Business Media
ISBN 13 : 3709104246
Total Pages : 344 pages
Book Rating : 4.7/5 (91 download)

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Book Synopsis Nanofabrication by : Maria Stepanova

Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.

Beam Processing Technologies

Author : Norman G. Einspruch
Publisher : Academic Press
ISBN 13 : 148321785X
Total Pages : 559 pages
Book Rating : 4.4/5 (832 download)

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Book Synopsis Beam Processing Technologies by : Norman G. Einspruch

Download or read book Beam Processing Technologies written by Norman G. Einspruch and published by Academic Press. This book was released on 2014-12-01 with total page 559 pages. Available in PDF, EPUB and Kindle. Book excerpt: Beam Processing Technologies is a collection of papers that deals with the miniaturization of devices that will be faster, consume less power, and cost less per operation or fabrication. One paper discusses metal oxide semiconductor (MOS) integrated circuit technology including the operation of devices whose lateral and vertical dimensions are scaled down. If the devices' silicon doping profiles are increased by the same scale factor, they can operate on lower voltages and currents, with the same performance. Another paper describes laser beam processing and wafer-scale integration as techniques to increase the number of devices on a silicon chip. Electron beam technologies can be used in many fabrication processes such as in microlithography, selective oxidation, doping, metrology. Ion beam applications depend on the presence of the ion introduced into the device (e.g. implantation doping), on pseudoelastic collisions (e.g. physical sputtering or crystal damage), and on inelastic scattering (e.g. polymer resist exposure). Silicon molecular beam epitaxy (SiMBE) can also grow high-quality layers at low temperature, particularly concerning germanium, especially as reagrds the growth system design and utilization of n- and p-type doping. Chemical beam epitaxy (CBE) is another epitaxial growth technique that can surpass MBE and metal organic chemical vapor deposition (MO-CVD). The collection is suitable chemical engineers, industrial physicists, and researchers whose work involve micro-fabrication and development of integrated circuits.

Fundamentals of Microfabrication

Author : Marc J. Madou
Publisher : CRC Press
ISBN 13 : 1482274000
Total Pages : 764 pages
Book Rating : 4.4/5 (822 download)

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Book Synopsis Fundamentals of Microfabrication by : Marc J. Madou

Download or read book Fundamentals of Microfabrication written by Marc J. Madou and published by CRC Press. This book was released on 2018-10-08 with total page 764 pages. Available in PDF, EPUB and Kindle. Book excerpt: MEMS technology and applications have grown at a tremendous pace, while structural dimensions have grown smaller and smaller, reaching down even to the molecular level. With this movement have come new types of applications and rapid advances in the technologies and techniques needed to fabricate the increasingly miniature devices that are literally changing our world. A bestseller in its first edition, Fundamentals of Microfabrication, Second Edition reflects the many developments in methods, materials, and applications that have emerged recently. Renowned author Marc Madou has added exercise sets to each chapter, thus answering the need for a textbook in this field. Fundamentals of Microfabrication, Second Edition offers unique, in-depth coverage of the science of miniaturization, its methods, and materials. From the fundamentals of lithography through bonding and packaging to quantum structures and molecular engineering, it provides the background, tools, and directions you need to confidently choose fabrication methods and materials for a particular miniaturization problem. New in the Second Edition Revised chapters that reflect the many recent advances in the field Updated and enhanced discussions of topics including DNA arrays, microfluidics, micromolding techniques, and nanotechnology In-depth coverage of bio-MEMs, RF-MEMs, high-temperature, and optical MEMs. Many more links to the Web Problem sets in each chapter

Microelectronic Materials and Processes

Author : R.A. Levy
Publisher : Springer Science & Business Media
ISBN 13 : 9400909179
Total Pages : 992 pages
Book Rating : 4.4/5 (9 download)

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Book Synopsis Microelectronic Materials and Processes by : R.A. Levy

Download or read book Microelectronic Materials and Processes written by R.A. Levy and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 992 pages. Available in PDF, EPUB and Kindle. Book excerpt: The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.

Metal Additive Manufacturing

Author : Dyuti Sarker
Publisher : John Wiley & Sons
ISBN 13 : 1119210836
Total Pages : 624 pages
Book Rating : 4.1/5 (192 download)

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Book Synopsis Metal Additive Manufacturing by : Dyuti Sarker

Download or read book Metal Additive Manufacturing written by Dyuti Sarker and published by John Wiley & Sons. This book was released on 2021-10-26 with total page 624 pages. Available in PDF, EPUB and Kindle. Book excerpt: METAL ADDITIVE MANUFACTURING A comprehensive review of additive manufacturing processes for metallic structures Additive Manufacturing (AM)—also commonly referred to as 3D printing—builds three-dimensional objects by adding materials layer by layer. Recent years have seen unprecedented investment in additive manufacturing research and development by governments and corporations worldwide. This technology has the potential to replace many conventional manufacturing processes, enable the development of new industry practices, and transform the entire manufacturing enterprise. Metal Additive Manufacturing provides an up-to-date review of all essential physics of metal additive manufacturing techniques with emphasis on both laser-based and non-laser-based additive manufacturing processes. This comprehensive volume covers fundamental processes and equipment, governing physics and modelling, design and topology optimization, and more. The text adresses introductory, intermediate, and advanced topics ranging from basic additive manufacturing process classification to practical and material design aspects of additive manufacturability. Written by a panel of expert authors in the field, this authoritative resource: Provides a thorough analysis of AM processes and their theoretical foundations Explains the classification, advantages, and applications of AM processes Describes the equipment required for different AM processes for metallic structures, including laser technologies, positioning devices, feeder and spreader mechanisms, and CAD software Discusses the opportunities, challenges, and current and emerging trends within the field Covers practical considerations, including design for AM, safety, quality assurance, automation, and real-time control of AM processes Includes illustrative cases studies and numerous figures and tables Featuring material drawn from the lead author’s research and professional experience on laser additive manufacturing, Metal Additive Manufacturing is an important source for manufacturing professionals, research and development engineers in the additive industry, and students and researchers involved in mechanical, mechatronics, automatic control, and materials engineering and science.

The Physics and Fabrication of Microstructures and Microdevices

Author : Michael J. Kelly
Publisher : Springer Science & Business Media
ISBN 13 : 3642714463
Total Pages : 481 pages
Book Rating : 4.6/5 (427 download)

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Book Synopsis The Physics and Fabrication of Microstructures and Microdevices by : Michael J. Kelly

Download or read book The Physics and Fabrication of Microstructures and Microdevices written by Michael J. Kelly and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 481 pages. Available in PDF, EPUB and Kindle. Book excerpt: les Houches This Winter School on "The Physics and Fabrication of Microstructures" originated with a European industrial decision to investigate in some detail the potential of custom-designed microstructures for new devices. Beginning in 1985, GEC and THOMSON started a collaboration on these subjects, supported by an ESPRIT grant from the Commission of the European Com munity. To the outside observer of the whole field, it appears clear that the world effort is very largely based in the United States and Japan. It also appears that cooperation and dissemination of results are very well organised outside Europe and act as a major influence on the development of new concepts and devices. In Japan, a main research programme of the Research and Development for Basic Technology for Future Industries is focused on "Future Electron Devices". In Japan and in the United States, many workshops are organised annually in order to bring together the major specialists in industry and academia, allowing fast dissemination of advances and contacts for setting up cooperative efforts.

Handbook of VLSI Microlithography, 2nd Edition

Author : John N. Helbert
Publisher : Cambridge University Press
ISBN 13 : 0080946801
Total Pages : 1026 pages
Book Rating : 4.0/5 (89 download)

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Book Synopsis Handbook of VLSI Microlithography, 2nd Edition by : John N. Helbert

Download or read book Handbook of VLSI Microlithography, 2nd Edition written by John N. Helbert and published by Cambridge University Press. This book was released on 2001-04 with total page 1026 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.