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Direct Simulation Monte Carlo Modelling Of Physical Vapour Deposition
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Book Synopsis Direct Simulation Monte Carlo Modelling of Physical Vapour Deposition by : Robert Charles Buxton
Download or read book Direct Simulation Monte Carlo Modelling of Physical Vapour Deposition written by Robert Charles Buxton and published by . This book was released on 2005 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Enabling the Direct Simulation (Monte Carlo) of Physical Vapor Deposition by :
Download or read book Enabling the Direct Simulation (Monte Carlo) of Physical Vapor Deposition written by and published by . This book was released on 2008 with total page 139 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition Modeling Using Direct Simulation Monte Carlo with Non-linear Chemistry and Level Set Profile Evolution by : Husain Ali Al-Mohssen
Download or read book Chemical Vapor Deposition Modeling Using Direct Simulation Monte Carlo with Non-linear Chemistry and Level Set Profile Evolution written by Husain Ali Al-Mohssen and published by . This book was released on 2003 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Direct Simulation Monte Carlo Modeling of Effusion Source Vapor Plumes Used in Thin-film Deposition Processes by : Brandon D. Morrison
Download or read book Direct Simulation Monte Carlo Modeling of Effusion Source Vapor Plumes Used in Thin-film Deposition Processes written by Brandon D. Morrison and published by . This book was released on 2002 with total page 57 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Evaluating the Suitability of the Direct Simulation Monte Carlo Technique to Modelling PVD at Very Low Background Pressure by : Paul Stanley Minson
Download or read book Evaluating the Suitability of the Direct Simulation Monte Carlo Technique to Modelling PVD at Very Low Background Pressure written by Paul Stanley Minson and published by . This book was released on 1996 with total page 72 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Direct Simulation Monte Carlo Modeling of Silicon Thin Film Deposition Using Supersonic Beams by : Gang Chen
Download or read book Direct Simulation Monte Carlo Modeling of Silicon Thin Film Deposition Using Supersonic Beams written by Gang Chen and published by . This book was released on 1998 with total page 460 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Monte Carlo Modeling of YBCO Vapor Deposition by :
Download or read book Monte Carlo Modeling of YBCO Vapor Deposition written by and published by . This book was released on 2000 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A three dimensional electron beam physical vapor deposition process of super-conducting films of YBa2Cu3O7-(sub delta) in a vacuum chamber is investigated both computationally and experimentally. The numerical analysis employs the direct simulation Monte Carlo (DSMC) method. Some important modeling issues such as atomic collision cross-sections for metal vapors and hyperfine electronic structure of the atomic absorption spectra are addressed. Film deposition thickness profiles and atomic absorption spectra given by the DSMC method and experiment for pure yttrium evaporation are in excellent agreement. Interaction between the vapor jets is found to have a significant effect on the film growth rate and species molar ratio that are key factors of the film technology.
Book Synopsis Combining Monte Carlo Transport and Level Set Surface Evolution for Modeling Vapor Phase Deposition of Thin Films Over Sub-micron Features by : John Lewis Smith
Download or read book Combining Monte Carlo Transport and Level Set Surface Evolution for Modeling Vapor Phase Deposition of Thin Films Over Sub-micron Features written by John Lewis Smith and published by . This book was released on 2014 with total page 58 pages. Available in PDF, EPUB and Kindle. Book excerpt: A hybrid scheme is used to model the vapor phase deposition of thin films at the feature scale. The transport of the chemical species to the substrate surface is modeled with a Collisionless Direct Simulation Monte Carlo (DSMC) method. The Level Set Method is used to model the growth of the thin-film on the substrate. The convergence criteria for these methods were not found in literature. The governing equations for the Level Set Method are, in general, non-linear partial differential equations. The coupling of the DSMC Method with the Level Set Method results in a set of non-Gaussian stochastic non-linear partial differential equations. Developing general convergence criteria proved exceedingly difficult, and only qualitative results are presented to support our convergence criteria. Simulation results are in qualitative agreement with experiments and other results from literature.
Book Synopsis The Monte Carlo Simulation of Physical Vapor Deposition by : Yougen Yang
Download or read book The Monte Carlo Simulation of Physical Vapor Deposition written by Yougen Yang and published by . This book was released on 2000 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Monte Carlo Simulation in Rarefied Gas Dynamics with Application to Physical Vapor Deposition by : John Samuel Dolaghan
Download or read book Monte Carlo Simulation in Rarefied Gas Dynamics with Application to Physical Vapor Deposition written by John Samuel Dolaghan and published by . This book was released on 1996 with total page 232 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Direct Simulation Monte Carlo Study of H/H2 and H/H2/CO Mixtures for Diamond Chemical Vapor Deposition by :
Download or read book Direct Simulation Monte Carlo Study of H/H2 and H/H2/CO Mixtures for Diamond Chemical Vapor Deposition written by and published by . This book was released on 1996 with total page 57 pages. Available in PDF, EPUB and Kindle. Book excerpt: One dimensional direct simulation Monte Carlo calculations have been carried out on H/H2 and H/H2/CO mixtures under operating conditions typical of diffusion-dominated diamond chemical vapor deposition processes. Mechanisms have been included in the model for the adsorption and recombination of hydrogen atoms on the diamond surface and the dissociation of molecular hydrogen at the interior of the reactor. Hydrogen atom fluxes and recombinative and conductive heat fluxes to the diamond surface are calculated as a function of pressure, gas composition, hydrogen dissociation and surface reaction probabilities, reactor temperature, and distance between the activating source and substrate. The numerical calculations are shown to be in excellent agreement with analytical results in the limiting regimes of free-streaming particles at low pressures and continuum hydrodynamics at high pressures.
Book Synopsis Monte Carlo Modeling of Thin Film Deposition by :
Download or read book Monte Carlo Modeling of Thin Film Deposition written by and published by . This book was released on 2002 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this paper we discuss the use of atomistic Monte Carlo simulations to predict film microstructure evolution. We discuss physical vapor deposition, and are primarily concerned with films that are formed by the nucleation and coalescence of 3D islands. Multi-scale modeling is used in the sense that information obtained from molecular dynamics and first principles calculations provide atomic interaction energies, surface and grain boundary properties and diffusion rates for use in the Monte Carlo model. In this paper, we discuss some fundamental issues associated with thin film formation, together with an assessment of the sensitivity of the film morphology to the deposition conditions and materials properties.
Book Synopsis A Hybrid CFD-DSMC Model Designed to Simulate Rapidly Rarefying Flow Fields and Its Application to Physical Vapor Deposition by : Kevin Gott
Download or read book A Hybrid CFD-DSMC Model Designed to Simulate Rapidly Rarefying Flow Fields and Its Application to Physical Vapor Deposition written by Kevin Gott and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This research endeavors to better understand the physical vapor deposition (PVD) vapor transport process by determining the most appropriate fluidic model to design PVD coating manufacturing. An initial analysis was completed based on the calculation of Knudsen number from titanium vapor properties. The results show a dense Navier-Stokes solver best describes flow near the evaporative source, but the material properties suggest expansion into the chamber may result in a strong drop in density and a rarefied flow close to the substrate.A hybrid CFD-DSMC solver is constructed in OpenFOAM for rapidly rarefying flow fields such as PVD vapor transport. The models are patched together combined using a new patching methodology designed to take advantage of the one-way motion of vapor from the CFD region to the DSMC region. Particles do not return to the dense CFD region, therefore the temperature and velocity can be solved independently in each domain. This novel technique allows a hybrid method to be applied to rapidly rarefying PVD flow fields in a stable manner.Parameter studies are performed on a CFD, Navier-Stokes continuum based compressible solver, a Direct Simulation Monte Carlo (DSMC) rarefied particle solver, a collisionless free molecular solver and the hybrid CFD-DSMC solver. The radial momentum at the inlet and radial diffusion characteristics in the flow field are shown to be the most important to achieve an accurate deposition profile. The hybrid model also shows sensitivity to the shape of the CFD region and rarefied regions shows sensitivity to the Knudsen number.The models are also compared to each other and appropriate experimental data to determine which model is most likely to accurately describe PVD coating deposition processes. The Navier-Stokes solvers are expected to yield backflow across the majority of realistic inlet conditions, making their physics unrealistic for PVD flow fields. A DSMC with improved collision model may yield an accurate model, but additional research will first need to be completed to accurately describe the complex intermolecular forces of metals and ceramics. Overall, a hybrid CFD-DSMC solver with an improved equation of state for evaporated PVD materials is recommended to model PVD flow.
Book Synopsis Direct Simulation Monte Carlo Method of Deposition Processes by : Chee Hong Tan
Download or read book Direct Simulation Monte Carlo Method of Deposition Processes written by Chee Hong Tan and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Modeling of Chemical Vapor Deposition of Tungsten Films by : Chris R. Kleijn
Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Book Synopsis Handbook of Fluid Dynamics by : Richard W. Johnson
Download or read book Handbook of Fluid Dynamics written by Richard W. Johnson and published by CRC Press. This book was released on 2016-04-06 with total page 1544 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Fluid Dynamics offers balanced coverage of the three traditional areas of fluid dynamics—theoretical, computational, and experimental—complete with valuable appendices presenting the mathematics of fluid dynamics, tables of dimensionless numbers, and tables of the properties of gases and vapors. Each chapter introduces a different fluid dynamics topic, discusses the pertinent issues, outlines proven techniques for addressing those issues, and supplies useful references for further research. Covering all major aspects of classical and modern fluid dynamics, this fully updated Second Edition: Reflects the latest fluid dynamics research and engineering applications Includes new sections on emerging fields, most notably micro- and nanofluidics Surveys the range of numerical and computational methods used in fluid dynamics analysis and design Expands the scope of a number of contemporary topics by incorporating new experimental methods, more numerical approaches, and additional areas for the application of fluid dynamics Handbook of Fluid Dynamics, Second Edition provides an indispensable resource for professionals entering the field of fluid dynamics. The book also enables experts specialized in areas outside fluid dynamics to become familiar with the field.
Book Synopsis Direct Modeling For Computational Fluid Dynamics: Construction And Application Of Unified Gas-kinetic Schemes by : Kun Xu
Download or read book Direct Modeling For Computational Fluid Dynamics: Construction And Application Of Unified Gas-kinetic Schemes written by Kun Xu and published by World Scientific. This book was released on 2014-12-23 with total page 335 pages. Available in PDF, EPUB and Kindle. Book excerpt: Computational fluid dynamics (CFD) studies the flow motion in a discretized space. Its basic scale resolved is the mesh size and time step. The CFD algorithm can be constructed through a direct modeling of flow motion in such a space. This book presents the principle of direct modeling for the CFD algorithm development, and the construction unified gas-kinetic scheme (UGKS). The UGKS accurately captures the gas evolution from rarefied to continuum flows. Numerically it provides a continuous spectrum of governing equation in the whole flow regimes.