Diffusion of Ion-implanted Group IV N-type Dopants in Gallium Arsenide and Gallium Arsenide-based Superlattices

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Total Pages : 306 pages
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Book Synopsis Diffusion of Ion-implanted Group IV N-type Dopants in Gallium Arsenide and Gallium Arsenide-based Superlattices by : Emily Lin Allen

Download or read book Diffusion of Ion-implanted Group IV N-type Dopants in Gallium Arsenide and Gallium Arsenide-based Superlattices written by Emily Lin Allen and published by . This book was released on 1991 with total page 306 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Scientific and Technical Aerospace Reports

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ISBN 13 :
Total Pages : 312 pages
Book Rating : 4.:/5 (3 download)

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Annual Commencement

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Total Pages : 476 pages
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Book Synopsis Annual Commencement by : Stanford University

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III-V Electronic and Photonic Device Fabrication and Performance: Volume 300

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Publisher : Mrs Proceedings
ISBN 13 :
Total Pages : 648 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis III-V Electronic and Photonic Device Fabrication and Performance: Volume 300 by : K. S. Jones

Download or read book III-V Electronic and Photonic Device Fabrication and Performance: Volume 300 written by K. S. Jones and published by Mrs Proceedings. This book was released on 1993-08-25 with total page 648 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Doping Gallium Arsenide by Ion Implantation and Proton-enhanced Diffusion

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Total Pages : 93 pages
Book Rating : 4.:/5 (386 download)

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Book Synopsis Doping Gallium Arsenide by Ion Implantation and Proton-enhanced Diffusion by : Robert Ell Tremain

Download or read book Doping Gallium Arsenide by Ion Implantation and Proton-enhanced Diffusion written by Robert Ell Tremain and published by . This book was released on 1976 with total page 93 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Dissertation Abstracts International

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Total Pages : 692 pages
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American Doctoral Dissertations

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Total Pages : 724 pages
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Chemical Abstracts

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Total Pages : 2002 pages
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Encyclopedia of Materials

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Total Pages : 1120 pages
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Book Synopsis Encyclopedia of Materials by : K. H. J. Buschow

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Science Abstracts

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Total Pages : 1990 pages
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Diffusion of P-type Dopants in Gallium Arsenide

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ISBN 13 :
Total Pages : 338 pages
Book Rating : 4.:/5 (387 download)

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Book Synopsis Diffusion of P-type Dopants in Gallium Arsenide by : Heyward Gibbes Robinson

Download or read book Diffusion of P-type Dopants in Gallium Arsenide written by Heyward Gibbes Robinson and published by . This book was released on 1992 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt:

N-Type Doping of Gallium Arsenide by Ion Implantation

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Total Pages : 26 pages
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Book Synopsis N-Type Doping of Gallium Arsenide by Ion Implantation by : T. Ambridge

Download or read book N-Type Doping of Gallium Arsenide by Ion Implantation written by T. Ambridge and published by . This book was released on 1977 with total page 26 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Diffusion and Electrical Properties of Sulfur Implanted in Gallium Arsenide

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ISBN 13 :
Total Pages : 172 pages
Book Rating : 4.:/5 (12 download)

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Book Synopsis Diffusion and Electrical Properties of Sulfur Implanted in Gallium Arsenide by : Siu Sing Chan

Download or read book Diffusion and Electrical Properties of Sulfur Implanted in Gallium Arsenide written by Siu Sing Chan and published by . This book was released on 1983 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the need for high speed devices and circuits continues to grow, GaAs has received increasing attention as a viable (both technologically and economically) electronic material complementary to Si. The advantages of GaAs lie in its much higher electron mobility and its compatibility with optoelectronic devices. The merits of a planar process have been well demonstrated in Si technology, and in the course of the development of a similar process for GaAs, ion implantation has emerged as an indispensable tool. Ion implantation is inherently a much more precise and controllable method of selective semiconductor doping than diffusion. To attain the degree of line-width control necessary for high speed or high density devices, ion implantation is a prerequisite. Besides, many useful dopants in GaAs cannot be introduced readily by diffusion because of material constraints. In spite of its importance in the fabrication of devices which take advantage of the high electron mobility of GaAs, donor implantation in GaAs has not found as much success as acceptor implantations. In order to avoid amphoteric tendencies and possible self-compensation mechanisms, it is generally best to use a column VI element.

Physics Briefs

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Total Pages : 1058 pages
Book Rating : 4.3/5 (91 download)

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Extended Abstracts

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Book Synopsis Extended Abstracts by : Electrochemical Society

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Semiconductor Quantum Well Intermixing

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Publisher : CRC Press
ISBN 13 : 1482283344
Total Pages : 712 pages
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Book Synopsis Semiconductor Quantum Well Intermixing by : J. T. Lie

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Electrical Properties of Ion Implanted Layers in Silicon and Gallium Arsenide

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Total Pages : 123 pages
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Book Synopsis Electrical Properties of Ion Implanted Layers in Silicon and Gallium Arsenide by : Richard Dana Pashley

Download or read book Electrical Properties of Ion Implanted Layers in Silicon and Gallium Arsenide written by Richard Dana Pashley and published by . This book was released on 1974 with total page 123 pages. Available in PDF, EPUB and Kindle. Book excerpt: Part I: With the advent of ion implantation, it has become possible to introduce many new dopant species into silicon. The electrical behavior of implanted species displaying deep energy levels was investigated. Part II: Ion implantation was investigated as a doping process for the fabrication of submicron n-type layers in GaAs.