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Diazonaphthoquinone Based Resists
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Book Synopsis Diazonaphthoquinone-based Resists by : Ralph Dammel
Download or read book Diazonaphthoquinone-based Resists written by Ralph Dammel and published by SPIE Press. This book was released on 1993 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book elucidates the reasons underlying the lasting success of DNQ/N resist systems by examining the correlation between the chemical structure of the components and the photoresist performance. The basic chemistry of both DNQ sensitizers and novolak resins are explored. Focus also is placed on the chemical basis of application-related facets of the lithographic process. Methods of increasing process performance, such as image reversal, top layer imaging, antireflection layers, and phase shift technology are treated.
Book Synopsis Introduction to Optical Testing by : Joseph M. Geary
Download or read book Introduction to Optical Testing written by Joseph M. Geary and published by SPIE Press. This book was released on 1993 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume in the SPIE Tutorial Text series presents a practical approach to optical testing, with emphasis on techniques, procedures, and instrumentation rather than mathematical analysis. The author provides the reader with a basic understanding of the measurements made and the tools used to make those measurements. Detailed information is given on how to measure and characterize imaging systems, perform optical bench measurements to determine first- and third-order properties of optical systems, set up and operate a Fizeau interferometer and evaluate fringe data, conduct beam diagnostics (such as wavefront sensing), and perform radiometric calibrations.
Book Synopsis Polymer Science: A Comprehensive Reference by :
Download or read book Polymer Science: A Comprehensive Reference written by and published by Newnes. This book was released on 2012-12-05 with total page 7752 pages. Available in PDF, EPUB and Kindle. Book excerpt: The progress in polymer science is revealed in the chapters of Polymer Science: A Comprehensive Reference, Ten Volume Set. In Volume 1, this is reflected in the improved understanding of the properties of polymers in solution, in bulk and in confined situations such as in thin films. Volume 2 addresses new characterization techniques, such as high resolution optical microscopy, scanning probe microscopy and other procedures for surface and interface characterization. Volume 3 presents the great progress achieved in precise synthetic polymerization techniques for vinyl monomers to control macromolecular architecture: the development of metallocene and post-metallocene catalysis for olefin polymerization, new ionic polymerization procedures, and atom transfer radical polymerization, nitroxide mediated polymerization, and reversible addition-fragmentation chain transfer systems as the most often used controlled/living radical polymerization methods. Volume 4 is devoted to kinetics, mechanisms and applications of ring opening polymerization of heterocyclic monomers and cycloolefins (ROMP), as well as to various less common polymerization techniques. Polycondensation and non-chain polymerizations, including dendrimer synthesis and various "click" procedures, are covered in Volume 5. Volume 6 focuses on several aspects of controlled macromolecular architectures and soft nano-objects including hybrids and bioconjugates. Many of the achievements would have not been possible without new characterization techniques like AFM that allowed direct imaging of single molecules and nano-objects with a precision available only recently. An entirely new aspect in polymer science is based on the combination of bottom-up methods such as polymer synthesis and molecularly programmed self-assembly with top-down structuring such as lithography and surface templating, as presented in Volume 7. It encompasses polymer and nanoparticle assembly in bulk and under confined conditions or influenced by an external field, including thin films, inorganic-organic hybrids, or nanofibers. Volume 8 expands these concepts focusing on applications in advanced technologies, e.g. in electronic industry and centers on combination with top down approach and functional properties like conductivity. Another type of functionality that is of rapidly increasing importance in polymer science is introduced in volume 9. It deals with various aspects of polymers in biology and medicine, including the response of living cells and tissue to the contact with biofunctional particles and surfaces. The last volume is devoted to the scope and potential provided by environmentally benign and green polymers, as well as energy-related polymers. They discuss new technologies needed for a sustainable economy in our world of limited resources. Provides broad and in-depth coverage of all aspects of polymer science from synthesis/polymerization, properties, and characterization methods and techniques to nanostructures, sustainability and energy, and biomedical uses of polymers Provides a definitive source for those entering or researching in this area by integrating the multidisciplinary aspects of the science into one unique, up-to-date reference work Electronic version has complete cross-referencing and multi-media components Volume editors are world experts in their field (including a Nobel Prize winner)
Book Synopsis Diffusion Phenomena in the Chemically Amplified CARL Resist System by : Ernst-Christian Richter
Download or read book Diffusion Phenomena in the Chemically Amplified CARL Resist System written by Ernst-Christian Richter and published by Herbert Utz Verlag. This book was released on 2000 with total page 96 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Materials and Processes for Next Generation Lithography by :
Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Book Synopsis Fundamental Principles of Optical Lithography by : Chris Mack
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Book Synopsis Processes in Photoreactive Polymers by : V.V. Krongauz
Download or read book Processes in Photoreactive Polymers written by V.V. Krongauz and published by Springer Science & Business Media. This book was released on 1995-02-28 with total page 430 pages. Available in PDF, EPUB and Kindle. Book excerpt: The development of photosensitive materials in general and photoreactive polymers in particular is responsible for major advances in the information, imaging, and electronic industries. Computer parts manufacturing, information storage, and book and magazine publishing all depend on photoreactive polymer systems. The photo-and radiation-induced processes in polymers are also active areas of research. New information on the preparation and properties of com mercially available photosensitive systems is constantly being acquired. The recent demand for environmentally safe solvent-free and water-soluble materials also motivated changes in the composition of photopolymers and photoresists. The interest in holographic recording media for head-up displays, light scanners, and data recording stimulated development of reconfigurable and visible light sensitive materials. Photoconductive polymerizable coatings are being tested in electrostatic proofing and color printing. The list of available initiators, poly meric binders, and other coating ingredients is continually evolving to respond to the requirements of low component loss (low diffusivity) and the high rate of photochemical reactions.
Book Synopsis Microlithography/Molecular Imprinting by :
Download or read book Microlithography/Molecular Imprinting written by and published by Springer Science & Business Media. This book was released on 2005-02-18 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: 1. J.D. Marty, M. Mauzac: Molecular Imprinting: State of the Art and Perspectives.- 2. H. Ito: Chemical Amplification Resists for Microlithography
Book Synopsis Introduction to Computer-based Imaging Systems by : Divyendu Sinha
Download or read book Introduction to Computer-based Imaging Systems written by Divyendu Sinha and published by SPIE Press. This book was released on 1998 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authors have designed a tutorial text to provide scientists with a technical understanding of computer-based imaging systems and how these systems interact with digital image processing algorithms. Contents include Boolean logic, image processing, image compression, basic computer architecture, advanced architectures, image processors, operating systems, error detection and correction, local area networks, object-oriented design paradigms, and software engineering. Contains numerous figures and case studies. Annotation copyrighted by Book News, Inc., Portland, OR
Book Synopsis Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology by : Saburo Nonogaki
Download or read book Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology written by Saburo Nonogaki and published by CRC Press. This book was released on 2018-10-08 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."
Book Synopsis Handbook of VLSI Microlithography, 2nd Edition by : John N. Helbert
Download or read book Handbook of VLSI Microlithography, 2nd Edition written by John N. Helbert and published by Cambridge University Press. This book was released on 2001-04 with total page 1026 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Book Synopsis Handbook of VLSI Microlithography by : John N. Helbert
Download or read book Handbook of VLSI Microlithography written by John N. Helbert and published by William Andrew. This book was released on 2001-04-01 with total page 1025 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Book Synopsis Photopolymerisation and Photoimaging Science and Technology by : N.S. Allen
Download or read book Photopolymerisation and Photoimaging Science and Technology written by N.S. Allen and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 313 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Macromolecules Containing Metal and Metal-Like Elements, Volume 2 by : Alaa S. Abd-El-Aziz
Download or read book Macromolecules Containing Metal and Metal-Like Elements, Volume 2 written by Alaa S. Abd-El-Aziz and published by John Wiley & Sons. This book was released on 2003-12-04 with total page 305 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal- and metalloid-containing macromolecules are defined as large molecules (i.e., polymers, DNA, proteins) that contain a metal or metalloid group affiliated with the molecule. Compiled by an all-star cast of macromolecular experts, Macromolecules Containing Metal and Metal-Like Elements, Volume 2, Organoiron-Containing Polymers: Provides useful descriptions of applications for the reader to apply in his/her research into materials, polymers, and medicine/drug development. Covers non-linear optical materials, speciality magnetic materials, liquid crystals, anticancer and antiviral drugs, treatment of arthritis, antibacterial drugs, antifouling materials, treatment of certain vitamin deficiencies, electrical conductors and semiconductors, piezoelectronic materials, electrodes, UV absorption applications, super-strength materials, special lubricants and gaskets, selective catalytic and multisite catalytic agents.
Book Synopsis Microarray Technology and Its Applications by : Uwe R. Müller
Download or read book Microarray Technology and Its Applications written by Uwe R. Müller and published by Springer Science & Business Media. This book was released on 2006-03-30 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ithasbeenstatedthatourknowledgedoublesevery20years,butthatmaybe an understatement when considering the Life Sciences. A series of discoveries and inventions have propelled our knowledge from the recognition that DNA isthegeneticmaterialtoabasicmolecularunderstandingofourselvesandthe living world around us in less than 50 years. Crucial to this rapid progress was thediscoveryofthedouble-helicalstructureofDNA,whichlaidthefoundation forallhybridizationbasedtechnologies. Thediscoveriesofrestrictionenzymes, ligases, polymerases, combined with key innovations in DNA synthesis and sequencing ushered in the era of biotechnologyas a new science with profound sociological and economic implications that are likely to have a dominating in?uence on the development of our society during this century. Given the process by which science builds on prior knowledge, it is perhaps unfair to single out a few inventions and credit them with having contributed most to thisavalancheofknowledge. Yet,therearesurelysomethatwillberecognized as having had a more profound impact than others, not just in the furthering of our scienti?c knowledge, but by leveraging commercial applications that provide a tangible return to our society. The now famous Polymerase Chain Reaction, or PCR, is surely one of those, as it has uniquely catalyzed molecular biology during the past 20 years, and continues to have a signi?cant impact on all areas that involve nucleic acids, ranging from molecular pathology to forensics. Ten years ago micro- ray technology emerged as a new and powerful tool to study nucleic acid - quences in a highly multiplexed manner, and has since found equally exciting and useful applications in the study of proteins, metabolites, toxins, viruses, whole cells and even tissues.
Book Synopsis Semiconductor Manufacturing Technology by : Chue San Yoo
Download or read book Semiconductor Manufacturing Technology written by Chue San Yoo and published by World Scientific. This book was released on 2008 with total page 483 pages. Available in PDF, EPUB and Kindle. Book excerpt: This textbook contains all the materials that an engineer needs to know to start a career in the semiconductor industry. It also provides readers with essential background information for semiconductor research. It is written by a professional who has been working in the field for over two decades and teaching the material to university students for the past 15 years. It includes process knowledge from raw material preparation to the passivation of chips in a modular format.
Book Synopsis Kirk-Othmer Encyclopedia of Chemical Technology, Volume 15 by : Kirk-Othmer
Download or read book Kirk-Othmer Encyclopedia of Chemical Technology, Volume 15 written by Kirk-Othmer and published by John Wiley & Sons. This book was released on 2005-10-06 with total page 886 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fifth edition of the Kirk-Othmer Encyclopedia of Chemical Technology builds upon the solid foundation of the previous editions, which have proven to be a mainstay for chemists, biochemists, and engineers at academic, industrial, and government institutions since publication of the first edition in 1949. The new edition includes necessary adjustments and modernisation of the content to reflect changes and developments in chemical technology. Presenting a wide scope of articles on chemical substances, properties, manufacturing, and uses; on industrial processes, unit operations in chemical engineering; and on fundamentals and scientific subjects related to the field. The Encyclopedia describes established technology along with cutting edge topics of interest in the wide field of chemical technology, whilst uniquely providing the necessary perspective and insight into pertinent aspects, rather than merely presenting information. * Set began publication in January 2004 * Over 1,000 articles * More than 600 new or updated articles * 27 volumes
