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Author :
Publisher :
ISBN 13 :
Total Pages : 634 pages
Book Rating : 4.3/5 (91 download)
Download or read book Design and Process Integration for Microelectronic Manufacturing written by and published by . This book was released on 2006 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Alfred K. K. Wong
Publisher :
ISBN 13 : 9780819461995
Total Pages : pages
Book Rating : 4.4/5 (619 download)
Download or read book Design and Process Integration for Microelectronic Manufacturing 4 written by Alfred K. K. Wong and published by . This book was released on 2006-02-15 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Alexander Starikov
Publisher : Society of Photo Optical
ISBN 13 : 9780819448477
Total Pages : 418 pages
Book Rating : 4.4/5 (484 download)
Download or read book Design and Process Integration for Microelectronic Manufacturing II written by Alexander Starikov and published by Society of Photo Optical. This book was released on 2003 with total page 418 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Lars W. Liebmann
Publisher : Society of Photo Optical
ISBN 13 : 9780819457363
Total Pages : 438 pages
Book Rating : 4.4/5 (573 download)
Download or read book Design and Process Integration for Microelectronic Manufacturing III written by Lars W. Liebmann and published by Society of Photo Optical. This book was released on 2005 with total page 438 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author : Alfred Kwok-Kit Wong
Publisher : Society of Photo Optical
ISBN 13 : 9780819461995
Total Pages : 526 pages
Book Rating : 4.4/5 (619 download)
Download or read book Design and Process Integration for Microelectronic Manufacturing IV written by Alfred Kwok-Kit Wong and published by Society of Photo Optical. This book was released on 2006 with total page 526 pages. Available in PDF, EPUB and Kindle. Book excerpt: Includes Proceedings Vol. 7821
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Author : Lars W. Liebmann
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 336 pages
Book Rating : 4.F/5 ( download)
Download or read book Design and Process Integration for Microelectronic Manufacturing II [sic] written by Lars W. Liebmann and published by SPIE-International Society for Optical Engineering. This book was released on 2004 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author : National Research Council
Publisher : National Academies Press
ISBN 13 : 0309176670
Total Pages : 228 pages
Book Rating : 4.3/5 (91 download)
Download or read book Unit Manufacturing Processes written by National Research Council and published by National Academies Press. This book was released on 1995-01-03 with total page 228 pages. Available in PDF, EPUB and Kindle. Book excerpt: Manufacturing, reduced to its simplest form, involves the sequencing of product forms through a number of different processes. Each individual step, known as an unit manufacturing process, can be viewed as the fundamental building block of a nation's manufacturing capability. A committee of the National Research Council has prepared a report to help define national priorities for research in unit processes. It contains an organizing framework for unit process families, criteria for determining the criticality of a process or manufacturing technology, examples of research opportunities, and a prioritized list of enabling technologies that can lead to the manufacture of products of superior quality at competitive costs. The study was performed under the sponsorship of the National Science Foundation and the Defense Department's Manufacturing Technology Program.
Author : Gary S. May
Publisher : John Wiley & Sons
ISBN 13 : 0471790273
Total Pages : 428 pages
Book Rating : 4.4/5 (717 download)
Download or read book Fundamentals of Semiconductor Manufacturing and Process Control written by Gary S. May and published by John Wiley & Sons. This book was released on 2006-05-26 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt: A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Author : Luciano Lavagno
Publisher : CRC Press
ISBN 13 : 1351831003
Total Pages : 893 pages
Book Rating : 4.3/5 (518 download)
Download or read book Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology written by Luciano Lavagno and published by CRC Press. This book was released on 2017-02-03 with total page 893 pages. Available in PDF, EPUB and Kindle. Book excerpt: The second of two volumes in the Electronic Design Automation for Integrated Circuits Handbook, Second Edition, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology thoroughly examines real-time logic (RTL) to GDSII (a file format used to transfer data of semiconductor physical layout) design flow, analog/mixed signal design, physical verification, and technology computer-aided design (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability (DFM) at the nanoscale, power supply network design and analysis, design modeling, and much more. New to This Edition: Major updates appearing in the initial phases of the design flow, where the level of abstraction keeps rising to support more functionality with lower non-recurring engineering (NRE) costs Significant revisions reflected in the final phases of the design flow, where the complexity due to smaller and smaller geometries is compounded by the slow progress of shorter wavelength lithography New coverage of cutting-edge applications and approaches realized in the decade since publication of the previous edition—these are illustrated by new chapters on 3D circuit integration and clock design Offering improved depth and modernity, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology provides a valuable, state-of-the-art reference for electronic design automation (EDA) students, researchers, and professionals.
Author : Eitan N. Shauly
Publisher : CRC Press
ISBN 13 : 1000631354
Total Pages : 831 pages
Book Rating : 4.0/5 (6 download)
Download or read book Design Rules in a Semiconductor Foundry written by Eitan N. Shauly and published by CRC Press. This book was released on 2022-11-30 with total page 831 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nowadays over 50% of integrated circuits are fabricated at wafer foundries. This book presents a foundry-integrated perspective of the field and is a comprehensive and up-to-date manual designed to serve process, device, layout, and design engineers. It comprises chapters carefully selected to cover topics relevant for them to deal with their work. The book provides an insight into the different types of design rules (DRs) and considerations for setting new DRs. It discusses isolation, gate patterning, S/D contacts, metal lines, MOL, air gaps, and so on. It explains in detail the layout rules needed to support advanced planarization processes, different types of dummies, and related utilities as well as presents a large set of guidelines and layout-aware modeling for RF CMOS and analog modules. It also discusses the layout DRs for different mobility enhancement techniques and their related modeling, listing many of the dedicated rules for static random-access memory (SRAM), embedded polyfuse (ePF), and LogicNVM. The book also provides the setting and calibration of the process parameters set and describes the 28~20 nm planar MOSFET process flow for low-power and high-performance mobile applications in a step-by-step manner. It includes FEOL and BEOL physical and environmental tests for qualifications together with automotive qualification and design for automotive (DfA). Written for the professionals, the book belongs to the bookshelf of microelectronic discipline experts.
Author : Mahmoud M. El-Halwagi
Publisher : Butterworth-Heinemann
ISBN 13 : 0128098244
Total Pages : 618 pages
Book Rating : 4.1/5 (28 download)
Download or read book Sustainable Design Through Process Integration written by Mahmoud M. El-Halwagi and published by Butterworth-Heinemann. This book was released on 2017-08-08 with total page 618 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sustainable Design through Process Integration: Fundamentals and Applications to Industrial Pollution Prevention, Resource Conservation, and Profitability Enhancement, Second Edition, is an important textbook that provides authoritative, comprehensive, and easy-to-follow coverage of the fundamental concepts and practical techniques on the use of process integration to maximize the efficiency and sustainability of industrial processes. The book is ideal for adoption in process design and sustainability courses. It is also a valuable guidebook to process, chemical, and environmental engineers who need to improve the design, operation, performance, and sustainability of industrial plants. The book covers pressing and high growth topics, including benchmarking process performance, identifying root causes of problems and opportunities for improvement, designing integrated solutions, enhancing profitability, conserving natural resources, and preventing pollution. Written by one of the world’s foremost authorities in integrated process design and sustainability, the new edition contains new chapters and updated materials on various aspects of process integration and sustainable design. The new edition is also packed with numerous new examples and industrial applications. Allows the reader to methodically develop rigorous targets that benchmark the performance of industrial processes then develop cost-effective implementations Contains state-of-the-art process integration and improvement approaches and techniques including graphical, algebraic, and mathematical methods Covers topics and applications that include profitability enhancement, mass and energy conservation, synthesis of innovative processes, retrofitting of existing systems, design and assessment of water, energy, and water-energy-nexus systems, and reconciliation of various sustainability objectives
Author : Alexander Starikov
Publisher : Society of Photo Optical
ISBN 13 : 9780819444394
Total Pages : 628 pages
Book Rating : 4.4/5 (443 download)
Download or read book Design, Process Integration, and Characterization for Microelectronics written by Alexander Starikov and published by Society of Photo Optical. This book was released on 2002 with total page 628 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Michael Orshansky
Publisher : Springer Science & Business Media
ISBN 13 : 0387690115
Total Pages : 319 pages
Book Rating : 4.3/5 (876 download)
Download or read book Design for Manufacturability and Statistical Design written by Michael Orshansky and published by Springer Science & Business Media. This book was released on 2007-10-28 with total page 319 pages. Available in PDF, EPUB and Kindle. Book excerpt: Design for Manufacturability and Statistical Design: A Comprehensive Approach presents a comprehensive overview of methods that need to be mastered in understanding state-of-the-art design for manufacturability and statistical design methodologies. Broadly, design for manufacturability is a set of techniques that attempt to fix the systematic sources of variability, such as those due to photolithography and CMP. Statistical design, on the other hand, deals with the random sources of variability. Both paradigms operate within a common framework, and their joint comprehensive treatment is one of the objectives of this book and an important differentation.
Author : Charles J. Alpert
Publisher : CRC Press
ISBN 13 : 1000654192
Total Pages : 1044 pages
Book Rating : 4.0/5 (6 download)
Download or read book Handbook of Algorithms for Physical Design Automation written by Charles J. Alpert and published by CRC Press. This book was released on 2008-11-12 with total page 1044 pages. Available in PDF, EPUB and Kindle. Book excerpt: The physical design flow of any project depends upon the size of the design, the technology, the number of designers, the clock frequency, and the time to do the design. As technology advances and design-styles change, physical design flows are constantly reinvented as traditional phases are removed and new ones are added to accommodate changes in
Author : Luciano Lavagno
Publisher : CRC Press
ISBN 13 : 1351837583
Total Pages : 762 pages
Book Rating : 4.3/5 (518 download)
Download or read book EDA for IC Implementation, Circuit Design, and Process Technology written by Luciano Lavagno and published by CRC Press. This book was released on 2018-10-03 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presenting a comprehensive overview of the design automation algorithms, tools, and methodologies used to design integrated circuits, the Electronic Design Automation for Integrated Circuits Handbook is available in two volumes. The second volume, EDA for IC Implementation, Circuit Design, and Process Technology, thoroughly examines real-time logic to GDSII (a file format used to transfer data of semiconductor physical layout), analog/mixed signal design, physical verification, and technology CAD (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability at the nanoscale, power supply network design and analysis, design modeling, and much more. Save on the complete set.
Author : Samar K. Saha
Publisher : CRC Press
ISBN 13 : 1351831070
Total Pages : 385 pages
Book Rating : 4.3/5 (518 download)
Download or read book Compact Models for Integrated Circuit Design written by Samar K. Saha and published by CRC Press. This book was released on 2018-09-03 with total page 385 pages. Available in PDF, EPUB and Kindle. Book excerpt: Compact Models for Integrated Circuit Design: Conventional Transistors and Beyond provides a modern treatise on compact models for circuit computer-aided design (CAD). Written by an author with more than 25 years of industry experience in semiconductor processes, devices, and circuit CAD, and more than 10 years of academic experience in teaching compact modeling courses, this first-of-its-kind book on compact SPICE models for very-large-scale-integrated (VLSI) chip design offers a balanced presentation of compact modeling crucial for addressing current modeling challenges and understanding new models for emerging devices. Starting from basic semiconductor physics and covering state-of-the-art device regimes from conventional micron to nanometer, this text: Presents industry standard models for bipolar-junction transistors (BJTs), metal-oxide-semiconductor (MOS) field-effect-transistors (FETs), FinFETs, and tunnel field-effect transistors (TFETs), along with statistical MOS models Discusses the major issue of process variability, which severely impacts device and circuit performance in advanced technologies and requires statistical compact models Promotes further research of the evolution and development of compact models for VLSI circuit design and analysis Supplies fundamental and practical knowledge necessary for efficient integrated circuit (IC) design using nanoscale devices Includes exercise problems at the end of each chapter and extensive references at the end of the book Compact Models for Integrated Circuit Design: Conventional Transistors and Beyond is intended for senior undergraduate and graduate courses in electrical and electronics engineering as well as for researchers and practitioners working in the area of electron devices. However, even those unfamiliar with semiconductor physics gain a solid grasp of compact modeling concepts from this book.
Author : Chandan Kumar Sarkar
Publisher : CRC Press
ISBN 13 : 1466512660
Total Pages : 462 pages
Book Rating : 4.4/5 (665 download)
Download or read book Technology Computer Aided Design written by Chandan Kumar Sarkar and published by CRC Press. This book was released on 2018-09-03 with total page 462 pages. Available in PDF, EPUB and Kindle. Book excerpt: Responding to recent developments and a growing VLSI circuit manufacturing market, Technology Computer Aided Design: Simulation for VLSI MOSFET examines advanced MOSFET processes and devices through TCAD numerical simulations. The book provides a balanced summary of TCAD and MOSFET basic concepts, equations, physics, and new technologies related to TCAD and MOSFET. A firm grasp of these concepts allows for the design of better models, thus streamlining the design process, saving time and money. This book places emphasis on the importance of modeling and simulations of VLSI MOS transistors and TCAD software. Providing background concepts involved in the TCAD simulation of MOSFET devices, it presents concepts in a simplified manner, frequently using comparisons to everyday-life experiences. The book then explains concepts in depth, with required mathematics and program code. This book also details the classical semiconductor physics for understanding the principle of operations for VLSI MOS transistors, illustrates recent developments in the area of MOSFET and other electronic devices, and analyzes the evolution of the role of modeling and simulation of MOSFET. It also provides exposure to the two most commercially popular TCAD simulation tools Silvaco and Sentaurus. • Emphasizes the need for TCAD simulation to be included within VLSI design flow for nano-scale integrated circuits • Introduces the advantages of TCAD simulations for device and process technology characterization • Presents the fundamental physics and mathematics incorporated in the TCAD tools • Includes popular commercial TCAD simulation tools (Silvaco and Sentaurus) • Provides characterization of performances of VLSI MOSFETs through TCAD tools • Offers familiarization to compact modeling for VLSI circuit simulation R&D cost and time for electronic product development is drastically reduced by taking advantage of TCAD tools, making it indispensable for modern VLSI device technologies. They provide a means to characterize the MOS transistors and improve the VLSI circuit simulation procedure. The comprehensive information and systematic approach to design, characterization, fabrication, and computation of VLSI MOS transistor through TCAD tools presented in this book provides a thorough foundation for the development of models that simplify the design verification process and make it cost effective.
