Read Books Online and Download eBooks, EPub, PDF, Mobi, Kindle, Text Full Free.
Design And Implementation Of Ybco Superconducting Thin Film Deposition System Using Rf Sputtering
Download Design And Implementation Of Ybco Superconducting Thin Film Deposition System Using Rf Sputtering full books in PDF, epub, and Kindle. Read online Design And Implementation Of Ybco Superconducting Thin Film Deposition System Using Rf Sputtering ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Book Synopsis Design and Implementation of YBCO Superconducting Thin Film Deposition System Using RF Sputtering by : Zhiyong Jiang
Download or read book Design and Implementation of YBCO Superconducting Thin Film Deposition System Using RF Sputtering written by Zhiyong Jiang and published by . This book was released on 1998 with total page 128 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Novel Process and Apparatus Design for Metalorganic Chemical Vapor Deposition (MOCVD) of Superconducting Thin Films by : Brian Norio Hubert
Download or read book Novel Process and Apparatus Design for Metalorganic Chemical Vapor Deposition (MOCVD) of Superconducting Thin Films written by Brian Norio Hubert and published by . This book was released on 1996 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Sputter Deposition Technology by : Kiyotaka Wasa
Download or read book Handbook of Sputter Deposition Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2012-12-31 with total page 657 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Book Synopsis The Study on the Growth of In-situ High-T[subscript C] Bi-Sr-Ca-Cu-O Superconducting Thin Films Using Single Target Rf Magnetron Sputtering System by : Ji Ung Lee
Download or read book The Study on the Growth of In-situ High-T[subscript C] Bi-Sr-Ca-Cu-O Superconducting Thin Films Using Single Target Rf Magnetron Sputtering System written by Ji Ung Lee and published by . This book was released on 1991 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Off Axis RF Sputtering of YBCO Superconducting Thin Film, Fabrication and Investigation of the Effect of Penetration Depth on London Moment by : Hamid Fath Karimy
Download or read book Off Axis RF Sputtering of YBCO Superconducting Thin Film, Fabrication and Investigation of the Effect of Penetration Depth on London Moment written by Hamid Fath Karimy and published by . This book was released on 1993 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Superconducting Thin Films for the Enhancement of Superconducting Radio Frequency Accelerator Cavities by : Matthew C. Burton
Download or read book Superconducting Thin Films for the Enhancement of Superconducting Radio Frequency Accelerator Cavities written by Matthew C. Burton and published by . This book was released on 2017 with total page 151 pages. Available in PDF, EPUB and Kindle. Book excerpt: Bulk niobium (Nb) superconducting radio frequency (SRF) cavities are currently the preferred method for acceleration of charged particles at accelerating facilities around the world. However, bulk Nb cavities have poor thermal conductance, impose material and design restrictions on other components of a particle accelerator, have low reproducibility and are approaching the fundamental material-dependent accelerating field limit of approximately 50MV/m. Since the SRF phenomena occurs at surfaces within a shallow depth of ~1 μm, a proposed solution to this problem has been to utilize thin film technology to deposit superconducting thin films on the interior of cavities to engineer the active SRF surface in order to achieve cavities with enhanced properties and performance. Two proposed thin film applications for SRF cavities are: 1) Nb thin films coated on bulk cavities made of suitable castable metals (such as copper or aluminum) and 2) multilayer films designed to increase the accelerating gradient and performance of SRF cavities. While Nb thin films on copper (Cu) cavities have been attempted in the past using DC magnetron sputtering (DCMS), such cavities have never performed at the bulk Nb level. However, new energetic condensation techniques for film deposition, such as High Power Impulse Magnetron Sputtering (HiPIMS), offer the opportunity to create suitably thick Nb films with improved density, microstructure and adhesion compared to traditional DCMS. Clearly use of such novel technique requires fundamental studies to assess surface evolution and growth modes during deposition and resulting microstructure and surface morphology and the correlation with RF superconducting properties. Here we present detailed structure-property correlative research studies done on Nb/Cu thin films and NbN- and NbTiN-based multilayers made using HiPIMS and DCMS, respectively.
Book Synopsis Fabrication of Bi-Sr-Ca-Cu-O Superconducting Thin Films and Interface Studies by : YiFeng Yang
Download or read book Fabrication of Bi-Sr-Ca-Cu-O Superconducting Thin Films and Interface Studies written by YiFeng Yang and published by . This book was released on 1993 with total page 486 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Sputtering Materials for VLSI and Thin Film Devices by : Jaydeep Sarkar
Download or read book Sputtering Materials for VLSI and Thin Film Devices written by Jaydeep Sarkar and published by William Andrew. This book was released on 2010-12-13 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements Practical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. Practical case-studies on target performance and troubleshooting Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry
Book Synopsis Handbook of Sputter Deposition Technology by : Shigeru Hayakawa
Download or read book Handbook of Sputter Deposition Technology written by Shigeru Hayakawa and published by William Andrew Publishing. This book was released on 1992-01-01 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt: A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.
Book Synopsis Handbook of Thin Film Deposition by : Krishna Seshan
Download or read book Handbook of Thin Film Deposition written by Krishna Seshan and published by William Andrew. This book was released on 2018-02-23 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries Features a new chapter discussing Gates Dielectrics
Book Synopsis System Innovations for Aerosol MOCVD of YBCO Superconducting Thin Films by : David M. Nelms
Download or read book System Innovations for Aerosol MOCVD of YBCO Superconducting Thin Films written by David M. Nelms and published by . This book was released on 1997 with total page 410 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Reduced Thermal Budget Processing of YBCO Superconducting Thin Films by Metalorganic Chemical Vapor Deposition by : Neng-Jye Hsu
Download or read book Reduced Thermal Budget Processing of YBCO Superconducting Thin Films by Metalorganic Chemical Vapor Deposition written by Neng-Jye Hsu and published by . This book was released on 1992 with total page 252 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Design of a Radio-frequency Facing-target Sputtering System for Low-damage Thin Film Deposition by : Sophia Weeks
Download or read book Design of a Radio-frequency Facing-target Sputtering System for Low-damage Thin Film Deposition written by Sophia Weeks and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin film devices are becoming increasingly important in the electronic semi- conductor industry. For example, organic light-emitting diodes provide many advantages for the development of flat panel displays used in mobile phones, while thin film transistors have provided solutions in the fabrication of OLED backplanes. Organic photovoltaics have the potential to provide our planet with a vast supply of clean, cheap energy. Thin film deposition processes today have a number of drawbacks, including complicated and time-consuming operation procedures, high cost of construction, and laborious maintenance procedures. While these methods are currently being used effectively in premier research laboratories, addressing these problems would open up the field to researchers with less time and fewer resources. For this purpose, we have designed and constructed a state-of-the-art thermal evaporator which is inexpensive, simple and quick to operate, and easy to maintain. While common thermal evaporators are situated inside the glove box, the evaporator developed in this project is mounted instead beneath the glove box floor with top-loading substrate access from inside the glove box. A retractable base plate elevator system enables access to the chamber from outside the glove box through the chamber floor. These improvements maximize space inside the glove box and accessibility of the evaporator chamber, and the chamber's compact size significantly reduces construction costs and pump-down times. We have also designed a radio-frequency facing-target magnetron sputtering system, which shares these features. However, current sputter deposition processes face additional problems. The fabrication of many semiconductor devices involves deposition onto a substrate previously coated with an organic thin film. Energetic particles in the sputtering plasma have been shown to cause critical damage to underlying organic layers on substrates during sputter deposition. Consequently, our sputtering system takes advantage of the facing target configuration, which has been shown to effectively confine the sputtering plasma below the substrates, thereby protecting previously deposited organic layers. The design also features high strength magnets positioned above the sputter guns to create a high magnitude magnetic field near the substrates for further protection from high energy electrons and ions. Radio frequency excitation of the sputtering plasma allows for the deposition of insulating materials. CAD designs for both the evaporator and the sputtering system were created in SolidWorks, and Finite Element Analysis (FEA) was performed using Maxwell 3D. The evaporator has been built and is operating smoothly with no user errors. The total cost was under $40K. The chamber takes less than 3 minutes to pump down, while deposition takes less than 10 minutes. Cleaning is as easy as switching out the metal sleeve, which takes 15 minutes at most.
Book Synopsis Fabrication and Characterization of Epitaxial Yba2cu3oy Thin Films on Double-Buffered Silicon Substrates by : Ho-Yi Eric Wong
Download or read book Fabrication and Characterization of Epitaxial Yba2cu3oy Thin Films on Double-Buffered Silicon Substrates written by Ho-Yi Eric Wong and published by . This book was released on 2017-01-27 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This dissertation, "Fabrication and Characterization of Epitaxial YBa2Cu3Oy Thin Films on Double-buffered Silicon Substrates" by Ho-yi, Eric, Wong, 黃灝頤, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. Abstract: Abstract of thesis entitled FABRICATION AND CHARACTERIZATION OF EPITAXIAL YBa Cu O 2 3 y THIN FILMS ON DOUBLE-BUFFERED SILICON SUBSTRATES submitted by WONG HO YI ERIC for the degree of Master of Philosophy at The University of Hong Kong in August 2003 The discovery of perovskite copper oxide YBa Cu O (YBCO) has aroused a 2 3 y constantly increasing interest in this material due to the potential applications in microelectronics devices, such as microwave elements, multilayer junctions, etc. Suitable substrates with a low dielectric constant, good high frequency properties, large size and low cost are necessary. Silicon substrates are widely used and well developed in the semiconductor industry and microwave device applications. Therefore, successful fabrication of high T YBCO films on silicon is of interest for various applications of hybrid superconductor-semiconductor devices and interconnected circuits. In such applications, the epitaxial growth of YBCO on silicon is extremely important. This thesis presents a systematic investigation of the fabrication and characterization of epitaxial YBCO thin films on silicon substrates with a double buffer of Eu CuO (ECO)/YSZ(Yttria-Stabilized Zirconia). Silicon (001) substrates 2 4 were prepared using a chemical etch by dilute HF acid prior to thin film deposition. The YBCO thin films were grown via an entirely in situ process using an on-axis rf magnetron sputtering method with optimized deposition parameters including the deposition temperature, operating pressure and partial oxygen pressure. The crystallinity, surface morphology, electrical properties, and interface of the obtained YBCO/ECO/YSZ thin films were studied by x-ray diffraction, surface profiler, atomic force microscope, optical microscope, standard dc four-probe measurements and small angle x-ray reflection. The X-ray diffraction patterns showed that all the thin films were highly c-axis oriented. A full width of 0.69 at half maximum of the YBCO(005) peak was obtained. This was smaller than reported in previous studies of YBCO thin films on double buffered silicon or nickel substrates. The atomic force microscopy image showed that the ECO buffer surface was flat and smooth. The average roughness over a wide scanning region of 2000m was less than 25nm. The optical microscope images showed that the surface morphology of the grown YBCO thin films was significantly improved by the ECO buffer layer since ECO had a very stable 214-T' crystal structure and very small lattice mismatch with YBCO. The YBCO/ECO/YSZ multilayers were further characterized by small angle x-ray reflection. The surface roughness of the YBCO layers decreased when an ECO buffer was added. No intermediate layer was found at the YBCO/ECO and ECO/YSZ interfaces. The results suggest that ECO is chemically compatible with YBCO and YSZ. The superconductivity of YBCO films was significantly improved by the ECO/YSZ double buffer. This is indicated by the fact that YBCO thin films on silicon substrates with an ECO/YSZ double buffer showed a higher T than that grown on YSZ/Si without the ECO layer. The advantages of using ECO/YSZ double buffer layers in deposition of YBCO on silicon were clearly demonstrated. It would provide a good basis for the potential applications of YBCO on other semiconductors, metallic or me
Book Synopsis High-Temperature Superconductors by : Ajay Kumar Saxena
Download or read book High-Temperature Superconductors written by Ajay Kumar Saxena and published by Springer Science & Business Media. This book was released on 2009-10-09 with total page 231 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the phenomenon of superconductivity and high-temperature superconductors discovered by Bednorz and Muller in 1986. It covers all major experimental and theoretical developments in the field as well as many applications.
Book Synopsis High Rate Sputter Deposition Method for Superconductors by :
Download or read book High Rate Sputter Deposition Method for Superconductors written by and published by . This book was released on 1997 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Magnetron sputtering deposition is potentially the most economical deposition method for thin films. Presently sputtering can't deposit high temperature superconductors like Yttrium Barium Copper Oxide (YBCO) because of negative oxygen ion bombardment damage. Lowering the plasma discharge voltage to less than 100 volts would decrease such damage and make YBCO economically practical. The goal of this phase I effort was to lower plasma discharge voltages using high magnetic fields. Our results showed that high magnetic fields alone can lower plasma voltages to about 200 volts. Just as important, we showed that plasma impedance was lowered by more than ten times. Low plasma impedance allows high magnetic fields and electron injection into the plasma to be combined to lower plasma voltage to 30 volts. This combination removes the power limitations of electron injection. It should also produce epitaxial quality thin film semiconductors because low voltages allow 'self-bombardment' where the adatoms have the optimum energy to form a crystalline matrix at lower temperatures. The method is also applicable to thin film semiconductors such as II-VI solar cells and III-V films.
Book Synopsis Handbook of Thin Film Devices: Superconducting film devices by : Maurice H. Francombe
Download or read book Handbook of Thin Film Devices: Superconducting film devices written by Maurice H. Francombe and published by Academic Press. This book was released on 2000 with total page 256 pages. Available in PDF, EPUB and Kindle. Book excerpt: The highly industrialized world we live in depends for its survival and further growth on advanced electronic technologies which place a premium on rapidly improved performance versus size, weight, and cost. Small computers, high-definition TV, digital camcorders, flat-panel displays, and robotic systems are but a few examples of miniatured device technologies which are of critical importance to emerging societal, industrial, defense, and space needs. All of these technologies depend sensitively on the availability of miniature thin film components in array and/or integrated formats. This book provides that first multi-topical coverage of the semiconductor, optical, superconductor, magnetic, and ferroelectric devices and technologies responding to these needs. This book comprises five topical volumes edited by world authorities in their fields, id est semiconductor junction devices, semiconductor optics, superconducting film devices, magnetic film devices, and ferroelectric film devices. Well-known experts were invited to cover recent progress in aspects ranging from deposition and fabrication to device modeling, measurements, and new cutting-edge design approached for improved performance. This multitopic approach effectively demonstrates the broad-based and pervasive character of thin film techniques that impact and control a vast array of device functions that are critical to developments in computer technology, communications, television, defense and space systems, and industrial and consumer products. Readers are provided with both broad critical overviews and research level analysis and technical details. Key Features * A comprehensive discussion of the most promising and completely developed of thin film devices which impact the entire field of high-tech components and systems for commercial, defense and space applications * Edited and written by internationally known, authoritative experts and innovators, familiar with all aspects of research and development in their fields and with current and potential applications * Presents the reader with informed assessments of all candidate solid state film devices now being optimized for advanced application, e.g., in flat panel displays, solar energy conversion, high-speed and power components, radar technology, infrared imaging , advanced computers, laser sources, and numerous other arenas * Provides a well-balanced coverage of materials growth and optimization, thin-film device modelling , device fabrication and characterization, and future development directions;These inputs are critically important to both educators, designers, device technologists and manufacturers, and to system engineers * Furnishes useful insights on processing compatibility, materials and film device stability, interface engineering, cryogenic requirements and operation, lithography and micro-machining, and integrability for sub-systems * Provides a broad-based view of alternative and/or complimentary film device technologies in a single, well-referenced source * Ensures complete and detailed overview of solid-state device topics, comprehensive bibliographical information, and expert guidance in advanced and sophisticated areas of device technology and potental applications * Furnishes invaluable insights on competitive state-of-the-art thin film semiconductor, photonics, superconductor, magnetic and ferroelectric technologies, processing and compatibility,device options, performance potential and prospects for essentially all solid-state film components * An essential information source and primer for educators , researchers, engineers and technology leaders supplying a wealth of background theoretical and experimental details, as well as guidance for further advanced research and development , thesis topics and high-tech product design * Identifies key processing, fabrication, design, integration, compatibility problems and solutions involved in successful development of high-performance and stable device and sub-system architectures.
![Download The Study on the Growth of In-situ High-T[subscript C] Bi-Sr-Ca-Cu-O Superconducting Thin Films Using Single Target Rf Magnetron Sputtering System PDF Online Free](https://books.google.com/books/content/images/frontcover/pNdbAAAAMAAJ?fife=w200-h370)
