DC Magnetron Reactive Sputtering of Low Stress AlN Piezoelectric Thin Films for MEMS Application

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ISBN 13 : 9781423552901
Total Pages : 61 pages
Book Rating : 4.5/5 (529 download)

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Book Synopsis DC Magnetron Reactive Sputtering of Low Stress AlN Piezoelectric Thin Films for MEMS Application by : Peter Y. Hsieh

Download or read book DC Magnetron Reactive Sputtering of Low Stress AlN Piezoelectric Thin Films for MEMS Application written by Peter Y. Hsieh and published by . This book was released on 1999-10-01 with total page 61 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microelectromechanical systems (MEMS) often incorporate piezoelectric thin films to actuate and detect motion of mechanical structures. Aluminum nitride is advantageous for MEMS use because it can be deposited at low temperatures, is easily patterned using conventional photo lithographic techniques, and is compatible with CMOS contaminant requirements for silicon IC foundries. In this work, AlN thin films were deposited on silicon for use in a MEMS ultrasonic resonator. The resonator is configured as a gravimetric chemical sensor. A rotatable central composite designed experiment was performed to optimize film properties affecting device performance: film crystallinity, stress, and uniformity. Film property response characterization was conducted with x-ray diffractometry, spectroscopic ellipsometry, and surface profilometry. Optimization of film deposition parameters improved AlN film properties in the MEMS sensors. Film property characterization using response surface methodology indicated microstructural changes due to sputtered particle bombardment of the growing film surface. Surface morphology of the sputtered AlN films was assessed using tapping mode atomic force microscopy and scanning electron microscopy. Energetic particle bombardment of the growing film surface helped to yield dense crystalline films with zone T microstructure. Thermalization of the impinging particle flux resulted in voided films with zone 1 microstructure with inferior film properties. Correlation between film crystallinity and oxygen content was explored with x-ray photoelectron spectrometry. Changes in film microstructure and composition are correlated with variations in deposition parameters. Adatom mobility during film growth appears to play an important role in determining final film properties.

Pulsed DC Reactive Magnetron Sputtering of Aluminum Nitride Thin Films

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (656 download)

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Book Synopsis Pulsed DC Reactive Magnetron Sputtering of Aluminum Nitride Thin Films by :

Download or read book Pulsed DC Reactive Magnetron Sputtering of Aluminum Nitride Thin Films written by and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Aluminum nitride thin films have been deposited by pulsed DC reactive magnetron sputtering. The pulsed DC power provides arc-free deposition of insulating films. Two types of pulsed DC (unipolar and asymmetric bipolar) were studied with respect to characteristics and properties of resultant films. The unipolar power supply generates a series of 75 kHz DC pulses modulated with 2.5 kHz frequency. The frequency of asymmetric power supply can be varied from 50 kHz to 250 kHz. The duty cycle, which is a ratio of negative pulse time to total time, can be varied from 60% to 98%. Very fast oscillation and overshoot were observed when the polarity of the target voltage was changed. The control of crystal orientation of deposited film is important since the properties of AlN film is related with the orientation. For example, the acoustic velocity is high along the c-axis. The electromechanical coupling coefficient is large in a-axis direction. The crystal orientation and microstructure of the AlN films were strongly affected by the deposition conditions such as sputtering power, growth temperature, sputtering gas pressure and frequency/duty cycle. The crystal orientation of AlN films was closely related with the energy of sputtered atoms and mobility of adatoms on substrate. The c-axis oriented films were obtained when the target power and growth temperature were high. This provided higher energy of sputtered atoms and mobility of adatoms. The deposited AlN films have a columnar structure. The crystal orientation of the AlN films was changed from (101) to (002) by applying an RF bias was applied to the substrate in unipolar pulsed DC sputtering. The columnar structure disappeared when the RF bias was applied to the substrate. Applying bias was thought to increase mobility of adatoms by ion bombardment. MIM (aluminum-AlN-aluminum or molybdenum) structure was fabricated to measure electric properties of AlN films. Dielectric constants of 8.5 to 11.5 were obtained at 100 kHz. Th.

Handbook of Sputter Deposition Technology

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Author :
Publisher : William Andrew
ISBN 13 : 1437734839
Total Pages : 658 pages
Book Rating : 4.4/5 (377 download)

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Book Synopsis Handbook of Sputter Deposition Technology by : Kiyotaka Wasa

Download or read book Handbook of Sputter Deposition Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2012-11-20 with total page 658 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere

Piezoelectric MEMS Resonators

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Publisher : Springer
ISBN 13 : 3319286889
Total Pages : 423 pages
Book Rating : 4.3/5 (192 download)

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Book Synopsis Piezoelectric MEMS Resonators by : Harmeet Bhugra

Download or read book Piezoelectric MEMS Resonators written by Harmeet Bhugra and published by Springer. This book was released on 2017-01-09 with total page 423 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book introduces piezoelectric microelectromechanical (pMEMS) resonators to a broad audience by reviewing design techniques including use of finite element modeling, testing and qualification of resonators, and fabrication and large scale manufacturing techniques to help inspire future research and entrepreneurial activities in pMEMS. The authors discuss the most exciting developments in the area of materials and devices for the making of piezoelectric MEMS resonators, and offer direct examples of the technical challenges that need to be overcome in order to commercialize these types of devices. Some of the topics covered include: Widely-used piezoelectric materials, as well as materials in which there is emerging interest Principle of operation and design approaches for the making of flexural, contour-mode, thickness-mode, and shear-mode piezoelectric resonators, and examples of practical implementation of these devices Large scale manufacturing approaches, with a focus on the practical aspects associated with testing and qualification Examples of commercialization paths for piezoelectric MEMS resonators in the timing and the filter markets ...and more! The authors present industry and academic perspectives, making this book ideal for engineers, graduate students, and researchers.

Reactive Ion Enhanced Magnetron Sputtering of Nitride Thin Films

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Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.4/5 (387 download)

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Book Synopsis Reactive Ion Enhanced Magnetron Sputtering of Nitride Thin Films by : Al-Ahsan Talukder

Download or read book Reactive Ion Enhanced Magnetron Sputtering of Nitride Thin Films written by Al-Ahsan Talukder and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Magnetron sputtering is a popular vacuum plasma coating technique used for depositing metals, dielectrics, semiconductors, alloys, and compounds onto a wide range of substrates. In this work, we present two popular types of magnetron sputtering, i.e., pulsed DC and RF magnetron sputtering, for depositing piezoelectric aluminum nitride (AlN) thin films with high Young's modulus. The effects of important process parameters on the plasma I-V characteristics, deposition rate, and the properties of the deposited AlN films, are studied comprehensively. The effects of these process parameters on Young's modulus of the deposited films are also presented. Scanning electron microscope imaging revealed a c-axis oriented columnar growth of AlN. Performance of surface acoustic devices, utilizing the AlN films deposited by magnetron sputtering, are also presented, which confirms the differences in qualities and microstructures of the pulsed DC and RF sputtered films. The RF sputtered AlN films showed a denser microstructure with smaller grains and a smoother surface than the pulsed DC sputtered films. However, the deposition rate of RF sputtering is about half of the pulsed DC sputtering process. We also present a novel ion source enhanced pulsed DC magnetron sputtering for depositing high-quality nitrogen-doped zinc telluride (ZnTe:N) thin films. This ion source enhanced magnetron sputtering provides an increased deposition rate, efficient N-doping, and improved electrical, structural, and optical properties than the traditional magnetron sputtering. Ion source enhanced deposition leads to ZnTe:N films with smaller lattice spacing and wider X-ray diffraction peak, which indicates denser films with smaller crystallites embedded in an amorphous matrix.

Silicon Sensors and Actuators

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Publisher : Springer Nature
ISBN 13 : 3030801357
Total Pages : 988 pages
Book Rating : 4.0/5 (38 download)

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Book Synopsis Silicon Sensors and Actuators by : Benedetto Vigna

Download or read book Silicon Sensors and Actuators written by Benedetto Vigna and published by Springer Nature. This book was released on 2022-04-12 with total page 988 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book thoroughly reviews the present knowledge on silicon micromechanical transducers and addresses emerging and future technology challenges. Readers will acquire a solid theoretical and practical background that will allow them to analyze the key performance aspects of devices, critically judge a fabrication process, and then conceive and design new ones for future applications. Envisioning a future complex versatile microsystem, the authors take inspiration from Richard Feynman’s visionary talk “There is Plenty of Room at the Bottom” to propose that the time has come to see silicon sensors as part of a “Feynman Roadmap” instead of the “More-than-Moore” technology roadmap. The sharing of the author’s industrially proven track record of development, design, and manufacturing, along with their visionary approach to the technology, will allow readers to jump ahead in their understanding of the core of the topic in a very effective way. Students, researchers, engineers, and technologists involved in silicon-based sensor and actuator research and development will find a wealth of useful and groundbreaking information in this book.

Thin Films

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Publisher : BoD – Books on Demand
ISBN 13 : 1803564555
Total Pages : 224 pages
Book Rating : 4.8/5 (35 download)

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Book Synopsis Thin Films by : Dongfang Yang

Download or read book Thin Films written by Dongfang Yang and published by BoD – Books on Demand. This book was released on 2023-03-29 with total page 224 pages. Available in PDF, EPUB and Kindle. Book excerpt: A thin film is a layer of material ranging from fractions of a nanometer to several micrometers in thickness. Thin films have been employed in many applications to provide surfaces that possess specific optical, electronic, chemical, mechanical and thermal properties. Through ten chapters consisting of original research studies and literature reviews written by experts from the international scientific community, this book covers the deposition and application of thin films.

Nanotechnology for Energy and Environmental Engineering

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Publisher : Springer Nature
ISBN 13 : 303033774X
Total Pages : 605 pages
Book Rating : 4.0/5 (33 download)

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Book Synopsis Nanotechnology for Energy and Environmental Engineering by : Lalita Ledwani

Download or read book Nanotechnology for Energy and Environmental Engineering written by Lalita Ledwani and published by Springer Nature. This book was released on 2020-03-12 with total page 605 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book examines the potential applications of nanoscience and nanotechnology to promote eco-friendly processes and techniques for energy and environment sustainability. Covering various aspects of both the synthesis and applications of nanoparticles and nanofluids for energy and environmental engineering, its goal is to promote eco-friendly processes and techniques. Accordingly, the book elaborates on the development of reliable, economical, eco-friendly processes through advanced nanoscience and technological research and innovations. Gathering contributions by researchers actively engaged in various domains of nanoscience and technology, it addresses topics such as nanoparticle synthesis (both top-down and bottom-up approaches); applications of nanomaterials, nanosensors and plasma discharge in pollution control; environmental monitoring; agriculture; energy recovery; production enhancement; energy conservation and storage; surface modification of materials for energy storage; fuel cells; pollution mitigation; and CO2 capture and sequestration. Given its scope, the book will be of interest to academics and researchers whose work involves nanotechnology or nanomaterials, especially as applied to energy and/or environmental sustainability engineering. Graduate students in the same areas will also find it a valuable resource.

Advanced Strategies in Thin Film Engineering by Magnetron Sputtering

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Publisher : MDPI
ISBN 13 : 3039364294
Total Pages : 148 pages
Book Rating : 4.0/5 (393 download)

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Book Synopsis Advanced Strategies in Thin Film Engineering by Magnetron Sputtering by : Alberto Palmero

Download or read book Advanced Strategies in Thin Film Engineering by Magnetron Sputtering written by Alberto Palmero and published by MDPI. This book was released on 2020-12-10 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.

Characterization of the Piezoelectric Response of Aluminum Nitride Grown by DC Magnetron Sputtering for Applications in Thin-film Resonators

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Publisher :
ISBN 13 :
Total Pages : 14 pages
Book Rating : 4.:/5 (419 download)

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Book Synopsis Characterization of the Piezoelectric Response of Aluminum Nitride Grown by DC Magnetron Sputtering for Applications in Thin-film Resonators by : Rajan Sharad Naik

Download or read book Characterization of the Piezoelectric Response of Aluminum Nitride Grown by DC Magnetron Sputtering for Applications in Thin-film Resonators written by Rajan Sharad Naik and published by . This book was released on 1998 with total page 14 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Reactive Sputter Deposition

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Publisher : Springer Science & Business Media
ISBN 13 : 3540766642
Total Pages : 584 pages
Book Rating : 4.5/5 (47 download)

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Book Synopsis Reactive Sputter Deposition by : Diederik Depla

Download or read book Reactive Sputter Deposition written by Diederik Depla and published by Springer Science & Business Media. This book was released on 2008-06-24 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

Sputtering Materials for VLSI and Thin Film Devices

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Publisher : William Andrew
ISBN 13 : 0815519877
Total Pages : 614 pages
Book Rating : 4.8/5 (155 download)

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Book Synopsis Sputtering Materials for VLSI and Thin Film Devices by : Jaydeep Sarkar

Download or read book Sputtering Materials for VLSI and Thin Film Devices written by Jaydeep Sarkar and published by William Andrew. This book was released on 2010-12-13 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements Practical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. Practical case-studies on target performance and troubleshooting Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry

Acoustic Waves

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Publisher : BoD – Books on Demand
ISBN 13 : 9533075724
Total Pages : 670 pages
Book Rating : 4.5/5 (33 download)

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Book Synopsis Acoustic Waves by : Marco G. Beghi

Download or read book Acoustic Waves written by Marco G. Beghi and published by BoD – Books on Demand. This book was released on 2011-11-14 with total page 670 pages. Available in PDF, EPUB and Kindle. Book excerpt: The concept of acoustic wave is a pervasive one, which emerges in any type of medium, from solids to plasmas, at length and time scales ranging from sub-micrometric layers in microdevices to seismic waves in the Sun's interior. This book presents several aspects of the active research ongoing in this field. Theoretical efforts are leading to a deeper understanding of phenomena, also in complicated environments like the solar surface boundary. Acoustic waves are a flexible probe to investigate the properties of very different systems, from thin inorganic layers to ripening cheese to biological systems. Acoustic waves are also a tool to manipulate matter, from the delicate evaporation of biomolecules to be analysed, to the phase transitions induced by intense shock waves. And a whole class of widespread microdevices, including filters and sensors, is based on the behaviour of acoustic waves propagating in thin layers. The search for better performances is driving to new materials for these devices, and to more refined tools for their analysis.

Characterization of Piezoelectric AIN Thin Films Deposited on Silicon by RF Reactive Magnetron Sputtering at Low Temperature for Acoustic Wave Devices [microform]

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Publisher : National Library of Canada = Bibliothèque nationale du Canada
ISBN 13 : 9780612939431
Total Pages : 192 pages
Book Rating : 4.9/5 (394 download)

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Book Synopsis Characterization of Piezoelectric AIN Thin Films Deposited on Silicon by RF Reactive Magnetron Sputtering at Low Temperature for Acoustic Wave Devices [microform] by : Akhtar Mirfazli

Download or read book Characterization of Piezoelectric AIN Thin Films Deposited on Silicon by RF Reactive Magnetron Sputtering at Low Temperature for Acoustic Wave Devices [microform] written by Akhtar Mirfazli and published by National Library of Canada = Bibliothèque nationale du Canada. This book was released on 2004 with total page 192 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Reactive Magnetron Sputtering as a Deposition Tool for Piezoelectric Thin Films

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Publisher :
ISBN 13 :
Total Pages : 130 pages
Book Rating : 4.:/5 (299 download)

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Book Synopsis Reactive Magnetron Sputtering as a Deposition Tool for Piezoelectric Thin Films by : Troy Taylor

Download or read book Reactive Magnetron Sputtering as a Deposition Tool for Piezoelectric Thin Films written by Troy Taylor and published by . This book was released on 1998 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Aluminum Nitride Piezoelectric Thin Films Reactively Deposited in Closed Field Unbalanced Magnetron Sputtering for Elevated Temperature 'smart' Tribological Applications

Download Aluminum Nitride Piezoelectric Thin Films Reactively Deposited in Closed Field Unbalanced Magnetron Sputtering for Elevated Temperature 'smart' Tribological Applications PDF Online Free

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Publisher :
ISBN 13 :
Total Pages : 168 pages
Book Rating : 4.:/5 (851 download)

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Book Synopsis Aluminum Nitride Piezoelectric Thin Films Reactively Deposited in Closed Field Unbalanced Magnetron Sputtering for Elevated Temperature 'smart' Tribological Applications by : Masood Hasheminiasari

Download or read book Aluminum Nitride Piezoelectric Thin Films Reactively Deposited in Closed Field Unbalanced Magnetron Sputtering for Elevated Temperature 'smart' Tribological Applications written by Masood Hasheminiasari and published by . This book was released on 2013 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Current Research in Pulsed Laser Deposition

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Publisher : MDPI
ISBN 13 : 3036510443
Total Pages : 224 pages
Book Rating : 4.0/5 (365 download)

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Book Synopsis Current Research in Pulsed Laser Deposition by : Liviu Duta

Download or read book Current Research in Pulsed Laser Deposition written by Liviu Duta and published by MDPI. This book was released on 2021-08-30 with total page 224 pages. Available in PDF, EPUB and Kindle. Book excerpt: Despite its limitation in terms of surface covered area, the PLD technique still gathers interest among researchers by offering endless possibilities for tuning thin film composition and enhancing their properties of interest due to: (i) the easiness of a stoichiometric transfer even for very complex target materials, (ii) high adherence of the deposited structures to the substrate, (iii) controlled degree of phase, crystallinity, and thickness of deposited coatings, (iv) versatility of the experimental set-up which allows for simultaneous ablation of multiple targets resulting in combinatorial maps or consecutive ablation of multiple targets producing multi-layered structures, and (v) adjustment of the number of laser pulses, resulting in either a spread of nanoparticles, islands of materials or a complete covering of a surface. Moreover, a variation of PLD, known as Matrix Assisted Pulsed Laser Evaporation, allows for deposition of organic materials, ranging from polymers to proteins and even living cells, otherwise difficult to transfer unaltered in the form of thin films by other techniques. Furthermore, the use of laser light as transfer agent ensures purity of films and pulse-to-pulse deposition allows for an unprecedented control of film thickness at the nm level. This Special Issue is a collection of state-of-the art research papers and reviews in which the topics of interest are devoted to thin film synthesis by PLD and MAPLE, for numerous research and industry field applications, such as bio-active coatings for medical implants and hard, protective coatings for cutting and drilling tools withstanding high friction and elevated temperatures, sensors, solar cells, lithography, magnetic devices, energy-storage and conversion devices, controlled drug delivery and in situ microstructuring for boosting of surface properties.