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Author : Brooke S. Stutzman
Publisher :
ISBN 13 :
Total Pages : 460 pages
Book Rating : 4.3/5 (91 download)
Download or read book Correlation of Process with Topography Evolution During Reactive Ion Etching written by Brooke S. Stutzman and published by . This book was released on 2000 with total page 460 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Wei Kong
Publisher :
ISBN 13 :
Total Pages : 314 pages
Book Rating : 4.3/5 (91 download)
Download or read book Analysis of Spectroscopic Ellipsometry Data from Patterned Structures for Etching Process Monitoring and Control written by Wei Kong and published by . This book was released on 2001 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 902 pages
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ISBN 13 :
Total Pages : 816 pages
Book Rating : 4.3/5 (91 download)
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Author : G. S. Mathad
Publisher : The Electrochemical Society
ISBN 13 : 9781566773935
Total Pages : 438 pages
Book Rating : 4.7/5 (739 download)
Download or read book Thin Film Materials, Processes, and Reliability written by G. S. Mathad and published by The Electrochemical Society. This book was released on 2003 with total page 438 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 1036 pages
Book Rating : 4.:/5 (31 download)
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ISBN 13 :
Total Pages : 862 pages
Book Rating : 4.3/5 (91 download)
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ISBN 13 :
Total Pages : 1224 pages
Book Rating : 4.3/5 (91 download)
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Author : Electrochemical Society
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ISBN 13 :
Total Pages : 1304 pages
Book Rating : 4.:/5 (44 download)
Download or read book Extended Abstracts written by Electrochemical Society and published by . This book was released on 1991 with total page 1304 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 2304 pages
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ISBN 13 :
Total Pages : 548 pages
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Author : Kazuo Nojiri
Publisher : Springer
ISBN 13 : 3319102958
Total Pages : 126 pages
Book Rating : 4.3/5 (191 download)
Download or read book Dry Etching Technology for Semiconductors written by Kazuo Nojiri and published by Springer. This book was released on 2014-10-25 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
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ISBN 13 :
Total Pages : 720 pages
Book Rating : 4.3/5 (91 download)
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Author : Materials Research Society. Fall Meeting
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ISBN 13 :
Total Pages : 516 pages
Book Rating : 4.F/5 ( download)
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Author : Joseph Newell Jennings
Publisher : Australian National University, Research School of Social Sciences
ISBN 13 :
Total Pages : 408 pages
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ISBN 13 :
Total Pages : 950 pages
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Author : European Physical Society. Condensed Matter Division. General Conference
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ISBN 13 :
Total Pages : 320 pages
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