Combining Monte Carlo Transport and Level Set Surface Evolution for Modeling Vapor Phase Deposition of Thin Films Over Sub-micron Features

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ISBN 13 :
Total Pages : 58 pages
Book Rating : 4.:/5 (951 download)

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Book Synopsis Combining Monte Carlo Transport and Level Set Surface Evolution for Modeling Vapor Phase Deposition of Thin Films Over Sub-micron Features by : John Lewis Smith

Download or read book Combining Monte Carlo Transport and Level Set Surface Evolution for Modeling Vapor Phase Deposition of Thin Films Over Sub-micron Features written by John Lewis Smith and published by . This book was released on 2014 with total page 58 pages. Available in PDF, EPUB and Kindle. Book excerpt: A hybrid scheme is used to model the vapor phase deposition of thin films at the feature scale. The transport of the chemical species to the substrate surface is modeled with a Collisionless Direct Simulation Monte Carlo (DSMC) method. The Level Set Method is used to model the growth of the thin-film on the substrate. The convergence criteria for these methods were not found in literature. The governing equations for the Level Set Method are, in general, non-linear partial differential equations. The coupling of the DSMC Method with the Level Set Method results in a set of non-Gaussian stochastic non-linear partial differential equations. Developing general convergence criteria proved exceedingly difficult, and only qualitative results are presented to support our convergence criteria. Simulation results are in qualitative agreement with experiments and other results from literature.

Evolution of Thin Film Morphology

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Publisher : Springer Science & Business Media
ISBN 13 : 0387751092
Total Pages : 206 pages
Book Rating : 4.3/5 (877 download)

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Book Synopsis Evolution of Thin Film Morphology by : Matthew Pelliccione

Download or read book Evolution of Thin Film Morphology written by Matthew Pelliccione and published by Springer Science & Business Media. This book was released on 2008-01-29 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt: The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes.

Phase-field Models for Simulating Physical Vapor Deposition and Microstructure Evolution of Thin Films

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ISBN 13 :
Total Pages : 312 pages
Book Rating : 4.:/5 (12 download)

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Book Synopsis Phase-field Models for Simulating Physical Vapor Deposition and Microstructure Evolution of Thin Films by : James A. Stewart (Jr)

Download or read book Phase-field Models for Simulating Physical Vapor Deposition and Microstructure Evolution of Thin Films written by James A. Stewart (Jr) and published by . This book was released on 2016 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: The focus of this research is to develop, implement, and utilize phase-field models to study microstructure evolution in thin films during physical vapor deposition (PVD). There are four main goals to this dissertation. First, a phase-field model is developed to simulate PVD of a single-phase polycrystalline material by coupling previous modeling efforts on deposition of single-phase materials and grain evolution in polycrystalline materials. Second, a phase-field model is developed to simulate PVD of a polymorphic material by coupling previous modeling efforts on PVD of a single-phase material, evolution in multiphase materials, and phase nucleation. Third, a novel free energy functional is proposed that incorporates appropriate energetics and dynamics for simultaneous modeling of PVD and grain evolution in single-phase polycrystalline materials. Finally, these phase-field models are implemented into custom simulation codes and utilized to illustrate these models' capabilities in capturing PVD thin film growth, grain and grain boundary (GB) evolution, phase evolution and nucleation, and temperature evolution. In general, these simulations show: grain coarsening through grain rotation and GB migration such that grains tend to align with the thin film surface features and GBs migrate to locations between these features so that each surface feature has a distinct grain and orientation; the incident vapor flux rate controls the density of the thin film and the formation of surface and subsurface features; the substrate phase distribution initially acts as a template for the growing microstructure until the thin film becomes sufficiently thick; latent heat released during PVD increases the surface temperature of the thin film creating a temperature gradient within the thin film influencing phase evolution and nucleation; and temperature distributions lead to regions within the thin film that allow for multiple phases to be stable and coexist. Further, this work shows the sequential approach for coupling phase-field models, described in goals (i) and (ii) is sufficient to capture first-order features of the growth process, such as the stagnation of GBs at the valleys of the surface roughness, but to capture higher-order features, such as orientation gradients within columnar grains, the single free energy functional approach developed in goal (iii) is necessary.

Metal film growth on weakly-interacting substrates

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Publisher : Linköping University Electronic Press
ISBN 13 : 9176851443
Total Pages : 46 pages
Book Rating : 4.1/5 (768 download)

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Book Synopsis Metal film growth on weakly-interacting substrates by : Víctor Gervilla Palomar

Download or read book Metal film growth on weakly-interacting substrates written by Víctor Gervilla Palomar and published by Linköping University Electronic Press. This book was released on 2019-02-11 with total page 46 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin films are nanoscale layers of material, with exotic properties useful in diverse areas, ranging from biomedicine to nanoelectronics and surface protection. Film properties are not only determined by their chemical composition, but also by their microstructure and roughness, features that depend crucially on the growth process due to the inherent out-of equilibrium nature of the film deposition techniques. This fact suggest that it is possible to control film growth, and in turn film properties, in a knowledge-based manner by tuning the deposition conditions. This requires a good understanding of the elementary film-forming processes, and the way by which they are affected by atomic-scale kinetics. The kinetic Monte Carlo (kMC) method is a simulation tool that can model film evolution over extended time scales, of the order of microseconds, and beyond, and thus constitutes a powerful complement to experimental research aiming to obtain an universal understanding of thin film formation and morphological evolution. In this work, kMC simulations, coupled with analytical modelling, are used to investigate the early stages of formation of metal films and nanostructures supported on weakly-interacting substrates. This starts with the formation and growth of faceted 3D islands, that relies first on facile adatom ascent at single-layer island steps and subsequently on facile adatom upward diffusion from the base to the top of the island across its facets. Interlayer mass transport is limited by the rate at which adatoms cross from the sidewall facets to the island top, a process that determines the final height of the islands and leads non-trivial growth dynamics, as increasing temperatures favour 3D growth as a result of the upward transport. These findings explain the high roughness observed experimentally in metallic films grown on weakly-interacting substrates at high temperatures. The second part of the study focus on the next logical step of film formation, when 3D islands come into contact and fuse into a single one, or coalesce. The research reveals that the faceted island structure governs the macroscopic process of coalescence as well as its dynamics, and that morphological changes depend on 2D nucleation on the II facets. In addition, deposition during coalescence is found to accelerate the process and modify its dynamics, by contributing to the nucleation of new facets. This study provides useful knowledge concerning metal growth on weakly-interacting substrates, and, in particular, identifies the key atomistic processes controlling the early stages of formation of thin films, which can be used to tailor deposition conditions in order to achieve films with unique properties and applications.

Principles of Vapor Deposition of Thin Films

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Publisher : Elsevier
ISBN 13 : 0080480314
Total Pages : 1173 pages
Book Rating : 4.0/5 (84 download)

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Book Synopsis Principles of Vapor Deposition of Thin Films by : Professor K.S. K.S Sree Harsha

Download or read book Principles of Vapor Deposition of Thin Films written by Professor K.S. K.S Sree Harsha and published by Elsevier. This book was released on 2005-12-16 with total page 1173 pages. Available in PDF, EPUB and Kindle. Book excerpt: The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Metalorganic Vapor Phase Epitaxy (MOVPE)

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Publisher : John Wiley & Sons
ISBN 13 : 1119313015
Total Pages : 582 pages
Book Rating : 4.1/5 (193 download)

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Book Synopsis Metalorganic Vapor Phase Epitaxy (MOVPE) by : Stuart Irvine

Download or read book Metalorganic Vapor Phase Epitaxy (MOVPE) written by Stuart Irvine and published by John Wiley & Sons. This book was released on 2019-10-07 with total page 582 pages. Available in PDF, EPUB and Kindle. Book excerpt: Systematically discusses the growth method, material properties, and applications for key semiconductor materials MOVPE is a chemical vapor deposition technique that produces single or polycrystalline thin films. As one of the key epitaxial growth technologies, it produces layers that form the basis of many optoelectronic components including mobile phone components (GaAs), semiconductor lasers and LEDs (III-Vs, nitrides), optical communications (oxides), infrared detectors, photovoltaics (II-IV materials), etc. Featuring contributions by an international group of academics and industrialists, this book looks at the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring. It covers the most important materials from III-V and II-VI compounds to quantum dots and nanowires, including sulfides and selenides and oxides/ceramics. Sections in every chapter of Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications cover the growth of the particular materials system, the properties of the resultant material, and its applications. The book offers information on arsenides, phosphides, and antimonides; nitrides; lattice-mismatched growth; CdTe, MCT (mercury cadmium telluride); ZnO and related materials; equipment and safety; and more. It also offers a chapter that looks at the future of the technique. Covers, in order, the growth method, material properties, and applications for each material Includes chapters on the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring Looks at important materials such as III-V and II-VI compounds, quantum dots, and nanowires Provides topical and wide-ranging coverage from well-known authors in the field Part of the Materials for Electronic and Optoelectronic Applications series Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications is an excellent book for graduate students, researchers in academia and industry, as well as specialist courses at undergraduate/postgraduate level in the area of epitaxial growth (MOVPE/ MOCVD/ MBE).

Monte Carlo Modeling of Thin Film Deposition

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ISBN 13 :
Total Pages : 7 pages
Book Rating : 4.:/5 (682 download)

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Book Synopsis Monte Carlo Modeling of Thin Film Deposition by :

Download or read book Monte Carlo Modeling of Thin Film Deposition written by and published by . This book was released on 2002 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this paper we discuss the use of atomistic Monte Carlo simulations to predict film microstructure evolution. We discuss physical vapor deposition, and are primarily concerned with films that are formed by the nucleation and coalescence of 3D islands. Multi-scale modeling is used in the sense that information obtained from molecular dynamics and first principles calculations provide atomic interaction energies, surface and grain boundary properties and diffusion rates for use in the Monte Carlo model. In this paper, we discuss some fundamental issues associated with thin film formation, together with an assessment of the sensitivity of the film morphology to the deposition conditions and materials properties.

Dissertation Abstracts International

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Publisher :
ISBN 13 :
Total Pages : 956 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Dissertation Abstracts International by :

Download or read book Dissertation Abstracts International written by and published by . This book was released on 2000 with total page 956 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

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Publisher :
ISBN 13 : 9789401003544
Total Pages : 382 pages
Book Rating : 4.0/5 (35 download)

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Book Synopsis Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies by : Y. Pauleau

Download or read book Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies written by Y. Pauleau and published by . This book was released on 2011-04-27 with total page 382 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Evolution of Surface Roughness and Texture During Low Temperature Film Deposition

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Publisher :
ISBN 13 :
Total Pages : 294 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Evolution of Surface Roughness and Texture During Low Temperature Film Deposition by : Oleh Petro Karpenko

Download or read book Evolution of Surface Roughness and Texture During Low Temperature Film Deposition written by Oleh Petro Karpenko and published by . This book was released on 1996 with total page 294 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Vacuum Deposition of Thin Films

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ISBN 13 :
Total Pages : 608 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Vacuum Deposition of Thin Films by : L. Holland

Download or read book Vacuum Deposition of Thin Films written by L. Holland and published by . This book was released on 1966 with total page 608 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition Modeling Using Direct Simulation Monte Carlo with Non-linear Chemistry and Level Set Profile Evolution

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Publisher :
ISBN 13 :
Total Pages : 69 pages
Book Rating : 4.:/5 (546 download)

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Book Synopsis Chemical Vapor Deposition Modeling Using Direct Simulation Monte Carlo with Non-linear Chemistry and Level Set Profile Evolution by : Husain Ali Al-Mohssen

Download or read book Chemical Vapor Deposition Modeling Using Direct Simulation Monte Carlo with Non-linear Chemistry and Level Set Profile Evolution written by Husain Ali Al-Mohssen and published by . This book was released on 2003 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Direct Simulation Monte Carlo Modeling of Silicon Thin Film Deposition Using Supersonic Beams

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Publisher :
ISBN 13 :
Total Pages : 460 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Direct Simulation Monte Carlo Modeling of Silicon Thin Film Deposition Using Supersonic Beams by : Gang Chen

Download or read book Direct Simulation Monte Carlo Modeling of Silicon Thin Film Deposition Using Supersonic Beams written by Gang Chen and published by . This book was released on 1998 with total page 460 pages. Available in PDF, EPUB and Kindle. Book excerpt:

A Theoretical and Experimental Study Into the Kinetics of Solution Phase Thin Film Deposition

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Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (992 download)

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Book Synopsis A Theoretical and Experimental Study Into the Kinetics of Solution Phase Thin Film Deposition by : Cyrus Schaaf

Download or read book A Theoretical and Experimental Study Into the Kinetics of Solution Phase Thin Film Deposition written by Cyrus Schaaf and published by . This book was released on 2017 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The performance of electronic and optoelectronic devices based on solution-processed organic semiconductor layers is strongly influenced by their mesoscale polycrystalline structure, including domain size and spatial distributions. In solution-processed films prepared by spin casting, solvent-based printing, and related methods, morphology is governed by a combination of interrelated thermodynamic and kinetic factors. Classical models of crystal formation in bulk solution or on bare surfaces in vacuum-deposited films fail to adequately capture these effects; the current theoretical understanding of crystallization in solution-deposited films is generally unable to provide much insight, let alone predictive design guidance for tailoring films with specific structural characteristics for a given set of experimental conditions and chemical properties. In this thesis solution-phase thin film formation has been studied for the purpose of developing and new experimental techniques new models for understanding and predicting mesoscale film structure and crystal morphology. I will describe how nucleation can be modeled, and the predictions tested against experiment, by an approach that enables quantitative prediction of crystal coverage and intercrystalline spacing statistics as a function of processing conditions, using only a small number of experimentally-measureable parameters. To do this, a model is introduced that combines a mean-field rate equation treatment of monomer aggregation kinetics with classical nucleation theory and a supersaturation-dependent critical nucleus size to solve for the quasi-two-dimensional temporally- and spatially-varying monomer concentration and nucleation rate. Excellent agreement is observed with measured nucleation densities and inter-domain radial distribution functions in submonolayer tetracene films. The model leads to the first universal set of predictive design rules for solution-phase thin film growth capable of guiding the selection of experimental conditions for truly engineered morphological control. Accompanying this theoretical work a first of its kind experiment is also reported, in which monomer concentration has been spatially and temporally mapped in real time during the film formation process. Through the use of high resolution dark field fluorescence microscopy employing an internal fluorescent standard and multi-wavelength imaging optics the concentration dependence is visualized throughout all regimes of thin film formation. In situ measurements of local concentration contributes to the development of models which treat the role of variations in monomer concentration on mesoscale film morphology of polycrystalline thin films. This work opens the door to numerous studies enabling further development of models which allow for predictive control of polycrystalline thin films in solution-phase deposition techniques. In addition to nucleation, growth of crystalline films is modeled through a set of numerical and computational methods which provide insight into the main factors influencing crystal growth habit. It is shown that crystal capture rate correlation with physical properties displays a distinct lack of agreement between the spacing and initial sizes of crystals with their relative growth rates. This lack of correlation points to the need for more sophisticated models. Through the use of a mean field numerical calculation of the volumetric growth rate changes in crystal morphology can be attributed to a variable sticking probability which depends on the crystal face. Kinetic Monte Carlo simulations are used to directly probe the physics which explain the deviation from the typical single sticking coefficient capture model. The change in shape at long deposition times further suggests that crystal growth occurs in distinct regimes which dictate the final morphology of the crystals. This work provides an explanation to the change in shape of crystalline material at long deposition times which can be used to develop models to predict final crystal morphology. This thesis is comprised of several parts. In the first chapter the broader context of the work is discussed. In chapter 2, I discuss the scientific background laying the foundation for theoretical models into solution-phase deposition. In the third chapter, I describe the experimental system as well as results from various measurements of fundamental chemical and physical properties needed later. The fourth chapter describes a set of models which I have developed to predict mesoscale film structure to create a set of universal design rules in order to engineer thin films grown in the solution-phase. In chapter 5, I describe a state of the art experimental set up allowing for monomer concentration to be mapped in real time. Finally in the last chapter I describe a set of exploratory models to describe change in crystal morphology during the course of thin film formation. This thesis creates new understanding, which will allow for an increase in production of thin films for applications where strict control over domain size, shape, spacing, and crystallographic orientation.

Morphological and Compositional Evolution of Thin Films: Volume 749

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Publisher : Mrs Proceedings
ISBN 13 :
Total Pages : 448 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Morphological and Compositional Evolution of Thin Films: Volume 749 by : Michael J. Aziz

Download or read book Morphological and Compositional Evolution of Thin Films: Volume 749 written by Michael J. Aziz and published by Mrs Proceedings. This book was released on 2003 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The papers compiled in this volume were presented in Symposium W, 'Morphological and Compositional Evolution of Thin Films, ' held December 2-5 at the 2002 MRS Fall Meeting in Boston Massachusetts. They are organized in the order that they were presented."--P. xiii.

Simulation of Thin Film Deposition, Microstructure Evolution, and Properties in Complex Oxide Systems

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Publisher :
ISBN 13 :
Total Pages : 272 pages
Book Rating : 4.:/5 (33 download)

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Book Synopsis Simulation of Thin Film Deposition, Microstructure Evolution, and Properties in Complex Oxide Systems by : Christopher Paul Burmester

Download or read book Simulation of Thin Film Deposition, Microstructure Evolution, and Properties in Complex Oxide Systems written by Christopher Paul Burmester and published by . This book was released on 1996 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Modeling of Mass Transport in the Growth and Doping of Thin Films by Chemical Vapor Deposition

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Publisher :
ISBN 13 :
Total Pages : 426 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Modeling of Mass Transport in the Growth and Doping of Thin Films by Chemical Vapor Deposition by : Andrew Yeckel

Download or read book Modeling of Mass Transport in the Growth and Doping of Thin Films by Chemical Vapor Deposition written by Andrew Yeckel and published by . This book was released on 1989 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt: