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Combined Experimental And Modelling Studies Of Laser Assisted Chemical Vapor Deposition Of Copper And Aluminum
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Book Synopsis Combined Experimental and Modelling Studies of Laser Assisted Chemical Vapor Deposition of Copper and Aluminum by : Jaesung Han
Download or read book Combined Experimental and Modelling Studies of Laser Assisted Chemical Vapor Deposition of Copper and Aluminum written by Jaesung Han and published by . This book was released on 1993 with total page 406 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Experiments and Models of the Plasma Assisted Chemical Vapor Deposition of Copper from Copper Hexafluoroacetylacetonate and Hydrogen by : Satish Kumar Lakshmanan
Download or read book Experiments and Models of the Plasma Assisted Chemical Vapor Deposition of Copper from Copper Hexafluoroacetylacetonate and Hydrogen written by Satish Kumar Lakshmanan and published by . This book was released on 1998 with total page 193 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Laser Processing and Chemistry by : Dieter Bäuerle
Download or read book Laser Processing and Chemistry written by Dieter Bäuerle and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 788 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser Processing and Chemistry gives an overview of the fundamentals and applications of laser-matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas-solid, liquid-solid, and solid-solid interfaces. Starting with the background physics, the book proceeds to examine applications of laser techniques in micro-machining, and the patterning, coating, and modification of material surfaces. This third edition has been revised and enlarged to cover new topics such as the synthesis of nanoclusters and nanocrystalline films, ultrashort-pulse laser processing, laser polishing, cleaning, and lithography. Graduate students, physicists, chemists, engineers, and manufacturers alike will find this book an invaluable reference work on laser processing.
Book Synopsis Dissertation Abstracts International by :
Download or read book Dissertation Abstracts International written by and published by . This book was released on 1994 with total page 758 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Experiments and Models for the Chemical Vapor Deposition of Copper from Copper(I) and Copper(II) Compounds by : Mehul B. Naik
Download or read book Experiments and Models for the Chemical Vapor Deposition of Copper from Copper(I) and Copper(II) Compounds written by Mehul B. Naik and published by . This book was released on 1995 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis American Doctoral Dissertations by :
Download or read book American Doctoral Dissertations written by and published by . This book was released on 2000 with total page 816 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Modelling of Microfabrication Systems by : Raja Nassar
Download or read book Modelling of Microfabrication Systems written by Raja Nassar and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first book to address modelling of systems that are important to the fabrication of three-dimensional microstructures. It is unique in that it focuses on high aspect ratio microtechnology, ranging from ion beam micromachining to x-ray lithography.
Book Synopsis Research in Materials by : Massachusetts Institute of Technology
Download or read book Research in Materials written by Massachusetts Institute of Technology and published by . This book was released on 1994 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Research in Materials written by and published by . This book was released on 1994 with total page 638 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Complementary Computational Chemistry and Surface Science Experiments of Reaction Pathways in Aluminum Chemical Vapor Deposition by : Brian G. Willis
Download or read book Complementary Computational Chemistry and Surface Science Experiments of Reaction Pathways in Aluminum Chemical Vapor Deposition written by Brian G. Willis and published by . This book was released on 1999 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt: (Cont.) Aluminum chemical vapor deposition (CVD) is a process of interest for semiconductor metalization. Aluminum has been the workhorse metal for interconnect applications since the dawning age of the semiconductor industry. Although aluminum is traditionally deposited with advanced physical vapor deposition (PVD) techniques, new deposition methods, such as CVD, are required as characteristic feature sizes move into the nanometer range. In the present study, a combined experimental/theoretical approach has been implemented to investigate both vapor phase and surface reaction pathways of the aluminum CVD precursor dimethylaluminum hydride (DMAH). DMAH is arguably the best aluminum CVD precursor available, but it has complications including a puzzling liquid and vapor phase chemistry, and an unknown surface chemistry. Detailed knowledge of the deposition process is necessary to design a robust, high yield aluminum CVD process. In the present studies, experimental observations have been taken from the literature for the vapor phase chemistry, and ultra-high vacuum (UHV) surface science studies have been employed to investigate the surface chemistry. Theoretical studies were performed by combining quantum chemistry calculations with transition state theory (TST) and micro-kinetic style estimation of rate parameters ...
Book Synopsis Laser Assisted and Blanket Chemical Vapor Deposition of Copper Using Copper (II) Hexafluoroacetylacetonate in a Cold Wall Atmospheric Pressure Laser Assited Chemical Vapor Deposition Reactor by : Yu David Chen
Download or read book Laser Assisted and Blanket Chemical Vapor Deposition of Copper Using Copper (II) Hexafluoroacetylacetonate in a Cold Wall Atmospheric Pressure Laser Assited Chemical Vapor Deposition Reactor written by Yu David Chen and published by . This book was released on 1994 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Studies of Chemical Vapor Deposition of Copper with Cu(HFA)(sub 2). by : Do-Heyoung Kim
Download or read book Studies of Chemical Vapor Deposition of Copper with Cu(HFA)(sub 2). written by Do-Heyoung Kim and published by . This book was released on 1990 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Thermal and Dynamic Processes in Deposition, Growth, and Etching of Materials by : Shrikant Prabhakar Lohokare
Download or read book Thermal and Dynamic Processes in Deposition, Growth, and Etching of Materials written by Shrikant Prabhakar Lohokare and published by . This book was released on 1996 with total page 574 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) is becoming an increasingly important manufacturing process for the fabrication of VLSI and ULSI devices. A major challenge in optimizing a CVD process is developing an understanding of the complex mechanistic pathways followed. The first section in this thesis reports studies on the thermal and dynamical activation of surface bound alkyl species which play a vital role in the form of intermediates in metal-organic chemical vapor deposition. The particular systems of interest are those of aluminum CVD precursors. Models of these intermediates are obtained by thermal decomposition of alkyl iodides. The results provide an insight into the complex reaction patterns involved in the thermal reactions and rate-structure sensitivities of the alkyl species in the presence of the coadsorbed halogen atom. Multiple reaction pathways including metal etching processes which bear direct implications to the synthesis of organometallics and metal etching, are identified. It is becoming apparent that chemistry at surfaces, whether it be heterogeneous catalysis, semiconductor etching, or chemical vapor deposition, is controlled by much more than the nature and structure of the surface. Also, nonthermal activation of autocatalytic reactions is often required for the nucleation and growth of thin films in devices so that the stability of the device structure is maintained. Dynamical pathways followed in these high pressure and energy processes have to be well understood. The second part of these studies describe an investigation of collision-induced reaction of alkyl intermediates using supersonic inert gas atomic beams. Selective activation of a thermodynamically favored unimolecular decomposition reaction is initiated by hyperthermal collisions. Quantitative estimations of the reaction cross sections are made using straightforward hard sphere energy transfer dynamics. This successful demonstration of collision-induced activation of large, multiatomic moieties has paved the way for proposed studies (now underway in our group) on actual CVD precursors with known barriers to nucleation and growth. In the second section, the reaction mechanisms and kinetics of competitive dissociation, disproportionation, and thin film growth processes involved in the chemical vapor deposition of metal-silicide thin films are investigated. Metal-silicides are widely used as interconnect and gate materials in devices and also as corrosion resistant materials. Reactivity of silane and disilane with copper is studied in detail using temperature programmed reaction, Auger electron, Fourier transform infrared reflection absorption spectroscopies and low energy electron diffraction. For both the precursors, the structural chemistry and product distributions of adsorbed intermediates found at low temperatures are quite rich but significantly differ at the mechanistic level. It is shown quantitatively that disilane is almost 2-3 orders of magnitude more reactive than silane due to its facile Si-Si bond dissociation. However, in both cases, kinetics of silicon deposition and silicide formation are limited by the site-blocking effect of surface bound hydrogen generated by the decomposition of the silyl fragments. An ordered silicide overlayer is readily formed at higher coverages effected above dihydrogen desorption temperatures. This bimolecular process has to compete with an associative reaction which leads to the formation of silane. The results obtained from the different spectroscopic data show that the growth process involves an intriguing set of coupled reactions in which deposition, island growth, and Si etching effectively compete in a complex manner. Understanding of these parameters and the reaction mechanisms involved, enables the application of this process for the vapor phase growth of silicide thin films.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Metals Abstracts written by and published by . This book was released on 1996 with total page 1628 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Laser Ablation in Liquids by : Guowei Yang
Download or read book Laser Ablation in Liquids written by Guowei Yang and published by CRC Press. This book was released on 2012-02-22 with total page 1166 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book focuses on the fundamental concepts and physical and chemical aspects of pulsed laser ablation of solid targets in liquid environments and its applications in the preparation of nanomaterials and fabrication of nanostructures. The areas of focus include basic thermodynamic and kinetic processes of laser ablation in liquids, and its applic