Chemical Vapor Deposition Of Silicon Nitride Films On Gallium Arsenide

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Catalytic Chemical Vapor Deposition

Author : Hideki Matsumura
Publisher : John Wiley & Sons
ISBN 13 : 352734523X
Total Pages : 438 pages
Book Rating : 4.5/5 (273 download)

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Book Synopsis Catalytic Chemical Vapor Deposition by : Hideki Matsumura

Download or read book Catalytic Chemical Vapor Deposition written by Hideki Matsumura and published by John Wiley & Sons. This book was released on 2019-08-05 with total page 438 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.

Chemical Vapor Deposition: 1960-1980

Author : Donald T. Hawkins
Publisher : Springer
ISBN 13 :
Total Pages : 762 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Chemical Vapor Deposition: 1960-1980 by : Donald T. Hawkins

Download or read book Chemical Vapor Deposition: 1960-1980 written by Donald T. Hawkins and published by Springer. This book was released on 1981-11-30 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:

An Investigation of Silicon Nitride on Gallium Arsenide

Author : Thomas Raymond Ohnstein
Publisher :
ISBN 13 :
Total Pages : 382 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis An Investigation of Silicon Nitride on Gallium Arsenide by : Thomas Raymond Ohnstein

Download or read book An Investigation of Silicon Nitride on Gallium Arsenide written by Thomas Raymond Ohnstein and published by . This book was released on 1982 with total page 382 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Catalytic Chemical Vapor Deposition

Author : Hideki Matsumura
Publisher : John Wiley & Sons
ISBN 13 : 3527818669
Total Pages : 604 pages
Book Rating : 4.5/5 (278 download)

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Book Synopsis Catalytic Chemical Vapor Deposition by : Hideki Matsumura

Download or read book Catalytic Chemical Vapor Deposition written by Hideki Matsumura and published by John Wiley & Sons. This book was released on 2019-02-08 with total page 604 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.

Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films

Author : Vikram J. Kapoor
Publisher :
ISBN 13 :
Total Pages : 570 pages
Book Rating : 4.0/5 ( download)

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Book Synopsis Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films by : Vikram J. Kapoor

Download or read book Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films written by Vikram J. Kapoor and published by . This book was released on 1987 with total page 570 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Proceedings of the Second Symposium on III-V Nitride Materials and Processes

Author : C. R. Abernathy
Publisher : The Electrochemical Society
ISBN 13 : 9781566771870
Total Pages : 310 pages
Book Rating : 4.7/5 (718 download)

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Book Synopsis Proceedings of the Second Symposium on III-V Nitride Materials and Processes by : C. R. Abernathy

Download or read book Proceedings of the Second Symposium on III-V Nitride Materials and Processes written by C. R. Abernathy and published by The Electrochemical Society. This book was released on 1998 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapour Deposition

Author : Anthony C. Jones
Publisher : Royal Society of Chemistry
ISBN 13 : 0854044655
Total Pages : 600 pages
Book Rating : 4.8/5 (54 download)

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Book Synopsis Chemical Vapour Deposition by : Anthony C. Jones

Download or read book Chemical Vapour Deposition written by Anthony C. Jones and published by Royal Society of Chemistry. This book was released on 2009 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket

State-of-the-Art Program on Compound Semiconductors : (SOTAPOCS XLII) and Processes at the Compound-Semiconductor/Solution Interface

Author : P. C. Chang
Publisher : The Electrochemical Society
ISBN 13 : 9781566774628
Total Pages : 500 pages
Book Rating : 4.7/5 (746 download)

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Book Synopsis State-of-the-Art Program on Compound Semiconductors : (SOTAPOCS XLII) and Processes at the Compound-Semiconductor/Solution Interface by : P. C. Chang

Download or read book State-of-the-Art Program on Compound Semiconductors : (SOTAPOCS XLII) and Processes at the Compound-Semiconductor/Solution Interface written by P. C. Chang and published by The Electrochemical Society. This book was released on 2005 with total page 500 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Proceedings of the Seventh International Conference on Chemical Vapor Deposition, 1979

Author : Thomas O. Sedgwick
Publisher :
ISBN 13 :
Total Pages : 696 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Proceedings of the Seventh International Conference on Chemical Vapor Deposition, 1979 by : Thomas O. Sedgwick

Download or read book Proceedings of the Seventh International Conference on Chemical Vapor Deposition, 1979 written by Thomas O. Sedgwick and published by . This book was released on 1979 with total page 696 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Scientific and Technical Aerospace Reports

Author :
Publisher :
ISBN 13 :
Total Pages : 836 pages
Book Rating : 4.:/5 (31 download)

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Book Synopsis Scientific and Technical Aerospace Reports by :

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 836 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Synthesis and Properties of Boron Nitride

Author : J.J. Pouch
Publisher : Trans Tech Publications Ltd
ISBN 13 : 3035704511
Total Pages : 421 pages
Book Rating : 4.0/5 (357 download)

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Book Synopsis Synthesis and Properties of Boron Nitride by : J.J. Pouch

Download or read book Synthesis and Properties of Boron Nitride written by J.J. Pouch and published by Trans Tech Publications Ltd. This book was released on 1990-01-01 with total page 421 pages. Available in PDF, EPUB and Kindle. Book excerpt: Boron nitride thin films can be deposited on different substrates using techniques such as plasma deposition, ion beam deposition and reactive sputter deposition.

Optical Techniques for Solid-State Materials Characterization

Author : Rohit P. Prasankumar
Publisher : CRC Press
ISBN 13 : 1439814376
Total Pages : 735 pages
Book Rating : 4.4/5 (398 download)

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Book Synopsis Optical Techniques for Solid-State Materials Characterization by : Rohit P. Prasankumar

Download or read book Optical Techniques for Solid-State Materials Characterization written by Rohit P. Prasankumar and published by CRC Press. This book was released on 2016-04-19 with total page 735 pages. Available in PDF, EPUB and Kindle. Book excerpt: Over the last century, numerous optical techniques have been developed to characterize materials, giving insight into their optical, electronic, magnetic, and structural properties and elucidating such diverse phenomena as high-temperature superconductivity and protein folding. Optical Techniques for Solid-State Materials Characterization provides

Passivity of Metals and Semiconductors

Author : Michael Brian Ives
Publisher : The Electrochemical Society
ISBN 13 : 9781566773041
Total Pages : 1000 pages
Book Rating : 4.7/5 (73 download)

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Book Synopsis Passivity of Metals and Semiconductors by : Michael Brian Ives

Download or read book Passivity of Metals and Semiconductors written by Michael Brian Ives and published by The Electrochemical Society. This book was released on 2001 with total page 1000 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Principles of Chemical Vapor Deposition

Author : D.M. Dobkin
Publisher : Springer Science & Business Media
ISBN 13 : 9401703698
Total Pages : 277 pages
Book Rating : 4.4/5 (17 download)

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Book Synopsis Principles of Chemical Vapor Deposition by : D.M. Dobkin

Download or read book Principles of Chemical Vapor Deposition written by D.M. Dobkin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Fundamentals of Semiconductor Processing Technology

Author : Badih El-Kareh
Publisher : Springer Science & Business Media
ISBN 13 : 1461522099
Total Pages : 605 pages
Book Rating : 4.4/5 (615 download)

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Book Synopsis Fundamentals of Semiconductor Processing Technology by : Badih El-Kareh

Download or read book Fundamentals of Semiconductor Processing Technology written by Badih El-Kareh and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 605 pages. Available in PDF, EPUB and Kindle. Book excerpt: The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.

The Physics of Micro/Nano-Fabrication

Author : Ivor Brodie
Publisher : Springer Science & Business Media
ISBN 13 : 1475767757
Total Pages : 661 pages
Book Rating : 4.4/5 (757 download)

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Book Synopsis The Physics of Micro/Nano-Fabrication by : Ivor Brodie

Download or read book The Physics of Micro/Nano-Fabrication written by Ivor Brodie and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 661 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.

Encyclopedia of Plasma Technology - Two Volume Set

Author : J. Leon Shohet
Publisher : CRC Press
ISBN 13 : 1482214318
Total Pages : 1654 pages
Book Rating : 4.4/5 (822 download)

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Book Synopsis Encyclopedia of Plasma Technology - Two Volume Set by : J. Leon Shohet

Download or read book Encyclopedia of Plasma Technology - Two Volume Set written by J. Leon Shohet and published by CRC Press. This book was released on 2016-12-12 with total page 1654 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]