Chemical Vapor Deposition and Atomic Layer Deposition of Metal Oxide and Nitride Thin Films

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Publisher :
ISBN 13 :
Total Pages : 276 pages
Book Rating : 4.:/5 (576 download)

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Book Synopsis Chemical Vapor Deposition and Atomic Layer Deposition of Metal Oxide and Nitride Thin Films by : Jeffrey Thomas Barton

Download or read book Chemical Vapor Deposition and Atomic Layer Deposition of Metal Oxide and Nitride Thin Films written by Jeffrey Thomas Barton and published by . This book was released on 2003 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Deposition of Metal Oxide and Nitride Thin Films [microform]

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Publisher : Ann Arbor, Mich. : University Microfilms International
ISBN 13 :
Total Pages : 308 pages
Book Rating : 4.:/5 (576 download)

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Book Synopsis Atomic Layer Deposition of Metal Oxide and Nitride Thin Films [microform] by : Becker, Jill Svenja

Download or read book Atomic Layer Deposition of Metal Oxide and Nitride Thin Films [microform] written by Becker, Jill Svenja and published by Ann Arbor, Mich. : University Microfilms International. This book was released on 2002 with total page 308 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Deposition

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Publisher : John Wiley & Sons
ISBN 13 : 1118062779
Total Pages : 274 pages
Book Rating : 4.1/5 (18 download)

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Book Synopsis Atomic Layer Deposition by : Tommi Kääriäinen

Download or read book Atomic Layer Deposition written by Tommi Kääriäinen and published by John Wiley & Sons. This book was released on 2013-05-28 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Chemical Vapour Deposition

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Publisher : Royal Society of Chemistry
ISBN 13 : 0854044655
Total Pages : 600 pages
Book Rating : 4.8/5 (54 download)

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Book Synopsis Chemical Vapour Deposition by : Anthony C. Jones

Download or read book Chemical Vapour Deposition written by Anthony C. Jones and published by Royal Society of Chemistry. This book was released on 2009 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket

Atomic Layer Deposition of Nanostructured Materials

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Publisher : John Wiley & Sons
ISBN 13 : 3527639926
Total Pages : 463 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Atomic Layer Deposition of Nanostructured Materials by : Nicola Pinna

Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 463 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Chemical Vapor Deposition of Metal Oxide, Titanium Nitride and Niobium Nitride Thin Films

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Publisher :
ISBN 13 :
Total Pages : 436 pages
Book Rating : 4.:/5 (438 download)

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Book Synopsis Chemical Vapor Deposition of Metal Oxide, Titanium Nitride and Niobium Nitride Thin Films by : Xinye Liu

Download or read book Chemical Vapor Deposition of Metal Oxide, Titanium Nitride and Niobium Nitride Thin Films written by Xinye Liu and published by . This book was released on 1999 with total page 436 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Deposition Applications 10

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Publisher : The Electrochemical Society
ISBN 13 : 1607685469
Total Pages : 311 pages
Book Rating : 4.6/5 (76 download)

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Book Synopsis Atomic Layer Deposition Applications 10 by : F. Roozeboom

Download or read book Atomic Layer Deposition Applications 10 written by F. Roozeboom and published by The Electrochemical Society. This book was released on 2014 with total page 311 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Deposition for Semiconductors

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Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)

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Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Handbook of Manufacturing Engineering and Technology

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Publisher : Springer
ISBN 13 : 9781447146698
Total Pages : 0 pages
Book Rating : 4.1/5 (466 download)

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Book Synopsis Handbook of Manufacturing Engineering and Technology by : Andrew Y. C. Nee

Download or read book Handbook of Manufacturing Engineering and Technology written by Andrew Y. C. Nee and published by Springer. This book was released on 2014-10-31 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.

Atomic Layer Deposition Applications 7

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Publisher : The Electrochemical Society
ISBN 13 : 1607682567
Total Pages : 353 pages
Book Rating : 4.6/5 (76 download)

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Book Synopsis Atomic Layer Deposition Applications 7 by : J. W. Elam

Download or read book Atomic Layer Deposition Applications 7 written by J. W. Elam and published by The Electrochemical Society. This book was released on 2011 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Handbook of Deposition Technologies for Films and Coatings

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Publisher : William Andrew
ISBN 13 : 0815520328
Total Pages : 932 pages
Book Rating : 4.8/5 (155 download)

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Book Synopsis Handbook of Deposition Technologies for Films and Coatings by : Peter M. Martin

Download or read book Handbook of Deposition Technologies for Films and Coatings written by Peter M. Martin and published by William Andrew. This book was released on 2009-12-01 with total page 932 pages. Available in PDF, EPUB and Kindle. Book excerpt: This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.

Chemical Vapour Deposition (CVD)

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Publisher : CRC Press
ISBN 13 : 1000691071
Total Pages : 492 pages
Book Rating : 4.0/5 (6 download)

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Book Synopsis Chemical Vapour Deposition (CVD) by : Kwang-Leong Choy

Download or read book Chemical Vapour Deposition (CVD) written by Kwang-Leong Choy and published by CRC Press. This book was released on 2019-06-07 with total page 492 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book offers a timely and complete overview on chemical vapour deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites. Chapters discuss key aspects, from processing, material structure and properties to practical use, cost considerations, versatility, and sustainability. The author presents a comprehensive overview of CVD and its potential in producing high performance, cost-effective nanomaterials and thin and thick films. Features Provides an up-to-date introduction to CVD technology for the fabrication of nanomaterials, nanostructured films, and composite coatings Discusses processing, structure, functionalization, properties, and use in clean energy, engineering, and biomedical grand challenges Covers thin and thick films and composites Compares CVD with other processing techniques in terms of structure/properties, cost, versatility, and sustainability Kwang-Leong Choy is the Director of the UCL Centre for Materials Discovery and Professor of Materials Discovery in the Institute for Materials Discovery at the University College London. She earned her D.Phil. from the University of Oxford, and is the recipient of numerous honors including the Hetherington Prize, Oxford Metallurgical Society Award, and Grunfeld Medal and Prize from the Institute of Materials (UK). She is an elected fellow of the Institute of Materials, Minerals and Mining, and the Royal Society of Chemistry.

EUROCVD 15

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Publisher : The Electrochemical Society
ISBN 13 : 9781566774277
Total Pages : 1128 pages
Book Rating : 4.7/5 (742 download)

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Book Synopsis EUROCVD 15 by : Anjana Devi

Download or read book EUROCVD 15 written by Anjana Devi and published by The Electrochemical Society. This book was released on 2005 with total page 1128 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition (CVD) of Transition Metal and Metal Oxide Thin Films

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (654 download)

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Book Synopsis Chemical Vapor Deposition (CVD) of Transition Metal and Metal Oxide Thin Films by :

Download or read book Chemical Vapor Deposition (CVD) of Transition Metal and Metal Oxide Thin Films written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition for Nanotechnology

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Publisher : BoD – Books on Demand
ISBN 13 : 1789849608
Total Pages : 166 pages
Book Rating : 4.7/5 (898 download)

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Book Synopsis Chemical Vapor Deposition for Nanotechnology by : Pietro Mandracci

Download or read book Chemical Vapor Deposition for Nanotechnology written by Pietro Mandracci and published by BoD – Books on Demand. This book was released on 2019-01-10 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.

Atomic Layer Deposition Applications 13

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Publisher : The Electrochemical Society
ISBN 13 : 1607688204
Total Pages : 128 pages
Book Rating : 4.6/5 (76 download)

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Book Synopsis Atomic Layer Deposition Applications 13 by : F. Roozeboom

Download or read book Atomic Layer Deposition Applications 13 written by F. Roozeboom and published by The Electrochemical Society. This book was released on with total page 128 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Handbook of Chemical Vapor Deposition

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Author :
Publisher : William Andrew
ISBN 13 : 1437744885
Total Pages : 458 pages
Book Rating : 4.4/5 (377 download)

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Book Synopsis Handbook of Chemical Vapor Deposition by : Hugh O. Pierson

Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 2012-12-02 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.