Atomic Layer Epitaxy

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Author :
Publisher : Springer
ISBN 13 :
Total Pages : 200 pages
Book Rating : 4.:/5 (45 download)

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Book Synopsis Atomic Layer Epitaxy by : T. Suntola

Download or read book Atomic Layer Epitaxy written by T. Suntola and published by Springer. This book was released on 1989-10-31 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a detailed study of the Atomic Layer Epitaxy technique (ALE), its development, current and potential applications. The rapid development of coating technologies over the last 25 years has been instrumental in generating interest and expertise in thin films of materials, and indeed the market for thin film coatings is currently £3 billion with projected annual growth of 20 to 30% [1]. ALE is typical of thin-film processes in that problems in the processing or preparation of good quality epitaxial films have been overcome, resulting in better performance, novel applications of previously unsuitable materials, and the development of new devices. Many materials exhibit interesting and novel properties when prepared as thin films and doped. Vapour-deposited coatings and films are used extensively in the semiconductor and related industries for making single devices, integrated circuits, microwave hybrid integrated circuits, compact discs, solar reflective glazing, fibre optics, photo voltaic cells, sensors, displays, and many other products in general, everyday use. The ALE technique was developed by a research team led by Tuomo Suntola, working for Instrumentarium Oy in Finland. The key members of this team were lorma Antson, Arto Pakkala and Sven Lindfors. In 1977, the research team moved from Instrumentarium to Lohja Corporation, where they continued the development of ALE and were granted a patent in the same year. By 1980, the technique was sufficiently advanced that they were producing flat-screen electroluminescent displays based on a manganese-doped zinc sulphide layer.

Atomic Layer Deposition of Nanostructured Materials

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Author :
Publisher : John Wiley & Sons
ISBN 13 : 3527639926
Total Pages : 463 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Atomic Layer Deposition of Nanostructured Materials by : Nicola Pinna

Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 463 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Atomic Layer Deposition

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Author :
Publisher : John Wiley & Sons
ISBN 13 : 1118062779
Total Pages : 274 pages
Book Rating : 4.1/5 (18 download)

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Book Synopsis Atomic Layer Deposition by : Tommi Kääriäinen

Download or read book Atomic Layer Deposition written by Tommi Kääriäinen and published by John Wiley & Sons. This book was released on 2013-05-28 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Atomic Layer Epitaxy

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Author :
Publisher : Springer
ISBN 13 : 9789401066617
Total Pages : 280 pages
Book Rating : 4.0/5 (666 download)

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Book Synopsis Atomic Layer Epitaxy by : T. Suntola

Download or read book Atomic Layer Epitaxy written by T. Suntola and published by Springer. This book was released on 2011-09-20 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a detailed study of the Atomic Layer Epitaxy technique (ALE), its development, current and potential applications. The rapid development of coating technologies over the last 25 years has been instrumental in generating interest and expertise in thin films of materials, and indeed the market for thin film coatings is currently £3 billion with projected annual growth of 20 to 30% [1]. ALE is typical of thin-film processes in that problems in the processing or preparation of good quality epitaxial films have been overcome, resulting in better performance, novel applications of previously unsuitable materials, and the development of new devices. Many materials exhibit interesting and novel properties when prepared as thin films and doped. Vapour-deposited coatings and films are used extensively in the semiconductor and related industries for making single devices, integrated circuits, microwave hybrid integrated circuits, compact discs, solar reflective glazing, fibre optics, photo voltaic cells, sensors, displays, and many other products in general, everyday use. The ALE technique was developed by a research team led by Tuomo Suntola, working for Instrumentarium Oy in Finland. The key members of this team were lorma Antson, Arto Pakkala and Sven Lindfors. In 1977, the research team moved from Instrumentarium to Lohja Corporation, where they continued the development of ALE and were granted a patent in the same year. By 1980, the technique was sufficiently advanced that they were producing flat-screen electroluminescent displays based on a manganese-doped zinc sulphide layer.

Handbook of Crystal Growth

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Author :
Publisher : Elsevier
ISBN 13 : 0444633065
Total Pages : 1420 pages
Book Rating : 4.4/5 (446 download)

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Book Synopsis Handbook of Crystal Growth by : Peter Rudolph

Download or read book Handbook of Crystal Growth written by Peter Rudolph and published by Elsevier. This book was released on 2014-11-04 with total page 1420 pages. Available in PDF, EPUB and Kindle. Book excerpt: Vol 2A: Basic TechnologiesHandbook of Crystal Growth, Second Edition Volume IIA (Basic Technologies) presents basic growth technologies and modern crystal cutting methods. Particularly, the methodical fundamentals and development of technology in the field of bulk crystallization on both industrial and research scales are explored. After an introductory chapter on the formation of minerals, ruling historically the basic crystal formation parameters, advanced basic technologies from melt, solution, and vapour being applied for research and production of the today most important materials, like silicon, semiconductor compounds and oxides are presented in detail. The interdisciplinary and general importance of crystal growth for human live are illustrated.Vol 2B: Growth Mechanisms and DynamicsHandbook of Crystal Growth, Second Edition Volume IIB (Growth Mechanisms and Dynamics) deals with characteristic mechanisms and dynamics accompanying each bulk crystal growth method discussed in Volume IIA. Before the atoms or molecules pass over from a position in the fluid medium (gas, melt or solution) to their place in the crystalline face they must be transported in the fluid over macroscopic distances by diffusion, buoyancy-driven convection, surface-tension-driven convection, and forced convection (rotation, acceleration, vibration, magnetic mixing). Further, the heat of fusion and the part carried by the species on their way to the crystal by conductive and convective transport must be dissipated in the solid phase by well-organized thermal conduction and radiation to maintain a stable propagating interface. Additionally, segregation and capillary phenomena play a decisional role for chemical composition and crystal shaping, respectively. Today, the increase of high-quality crystal yield, its size enlargement and reproducibility are imperative conditions to match the strong economy.Volume 2A - Presents the status and future of Czochralski and float zone growth of dislocation-free silicon - Examines directional solidification of silicon ingots for photovoltaics, vertical gradient freeze of GaAs, CdTe for HF electronics and IR imaging as well as antiferromagnetic compounds and super alloys for turbine blades - Focuses on growth of dielectric and conducting oxide crystals for lasers and non-linear optics - Topics on hydrothermal, flux and vapour phase growth of III-nitrides, silicon carbide and diamond are explored Volume 2B - Explores capillarity control of the crystal shape at the growth from the melt - Highlights modeling of heat and mass transport dynamics - Discusses control of convective melt processes by magnetic fields and vibration measures - Includes imperative information on the segregation phenomenon and validation of compositional homogeneity - Examines crystal defect generation mechanisms and their controllability - Illustrates proper automation modes for ensuring constant crystal growth process - Exhibits fundamentals of solution growth, gel growth of protein crystals, growth of superconductor materials and mass crystallization for food and pharmaceutical industries

Atomic Layer Deposition for Semiconductors

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Author :
Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)

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Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Atomic Layer Deposition of Nanostructured Materials

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Author :
Publisher : John Wiley & Sons
ISBN 13 : 3527639934
Total Pages : 472 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Atomic Layer Deposition of Nanostructured Materials by : Nicola Pinna

Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Atomic Layer Epitaxy of Copper

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Author :
Publisher : Uppsala Universitet
ISBN 13 : 9789155443771
Total Pages : 45 pages
Book Rating : 4.4/5 (437 download)

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Book Synopsis Atomic Layer Epitaxy of Copper by : Per Mårtensson

Download or read book Atomic Layer Epitaxy of Copper written by Per Mårtensson and published by Uppsala Universitet. This book was released on 1999 with total page 45 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Epitaxy of III-V Compounds

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Publisher :
ISBN 13 :
Total Pages : 244 pages
Book Rating : 4.:/5 (278 download)

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Book Synopsis Atomic Layer Epitaxy of III-V Compounds by : Kimberly G. Reid

Download or read book Atomic Layer Epitaxy of III-V Compounds written by Kimberly G. Reid and published by . This book was released on 1992 with total page 244 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Deposition Applications 14

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Author :
Publisher : The Electrochemical Society
ISBN 13 : 1607688522
Total Pages : 83 pages
Book Rating : 4.6/5 (76 download)

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Book Synopsis Atomic Layer Deposition Applications 14 by : F. Roozeboom

Download or read book Atomic Layer Deposition Applications 14 written by F. Roozeboom and published by The Electrochemical Society. This book was released on 2018-09-21 with total page 83 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Application of Atomic Layer Epitaxy to the Growth of III-V Compounds

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Publisher :
ISBN 13 :
Total Pages : 304 pages
Book Rating : 4.:/5 (229 download)

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Book Synopsis Application of Atomic Layer Epitaxy to the Growth of III-V Compounds by : Brian Thomas McDermott

Download or read book Application of Atomic Layer Epitaxy to the Growth of III-V Compounds written by Brian Thomas McDermott and published by . This book was released on 1990 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Deposition for Nanotechnology

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Publisher :
ISBN 13 : 9780981466378
Total Pages : 239 pages
Book Rating : 4.4/5 (663 download)

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Book Synopsis Atomic Layer Deposition for Nanotechnology by : Arthur Sherman

Download or read book Atomic Layer Deposition for Nanotechnology written by Arthur Sherman and published by . This book was released on 2008 with total page 239 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Handbook of Manufacturing Engineering and Technology

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Publisher : Springer
ISBN 13 : 9781447146698
Total Pages : 0 pages
Book Rating : 4.1/5 (466 download)

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Book Synopsis Handbook of Manufacturing Engineering and Technology by : Andrew Y. C. Nee

Download or read book Handbook of Manufacturing Engineering and Technology written by Andrew Y. C. Nee and published by Springer. This book was released on 2014-10-31 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.

International Symposium on Atomic Layer Epitaxy ; 2

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Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (258 download)

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Book Synopsis International Symposium on Atomic Layer Epitaxy ; 2 by :

Download or read book International Symposium on Atomic Layer Epitaxy ; 2 written by and published by . This book was released on 1993 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

International Symposium on Atomic Layer Epitaxy ; 1

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Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (258 download)

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Book Synopsis International Symposium on Atomic Layer Epitaxy ; 1 by :

Download or read book International Symposium on Atomic Layer Epitaxy ; 1 written by and published by . This book was released on 1990 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Low-temperature Chemically-driven Atomic Layer Epitaxy for II-VI Material Growth

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Publisher :
ISBN 13 :
Total Pages : 450 pages
Book Rating : 4.:/5 (454 download)

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Book Synopsis Low-temperature Chemically-driven Atomic Layer Epitaxy for II-VI Material Growth by : Yi Luo

Download or read book Low-temperature Chemically-driven Atomic Layer Epitaxy for II-VI Material Growth written by Yi Luo and published by . This book was released on 2000 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Epitaxy and Related Surface Processes

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Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (637 download)

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Book Synopsis Atomic Layer Epitaxy and Related Surface Processes by : H. Sitter

Download or read book Atomic Layer Epitaxy and Related Surface Processes written by H. Sitter and published by . This book was released on 1997 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: