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Atomic Layer Deposition Of Metal Films From Precursor Synthesis To Film Deposition
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Book Synopsis Atomic Layer Deposition of Metal Films: From Precursor Synthesis to Film Deposition by : Zhengwen Li
Download or read book Atomic Layer Deposition of Metal Films: From Precursor Synthesis to Film Deposition written by Zhengwen Li and published by . This book was released on 2007 with total page 222 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low temperature ALD deposition is important for making thin and continuous metal films. Liquid, volatile and reactive amidinates of Co and Fe complexes were developed for ALD applications. The reactions were self-limiting at low temperature (100--250°C). The films were characterized as pure and conductive metals, using H2 as the reducing agent.
Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang
Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Book Synopsis Organometallic Chemistry by : Nathan J Patmore
Download or read book Organometallic Chemistry written by Nathan J Patmore and published by Royal Society of Chemistry. This book was released on 2018-11-16 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt: With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.
Book Synopsis Thermal Atomic Layer Deposition of Titanium Nitride Films by : Anuththara Chalani Upeksha Abesinghe Arachchige
Download or read book Thermal Atomic Layer Deposition of Titanium Nitride Films written by Anuththara Chalani Upeksha Abesinghe Arachchige and published by . This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Due to the continuous miniaturization of microelectronic devices, robust deposition techniques are required which can provide continuous and conformal thin films even in high aspect ratio structures. Atomic Layer Deposition (ALD) is an excellent choice of deposition technique as it is capable of providing perfect film coverage. Because of its self-limited growth mechanism, ALD can afford sub-nanometer thickness control. Precursors used in ALD should be volatile, thermally stable at the deposition temperature, and highly reactive towards the co-regent. Traditionally, ALD has been used to grow metal oxide films. However, the microelectronics industry now demands ALD for metals and metal nitrides. Titanium nitride (TiN) is widely used as adhesion layers, electrode material, and diffusion barriers. Halogenated precursors used in TiN ALD studies require high deposition temperatures and the corrosive byproducts can etch the substrates. Dialkylamido titanium precursors have low thermal stabilities, and hence, significant carbon incorporation arises in TiN ALD. Moreover, during the TiN depositions, current Ti(IV) precursors should reduce to Ti(III) and this reduction step is often incomplete. Hence, the synthesis of novel Ti(III) precursors which do not require reduction steps is needed. The research herein seeks to develop highly volatile and thermally stable Ti(III) and Ti(IV) precursors and to carry out TiN ALD with highly thermally stable titanium metal-organic precursors.ALD of TiN film was carried out using Ti(tBu2DAD)2 and 1,1-dimethylhydrazine. Ti(tBu2DAD)2 is highly volatile and thermally stable with a decomposition temperature ≥ 350 °C, which is much higher than commonly used metal-organic precursors. According to the plots of growth rate versus pulse length on SiO2 substrates, self-limited growth behavior was observed ≤ 3.0 s for Ti(tBu2DAD)2 and ≤ 0.1 s 1,1dimethylhydrazine with a saturative growth rate of 0.28 Å/cycle. An ALD window was observed from 325 to 350 °C, and a linear relationship was observed for a plot of thickness versus the number of cycles at a deposition temperature of 325 °C for TiN growth on SiO2 substrates. GI-XRD revealed the presence of nanocrystalline material on the films deposited at 350 and 400 °C. Atomic force microscopy of 30 nm thick films deposited at 325 and 350 °C showed RMS roughness values of 4.1% and 5.2% of the film thicknesses, respectively. X-ray photoelectron spectroscopy analyses were performed on films deposited within the ALD window. Both samples revealed TiOxNy upon argon ion sputtering. TiN ALD was attempted using Ti(iPr2DAD)3 and 1,1-dimethylhydrazine, but highly resistive, rough, and poor-quality films were obtained. Novel Ti(III) complexes containing pyrazolate and carbohydrazide ligands were synthesized and characterized. These complexes are non-volatile and thermally unstable. Hence, they are not viable candidates for the TiN ALD study. However, Ti(III) pyrazolate complexes unexpectedly were found to decompose thermally to afford Ti(IV) pyrazolates and possibly Ti metal. A disproportionation mechanism is proposed. This finding may be valuable for the development of Ti metal, TiN, and TiSi2 CVD and ALD precursors.
Book Synopsis Atomic Layer Deposition Applications 14 by : F. Roozeboom
Download or read book Atomic Layer Deposition Applications 14 written by F. Roozeboom and published by The Electrochemical Society. This book was released on 2018-09-21 with total page 83 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapour Deposition by : Anthony C. Jones
Download or read book Chemical Vapour Deposition written by Anthony C. Jones and published by Royal Society of Chemistry. This book was released on 2009 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Book Synopsis Atomic Layer Deposition of Nanostructured Materials by : Nicola Pinna
Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 463 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Book Synopsis Atomic Layer Deposition Applications 13 by : F. Roozeboom
Download or read book Atomic Layer Deposition Applications 13 written by F. Roozeboom and published by The Electrochemical Society. This book was released on with total page 128 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Atomic Layer Deposition by : Tommi Kääriäinen
Download or read book Atomic Layer Deposition written by Tommi Kääriäinen and published by John Wiley & Sons. This book was released on 2013-05-28 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Book Synopsis Atomic Layer Deposition in Energy Conversion Applications by : Julien Bachmann
Download or read book Atomic Layer Deposition in Energy Conversion Applications written by Julien Bachmann and published by John Wiley & Sons. This book was released on 2017-03-15 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt: Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.
Book Synopsis Handbook of Manufacturing Engineering and Technology by : Andrew Y. C. Nee
Download or read book Handbook of Manufacturing Engineering and Technology written by Andrew Y. C. Nee and published by Springer. This book was released on 2014-10-31 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.
Book Synopsis Vacuum Deposition onto Webs, Films and Foils by : Charles Bishop
Download or read book Vacuum Deposition onto Webs, Films and Foils written by Charles Bishop and published by William Andrew. This book was released on 2015-08-15 with total page 603 pages. Available in PDF, EPUB and Kindle. Book excerpt: Vacuum Deposition onto Webs: Films and Foils, Third Edition, provides the latest information on vacuum deposition, the technology that applies an even coating to a flexible material that can be held on a roll, thereby offering a much faster and cheaper method of bulk coating than deposition onto single pieces or non-flexible surfaces such as glass. This technology has been used in industrial-scale applications for some time, including a wide range of metalized packaging. Its potential as a high-speed, scalable process has seen an increasing range of new products emerging that employ this cost-effective technology, including solar energy products that are moving from rigid panels onto cheaper and more versatile flexible substrates, flexible electronic circuit ‘boards’, and flexible displays. In this third edition, all chapters are thoroughly revised with a significant amount of new information added, including newly developed barrier measurement techniques, improved in-vacuum monitoring technologies, and the latest developments in Atomic Layer Deposition (ALD). Provides the know-how to maximize productivity of vacuum coating systems Thoroughly revised with a significant amount of new information added, including newly developed barrier measurement techniques, improved in-vacuum monitoring technologies, and the latest on Atomic Layer Deposition (ALD) Presents the latest information on vacuum deposition, the technology that applies an even coating to a flexible material that can be held on a roll, thereby offering a much faster and cheaper method of bulk coating Enables engineers to specify systems more effectively and enhances dialogue between non-specialists and suppliers/engineers Empowers those in rapidly expanding fields such as solar energy, display panels, and flexible electronics to unlock the potential of vacuum coating to transform their processes and products
Book Synopsis Chemical Vapor Deposition for Nanotechnology by : Pietro Mandracci
Download or read book Chemical Vapor Deposition for Nanotechnology written by Pietro Mandracci and published by BoD – Books on Demand. This book was released on 2019-01-10 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Book Synopsis Chemical Vapor Deposition by : M. L. Hitchman
Download or read book Chemical Vapor Deposition written by M. L. Hitchman and published by Academic Press. This book was released on 1993-04-13 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt: This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Book Synopsis Emerging Nanotechnologies in Rechargeable Energy Storage Systems by : Lide M Rodriguez-Martinez
Download or read book Emerging Nanotechnologies in Rechargeable Energy Storage Systems written by Lide M Rodriguez-Martinez and published by William Andrew. This book was released on 2017-02-06 with total page 348 pages. Available in PDF, EPUB and Kindle. Book excerpt: Emerging Nanotechnologies in Rechargeable Energy Storage Systems addresses the technical state-of-the-art of nanotechnology for rechargeable energy storage systems. Materials characterization and device-modeling aspects are covered in detail, with additional sections devoted to the application of nanotechnology in batteries for electrical vehicles. In the later part of the book, safety and regulatory issues are thoroughly discussed. Users will find a valuable source of information on the latest developments in nanotechnology in rechargeable energy storage systems. This book will be of great use to researchers and graduate students in the fields of nanotechnology, electrical energy storage, and those interested in materials and electrochemical cell development. Gives readers working in the rechargeable energy storage sector a greater awareness on how novel nanotechnology oriented methods can help them develop higher-performance batteries and supercapacitor systems Provides focused coverage of the development, process, characterization techniques, modeling, safety and applications of nanomaterials for rechargeable energy storage systems Presents readers with an informed choice in materials selection for rechargeable energy storage devices
Book Synopsis The Chemistry of Metal CVD by : Toivo T. Kodas
Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Book Synopsis Chemical Solution Deposition of Functional Oxide Thin Films by : Theodor Schneller
Download or read book Chemical Solution Deposition of Functional Oxide Thin Films written by Theodor Schneller and published by Springer Science & Business Media. This book was released on 2014-01-24 with total page 801 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.
