Advances In The Reduction And Compensation Of Film Stress In High Reflectance Multilayer Coatings For Extreme Ultraviolet Lithography Applications

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Advances in the Reduction and Compensation of Film Stress in High-reflectance Multilayer Coatings for Extreme Ultraviolet Lithography Applications

Author :
Publisher :
ISBN 13 :
Total Pages : 19 pages
Book Rating : 4.:/5 (684 download)

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Book Synopsis Advances in the Reduction and Compensation of Film Stress in High-reflectance Multilayer Coatings for Extreme Ultraviolet Lithography Applications by :

Download or read book Advances in the Reduction and Compensation of Film Stress in High-reflectance Multilayer Coatings for Extreme Ultraviolet Lithography Applications written by and published by . This book was released on 1998 with total page 19 pages. Available in PDF, EPUB and Kindle. Book excerpt: Due to the stringent surface figure requirements for the multilayer-coated optics in an extreme ultraviolet (EUV) projection lithography system, it is desirable to minimize deformation due to the multilayer film stress. However, the stress must be reduced or compensated without reducing EUV reflectivity, since the reflectivity has a strong impact on the throughput of a EUV lithography tool. In this work we identify and evaluate several leading techniques for stress reduction and compensation as applied to Mo/Si and Mo/Be multilayer films. The measured film stress for Mo/Si films with EUV reflectances near 67.4% at 13.4 nm is approximately - 420 MPa (compressive), while it is approximately +330 MPa (tensile) for Mo/Be films with EUV reflectances near 69.4% at 11.4 nm. Varying the Mo-to-Si ratio can be used to reduce the stress to near zero levels, but at a large loss in EUV reflectance (> 20%). The technique of varying the base pressure (impurity level) yielded a 10% decrease in stress with a 2% decrease in reflectance for our multilayers. Post-deposition annealing was performed and it was observed that while the cost in reflectance is relatively high (3.5%) to bring the stress to near zero levels (i.e., reduce by 1 00%), the stress can be reduced by 75% with only a 1.3% drop in reflectivity at annealing temperatures near 200°C. A study of annealing during Mo/Si deposition was also performed; however, no practical advantage was observed by heating during deposition. A new non-thermal (athermal) buffer-layer technique was developed to compensate for the effects of stress. Using this technique with amorphous silicon and Mo/Be buffer-layers it was possible to obtain Mo/Be and Mo/Si multilayer films with a near zero net film stress and less than a 1% loss in reflectivity. For example a Mo/Be film with 68.7% reflectivity at 11.4 nm and a Mo/Si film with 66.5% reflectivity at 13.3 nm were produced with net stress values less than 30 MPa.

Microlithography

Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1351643444
Total Pages : 770 pages
Book Rating : 4.3/5 (516 download)

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Book Synopsis Microlithography by : Bruce W. Smith

Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 770 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.

Short Wavelength Laboratory Sources

Author : Alan Michette
Publisher : Royal Society of Chemistry
ISBN 13 : 1849734569
Total Pages : 468 pages
Book Rating : 4.8/5 (497 download)

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Book Synopsis Short Wavelength Laboratory Sources by : Alan Michette

Download or read book Short Wavelength Laboratory Sources written by Alan Michette and published by Royal Society of Chemistry. This book was released on 2014-12-15 with total page 468 pages. Available in PDF, EPUB and Kindle. Book excerpt: Our ability to manipulate short wavelength radiation (0.01-100nm, equivalent to 120keV-12eV) has increased significantly over the last three decades. This has lead to major advances in applications in a wide range of disciplines such as: the life and medical sciences, including cancer-related studies; environmental science, including studies of pollution and its effects; archaeology and other cultural heritage disciplines; and materials science. Although expansion in application areas is due largely to modern synchrotron sources, many applications will not become widespread, and therefore routinely available as analytical tools, if they are confined to synchrotrons. This is because synchrotrons require enormous capital and infrastructure costs and are often, of necessity, national or international facilities. This seriously limits their scope for applications in research and analysis, in both academia and industry. How many universities, research institutes or even industrial laboratories would have electron microscopes if electron sources cost ú100M or more Hence the need to develop bright but small and (relatively) cheap x-ray sources, not to replace synchrotrons but to complement them. Written by a distinguished team of international authors this exemplary new handbook is based on the COST Action MP0601: Short Wavelength Laboratory Sources. The contents are divided into five main sections. The introductory section provides a comprehensive introduction to the fundamentals of radiation, generation mechanisms and short wavelength laboratory sources. The middle sections focus on modelling and simulation, source development: improvement and characterisation and integrated systems: sources, optics and detectors. The final section looks at recent applications.

High Reflectance-low Stress Mo-Si Multilayer Reflective Coatings

Author :
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (873 download)

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Book Synopsis High Reflectance-low Stress Mo-Si Multilayer Reflective Coatings by :

Download or read book High Reflectance-low Stress Mo-Si Multilayer Reflective Coatings written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.

Process for Fabricating High Reflectance-low Stress Mo--Si Multilayer Reflective Coatings

Author :
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (873 download)

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Book Synopsis Process for Fabricating High Reflectance-low Stress Mo--Si Multilayer Reflective Coatings by :

Download or read book Process for Fabricating High Reflectance-low Stress Mo--Si Multilayer Reflective Coatings written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A high reflectance-low stress Mo--Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.

Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications

Author : Ali M. Khounsary
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 : 9780819450661
Total Pages : 240 pages
Book Rating : 4.4/5 (56 download)

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Book Synopsis Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications by : Ali M. Khounsary

Download or read book Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications written by Ali M. Khounsary and published by SPIE-International Society for Optical Engineering. This book was released on 2004 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Multilayer Reflective Coatings for Extreme-ultraviolet Lithography

Author :
Publisher :
ISBN 13 :
Total Pages : 13 pages
Book Rating : 4.:/5 (683 download)

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Book Synopsis Multilayer Reflective Coatings for Extreme-ultraviolet Lithography by :

Download or read book Multilayer Reflective Coatings for Extreme-ultraviolet Lithography written by and published by . This book was released on 1998 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching among the seven multilayer-coated mirrors used in the present lithography system design. Uniformity of coating was improved to better than 0.5% across 150 mm diameter substrates. These improvements in EUV multilayer mirror technology will enable us to meet the stringent specifications for coating the large optical substrates for our next-generation EUV lithography system.

Emerging Lithographic Technologies

Author :
Publisher :
ISBN 13 :
Total Pages : 854 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Emerging Lithographic Technologies by :

Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 2001 with total page 854 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Soft X-ray and EUV Imaging Systems

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Publisher :
ISBN 13 :
Total Pages : 194 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Soft X-ray and EUV Imaging Systems by :

Download or read book Soft X-ray and EUV Imaging Systems written by and published by . This book was released on 2001 with total page 194 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Experimental Investigation of Beryllium-based Multilayer Coatings for Extreme Ultraviolet Lithography

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (683 download)

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Book Synopsis Experimental Investigation of Beryllium-based Multilayer Coatings for Extreme Ultraviolet Lithography by :

Download or read book Experimental Investigation of Beryllium-based Multilayer Coatings for Extreme Ultraviolet Lithography written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The performance of beryllium-based multilayer coatings designed to reflect light of wavelengths near 11 nm, at normal incidence, is presented. These multilayer coatings are of special interest for extreme ultraviolet lithography (EUVL). The beryllium-based multilayers investigated were Mo/Be, Ru/Be and a new material combination Mo, CiBe. The highest reflectivity achieved so far is 70% at 11.3 mn with 70 bilayers of Mo/Be. However, even though high reflectivity is very important, there are other parameters to satisfy the requirements for an EUVL production tool. Multilayer stress, thermal stability, radiation stability and long term reflectance stability are of equal or greater importance. An experimental characterization of several coatings was carried out to determine the reflectivity, stress, microstructure, and long term stability of these coatings. Theoretically calculated reflectivities are compared with experimental results for different material pairs; differences between experimental and theoretical reflectivities and bandwidths are addressed. Keywords: Extreme ultraviolet (EUV) lithography, reflective coatings, multilayer deposition, beryllium.

High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography

Author :
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (682 download)

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Book Synopsis High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography by :

Download or read book High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Synchrotron-based reflectometry is an important technique for the precise determination of optical properties of reflective multilayer coatings for Extreme Ultraviolet Lithography (EUVL). Multilayer coatings enable normal incidence reflectances of more than 65% in the wavelength range between 11 and 15 nm. In order to achieve high resolution and throughput of EUVL systems, stringent requirements not only apply to their mechanical and optical layout, but also apply to the optical properties of the multilayer coatings. Therefore, multilayer deposition on near-normal incidence optical surfaces of projection optics, condenser optics and reflective masks requires suitable high-precision metrology. Most important, due to their small bandpass on the order of only 0.5 nm, all reflective multilayer coatings in EUVL systems must be wavelength-matched to within "0.05 nm. In some cases, a gradient of the coating thickness is necessary for wavelength matching at variable average angle of incidence in different locations on the optical surfaces. Furthermore, in order to preserve the geometrical figure of the optical substrates, reflective multilayer coatings need to be uniform to within 0.01 nm in their center wavelength. This requirement can only be fulfilled with suitable metrology, which provides a precision of a fraction of this value. In addition, for the detailed understanding and the further development of reflective multilayer coatings a precision in the determination of peak reflectances is desirable on the order of 0.1%. Substrates up to 200 mm in diameter and 15 kg in mass need to be accommodated. Above requirements are fulfilled at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley. This beamline proved to be precise within 0.2% (ms) for reflectance and 0.002 nm (rms) for wavelength.

Lifetime Studies of Mo

Author :
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (683 download)

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Book Synopsis Lifetime Studies of Mo by :

Download or read book Lifetime Studies of Mo written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor industry in the production of sub-100 nm feature sizes in integrated circuits. Using multilayer reflective coatings optimized at wavelengths ranging from 11 to 14 nm, EUVL represents a potential successor to currently existing optical lithography techniques. In order to assess lifetimes of the multilayer coatings under realistic conditions, a series of radiation stability tests has been performed. In each run a dose of EUV radiation equivalent to several months of lithographic operation was applied to Mo/Si and MO/Be multilayer coatings within a few days. Depending on the residual gas concentration in the vacuum environment, surface deposition of carbon during the exposure lead to losses in the multilayer reflectivity. However, in none of the experimental runs was structural damage within the bulk of the multilayers observed. Mo/Si multilayer coatings recovered their full original reflectivity after removal of the carbon layer by an ozone cleaning method. Auger depth profiling on MO/Be multilayers indicate that carbon penetrated into the Be top layer during illumination with high doses of EUV radiation. Subsequent ozone cleaning fully removed the carbon, but revealed enhanced oxidation of the area illuminated, which led to an irreversible loss in reflectance on the order of 1%. Keywords: Extreme ultraviolet (EUV) lithography, multilayer reflective coatings, radiation stability, surface contamination.

Characterization of Multilayer Reflective Coatings for Extreme Ultraviolet Lithography

Author :
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (684 download)

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Book Synopsis Characterization of Multilayer Reflective Coatings for Extreme Ultraviolet Lithography by :

Download or read book Characterization of Multilayer Reflective Coatings for Extreme Ultraviolet Lithography written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The synchrotron-based reflectometer at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley is an important metrology tool within the current Extreme Ultraviolet Lithography (EUVL) program. This program is a joint activity of three National Laboratories and a consortium of leading semiconductor manufacturers. Its goal is the development of a technology for routine production of sub-100 nm feature sizes for microelectronic circuits. Multilayer-coated normal-incidence optical surfaces reflecting in the Extreme Ultraviolet (EUV) spectral range near 13 nm are the basis for this emerging technology. All optical components of EUV lithographic steppers need to be characterized at-wavelength during their development and manufacturing process. Multilayer coating uniformity and gradient, accurate wavelength matching and high peak reflectances are the main parameters to be optimized. The mechanical and optical properties of the reflectometer at ALS beamline 6.3.2 proved to be well suited for the needs of the current EUVL program. In particular the facility is highly precise in its wavelength calibration and the determination of absolute EUV reflectance. The reproducibility of results of measurements at ALS beamline 6.3.2 is 0.2 % for reflectivity and 0.002 nm for wavelength.

Multilayer Coated Optics for an Alpha-class Extreme Ultraviolet Lithography System

Author :
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (683 download)

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Book Synopsis Multilayer Coated Optics for an Alpha-class Extreme Ultraviolet Lithography System by :

Download or read book Multilayer Coated Optics for an Alpha-class Extreme Ultraviolet Lithography System written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: We present the results of coating the first set of optical elements for an alpha-class extreme-ultraviolet (EUV) lithography system, the Engineering Test Stand (ETS). The optics were coated with Mo/Si multilayer mirrors using an upgraded DC-magnetron sputtering system. Characterization of the near-normal incidence EUV reflectance was performed using synchrotron radiation from the Advanced Light Source at the Lawrence Berkeley National Laboratory. Stringent requirements were met for these multilayer coatings in terms of reflectance, wavelength matching among the different optics, and thickness control across the diameter of each individual optic. Reflectances above 65% were achieved at 13.35 nm at near-normal angles of incidence. The run-to-run reproducibility of the reflectance peak wavelength was maintained to within 0.4%, providing the required wavelength matching among the seven multilayer-coated optics. The thickness uniformity (or gradient) was controlled to within "0.25% peak-to-valley (P-V) for the condenser optics and "0.1% P-V for the four projection optics, exceeding the prescribed specification for the optics of the ETS.

Optical Engineering

Author :
Publisher :
ISBN 13 :
Total Pages : 538 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Optical Engineering by :

Download or read book Optical Engineering written by and published by . This book was released on 1999 with total page 538 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publishes papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.

International Aerospace Abstracts

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Publisher :
ISBN 13 :
Total Pages : 1044 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis International Aerospace Abstracts by :

Download or read book International Aerospace Abstracts written by and published by . This book was released on 1999 with total page 1044 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Method to Adjust Multilayer Film Stress Induced Deformation of Optics

Author :
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (873 download)

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Book Synopsis Method to Adjust Multilayer Film Stress Induced Deformation of Optics by :

Download or read book Method to Adjust Multilayer Film Stress Induced Deformation of Optics written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Stress compensating systems that reduces/compensates stress in a multilayer without loss in reflectivity, while reducing total film thickness compared to the earlier buffer-layer approach. The stress free multilayer systems contain multilayer systems with two different material combinations of opposite stress, where both systems give good reflectivity at the design wavelengths. The main advantage of the multilayer system design is that stress reduction does not require the deposition of any additional layers, as in the buffer layer approach. If the optical performance of the two systems at the design wavelength differ, the system with the poorer performance is deposited first, and then the system with better performance last, thus forming the top of the multilayer system. The components for the stress reducing layer are chosen among materials that have opposite stress to that of the preferred multilayer reflecting stack and simultaneously have optical constants that allow one to get good reflectivity at the design wavelength. For a wavelength of 13.4 nm, the wavelength presently used for extreme ultraviolet (EUV) lithography, Si and Be have practically the same optical constants, but the Mo/Si multilayer has opposite stress than the Mo/Be multilayer. Multilayer systems of these materials have practically identical reflectivity curves. For example, stress free multilayers can be formed on a substrate using Mo/Be multilayers in the bottom of the stack and Mo/Si multilayers at the top of the stack, with the switch-over point selected to obtain zero stress. In this multilayer system, the switch-over point is at about the half point of the total thickness of the stack, and for the Mo/Be--Mo/Si system, there may be 25 deposition periods Mo/Be to 20 deposition periods Mo/Si.