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Author :
Publisher :
ISBN 13 :
Total Pages : 780 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advances in Resist Technology and Processing written by and published by . This book was released on 2006 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 688 pages
Book Rating : 4.F/5 ( download)
Download or read book Advances in Resist Technology and Processing XXI written by and published by . This book was released on 2004 with total page 688 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : D. Harame
Publisher : The Electrochemical Society
ISBN 13 : 1607685434
Total Pages : 1042 pages
Book Rating : 4.6/5 (76 download)
Download or read book SiGe, Ge, and Related Compounds 6: Materials, Processing, and Devices written by D. Harame and published by The Electrochemical Society. This book was released on with total page 1042 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Andrew Sarangan
Publisher : CRC Press
ISBN 13 : 1498725597
Total Pages : 299 pages
Book Rating : 4.4/5 (987 download)
Download or read book Nanofabrication written by Andrew Sarangan and published by CRC Press. This book was released on 2016-10-26 with total page 299 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is designed to introduce typical cleanroom processes, techniques, and their fundamental principles. It is written for the practicing scientist or engineer, with a focus on being able to transition the information from the book to the laboratory. Basic theory such as electromagnetics and electrochemistry is described in as much depth as necessary to understand and explain the current practice and their limitations. Examples from various areas of interest will be covered, such as the fabrication of photonic devices including photo detectors, waveguides, and optical coatings, which are not commonly found in other fabrication texts.
Author : Chris Mack
Publisher : John Wiley & Sons
ISBN 13 : 1119965071
Total Pages : 503 pages
Book Rating : 4.1/5 (199 download)
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author : Elsa Reichmanis
Publisher :
ISBN 13 :
Total Pages : 640 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing VI written by Elsa Reichmanis and published by . This book was released on 1989 with total page 640 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Soumen Das
Publisher : Elsevier
ISBN 13 : 012823170X
Total Pages : 748 pages
Book Rating : 4.1/5 (282 download)
Download or read book Chemical Solution Synthesis for Materials Design and Thin Film Device Applications written by Soumen Das and published by Elsevier. This book was released on 2021-01-09 with total page 748 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical Solution Synthesis for Materials Design and Thin Film Device Applications presents current research on wet chemical techniques for thin-film based devices. Sections cover the quality of thin films, types of common films used in devices, various thermodynamic properties, thin film patterning, device configuration and applications. As a whole, these topics create a roadmap for developing new materials and incorporating the results in device fabrication. This book is suitable for graduate, undergraduate, doctoral students, and researchers looking for quick guidance on material synthesis and device fabrication through wet chemical routes. - Provides the different wet chemical routes for materials synthesis, along with the most relevant thin film structured materials for device applications - Discusses patterning and solution processing of inorganic thin films, along with solvent-based processing techniques - Includes an overview of key processes and methods in thin film synthesis, processing and device fabrication, such as nucleation, lithography and solution processing
Author :
Publisher :
ISBN 13 :
Total Pages : 442 pages
Book Rating : 4.3/5 (91 download)
Download or read book Lithography for Semiconductor Manufacturing written by and published by . This book was released on 2001 with total page 442 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Junyan Dai
Publisher :
ISBN 13 :
Total Pages : 596 pages
Book Rating : 4.E/5 ( download)
Download or read book Novel Resists for Advanced Lithography written by Junyan Dai and published by . This book was released on 2004 with total page 596 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Eitan N. Shauly
Publisher : CRC Press
ISBN 13 : 1000631354
Total Pages : 831 pages
Book Rating : 4.0/5 (6 download)
Download or read book Design Rules in a Semiconductor Foundry written by Eitan N. Shauly and published by CRC Press. This book was released on 2022-11-30 with total page 831 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nowadays over 50% of integrated circuits are fabricated at wafer foundries. This book presents a foundry-integrated perspective of the field and is a comprehensive and up-to-date manual designed to serve process, device, layout, and design engineers. It comprises chapters carefully selected to cover topics relevant for them to deal with their work. The book provides an insight into the different types of design rules (DRs) and considerations for setting new DRs. It discusses isolation, gate patterning, S/D contacts, metal lines, MOL, air gaps, and so on. It explains in detail the layout rules needed to support advanced planarization processes, different types of dummies, and related utilities as well as presents a large set of guidelines and layout-aware modeling for RF CMOS and analog modules. It also discusses the layout DRs for different mobility enhancement techniques and their related modeling, listing many of the dedicated rules for static random-access memory (SRAM), embedded polyfuse (ePF), and LogicNVM. The book also provides the setting and calibration of the process parameters set and describes the 28~20 nm planar MOSFET process flow for low-power and high-performance mobile applications in a step-by-step manner. It includes FEOL and BEOL physical and environmental tests for qualifications together with automotive qualification and design for automotive (DfA). Written for the professionals, the book belongs to the bookshelf of microelectronic discipline experts.
Author :
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ISBN 13 :
Total Pages : 620 pages
Book Rating : 4.:/5 (35 download)
Download or read book Memorandum written by and published by . This book was released on 2000 with total page 620 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Li Jian
Publisher : Trans Tech Publications Ltd
ISBN 13 : 303813757X
Total Pages : 1128 pages
Book Rating : 4.0/5 (381 download)
Download or read book Manufacturing Science and Materials Engineering written by Li Jian and published by Trans Tech Publications Ltd. This book was released on 2012-01-03 with total page 1128 pages. Available in PDF, EPUB and Kindle. Book excerpt: Selected, peer reviewed papers from the 2010 International Conference on Manufacturing Science and Materials Engineering, (ICMSME 2011), October 14-15, 2011, Shanghai, China
Author :
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ISBN 13 :
Total Pages : 576 pages
Book Rating : 4.3/5 (91 download)
Download or read book Annual Symposium on Photomask Technology written by and published by . This book was released on 1999 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 384 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing II written by and published by . This book was released on 1985 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Tapan Gupta
Publisher : Springer Science & Business Media
ISBN 13 : 1441900764
Total Pages : 433 pages
Book Rating : 4.4/5 (419 download)
Download or read book Copper Interconnect Technology written by Tapan Gupta and published by Springer Science & Business Media. This book was released on 2010-01-22 with total page 433 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since overall circuit performance has depended primarily on transistor properties, previous efforts to enhance circuit and system speed were focused on transistors as well. During the last decade, however, the parasitic resistance, capacitance, and inductance associated with interconnections began to influence circuit performance and will be the primary factors in the evolution of nanoscale ULSI technology. Because metallic conductivity and resistance to electromigration of bulk copper (Cu) are better than aluminum, use of copper and low-k materials is now prevalent in the international microelectronics industry. As the feature size of the Cu-lines forming interconnects is scaled, resistivity of the lines increases. At the same time electromigration and stress-induced voids due to increased current density become significant reliability issues. Although copper/low-k technology has become fairly mature, there is no single book available on the promise and challenges of these next-generation technologies. In this book, a leader in the field describes advanced laser systems with lower radiation wavelengths, photolithography materials, and mathematical modeling approaches to address the challenges of Cu-interconnect technology.
Author : Wiley-VCH
Publisher : John Wiley & Sons
ISBN 13 : 3527338233
Total Pages : 1934 pages
Book Rating : 4.5/5 (273 download)
Download or read book Ullmann's Polymers and Plastics, 4 Volume Set written by Wiley-VCH and published by John Wiley & Sons. This book was released on 2016-04-25 with total page 1934 pages. Available in PDF, EPUB and Kindle. Book excerpt: Your personal Ullmann's: Chemical and physical characteristics, production processes and production figures, main applications, toxicology and safety information are all to be found here in one single resource - bringing the vast knowledge of the Ullmann's Encyclopedia to the desks of industrial chemists and chemical engineers. The ULLMANN’S perspective on polymers and plastics brings reliable information on more than 1500 compounds and products straight to your desktop Carefully selected “best of” compilation of 61 topical articles from the Encyclopedia of Industrial Chemistry on economically important polymers provide a wealth of chemical, physical and economic data on more than 1000 different polymers and hundreds of modifications Contains a wealth of information on the production and use of all industrially relevant polymers and plastics, including organic and inorganic polymers, fibers, foams and resins Extensively updated: more than 30% of the content has been added or updated since the launch of the 7th edition of the Ullmann’s encyclopedia in 2011 and is now available in print for the first time 4 Volumes
Author : M. J. Bowden
Publisher :
ISBN 13 :
Total Pages : 384 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing IV written by M. J. Bowden and published by . This book was released on 1987 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:
