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ISBN 13 :
Total Pages : 780 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advances in Resist Technology and Processing written by and published by . This book was released on 2006 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 688 pages
Book Rating : 4.F/5 ( download)
Download or read book Advances in Resist Technology and Processing XXI written by and published by . This book was released on 2004 with total page 688 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Chris Mack
Publisher : John Wiley & Sons
ISBN 13 : 1119965071
Total Pages : 503 pages
Book Rating : 4.1/5 (199 download)
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author : Junyan Dai
Publisher :
ISBN 13 :
Total Pages : 596 pages
Book Rating : 4.E/5 ( download)
Download or read book Novel Resists for Advanced Lithography written by Junyan Dai and published by . This book was released on 2004 with total page 596 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 360 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing III written by and published by . This book was released on 1986 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 442 pages
Book Rating : 4.3/5 (91 download)
Download or read book Lithography for Semiconductor Manufacturing written by and published by . This book was released on 2001 with total page 442 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. J. Bowden
Publisher :
ISBN 13 :
Total Pages : 384 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing IV written by M. J. Bowden and published by . This book was released on 1987 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Elsa Reichmanis
Publisher :
ISBN 13 :
Total Pages : 640 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing VI written by Elsa Reichmanis and published by . This book was released on 1989 with total page 640 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 384 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing II written by and published by . This book was released on 1985 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 576 pages
Book Rating : 4.3/5 (91 download)
Download or read book Annual Symposium on Photomask Technology written by and published by . This book was released on 1999 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Kirk-Othmer
Publisher : John Wiley & Sons
ISBN 13 : 047148508X
Total Pages : 886 pages
Book Rating : 4.4/5 (714 download)
Download or read book Kirk-Othmer Encyclopedia of Chemical Technology, Volume 15 written by Kirk-Othmer and published by John Wiley & Sons. This book was released on 2005-10-06 with total page 886 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fifth edition of the Kirk-Othmer Encyclopedia of Chemical Technology builds upon the solid foundation of the previous editions, which have proven to be a mainstay for chemists, biochemists, and engineers at academic, industrial, and government institutions since publication of the first edition in 1949. The new edition includes necessary adjustments and modernisation of the content to reflect changes and developments in chemical technology. Presenting a wide scope of articles on chemical substances, properties, manufacturing, and uses; on industrial processes, unit operations in chemical engineering; and on fundamentals and scientific subjects related to the field. The Encyclopedia describes established technology along with cutting edge topics of interest in the wide field of chemical technology, whilst uniquely providing the necessary perspective and insight into pertinent aspects, rather than merely presenting information. * Set began publication in January 2004 * Over 1,000 articles * More than 600 new or updated articles * 27 volumes
Author : Yasuhisa Omura
Publisher : The Electrochemical Society
ISBN 13 : 1566778662
Total Pages : 347 pages
Book Rating : 4.5/5 (667 download)
Download or read book Advanced Semiconductor-on-Insulator Technology and Related Physics 15 written by Yasuhisa Omura and published by The Electrochemical Society. This book was released on 2011-04 with total page 347 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the continuation of the long running ¿Silicon-on-Insulator Technology and Devices¿ symposium. The issue of ECS Transactions covers recent significant advances in SOI technologies, SOI-based nanoelectronics and innovative applications including scientific interests. It will be of interest to materials and device scientists, as well as to process and applications oriented engineers and scientists.
Author : Climate Change Technology Program (U.S.)
Publisher :
ISBN 13 :
Total Pages : 244 pages
Book Rating : 4.:/5 (31 download)
Download or read book Strategic Plan written by Climate Change Technology Program (U.S.) and published by . This book was released on 2006 with total page 244 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. Meyyappan
Publisher : The Electrochemical Society
ISBN 13 : 9781566771368
Total Pages : 366 pages
Book Rating : 4.7/5 (713 download)
Download or read book Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing written by M. Meyyappan and published by The Electrochemical Society. This book was released on 1997 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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Publisher : Elsevier
ISBN 13 : 0080945074
Total Pages : 409 pages
Book Rating : 4.0/5 (89 download)
Download or read book written by and published by Elsevier. This book was released on with total page 409 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Joseph M. DeSimone
Publisher : Oxford University Press, USA
ISBN 13 : 0195154835
Total Pages : 276 pages
Book Rating : 4.1/5 (951 download)
Download or read book Green Chemistry Using Liquid and Supercritical Carbon Dioxide written by Joseph M. DeSimone and published by Oxford University Press, USA. This book was released on 2003 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt: Annotation. Introduction, J. Young, J. DeSimone, and W. TumasPart I: Catalysis and Chemical Synthesis in CO21. Phase behavior and its effects on reactions in liquid and supercritical CO2, L.A. Blanchard et al. 2. Advances in homogeneous, heterogeneous and biphasic metal catalyzed reactions in dense phase carbon dioxide, T. Ikariya et al. 3. CO2 as a reactant and solvent in catalysis, T. Ikariya and R. Noyori4. Free radical chemistry in supercritical CO2, J.M. Tanko5. Fluorous phases and compressed carbon dioxide as alternative solvents for chemical synthesis: a comparison, W. Leitner6. Enzyme chemistry in carbon dioxide, R.L. Rodney and A.J. RussellPart II: Polymers in CO27. Solubility of polymers in CO2, M. McHugh8. Interfacial phenomena with CO2-soluble surfactants, K. Johnston et al. 9. Synthesis and characterization of polymers: From polymeric micelles to step growth polymerizations, J. Young and J. DeSimone10. Preparation and studies of polymer/polymer composites prepared using supercritical carbon dioxide, E. Kung, A.J. Lesser, and T.J. McCarthy11. Rheological properties of polymers modified with CO2, C.W. Manke and E. GulariPart III: Industrial Processes and Applications Utilizing CO212. Coatings from liquid and supercritical CO2, Y. Chernyak et al. 13. Dry cleaning with liquid CO2, G. Stewart14. Selective and complete hydrogenation of vegetable oils and free fatty acids in supercritical fluids, T. Tacke, S. Wieland, and P. Panster15. Supercritical CO2 enhancement of cemented materials, C. Taylor, J. Rubin, and B. Carey.
Author : Klaus D. Sattler
Publisher : CRC Press
ISBN 13 : 1420075519
Total Pages : 782 pages
Book Rating : 4.4/5 (2 download)
Download or read book Handbook of Nanophysics written by Klaus D. Sattler and published by CRC Press. This book was released on 2010-09-17 with total page 782 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many bottom-up and top-down techniques for nanomaterial and nanostructure generation have enabled the development of applications in nanoelectronics and nanophotonics. Handbook of Nanophysics: Nanoelectronics and Nanophotonics explores important recent applications of nanophysics in the areas of electronics and photonics. Each peer-reviewed c
