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Author :
Publisher :
ISBN 13 :
Total Pages : 216 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications written by and published by . This book was released on 2004 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ali M. Khounsary
Publisher : Society of Photo Optical
ISBN 13 : 9780819454713
Total Pages : 194 pages
Book Rating : 4.4/5 (547 download)
Download or read book Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications II written by Ali M. Khounsary and published by Society of Photo Optical. This book was released on 2004 with total page 194 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author : Ali M. Khounsary
Publisher : Society of Photo Optical
ISBN 13 : 9780819450661
Total Pages : 222 pages
Book Rating : 4.4/5 (56 download)
Download or read book Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications written by Ali M. Khounsary and published by Society of Photo Optical. This book was released on 2004 with total page 222 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author : Ali M. Khounsary
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 : 9780819450661
Total Pages : 240 pages
Book Rating : 4.4/5 (56 download)
Download or read book Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications written by Ali M. Khounsary and published by SPIE-International Society for Optical Engineering. This book was released on 2004 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author : Tetsuya Kawachi
Publisher : Springer
ISBN 13 : 3319730258
Total Pages : 421 pages
Book Rating : 4.3/5 (197 download)
Download or read book X-Ray Lasers 2016 written by Tetsuya Kawachi and published by Springer. This book was released on 2018-02-23 with total page 421 pages. Available in PDF, EPUB and Kindle. Book excerpt: These proceedings comprise a selection of invited and contributed papers presented at the 15th International Conference on X-Ray Lasers (ICXRL 2016), held at the Nara Kasugano International Forum, Japan, from May 22 to 27, 2016. This conference was part of an ongoing series dedicated to recent developments in the science and technology of x-ray lasers and other coherent x-ray sources with additional focus on supporting technologies, instrumentation and applications. The book showcases recent advances in the generation of intense, coherent x-rays, the development of practical devices and their applications across a wide variety of fields. It also discusses emerging topics such as plasma-based x-ray lasers, 4th generation accelerator-based sources and higher harmonic generations, as well as other x-ray generation schemes.
Author : Federico Canova
Publisher : Springer
ISBN 13 : 3662474433
Total Pages : 205 pages
Book Rating : 4.6/5 (624 download)
Download or read book Optical Technologies for Extreme-Ultraviolet and Soft X-ray Coherent Sources written by Federico Canova and published by Springer. This book was released on 2015-08-17 with total page 205 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Author :
Publisher :
ISBN 13 :
Total Pages : 406 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advances in X-ray/EUV Optics, Components, and Applications written by and published by . This book was released on 2006 with total page 406 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Michaela Kozlová
Publisher : Springer Nature
ISBN 13 : 3030354539
Total Pages : 199 pages
Book Rating : 4.0/5 (33 download)
Download or read book X-Ray Lasers 2018 written by Michaela Kozlová and published by Springer Nature. This book was released on 2020-03-06 with total page 199 pages. Available in PDF, EPUB and Kindle. Book excerpt: These proceedings gather a selection of invited and contributed papers presented during the 16th International Conference on X-Ray Lasers (ICXRL 2018), held in Prague, Czech Republic, from 7 to 12 October 2018. The conference is part of an ongoing series dedicated to recent developments in the science and technology of X-ray lasers and other coherent X-ray sources, with an additional focus on supporting technologies, instrumentation and applications. The book highlights advances in a wide range of fields including laser and discharge-pumped plasma X-ray lasers, the injection and seeding of X-ray amplifiers, high-order harmonic generation and ultrafast phenomena, X-ray free electron lasers, novel schemes for (in)coherent XUV, X-ray and γ-ray generation, XUV and X-ray imaging, optics and metrology, X-rays and γ-rays for fundamental science, the practical implementation of X-ray lasers, XFELs and super-intense lasers, and the applications and industrial uses of X-ray lasers.
Author : David Cameron
Publisher : MDPI
ISBN 13 : 3039366521
Total Pages : 142 pages
Book Rating : 4.0/5 (393 download)
Download or read book Atomic Layer Deposition written by David Cameron and published by MDPI. This book was released on 2020-12-28 with total page 142 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing – known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.
Author : Stéphane Sebban
Publisher : Springer Science & Business Media
ISBN 13 : 3319006967
Total Pages : 305 pages
Book Rating : 4.3/5 (19 download)
Download or read book X-Ray Lasers 2012 written by Stéphane Sebban and published by Springer Science & Business Media. This book was released on 2013-09-17 with total page 305 pages. Available in PDF, EPUB and Kindle. Book excerpt: These proceedings comprise of invited and contributed papers presented at the 13th International Conference on X-Ray Lasers (ICXRL 2012) which was held 11–15 June 2012 in Paris, France, in the famous Quartier Latin, inside the historical Center of Cordeliers. This conference is part of a continuing series dedicated to recent developments and applications of x-ray lasers and other coherent x-ray sources with attention to supporting technologies and instrumentation. New results in the generation of intense coherent x-rays and progress towards practical devices and their applications are reported in these proceedings, including areas of research in plasma-based x-ray lasers, 4th generation accelerator-based sources and higher harmonic generation. Recent achievements related to the increase of the repetition rate up to 100 Hz and shorter wavelength collisional plasma-based soft x-ray lasers down to about 7 nm are presented. Seeding the amplifying plasma with a femtosecond high-order harmonic of infrared laser was foreseen as the required breakthrough to break the picosecond frontier. Numerical simulations based on the Maxwell-Bloch model are presented in these proceedings, transposing the chirped pulse amplification technique to the x-ray domain in order to increase the time over which the femtosecond seed can be amplified. These proceedings also include innovative applications of soft x–ray lasers based on techniques and diagnostics relevant to topical domains such as EUV lithography, inertial confinement fusion, or warm dense matter physics.
Author : Yen-Min Lee
Publisher :
ISBN 13 : 9780750326520
Total Pages : 0 pages
Book Rating : 4.3/5 (265 download)
Download or read book Efficient Extreme Ultraviolet Mirror Design written by Yen-Min Lee and published by . This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method.
Author : Qiushi Huang
Publisher : Frontiers Media SA
ISBN 13 : 2832513182
Total Pages : 95 pages
Book Rating : 4.8/5 (325 download)
Download or read book High-precision EUV and X-ray Optics for Advanced Photon Source Facilities written by Qiushi Huang and published by Frontiers Media SA. This book was released on 2023-02-02 with total page 95 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 708 pages
Book Rating : 4.3/5 (91 download)
Download or read book Developments in X-ray Tomography written by and published by . This book was released on 2006 with total page 708 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Vivek Bakshi
Publisher : SPIE Press
ISBN 13 : 9780819458452
Total Pages : 1104 pages
Book Rating : 4.4/5 (584 download)
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author : Society of Photo-optical Instrumentation Engineers
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 282 pages
Book Rating : 4.3/5 (91 download)
Download or read book Materials, Manufacturing, and Measurement for Synchrotron Radiation Mirrors written by Society of Photo-optical Instrumentation Engineers and published by SPIE-International Society for Optical Engineering. This book was released on 1997 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 424 pages
Book Rating : 4.6/5 (937 download)
Download or read book Journal de physique written by and published by . This book was released on 2005 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Vivek Bakshi
Publisher : SPIE Press
ISBN 13 : 0819469645
Total Pages : 704 pages
Book Rating : 4.8/5 (194 download)
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
