Read Books Online and Download eBooks, EPub, PDF, Mobi, Kindle, Text Full Free.
Download Advances In Metrology For X Ray And Euv Optics Viii full books in PDF, epub, and Kindle. Read online Advances In Metrology For X Ray And Euv Optics Viii ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Author :
Publisher :
ISBN 13 :
Total Pages : 192 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advances in Metrology for X-ray and EUV Optics written by and published by . This book was released on 2005 with total page 192 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Alexei Erko
Publisher : Springer Science & Business Media
ISBN 13 : 3540745602
Total Pages : 540 pages
Book Rating : 4.5/5 (47 download)
Download or read book Modern Developments in X-Ray and Neutron Optics written by Alexei Erko and published by Springer Science & Business Media. This book was released on 2008-04-14 with total page 540 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume describes modern developments in reflective, refractive and diffractive optics for short wavelength radiation. It also covers recent theoretical approaches to modelling and ray-tracing the x-ray and neutron optical systems. It is based on the joint research activities of specialists in x-ray and neutron optics, working together under the framework of the European Programme for Cooperation in Science and Technology (COST, Action P7) in the period 2002-2006.
Author :
Publisher :
ISBN 13 :
Total Pages : 406 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advances in X-ray/EUV Optics, Components, and Applications written by and published by . This book was released on 2006 with total page 406 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Qiushi Huang
Publisher : Frontiers Media SA
ISBN 13 : 2832513182
Total Pages : 95 pages
Book Rating : 4.8/5 (325 download)
Download or read book High-precision EUV and X-ray Optics for Advanced Photon Source Facilities written by Qiushi Huang and published by Frontiers Media SA. This book was released on 2023-02-02 with total page 95 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Vivek Bakshi
Publisher : SPIE Press
ISBN 13 : 9780819458452
Total Pages : 1104 pages
Book Rating : 4.4/5 (584 download)
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author : Vivek Bakshi
Publisher : SPIE Press
ISBN 13 : 0819469645
Total Pages : 704 pages
Book Rating : 4.8/5 (194 download)
Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author : Federico Canova
Publisher : Springer
ISBN 13 : 3662474433
Total Pages : 205 pages
Book Rating : 4.6/5 (624 download)
Download or read book Optical Technologies for Extreme-Ultraviolet and Soft X-ray Coherent Sources written by Federico Canova and published by Springer. This book was released on 2015-08-17 with total page 205 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1351643444
Total Pages : 913 pages
Book Rating : 4.3/5 (516 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author : Sergey Yurish
Publisher : Lulu.com
ISBN 13 : 8469794353
Total Pages : 484 pages
Book Rating : 4.4/5 (697 download)
Download or read book Advances in Optics, Vol. 1 written by Sergey Yurish and published by Lulu.com. This book was released on 2018-04-22 with total page 484 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Vol.1 devoted to various topics of optics and optic instrumentation, and contains 17 chapters written by 36 experts in the field from 15 countries: Brazil, China, Denmark, France, Germany, India, Japan, Mexico, Russia, Turkey, Slovenia, South Korea, UK, Ukraine and USA. 'Advances in Optics: Reviews' Book Series is a comprehensive study of the field of optics, which provides readers with the most up-to-date coverage of optics, photonics and lasers with a good balance of practical and theoretical aspects. Directed towards both physicists and engineers this Book Series is also suitable for audiences focusing on applications of optics. A clear comprehensive presentation makes these books work well as both a teaching resources and a reference books. The book is intended for researchers and scientists in physics and optics, in academia and industry, as well as postgraduate students.
Author : D. Keith Bowen
Publisher : CRC Press
ISBN 13 : 1420005650
Total Pages : 296 pages
Book Rating : 4.4/5 (2 download)
Download or read book X-Ray Metrology in Semiconductor Manufacturing written by D. Keith Bowen and published by CRC Press. This book was released on 2018-10-03 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.
Author : Uhlig, David
Publisher : KIT Scientific Publishing
ISBN 13 : 3731513064
Total Pages : 284 pages
Book Rating : 4.7/5 (315 download)
Download or read book Light Field Imaging for Deflectometry written by Uhlig, David and published by KIT Scientific Publishing. This book was released on 2023-07-14 with total page 284 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical measurement methods are becoming increasingly important for high-precision production of components and quality assurance. The increasing demand can be met by modern imaging systems with advanced optics, such as light field cameras. This work explores their use in the deflectometric measurement of specular surfaces. It presents improvements in phase unwrapping and calibration techniques, enabling high surface reconstruction accuracies using only a single monocular light field camera.
Author : Klaus D. Sattler
Publisher : CRC Press
ISBN 13 : 1466505109
Total Pages : 754 pages
Book Rating : 4.4/5 (665 download)
Download or read book Fundamentals of Picoscience written by Klaus D. Sattler and published by CRC Press. This book was released on 2013-09-26 with total page 754 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ushering in the next technological era, this state-of-the-art book focuses on the instrumentation and experiments emerging at the picometer scale. International scientists and researchers at the forefront of the field address the key challenges in developing new instrumentation and techniques to visualize and measure structures at this sub-nanometer level. The book helps you understand how picoscience is an extension of nanoscience, determine which experimental technique to use in your research, and connect basic studies to the development of next-generation picoelectronic devices.
Author : Tim Salditt
Publisher : Springer Nature
ISBN 13 : 3030344134
Total Pages : 634 pages
Book Rating : 4.0/5 (33 download)
Download or read book Nanoscale Photonic Imaging written by Tim Salditt and published by Springer Nature. This book was released on 2020-06-09 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt: This open access book, edited and authored by a team of world-leading researchers, provides a broad overview of advanced photonic methods for nanoscale visualization, as well as describing a range of fascinating in-depth studies. Introductory chapters cover the most relevant physics and basic methods that young researchers need to master in order to work effectively in the field of nanoscale photonic imaging, from physical first principles, to instrumentation, to mathematical foundations of imaging and data analysis. Subsequent chapters demonstrate how these cutting edge methods are applied to a variety of systems, including complex fluids and biomolecular systems, for visualizing their structure and dynamics, in space and on timescales extending over many orders of magnitude down to the femtosecond range. Progress in nanoscale photonic imaging in Göttingen has been the sum total of more than a decade of work by a wide range of scientists and mathematicians across disciplines, working together in a vibrant collaboration of a kind rarely matched. This volume presents the highlights of their research achievements and serves as a record of the unique and remarkable constellation of contributors, as well as looking ahead at the future prospects in this field. It will serve not only as a useful reference for experienced researchers but also as a valuable point of entry for newcomers.
Author : Sergey Y. Yurish Editor
Publisher : Lulu.com
ISBN 13 : 0244423288
Total Pages : 484 pages
Book Rating : 4.2/5 (444 download)
Download or read book Advances in Optics Reviews 1 written by Sergey Y. Yurish Editor and published by Lulu.com. This book was released on 2018-10-17 with total page 484 pages. Available in PDF, EPUB and Kindle. Book excerpt: ÔAdvances in Optics: ReviewsÕ Book Series is a comprehensive study of the field of optics, which provides readers with the most up-to-date coverage of optics, photonics and lasers with a good balance of practical and theoretical aspects. Directed towards both physicists and engineers this Book Series is also suitable for audiences focusing on applications of optics. A clear comprehensive presentation makes these books work well as both a teaching resources and a reference books. The book is intended for researchers and scientists in physics and optics, in academia and industry, as well as postgraduate students. The Vol.1 is devoted to various topics of optics and optic instrumentation, and contains 17 chapters written by 36 experts in the field from 15 countries: Brazil, China, Denmark, France, Germany, India, Japan, Mexico, Russia, Turkey, Slovenia, South Korea, UK, Ukraine and USA.
Author : Andreas Erdmann
Publisher :
ISBN 13 : 9781510639010
Total Pages : pages
Book Rating : 4.6/5 (39 download)
Download or read book Optical and EUV Lithography written by Andreas Erdmann and published by . This book was released on 2021-02 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Institute of Standards and Technology (U.S.)
Publisher :
ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.3/5 (91 download)
Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Semiconductor Metrology Program (U.S.)
Publisher :
ISBN 13 :
Total Pages : 148 pages
Book Rating : 4.3/5 ( download)
Download or read book National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and published by . This book was released on 1999 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
