Ion Implantation

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Publisher : BoD – Books on Demand
ISBN 13 : 9535132377
Total Pages : 154 pages
Book Rating : 4.5/5 (351 download)

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Book Synopsis Ion Implantation by : Ishaq Ahmad

Download or read book Ion Implantation written by Ishaq Ahmad and published by BoD – Books on Demand. This book was released on 2017-06-14 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation is one of the promising areas of sciences and technologies. It has been observed as a continuously evolving technology. In this book, there is a detailed overview of the recent ion implantation research and innovation along with the existing ion implantation technological issues especially in microelectronics. The book also reviews the basic knowledge of the radiation-induced defects production during the ion implantation in case of a semiconductor structure for fabrication and development of the required perfect microelectronic devices. The improvement of the biocompatibility of biomaterials by ion implantation, which is a hot research topic, has been summarized in the book as well. Moreover, advanced materials characterization techniques are also covered in this book to evaluate the ion implantation impact on the materials.

Advanced Applications of Ion Implantation

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Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (89 download)

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Book Synopsis Advanced Applications of Ion Implantation by :

Download or read book Advanced Applications of Ion Implantation written by and published by . This book was released on 1985 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Advanced Applications of Ion Implantation

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Publisher :
ISBN 13 :
Total Pages : 280 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Advanced Applications of Ion Implantation by : Michael I. Current

Download or read book Advanced Applications of Ion Implantation written by Michael I. Current and published by . This book was released on 1985 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Ion Implantation

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Publisher : Nova Science Publishers
ISBN 13 : 9781536139631
Total Pages : 334 pages
Book Rating : 4.1/5 (396 download)

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Book Synopsis Ion Implantation by : A. D. Pogrebnjak

Download or read book Ion Implantation written by A. D. Pogrebnjak and published by Nova Science Publishers. This book was released on 2018-09 with total page 334 pages. Available in PDF, EPUB and Kindle. Book excerpt: "New results in the field of ion implantation from the experienced scientists from different countries are presented in this book. Influence of ion implantation on structure and properties of semi-conducting materials, instrumental steels and alloys, nanocomposite coatings, including multielement ones, titanium alloys with the shape memory effect and super-elasticity are discussed in detail within this book. New data on novel applications of ion implantation for the modification and testing (radiation hardness simulation) of memristive devices, as well as application of ion implantation of group V dopants in the MCT epilayer are presented in this book. Potential use of ion implantation for the synthesis of Ag nanoparticles in a thin Si layer for the development of thin-film solar cells fabrication technology is discussed. The effect of ion implantation on the physical and mechanical properties of the hard alloy plates based on tungsten carbide and a cobalt binder is described. A study of the effects of ion implantation on the phase composition and the structure of materials is presented. The role of defects in the formation of the phase composition of the ion-implanted materials, structural-phase transformations in metals after ion implantation is investigated. This book will be interesting for professionals in the study of solid state physics, nuclear physics, physics of semi-conductors and nanomaterials. It can also be useful for masters and PhD students, as well as for professionals researching the fabrication and investigation of protective materials with enhanced physical-mechanical and tribological properties, good biocompatibility and resistance to irradiation"--

Ion Implantation Technology - 94

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Publisher : Newnes
ISBN 13 : 044459972X
Total Pages : 1031 pages
Book Rating : 4.4/5 (445 download)

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Book Synopsis Ion Implantation Technology - 94 by : S. Coffa

Download or read book Ion Implantation Technology - 94 written by S. Coffa and published by Newnes. This book was released on 1995-05-16 with total page 1031 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters. The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.

Ion Implantation

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Publisher : BoD – Books on Demand
ISBN 13 : 9535106341
Total Pages : 452 pages
Book Rating : 4.5/5 (351 download)

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Book Synopsis Ion Implantation by : Mark Goorsky

Download or read book Ion Implantation written by Mark Goorsky and published by BoD – Books on Demand. This book was released on 2012-05-30 with total page 452 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.

Ion Beam Applications

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Publisher : BoD – Books on Demand
ISBN 13 : 178923414X
Total Pages : 190 pages
Book Rating : 4.7/5 (892 download)

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Book Synopsis Ion Beam Applications by : Ishaq Ahmad

Download or read book Ion Beam Applications written by Ishaq Ahmad and published by BoD – Books on Demand. This book was released on 2018-07-18 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion beam of various energies is a standard research tool in many areas of science, from basic physics to diverse areas in space science and technology, device fabrications, materials science, environment science, and medical sciences. It is an advance and versatile tool to frequently discover applications across a broad range of disciplines and fields. Moreover, scientists are continuously improving the ion beam sources and accelerators to explore ion beam at the forefront of scientific endeavours. This book provides a glance view on MeV ion beam applications, focused ion beam generation and its applications as well as practical applications of ion implantation.

Ion Implantation in Semiconductors

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Publisher : Springer Science & Business Media
ISBN 13 : 1468421514
Total Pages : 716 pages
Book Rating : 4.4/5 (684 download)

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Book Synopsis Ion Implantation in Semiconductors by : Susumu Namba

Download or read book Ion Implantation in Semiconductors written by Susumu Namba and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt: The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third conference, which convened at Yorktown Heights, New York in 1973, the emphasis was broadened to include metals and insulators as well as semiconductors. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974. A huge number of papers had been submitted to this conference. All papers which were presented at the Fourth International Conference on Ion Implantation in Semiconductors and Other Materials are included in this proceedings. The success of this conference was due to technical presentations and discussions of 224 participants from 14 countries as well as to financial support from many companies in Japan. On behalf of the committee, I wish to thank the authors for their excellent papers and the sponsors for their financial support. The International Committee responsible for advising this conference consisted of B.L. Crowder, J.A. Davies, G. Dearna1ey, F.H. Eisen, Ph. G1otin, T. Itoh, A.U. MacRae, J.W. Mayer, S. Namba, I. Ruge, and F.L. Vook.

Single-Atom Nanoelectronics

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Publisher : CRC Press
ISBN 13 : 9814316695
Total Pages : 374 pages
Book Rating : 4.8/5 (143 download)

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Book Synopsis Single-Atom Nanoelectronics by : Enrico Prati

Download or read book Single-Atom Nanoelectronics written by Enrico Prati and published by CRC Press. This book was released on 2016-04-19 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt: Single-Atom Nanoelectronics covers the fabrication of single-atom devices and related technology, as well as the relevant electronic equipment and the intriguing new phenomena related to single-atom and single-electron effects in quantum devices. It also covers the alternative approaches related to both silicon- and carbon-based technologies, also

Advances in Silicon Carbide Processing and Applications

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Publisher : Artech House
ISBN 13 : 9781580537414
Total Pages : 236 pages
Book Rating : 4.5/5 (374 download)

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Book Synopsis Advances in Silicon Carbide Processing and Applications by : Stephen E. Saddow

Download or read book Advances in Silicon Carbide Processing and Applications written by Stephen E. Saddow and published by Artech House. This book was released on 2004 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt: Learn the latest advances in SiC (Silicon Carbide) technology from the leading experts in the field with this new cutting-edge resource. The book is your single source for in-depth information on both SiC device fabrication and system-level applications. This comprehensive reference begins with an examination of how SiC is grown and how defects in SiC growth can affect working devices. Key issues in selective doping of SiC via ion implantation are covered with special focus on implant conditions and electrical activation of implants. SiC applications discussed include chemical sensors, motor-control components, high-temperature gas sensors, and high-temperature electronics. By cutting through the arcane data and jargon surrounding the hype on SiC, this book gives an honest assessment of today's SiC technology and shows you how SiC can be adopted in developing tomorrow's applications.

Ion Implantation Techniques

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Publisher : Springer
ISBN 13 :
Total Pages : 400 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Ion Implantation Techniques by : H. Ryssel

Download or read book Ion Implantation Techniques written by H. Ryssel and published by Springer. This book was released on 1982-09 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech­ niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech­ niques, held at Queen's University,' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan­ tation conference for the first time. This implantation school concentra­ ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con­ trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap­ ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec­ tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.

Ion Implantation - Research and Application

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Publisher :
ISBN 13 : 9789535132387
Total Pages : pages
Book Rating : 4.1/5 (323 download)

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Book Synopsis Ion Implantation - Research and Application by :

Download or read book Ion Implantation - Research and Application written by and published by . This book was released on 19?? with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Ion Beam Treatment of Polymers

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Publisher : Elsevier
ISBN 13 : 0080556744
Total Pages : 327 pages
Book Rating : 4.0/5 (85 download)

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Book Synopsis Ion Beam Treatment of Polymers by : Alexey Kondyurin

Download or read book Ion Beam Treatment of Polymers written by Alexey Kondyurin and published by Elsevier. This book was released on 2010-07-07 with total page 327 pages. Available in PDF, EPUB and Kindle. Book excerpt: Polymer materials are used in different fields of industries, from microelectronice to medicine. Ion beam implantation is method of surface modification when surface properties must be significantly changed and bulk properties of material must be saved. Ion Beam Treatment of Polymers contains results of polymer investigations and techniques development in the field of polymer modification by high energy ion beams. This book is intended for specialists in polymer science who have interest to use an ion beam treatment for improvement of polymer properties, for specialists in physics who search a new application of ion beam and plasma equipment and also for students who look for future fields of high technology. Chapter 1-3 are devoted to overview of the basic processes at high energy ion penetration into solid target. The historical aspects and main physical aspects are covered. A basic equipment principles and main producers of equipment for ion beam treatment are considered. Chapter 4 contains chemical transformations in polymers during and after high energy ion penetration. The modern methods and results of experimental and theoretical investigation are described. Chapters 5-10 are devoted to properties of polymers after ion beam treatment, regimes of treatment, available applications, in particular: increase of adhesion of polymers and a mechanism of an adhesion increase, wetting angle of polymer by water and its stability, adhesion of cells on polymer surface, drug release regulation from polymer coating and others. Chapter 11 contains our last results on polymerisation processes in liquid oligomer composition under high vacuum, plasma and ion beam conditions as simulation of free space environment. * By scientists working in polymer chemistry, physics of ion beam implantation and in development and production of ion beam equipment * Covering industrial and scientific applications of ion beam implanted polymers * Also for students with an interest in future fields of high technology

Ion Implantation Science and Technology

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Publisher : Elsevier
ISBN 13 : 0323144012
Total Pages : 649 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Ion Implantation Science and Technology by : J.F. Ziegler

Download or read book Ion Implantation Science and Technology written by J.F. Ziegler and published by Elsevier. This book was released on 2012-12-02 with total page 649 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.

Ion Beams

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Publisher :
ISBN 13 :
Total Pages : 520 pages
Book Rating : 4.0/5 ( download)

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Book Synopsis Ion Beams by : Robert G. Wilson

Download or read book Ion Beams written by Robert G. Wilson and published by . This book was released on 1979 with total page 520 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Ion Implantation in Semiconductors

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Publisher : Springer Science & Business Media
ISBN 13 : 3642806600
Total Pages : 519 pages
Book Rating : 4.6/5 (428 download)

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Book Synopsis Ion Implantation in Semiconductors by : Ingolf Ruge

Download or read book Ion Implantation in Semiconductors written by Ingolf Ruge and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 519 pages. Available in PDF, EPUB and Kindle. Book excerpt: In recent years great progress has been made in the field of ion implantation, particularly with respect to applications in semiconductors. It would be impos sible not to note the growing interest in this field, both by research groups and those directly concerned with production of devices. Furthermore, as several papers have pointed out, ion implantation and its associated technologies promise exciting advances in the development of new kinds of devices and provide power ful new tools for materials investigations. It was, therefore, appropriate to arrange the II. International Conference on Ion Implantation in Semiconductors within the rather short time of one year since the first conference was held in 1970 in Thousand Oaks, California. Although ori ginally planned on a small scale with a very limited number of participants, more than two hundred scientists from 15 countries participated in the Conference which was held May 24 - 28, 1971 at the Congress Center in Garmisch-Partenkirchen. This volume contains the papers that were presented at the Conference. Due to the tremendous volume of research presented, publication here of all the works in full detail was not possible. Many authors therefore graciously agreed to submit abbreviated versions of their papers.

Ion Implantation Technology - 92

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Author :
Publisher : Elsevier
ISBN 13 : 0444599800
Total Pages : 716 pages
Book Rating : 4.4/5 (445 download)

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Book Synopsis Ion Implantation Technology - 92 by : D.F. Downey

Download or read book Ion Implantation Technology - 92 written by D.F. Downey and published by Elsevier. This book was released on 2012-12-02 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models.