Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567

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Publisher :
ISBN 13 :
Total Pages : 650 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567 by : H. R. Huff

Download or read book Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567 written by H. R. Huff and published by . This book was released on 1999-09 with total page 650 pages. Available in PDF, EPUB and Kindle. Book excerpt: Device scaling has been the engine driving the continued pervasiveness of the microelectronics revolution. The SIA roadmap calls for 4-5nm films (oxide equivalent thickness) in 2000, and

Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567

Download Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567 PDF Online Free

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Publisher :
ISBN 13 :
Total Pages : 650 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567 by : H. R. Huff

Download or read book Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567 written by H. R. Huff and published by . This book was released on 1999-09 with total page 650 pages. Available in PDF, EPUB and Kindle. Book excerpt: Device scaling has been the engine driving the continued pervasiveness of the microelectronics revolution. The SIA roadmap calls for 4-5nm films (oxide equivalent thickness) in 2000, and

High-k Gate Dielectrics for CMOS Technology

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Publisher : John Wiley & Sons
ISBN 13 : 3527646361
Total Pages : 560 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis High-k Gate Dielectrics for CMOS Technology by : Gang He

Download or read book High-k Gate Dielectrics for CMOS Technology written by Gang He and published by John Wiley & Sons. This book was released on 2012-08-10 with total page 560 pages. Available in PDF, EPUB and Kindle. Book excerpt: A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

Silicon Materials Science and Technology X

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Publisher : The Electrochemical Society
ISBN 13 : 156677439X
Total Pages : 599 pages
Book Rating : 4.5/5 (667 download)

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Book Synopsis Silicon Materials Science and Technology X by : Howard R. Huff

Download or read book Silicon Materials Science and Technology X written by Howard R. Huff and published by The Electrochemical Society. This book was released on 2006 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: This was the tenth symposium of the International Symposium on Silcon Material Science and Technology, going back to 1969. This issue provides a unique historical record of the program and will aid in the understanding of silicon materials over the last 35 years.

Multifunctional Oxide Heterostructures

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Publisher : Oxford University Press
ISBN 13 : 0199584125
Total Pages : 429 pages
Book Rating : 4.1/5 (995 download)

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Book Synopsis Multifunctional Oxide Heterostructures by : Evgeny Y. Tsymbal

Download or read book Multifunctional Oxide Heterostructures written by Evgeny Y. Tsymbal and published by Oxford University Press. This book was released on 2012-08-30 with total page 429 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume explores the rapidly developing field of oxide thin-films and heterostructures, which exhibit unusual physical properties interesting from the fundamental point of view and for device application. The chapters discuss topics that represent some of the key innovations in the field over recent years.

ULSI Process Integration II

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Publisher : The Electrochemical Society
ISBN 13 : 9781566773089
Total Pages : 636 pages
Book Rating : 4.7/5 (73 download)

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Book Synopsis ULSI Process Integration II by : Cor L. Claeys

Download or read book ULSI Process Integration II written by Cor L. Claeys and published by The Electrochemical Society. This book was released on 2001 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt:

National Semiconductor Metrology Program

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Publisher :
ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.0/5 ( download)

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Book Synopsis National Semiconductor Metrology Program by : National Institute of Standards and Technology (U.S.)

Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: Volume 592

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Publisher : Mrs Proceedings
ISBN 13 :
Total Pages : 408 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: Volume 592 by : D. A. Buchanan

Download or read book Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: Volume 592 written by D. A. Buchanan and published by Mrs Proceedings. This book was released on 2000-10-17 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. The book, first published in 2000, includes detailed theoretical studies of the nature of SiO2 and its interface with silicon, electron paramagnetic resonance for the study of defects, electron tunneling, and band alignment among others.

Silicon Surfaces And Formation Of Interfaces: Basic Science In The Industrial World

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Publisher : World Scientific
ISBN 13 : 9814496820
Total Pages : 576 pages
Book Rating : 4.8/5 (144 download)

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Book Synopsis Silicon Surfaces And Formation Of Interfaces: Basic Science In The Industrial World by : Jarek Dabrowski

Download or read book Silicon Surfaces And Formation Of Interfaces: Basic Science In The Industrial World written by Jarek Dabrowski and published by World Scientific. This book was released on 2000-05-25 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon, the basic material for a multibillion-dollar industry, is the most widely researched and applied semiconductor, and its surfaces are the most thoroughly studied of all semiconductor surfaces. Silicon Surfaces and Formation of Interfaces may be used as an introduction to graduate-level physics and chemical physics. Moreover, it gives a specialized and comprehensive description of the most common faces of silicon crystals as well as their interaction with adsorbates and overlayers. This knowledge is presented in a systematic and easy-to-follow way. Discussion of each system is preceded by a brief overview which categorizes the features and physical mechanisms before the details are presented. The literature is easily available, and the references are numerous and organized in tables, allowing a search without the need to browse through the text.Though this volume focuses on a scientific understanding of physics on the atomistic and mesoscopic levels, it also highlights existing and potential links between basic research in surface science and applications in the silicon industry. It will be valuable to anyone writing a paper, thesis, or proposal in the field of silicon surfaces.

National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000

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Publisher :
ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000 by :

Download or read book National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000 written by and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Electroactive Polymers (EAP): Volume 600

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Publisher :
ISBN 13 :
Total Pages : 358 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Electroactive Polymers (EAP): Volume 600 by : Q. M. Zhang

Download or read book Electroactive Polymers (EAP): Volume 600 written by Q. M. Zhang and published by . This book was released on 2000-07-17 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Amorphous and Nanostructured Carbon: Volume 593

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Publisher :
ISBN 13 :
Total Pages : 600 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Amorphous and Nanostructured Carbon: Volume 593 by : J. P. Sullivan

Download or read book Amorphous and Nanostructured Carbon: Volume 593 written by J. P. Sullivan and published by . This book was released on 2000-07-05 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: There has been tremendous development in the science of carbon in past years. First came the development of the chemical vapor deposition of diamond, followed by the discovery of a new class of molecules - the fullerenes. Carbon nanotubes were discovered and techniques were developed to deposit new phases of amorphous carbon containing mainly sp3 bonding. This book brings together scientists and engineers from all areas of carbon research, both sp2 and sp3 bonded, from the fully amorphous to nanostructured carbon, to the highly ordered nanotubes. It covers a range of subjects including the synthesis and properties of nanotubes, as well as diamond-like carbon deposition and properties. Applications range from nanotubes for hydrogen storage, to electrochemical double-layer capacitors (supercapacitors), field emission displays, hard coatings, and carbon coatings for magnetic storage technology. The book deals with the growth, characterization, properties and applications of nanotubes and field emission from all varieties of carbon, amorphous and diamond-like carbon- growth, properties and applications. It also contains papers on diamond, silicon carbide, carbon nitride and beryllium films.

GaN and Related Alloys - 1999: Volume 595

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Publisher :
ISBN 13 :
Total Pages : 1070 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis GaN and Related Alloys - 1999: Volume 595 by : Thomas H. Myers

Download or read book GaN and Related Alloys - 1999: Volume 595 written by Thomas H. Myers and published by . This book was released on 2000-05-05 with total page 1070 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book on gallium nitride (GaN) and associated materials focuses on advances in basic science, as well as the rapidly maturing technologies involving blue/green light emitters, detectors and high-power electronics. A highlight is a report on wide-bandgap semiconductor research done in Europe. Also reported is the commercialization of a laser operating at 405nm wavelength with a 4000-hour device lifetime. At 450nm emission wavelength, significant reductions in lifetime were found, and are believed to arise from nonideal properties of the InGaN alloy used in the active layer of the device. Additional topics include: the significant success of transistors for microwave applications; improvements in the epitaxy of GaN, using both selective area growth techniques (lateral epitaxy overgrowth) and introducing low-temperature intralayers in the films; advances in both molecular beam epitaxy and metal-organic vapor phase epitaxy, including several studies of quantum dot formation in strained alloys and improvements in hydride vapor phase epitaxy, particularly for providing very thick films.

Optical Microstructural Characterization of Semiconductors: Volume 588

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Publisher : Mrs Proceedings
ISBN 13 :
Total Pages : 360 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Optical Microstructural Characterization of Semiconductors: Volume 588 by : M. Selim Ūnlū

Download or read book Optical Microstructural Characterization of Semiconductors: Volume 588 written by M. Selim Ūnlū and published by Mrs Proceedings. This book was released on 2000-04-17 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Interfacial Engineering for Optimized Properties II: Volume 586

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Publisher :
ISBN 13 :
Total Pages : 338 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Interfacial Engineering for Optimized Properties II: Volume 586 by : C. Barry Carter

Download or read book Interfacial Engineering for Optimized Properties II: Volume 586 written by C. Barry Carter and published by . This book was released on 2000-10-02 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2000, concentrates on the preparation and processing of interfaces, the relationships between chemistry and structure and the properties and behavior of interfaces, particularly in relation to strength and bonding.

Self-Organized Processes in Semiconductor Alloys: Volume 583

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Publisher : Mrs Proceedings
ISBN 13 :
Total Pages : 408 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Self-Organized Processes in Semiconductor Alloys: Volume 583 by : Angelo Mascarenhas

Download or read book Self-Organized Processes in Semiconductor Alloys: Volume 583 written by Angelo Mascarenhas and published by Mrs Proceedings. This book was released on 2000-08-03 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Scientific Basis for Nuclear Waste Management XXIII: Volume 608

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Publisher :
ISBN 13 :
Total Pages : 800 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Scientific Basis for Nuclear Waste Management XXIII: Volume 608 by : Robert W. Smith

Download or read book Scientific Basis for Nuclear Waste Management XXIII: Volume 608 written by Robert W. Smith and published by . This book was released on 2000-10-09 with total page 800 pages. Available in PDF, EPUB and Kindle. Book excerpt: This long-standing symposia series has become the premier, international forum for scientific and engineering issues related to all levels and types of radioactive wastes and their management. Topics include: fuel cladding and spent nuclear fuel; container fabrication and corrosion; performance assessment; repository performance; radionuclide sorption and transport; cement-based materials and waste containment; corrosion of ceramic wasteforms; structure and characterization of ceramics; radiation effects; natural analogs; wasteform characterization and processing; and corrosion and characterization of glass wasteforms.