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Author : Yougen Yang
Publisher :
ISBN 13 :
Total Pages : 434 pages
Book Rating : 4.:/5 (452 download)
Download or read book The Monte Carlo Simulation of Physical Vapor Deposition written by Yougen Yang and published by . This book was released on 2000 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 139 pages
Book Rating : 4.:/5 (429 download)
Download or read book Enabling the Direct Simulation (Monte Carlo) of Physical Vapor Deposition written by and published by . This book was released on 2008 with total page 139 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : John Samuel Dolaghan
Publisher :
ISBN 13 :
Total Pages : 232 pages
Book Rating : 4.:/5 (358 download)
Download or read book Monte Carlo Simulation in Rarefied Gas Dynamics with Application to Physical Vapor Deposition written by John Samuel Dolaghan and published by . This book was released on 1996 with total page 232 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (946 download)
Download or read book Monte Carlo Modeling of YBCO Vapor Deposition written by and published by . This book was released on 2000 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A three dimensional electron beam physical vapor deposition process of super-conducting films of YBa2Cu3O7-(sub delta) in a vacuum chamber is investigated both computationally and experimentally. The numerical analysis employs the direct simulation Monte Carlo (DSMC) method. Some important modeling issues such as atomic collision cross-sections for metal vapors and hyperfine electronic structure of the atomic absorption spectra are addressed. Film deposition thickness profiles and atomic absorption spectra given by the DSMC method and experiment for pure yttrium evaporation are in excellent agreement. Interaction between the vapor jets is found to have a significant effect on the film growth rate and species molar ratio that are key factors of the film technology.
Author :
Publisher :
ISBN 13 :
Total Pages : 7 pages
Book Rating : 4.:/5 (682 download)
Download or read book Monte Carlo Modeling of Thin Film Deposition written by and published by . This book was released on 2002 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this paper we discuss the use of atomistic Monte Carlo simulations to predict film microstructure evolution. We discuss physical vapor deposition, and are primarily concerned with films that are formed by the nucleation and coalescence of 3D islands. Multi-scale modeling is used in the sense that information obtained from molecular dynamics and first principles calculations provide atomic interaction energies, surface and grain boundary properties and diffusion rates for use in the Monte Carlo model. In this paper, we discuss some fundamental issues associated with thin film formation, together with an assessment of the sensitivity of the film morphology to the deposition conditions and materials properties.
Author : Robert Charles Buxton
Publisher :
ISBN 13 :
Total Pages : 450 pages
Book Rating : 4.:/5 (71 download)
Download or read book Direct Simulation Monte Carlo Modelling of Physical Vapour Deposition written by Robert Charles Buxton and published by . This book was released on 2005 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Martine Kalke
Publisher :
ISBN 13 :
Total Pages : 212 pages
Book Rating : 4.:/5 (57 download)
Download or read book Kinetic Monte Carlo Simulation of Chemical Vapor Deposition Growth of Thin Films written by Martine Kalke and published by . This book was released on 2002 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Fethi Khelfaoui
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (139 download)
Download or read book How to Use the Monte Carlo Simulation Technique? Application written by Fethi Khelfaoui and published by . This book was released on 2018 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many physical phenomena can be modeled using Monte Carlo simulation (MCS) because it is a powerful tool to study thermodynamic properties. MCS can be used to simulate interactions between several particles or bodies in the presence of local or external fields. The main idea is to create a high number of different random configurations; statistics can be taken according to appropriate algorithms (Metropolis algorithm). In this chapter, we present basic techniques of MCS as the choice of potential, reaction rates, simulation cell, random configurations, and algorithms. We present some principal ideas of MCS used to study particle-particle collisions in the gas and in plasmas. Other MCS techniques are presented briefly. A numerical application is presented for collisions in gas phase during thin film deposition by plasma-enhanced chemical vapor deposition (PECVD) processes. Parameters and results of the simulation are studied according to a chosen reactor and mixture.
Author : D. M. Mattox
Publisher : Cambridge University Press
ISBN 13 : 0080946585
Total Pages : 947 pages
Book Rating : 4.0/5 (89 download)
Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Author : Husain Ali Al-Mohssen
Publisher :
ISBN 13 :
Total Pages : 69 pages
Book Rating : 4.:/5 (546 download)
Download or read book Chemical Vapor Deposition Modeling Using Direct Simulation Monte Carlo with Non-linear Chemistry and Level Set Profile Evolution written by Husain Ali Al-Mohssen and published by . This book was released on 2003 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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Publisher : Academic Press
ISBN 13 : 008054293X
Total Pages : 268 pages
Book Rating : 4.0/5 (85 download)
Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference. Key Features: The first comprehensive volume on ionized physical vapor deposition Combines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVD Emphasizes practical applications in the area of IC fabrication and interconnect technology Serves as a guide to select the most appropriate technology for any deposition application *This single source saves time and effort by including comprehensive information at one's finger tips *The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD *The numerous practical applications assist the working engineer to select and refine thin film processes
Author : Timothy Marshall
Publisher :
ISBN 13 :
Total Pages : 44 pages
Book Rating : 4.:/5 (111 download)
Download or read book Kinetic Monte Carlo Simulation of Binary Alloys written by Timothy Marshall and published by . This book was released on 2018 with total page 44 pages. Available in PDF, EPUB and Kindle. Book excerpt: There are many tools to simulate physical phenomena. Generally, the simulation technique is defined by the size of the simulation area. Two well known techniques for simulating atom dynamics are kinetic Monte Carlo (kMC) and molecular dynamics (MD). In this work we simulate physical vapor deposition of binary metallic systems using the kMC technique. A sufficient quantity of atoms are deposited so that morphological features can be observed. Where kMC has fallen short we have used MD to supplement our results.
Author : Ramprasad Vijayagopal
Publisher : LAP Lambert Academic Publishing
ISBN 13 : 9783838369389
Total Pages : 104 pages
Book Rating : 4.3/5 (693 download)
Download or read book Flux Profile Modeling Using Monte Carlo Simulation written by Ramprasad Vijayagopal and published by LAP Lambert Academic Publishing. This book was released on 2010-06 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt: Molecular Beam Epitaxy (MBE) is a process by which semiconductor films are grown on the substrate by physical vapor deposition of the source material in an ultra high vacuum environment. Spatial variations in flux are a result of the shape of the crucible and the geometry of the growth chamber. A process simulation tool for MBE based on a phenomenological model is proposed and elaborated. The tool can be used in industry to simulate the effusion and deposition of molecular beams by taking into account different parameters that influence the process. Additionally, it can generate deposition profiles created by effusing flux species, on the platen containing the wafers.
Author : Pooneh Saidi Bidokhti
Publisher : BoD – Books on Demand
ISBN 13 : 1789855454
Total Pages : 189 pages
Book Rating : 4.7/5 (898 download)
Download or read book Theory, Application, and Implementation of Monte Carlo Method in Science and Technology written by Pooneh Saidi Bidokhti and published by BoD – Books on Demand. This book was released on 2019-12-18 with total page 189 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Monte Carlo method is a numerical technique to model the probability of all possible outcomes in a process that cannot easily be predicted due to the interference of random variables. It is a technique used to understand the impact of risk, uncertainty, and ambiguity in forecasting models. However, this technique is complicated by the amount of computer time required to achieve sufficient precision in the simulations and evaluate their accuracy. This book discusses the general principles of the Monte Carlo method with an emphasis on techniques to decrease simulation time and increase accuracy.
Author : Xuegeng Li
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (129 download)
Download or read book Kinetic Monte Carlo Simulation of Gas Phase Nucleation of Particles During Chemical Vapor Deposition of Silicon written by Xuegeng Li and published by . This book was released on 2002 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Phillip J. Stout
Publisher :
ISBN 13 :
Total Pages : 98 pages
Book Rating : 4.:/5 (258 download)
Download or read book A Monte Carlo Simulation of Surface Kinetics During Plasma Enhanced Chemical Vapor Deposition of Silicon Dioxide Using Tetraethoxysilane Chemistry written by Phillip J. Stout and published by . This book was released on 1991 with total page 98 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Corbett Chandler Battaile
Publisher :
ISBN 13 :
Total Pages : 372 pages
Book Rating : 4.3/5 (91 download)
Download or read book Atomic-scale Kinetic Monte Carlo Simulations of Diamond Chemical Vapor Deposition written by Corbett Chandler Battaile and published by . This book was released on 1998 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt:
