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Author : Sze-Ming Lee
Publisher :
ISBN 13 :
Total Pages : 332 pages
Book Rating : 4.E/5 ( download)
Download or read book The Design and Chemistry of Novel Imaging Materials for Microlithography written by Sze-Ming Lee and published by . This book was released on 1994 with total page 332 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 830 pages
Book Rating : 4.F/5 ( download)
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2001 with total page 830 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1351643444
Total Pages : 913 pages
Book Rating : 4.3/5 (516 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author :
Publisher :
ISBN 13 :
Total Pages : 592 pages
Book Rating : 4.:/5 (319 download)
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1992 with total page 592 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1420051539
Total Pages : 866 pages
Book Rating : 4.4/5 (2 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2018-10-03 with total page 866 pages. Available in PDF, EPUB and Kindle. Book excerpt: This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Author :
Publisher :
ISBN 13 :
Total Pages : 704 pages
Book Rating : 4.3/5 (91 download)
Download or read book American Doctoral Dissertations written by and published by . This book was released on 1993 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hatada
Publisher : CRC Press
ISBN 13 : 9780824794651
Total Pages : 900 pages
Book Rating : 4.7/5 (946 download)
Download or read book Macromolecular Design of Polymeric Materials written by Hatada and published by CRC Press. This book was released on 1997-01-02 with total page 900 pages. Available in PDF, EPUB and Kindle. Book excerpt: Providing a range of information on polymers and polymerization techniques, this text covers the gamut of polymer science from synthesis, structure and properties to function and applications. It analyzes speciality polymers, including acrylics, fluoropolymers, polysiplanes, polyphosphazenes, and inorganic and conducting polymers. The book examines the stereochemistry of polymerization and the stereoregularity of polymers.
Author :
Publisher :
ISBN 13 :
Total Pages : 684 pages
Book Rating : 4.3/5 (91 download)
Download or read book The Journal of Imaging Science and Technology written by and published by . This book was released on 1994 with total page 684 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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Publisher :
ISBN 13 :
Total Pages : 632 pages
Book Rating : 4.:/5 (4 download)
Download or read book Memoirs of the Scientific Sections of the Academy of the Socialist Republic of Romania written by and published by . This book was released on 1991 with total page 632 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hiroshi Ito
Publisher :
ISBN 13 :
Total Pages : 408 pages
Book Rating : 4.3/5 (91 download)
Download or read book Micro- and Nanopatterning Polymers written by Hiroshi Ito and published by . This book was released on 1998 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt: Papers from a September 1997 symposium held in Las Vegas, Nevada, report on the status, future directions, challenges, and opportunities in the area of polymeric materials for use in micro- and nano-scale patterning. Selections are arranged in parts on novel patterning chemistry and processing, microlithographic and advanced microlithographic chemistry and processing, and lithographic materials and processes. Subjects include modeling of polymeric microstructures, photoacid diffusion in chemically amplified DUV resists, calixarene resists for nanolithography, and photoacid generating polymers for surface modification resists. Annotation copyrighted by Book News, Inc., Portland, OR
Author : New York Public Library
Publisher :
ISBN 13 :
Total Pages : 552 pages
Book Rating : 4.F/5 ( download)
Download or read book New Technical Books written by New York Public Library and published by . This book was released on 1986 with total page 552 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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Publisher :
ISBN 13 :
Total Pages : 1032 pages
Book Rating : 4.E/5 ( download)
Download or read book Fotoporimā Konwakai Shi written by and published by . This book was released on 2007 with total page 1032 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Jacques Lalevée
Publisher : Royal Society of Chemistry
ISBN 13 : 1788013301
Total Pages : 606 pages
Book Rating : 4.7/5 (88 download)
Download or read book Photopolymerisation Initiating Systems written by Jacques Lalevée and published by Royal Society of Chemistry. This book was released on 2018-08-10 with total page 606 pages. Available in PDF, EPUB and Kindle. Book excerpt: An update on the latest developments in the research of photoinitiating systems along with their applications.
Author : Marc J. Madou
Publisher : CRC Press
ISBN 13 : 1482274000
Total Pages : 764 pages
Book Rating : 4.4/5 (822 download)
Download or read book Fundamentals of Microfabrication written by Marc J. Madou and published by CRC Press. This book was released on 2018-10-08 with total page 764 pages. Available in PDF, EPUB and Kindle. Book excerpt: MEMS technology and applications have grown at a tremendous pace, while structural dimensions have grown smaller and smaller, reaching down even to the molecular level. With this movement have come new types of applications and rapid advances in the technologies and techniques needed to fabricate the increasingly miniature devices that are literally changing our world. A bestseller in its first edition, Fundamentals of Microfabrication, Second Edition reflects the many developments in methods, materials, and applications that have emerged recently. Renowned author Marc Madou has added exercise sets to each chapter, thus answering the need for a textbook in this field. Fundamentals of Microfabrication, Second Edition offers unique, in-depth coverage of the science of miniaturization, its methods, and materials. From the fundamentals of lithography through bonding and packaging to quantum structures and molecular engineering, it provides the background, tools, and directions you need to confidently choose fabrication methods and materials for a particular miniaturization problem. New in the Second Edition Revised chapters that reflect the many recent advances in the field Updated and enhanced discussions of topics including DNA arrays, microfluidics, micromolding techniques, and nanotechnology In-depth coverage of bio-MEMs, RF-MEMs, high-temperature, and optical MEMs. Many more links to the Web Problem sets in each chapter
Author :
Publisher : Springer Science & Business Media
ISBN 13 : 9783540218623
Total Pages : 296 pages
Book Rating : 4.2/5 (186 download)
Download or read book Microlithography/Molecular Imprinting written by and published by Springer Science & Business Media. This book was released on 2005-02-18 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: 1. J.D. Marty, M. Mauzac: Molecular Imprinting: State of the Art and Perspectives.- 2. H. Ito: Chemical Amplification Resists for Microlithography
Author :
Publisher : Elsevier
ISBN 13 : 0081003587
Total Pages : 636 pages
Book Rating : 4.0/5 (81 download)
Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author : M Feldman
Publisher : Woodhead Publishing
ISBN 13 : 0857098756
Total Pages : 599 pages
Book Rating : 4.8/5 (57 download)
Download or read book Nanolithography written by M Feldman and published by Woodhead Publishing. This book was released on 2014-02-13 with total page 599 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, "What comes next? and "How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
