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Surface Diffusion Knetics On Amorphous Silicon
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Book Synopsis Plasma Deposition of Amorphous Silicon-Based Materials by : Pio Capezzuto
Download or read book Plasma Deposition of Amorphous Silicon-Based Materials written by Pio Capezzuto and published by Elsevier. This book was released on 1995-10-10 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Book Synopsis Dispersive Kinetics by : Andrzej Plonka
Download or read book Dispersive Kinetics written by Andrzej Plonka and published by Springer Science & Business Media. This book was released on 2013-04-17 with total page 238 pages. Available in PDF, EPUB and Kindle. Book excerpt: Dynamical processes in which many timescales coexist are called dispersive. The rate coefficients for dispersive processes depend on time. In the case of a chemical reaction, the time dependence of the rate coefficient, k(t), termed the specific reaction rate, is rationalized in the following way. Reactions by their very nature have to disturb reactivity distributions of the reactants in condensed media, as the more reactive species are the first ones to disappear from the system. The extent of this disturbance depends on the ratio of the rates of reactions to the rate of internal rearrangements (mixing) in the system restoring the initial distribution in reactivity of reactants. If the rates of chemical reactions exceed the rates of internal rearrangements, then the initial distributions in reactant reactivity are not preserved during the course of reactions and the specific reaction rates depend on time. Otherwise the extent of disturbance is negligible and classical kinetics, with a constant specific reaction rate, k, termed the reaction rate constant, may be valid as an approximation. In condensed media dispersive dynamical processes are endemic and this is the first monograph devoted to these processes.
Download or read book Diffusion and Defect Data written by and published by . This book was released on 2002 with total page 962 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book CVD XV written by Mark Donald Allendorf and published by The Electrochemical Society. This book was released on 2000 with total page 826 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis C, H, N and O in Si and Characterization and Simulation of Materials and Processes by : A. Borghesi
Download or read book C, H, N and O in Si and Characterization and Simulation of Materials and Processes written by A. Borghesi and published by Newnes. This book was released on 2012-12-02 with total page 580 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
Book Synopsis Handbook of Surfaces and Interfaces of Materials, Five-Volume Set by : Hari Singh Nalwa
Download or read book Handbook of Surfaces and Interfaces of Materials, Five-Volume Set written by Hari Singh Nalwa and published by Elsevier. This book was released on 2001-10-26 with total page 1915 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook brings together, under a single cover, all aspects of the chemistry, physics, and engineering of surfaces and interfaces of materials currently studied in academic and industrial research. It covers different experimental and theoretical aspects of surfaces and interfaces, their physical properties, and spectroscopic techniques that have been applied to a wide class of inorganic, organic, polymer, and biological materials. The diversified technological areas of surface science reflect the explosion of scientific information on surfaces and interfaces of materials and their spectroscopic characterization. The large volume of experimental data on chemistry, physics, and engineering aspects of materials surfaces and interfaces remains scattered in so many different periodicals, therefore this handbook compilation is needed.The information presented in this multivolume reference draws on two decades of pioneering research on the surfaces and interfaces of materials to offer a complete perspective on the topic. These five volumes-Surface and Interface Phenomena; Surface Characterization and Properties; Nanostructures, Micelles, and Colloids; Thin Films and Layers; Biointerfaces and Applications-provide multidisciplinary review chapters and summarize the current status of the field covering important scientific and technological developments made over past decades in surfaces and interfaces of materials and spectroscopic techniques with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source long due for the scientific community. The complete reference on the topic of surfaces and interfaces of materialsThe information presented in this multivolume reference draws on two decades of pioneering researchProvides multidisciplinary review chapters and summarizes the current status of the fieldCovers important scientific and technological developments made over past decades in surfaces and interfaces of materials and spectroscopic techniquesContributions from internationally recognized experts from all over the world
Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 852 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Amorphous Silicon Technology written by and published by . This book was released on 1996 with total page 946 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 836 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Solar Energy Update written by and published by . This book was released on 1984 with total page 884 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Advanced Silicon Materials for Photovoltaic Applications by : Sergio Pizzini
Download or read book Advanced Silicon Materials for Photovoltaic Applications written by Sergio Pizzini and published by John Wiley & Sons. This book was released on 2012-06-07 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt: Today, the silicon feedstock for photovoltaic cells comes from processes which were originally developed for the microelectronic industry. It covers almost 90% of the photovoltaic market, with mass production volume at least one order of magnitude larger than those devoted to microelectronics. However, it is hard to imagine that this kind of feedstock (extremely pure but heavily penalized by its high energy cost) could remain the only source of silicon for a photovoltaic market which is in continuous expansion, and which has a cumulative growth rate in excess of 30% in the last few years. Even though reports suggest that the silicon share will slowly decrease in the next twenty years, finding a way to manufacture a specific solar grade feedstock in large quantities, at a low cost while maintaining the quality needed, still remains a crucial issue. Thin film and quantum confinement-based silicon cells might be a complementary solution. Advanced Silicon Materials for Photovoltaic Applications has been designed to describe the full potentialities of silicon as a multipurpose material and covers: Physical, chemical and structural properties of silicon Production routes including the promise of low cost feedstock for PV applications Defect engineering and the role of impurities and defects Characterization techniques, and advanced analytical techniques for metallic and non-metallic impurities Thin film silicon and thin film solar cells Innovative quantum effects, and 3rd generation solar cells With contributions from internationally recognized authorities, this book gives a comprehensive analysis of the state-of-the-art of process technologies and material properties, essential for anyone interested in the application and development of photovoltaics.
Download or read book ERDA Energy Research Abstracts written by and published by . This book was released on 1985 with total page 676 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Abstracts written by and published by . This book was released on 1926 with total page 1816 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :Electrochemical Society. Energy Technology Division Publisher :The Electrochemical Society ISBN 13 :9781566773164 Total Pages :444 pages Book Rating :4.7/5 (731 download)
Book Synopsis Photovoltaics for the 21st Century II by : Electrochemical Society. Energy Technology Division
Download or read book Photovoltaics for the 21st Century II written by Electrochemical Society. Energy Technology Division and published by The Electrochemical Society. This book was released on 2001 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Presentations of the 'Symposium on Photovoltaics for the 21st Century II' ... part of the 199th Meeting of the Electrochemical Society held in Washington, D.C. in March 2001"--Pref.
Book Synopsis Passivity of Metals and Semiconductors by : Michel Froment
Download or read book Passivity of Metals and Semiconductors written by Michel Froment and published by Elsevier. This book was released on 2013-09-03 with total page 784 pages. Available in PDF, EPUB and Kindle. Book excerpt: Passivity of Metals and Semiconductors covers the proceedings of the Fifth International Symposium on Passivity, held in Bombannes, France on May30 - June3, 1983. The said symposium is concerned with passivity of metallic materials, localized corrosion, experimental techniques, and classical techniques such as optical techniques and electron spectroscopy. The book is divided into five sections. Section I deals with the concepts involved in the composition-transport phenomena and covers topics such as the transport of oxygen and water in oxide layers; the kinetics of oxidation of silicon; and the oxidation rate laws of metals that form nonstoichiometric oxides. Section II covers related techniques and their specific applications such as study of passivity of iron by in situ methods; optical methods in the study of passive films; and the analysis of multiple layer surface films by modulated reflection spectroscopy. Section III tackles amorphous metals - their passivity, their depassivation and repassivation in localized corrosion, and a comparison of models for localized breakdown of passivity. Part IV discusses the photoelectrochemistry of semiconductors; Part V tackles passivation and localized corrosion of stainless steels. The text is recommended for organic chemists, metallurgists, and engineers who would like to know more about the passivity of metals and their applications in different fields.
Book Synopsis Cluster Beam Synthesis of Nanostructured Materials by : Paolo Milani
Download or read book Cluster Beam Synthesis of Nanostructured Materials written by Paolo Milani and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 195 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book supplies a systematic description of the preparation, characterization, and manipulation of cluster beams for the synthesis of nanocrystalline materials. It addresses all issues relevant to the realization of nanophase structures, providing an excellent introduction for scientists working in different fields. Particular emphasis is placed on using the technique for nanostructured materials and on explaining the role of cluster beams within the context of other experimental techniques in surface-science.
Book Synopsis Nano- and mesoscale morphology evolution of metal films on weakly-interacting surfaces by : Bo Lü
Download or read book Nano- and mesoscale morphology evolution of metal films on weakly-interacting surfaces written by Bo Lü and published by Linköping University Electronic Press. This book was released on 2018-01-11 with total page 82 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin films are structures consisting of one or several nanoscale atomic layers of material that are used to either functionalize a surface or constitute components in more complex devices. Many properties of a film are closely related to its microstructure, which allows films to be tailored to meet specific technological requirements. Atom-by-atom film growth from the vapor phase involves a multitude of atomic processes that may not be easily studied experimentally in real-time because they occur in small length- (? Å) and timescales (? ns). Therefore, different types of computer simulation methods have been developed in order to test theoretical models of thin film growth and unravel what experiments cannot show. In order to compare simulated and experimental results, the simulations must be able to model events on experimental time-scales, i.e. on the order of microseconds to seconds. This is achievable with the kinetic Monte Carlo (kMC) method. In this work, the initial growth stages of metal deposition on weakly-interacting substrates is studied using both kMC simulations as well as experiments whereby growth was monitored using in situ probes. Such film/substrate material combinations are widely encountered in technological applications including low-emissivity window coatings to parts of microelectronics components. In the first part of this work, a kMC algorithm was developed to model the growth processes of island nucleation, growth and coalescence when these are functions of deposition parameters such as the vapor deposition rate and substrate temperature. The dynamic interplay between these growth processes was studied in terms of the scaling behavior of the film thickness at the elongation transition, for both continuous and pulsed deposition fluxes, and revealed in both cases two distinct growth regimes in which coalescence is either active or frozen out during deposition. These growth regimes were subsequently confirmed in growth experiments of Ag on SiO2, again for both pulsed and continuous deposition, by measuring the percolation thickness as well as the continuous film formation thickness. However, quantitative agreement with regards to scaling exponents in the two growth regimes was not found between simulations and experiments, and this prompted the development of a method to determine the elongation transition thickness experimentally. Using this method, the elongation transition of Ag on SiO2 was measured, with scaling exponents found in much better agreement with the simulation results. Further, these measurement data also allowed the calculation of surface properties such as the terrace diffusion barrier of Ag on SiO2 and the average island coalescence rate. In the second part of this thesis, pioneering work is done to develop a fully atomistic, on-lattice model which describes the growth of Ag on weakly-interacting substrates. Simulations performed using this model revealed several key atomic-scale processes occurring at the film/substrate interface and on islands which govern island shape evolution, thereby contributing to a better understanding of how 3D island growth occurs at the atomic scale for a wide class of materials. The latter provides insights into the directed growth of metal nanostructures with controlled shapes on weakly-interacting substrates, including twodimensional crystals for use in catalytic and nano-electronic applications.
