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Structural Characterization And Lifetime Stability Of Mo Y Extreme Ultraviolet Multilayer Mirrors
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Book Synopsis Structural Characterization and Lifetime Stability of Mo/Y Extreme Ultraviolet Multilayer Mirrors by :
Download or read book Structural Characterization and Lifetime Stability of Mo/Y Extreme Ultraviolet Multilayer Mirrors written by and published by . This book was released on 2004 with total page 31 pages. Available in PDF, EPUB and Kindle. Book excerpt: We observe a dramatic dependence of the extreme ultraviolet (EUV) reflectivity of Mo/Y multilayers on the oxygen content of yttrium. This is explained by a change in microstructure, increase in roughness of the Y layers and not by an increase in absorption due to oxygen in Y layers. We find best reflectivity of 38.4% is achieved with an oxygen content of 25%, which reduces to 32.6% and 29.6% for multilayers manufactured from oxygen free yttrium and 39%-oxygen yttrium, respectively. These results highlight the importance of experimentally determined optical constants as well as interface roughness in multilayer calculations. In addition, lifetime stability of Mo/Y multilayers with different capping layers was monitored for one year. The molybdenum- and palladium-capped samples exhibited low surface roughness and about 4% relative reflectivity loss in one year. The relative reflectivity loss on yttrium-capped sample (yttrium with 39% oxygen) was about 8%. However, the reflectivity loss in all three capping layers occurred within the first 100 days after the deposition and the reflectivity remained stable afterwards.
Book Synopsis Reflectance, Optical Properties, and Stability of Molybdenum/Strontium and Molybdenum/Yttrium Multilayer Mirrors by :
Download or read book Reflectance, Optical Properties, and Stability of Molybdenum/Strontium and Molybdenum/Yttrium Multilayer Mirrors written by and published by . This book was released on 2002 with total page 174 pages. Available in PDF, EPUB and Kindle. Book excerpt: The motivation of this work is to develop high reflectance normal-incidence multilayer mirrors in the 8-12 nm wavelength region for applications in astronomy and extreme ultraviolet lithography. To achieve this goal, Mo/Sr and Mo/Y multilayers were studied. These multilayers were deposited with a UHV magnetron sputtering system and their reflectances were measured with synchrotron radiation. High normal-incidence reflectances of 23% at 8.8 nm, 40.8% at 9.4 nm, and 48.3% at 10.5 nm were achieved. However, the reflectance of Mo/Sr multilayers decreased rapidly after exposure to air. Attempts to use thin layers of carbon to passivate the surface of Mo/Sr multilayers were unsuccessful. Experimental results on the refractive index $\tilde{n}$ = 1-? + i? of yttrium and molybdenum in the 50-1300 eV energy region are reported in this work. This is the first time ever that values on the refractive index of yttrium are measured in this energy range. The absorption part ? was determined through transmittance measurements. The dispersive part ? was calculated by means of the Kramers-Kronig formalism. The newly determined values of the refractive index of molybdenum are in excellent agreement with the published data. Those of yttrium are more accurate and contain fine structures around the yttrium M-absorption edges where Mo/Y multilayers operate. These improved sets of optical data lead to better design and modeling of the optical properties of Mo/Y multilayers. The reflectance quality of Mo/Y multilayers is dependent on their optical and structural properties. To correlate these properties with the multilayer reflectance, x-ray diffraction, Rutherford backscattering spectrometry, and transmission electron microscopy were used to analyze samples. Normal-incidence reflectances of 32.6% at 9.27 nm, 38.4% at 9.48 nm, and 29.6% at 9.46 nm were obtained from three representative Mo/Y multilayers which had about 0%, 25%, and 39% atomic oxygen assimilated in their yttrium layers, respectively. Based on the optical properties, multilayers with higher oxygen content should have higher absorption. However, the 25%-oxygen multilayer had less interface roughness and thus had higher reflectance than the 0%-oxygen sample. The 39%-oxygen multilayer had the highest absorption and roughness, thus had the lowest reflectance among three samples. The optical and structural properties of the multilayers are competing in the reflectance results.
Author :Silvano Fineschi Publisher :SPIE-International Society for Optical Engineering ISBN 13 :9780819459060 Total Pages :434 pages Book Rating :4.4/5 (59 download)
Book Synopsis Solar Physics and Space Weather Instrumentation by : Silvano Fineschi
Download or read book Solar Physics and Space Weather Instrumentation written by Silvano Fineschi and published by SPIE-International Society for Optical Engineering. This book was released on 2005 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.
Book Synopsis Characteristics of Multilayer Mirrors in the X-ray and Extreme Ultraviolet Radiation Ranges by : Hui Jiang
Download or read book Characteristics of Multilayer Mirrors in the X-ray and Extreme Ultraviolet Radiation Ranges written by Hui Jiang and published by . This book was released on 2012 with total page 370 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis comprehensively describes the computational design, fabrication and characterisation of multilayer mirrors intended as key reflective elements for the X-ray and extreme ultraviolet radiation ranges. -- The first central theme was to present various designs for the requirements of soft X-ray microprobes, EUVL lithography systems and high harmonic generation sources, i.e. monochromator, broad-angle supermirror, broadband intensity and polarising beamsplitters and order-selecting mirror. The particle swarm optimisation method was successfully applied in a global search of materials for the structure of mirrors. The robust designs made possible are considered to alleviate fabrication difficulties, such as control of layer thickness errors. -- The second important theme was to analyse the interfacial and surface imperfections in multilayer mirrors. This work is crucial in improving the fabrication technology and in : understanding the basic growth status at the interfaces. Transmission electron microscopy, X-ray diffraction and atomic force microscopy were used in these experiments. The analyses are based on innovative methods, namely time series analysis and wavelet analysis. The evolution tendencies of the layer thicknesses, interfacial roughness and interdiffusion were determined, as were correlated growth, structural uniformity, surface stress damage and surface roughness. -- The final theme was to test a multilayer monochromator for use in a soft X-ray microprobe for radiobiological studies on pathological cells and tissue. The source spectrum was determined using different incidence angles on multilayer mirrors and some suggestions for improvement were presented.
Download or read book Lifetime Studies of Mo written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor industry in the production of sub-100 nm feature sizes in integrated circuits. Using multilayer reflective coatings optimized at wavelengths ranging from 11 to 14 nm, EUVL represents a potential successor to currently existing optical lithography techniques. In order to assess lifetimes of the multilayer coatings under realistic conditions, a series of radiation stability tests has been performed. In each run a dose of EUV radiation equivalent to several months of lithographic operation was applied to Mo/Si and MO/Be multilayer coatings within a few days. Depending on the residual gas concentration in the vacuum environment, surface deposition of carbon during the exposure lead to losses in the multilayer reflectivity. However, in none of the experimental runs was structural damage within the bulk of the multilayers observed. Mo/Si multilayer coatings recovered their full original reflectivity after removal of the carbon layer by an ozone cleaning method. Auger depth profiling on MO/Be multilayers indicate that carbon penetrated into the Be top layer during illumination with high doses of EUV radiation. Subsequent ozone cleaning fully removed the carbon, but revealed enhanced oxidation of the area illuminated, which led to an irreversible loss in reflectance on the order of 1%. Keywords: Extreme ultraviolet (EUV) lithography, multilayer reflective coatings, radiation stability, surface contamination.
Book Synopsis Reflectance, Optical Properties, and Stability of Molybdenum/strontium and Molybdenum/yttrium Multilayer Mirrors by : Benjawan Kjornrattanawanich
Download or read book Reflectance, Optical Properties, and Stability of Molybdenum/strontium and Molybdenum/yttrium Multilayer Mirrors written by Benjawan Kjornrattanawanich and published by . This book was released on 2002 with total page 354 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Design, Fabrication, and Characterization of Multilayer Mirrors for Extreme Ultra-Violet Lithography by :
Download or read book Design, Fabrication, and Characterization of Multilayer Mirrors for Extreme Ultra-Violet Lithography written by and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Design and Performance of Capping Layers for EUV Multilayer Mirrors by : J. C. Robinson
Download or read book Design and Performance of Capping Layers for EUV Multilayer Mirrors written by J. C. Robinson and published by . This book was released on 2003 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of uttermost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in designing the protective capping layer coatings, understanding their performance and estimating their lifetimes based on accelerated electron beam and EUV exposure studies. Our current capping layer coatings have about 40 times longer lifetimes than Si-capped multilayer optics. Nevertheless, the lifetime of current Ru-capped multilayers is too short to satisfy commercial tool requirements and further improvements are essential.
Book Synopsis Multilayer Reflective Coatings for Extreme-ultraviolet Lithography by :
Download or read book Multilayer Reflective Coatings for Extreme-ultraviolet Lithography written by and published by . This book was released on 1998 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectances of 67.5% at 13.4 nm are now routinely achieved and reflectances of 70 2% at 11.4 nm were obtained with MO/Be multilayers. High reflectance is achieved with careful control of substrate quality, layer thicknesses, multilayer materials, interface quality, and surface termination. Reflectance and film stress were found to be stable relative to the requirements for application to EUV lithography. The run-to-run reproducibility of the reflectance peak position was characterized to be better than 0.2%, providing the required wavelength matching among the seven multilayer-coated mirrors used in the present lithography system design. Uniformity of coating was improved to better than 0.5% across 150 mm diameter substrates. These improvements in EUV multilayer mirror technology will enable us to meet the stringent specifications for coating the large optical substrates for our next-generation EUV lithography system.
Book Synopsis Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems by : Maksym Tryus
Download or read book Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems written by Maksym Tryus and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optical Engineering written by and published by . This book was released on 2002 with total page 940 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publishes papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.
Book Synopsis Dissertation Abstracts International by :
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2003 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Optics Letters written by and published by . This book was released on 1995 with total page 756 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis International aerospace abstracts by :
Download or read book International aerospace abstracts written by and published by . This book was released on 1993 with total page 1060 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Soft X-ray Optics by : Eberhard Spiller
Download or read book Soft X-ray Optics written by Eberhard Spiller and published by SPIE Press. This book was released on 1994 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text describes optics mainly in the 10 to 500 angstrom wavelength region. These wavelengths are 50 to 100 times shorter than those for visible light and 50 to 100 times longer than the wavelengths of medical x rays or x-ray diffraction from natural crystals. There have been substantial advances during the last 20 years, which one can see as an extension of optical technology to shorter wavelengths or as an extension of x-ray diffraction to longer wavelengths. Artificial diffracting structures like zone plates and multilayer mirrors are replacing the natural crystals of x-ray diffraction. Some of these structures can now be fabricated to have diffraction-limited resolution. The new possibilities are described in a simple, tutorial way.
Book Synopsis EUV Sources for Lithography by : Vivek Bakshi
Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Book Synopsis Biochar for Environmental Management by : Johannes Lehmann
Download or read book Biochar for Environmental Management written by Johannes Lehmann and published by Routledge. This book was released on 2012-05-16 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt: Biochar is the carbon-rich product when biomass (such as wood, manure or crop residues) is heated in a closed container with little or no available air. It can be used to improve agriculture and the environment in several ways, and its stability in soil and superior nutrient-retention properties make it an ideal soil amendment to increase crop yields. In addition to this, biochar sequestration, in combination with sustainable biomass production, can be carbon-negative and therefore used to actively remove carbon dioxide from the atmosphere, with major implications for mitigation of climate change. Biochar production can also be combined with bioenergy production through the use of the gases that are given off in the pyrolysis process. This book is the first to synthesize the expanding research literature on this topic. The book's interdisciplinary approach, which covers engineering, environmental sciences, agricultural sciences, economics and policy, is a vital tool at this stage of biochar technology development. This comprehensive overview of current knowledge will be of interest to advanced students, researchers and professionals in a wide range of disciplines.
