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Sputter Deposition For Multi Component Thin Films
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Book Synopsis Sputter Deposition for Multi-component Thin Films by :
Download or read book Sputter Deposition for Multi-component Thin Films written by and published by . This book was released on 1990 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion beam sputter-induced deposition using a single ion beam and a multicomponent target is capable of reproducibly producing thin films of arbitrary composition, including those which are close to stoichiometry. Using a quartz crystal deposition monitor and a computer controlled, well-focused ion beam, this sputter-deposition approach is capable of producing metal oxide superconductors and semiconductors of the superlattice type such as GaAs-AlGaAs as well as layered metal/oxide/semiconductor/superconductor structures. By programming the dwell time for each target according to the known sputtering yield and desired layer thickness for each material, it is possible to deposit composite films from a well-controlled sub-monolayer up to thicknesses determined only by the available deposition time. In one embodiment, an ion beam is sequentially directed via a set of X-Y electrostatic deflection plates onto three or more different element or compound targets which are constituents of the desired film. In another embodiment, the ion beam is directed through an aperture in the deposition plate and is displaced under computer control to provide a high degree of control over the deposited layer. In yet another embodiment, a single fixed ion beam is directed onto a plurality of sputter targets in a sequential manner where the targets are each moved in alignment with the beam under computer control in forming a multilayer thin film. This controlled sputter-deposition approach may also be used with laser and electron beams.
Book Synopsis Handbook of Sputter Deposition Technology by : Kiyotaka Wasa
Download or read book Handbook of Sputter Deposition Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2012-11-20 with total page 658 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Book Synopsis Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices by : O. Auciello
Download or read book Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices written by O. Auciello and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 625 pages. Available in PDF, EPUB and Kindle. Book excerpt: The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.
Book Synopsis The Deposition of Multicomponent Films for Electrooptic Applications Via a Computer Controlled Dual Ion Beam Sputtering System by :
Download or read book The Deposition of Multicomponent Films for Electrooptic Applications Via a Computer Controlled Dual Ion Beam Sputtering System written by and published by . This book was released on 1991 with total page 78 pages. Available in PDF, EPUB and Kindle. Book excerpt: Contents: Deposition of Electrooptic Thin Films; High Resolution Imaging of Twin and Antiphase Domain Boundaries in Perovskite KNbO3 Thin Films; Microstructural Characterization of the Epitaxial (111) KNbO3 on (0001) Sapphire; Electro-optic Characterization of Ion Beam Sputter-Deposited KNbO3 Thin Films; Optical Characterization of Potassium Niobate Thin Film Planar Waveguides.
Book Synopsis Investigation of Sputter Deposition and Mechanical Indentation Behavior of Zr-based Multi-Component Amorphous Nano-Scale Thin Films Via Molecular Dynamics Simulation by : 吳俊毅
Download or read book Investigation of Sputter Deposition and Mechanical Indentation Behavior of Zr-based Multi-Component Amorphous Nano-Scale Thin Films Via Molecular Dynamics Simulation written by 吳俊毅 and published by . This book was released on 2009 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Magnetron Sputtering of Multicomponent Refractory Thin Films by : Trent Mitchell Borman
Download or read book Magnetron Sputtering of Multicomponent Refractory Thin Films written by Trent Mitchell Borman and published by . This book was released on 2020 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A resurgence of interest in hypersonic flight has led to an increased demand for new refractory materials that possess a complex blend of physical, thermal, chemical, and mechanical properties. The selection of materials for use at extreme temperatures (>3000 °C) is dominated by the Group IVB and VB carbides, diborides, and nitrides. While these ultra high temperature ceramics (UHTCs) provide an excellent basis from which to start, new compositions are necessary for the envisioned applications. As complexity increases from binary carbides, diborides, and nitrides to ternary, quaternary, and high entropy compositions, the breadth of the compositional space grows exponentially. These new and vast, multi-dimensional phase diagrams pose a few important questions: what are the metal stoichiometries of interest? and how do the property-chemistry trends observed in binary systems translate to these complex compositions? Studying these new materials systems and answering these questions is not a trivial undertaking. Throughout the history of UHTC synthesis, the intrinsic properties of these ultra refractory materials have been convoluted with extrinsic factors, such as microstructure, phase purity, and defects. A valid study of the roles of metal and anion stoichiometry in these materials requires synthesis of UHTCs over broad compositional ranges while limiting the impacts of extrinsic characteristics. Physical vapor deposition has been widely used to study high entropy systems including alloys, oxides, carbides, and nitrides. This work expands on previous studies and focuses on understanding and improving the sputter deposition process for multicomponent carbides. The advantages and limitations of conventional sputtering techniques were investigated; avenues to improve the process, ranging from gas flows to pulsed power techniques, were explored; and finally, the benefits of high power impulse magnetron sputtering inspired the development of new co-sputtering techniques. (HfNbTaTiZr)C has received significant research interest in the UHTC community, as it combines 5 of the most refractory carbide systems; however, researchers had not studied the influence of carbon stoichiometry in this, or other, high entropy compositions. In this work, (HfNbTaTiZr)C films were synthesized over a broad range of carbon stoichiometries with reactive RF sputtering. These films exhibited broad crystallographic and microstructural transitions from metallic to carbide and finally nanocomposite films, simply by changing carbon content. Carbon vacancies were observed to cluster into stacking faults in substoichiometric films, despite the chemical disorder of the metal sublattice. A near-stoichiometric film with a hardness of 24 ± 3 GPa was synthesized, closely matching the rule of mixtures for the binary constituents. Additionally, ab-initio calculations validated the experimental mechanical property findings. Overall, the synthesis and property trends of (HfNbTaTiZr)C closely mirrored those of binary counterparts. Unfortunately, as with other carbides, excess carbon rapidly precipitated at methane flow rates slightly (2.5%) higher than the stoichiometric flow rate. The sudden onset of excess carbon precipitation stymied the rapid and facile synthesis of near-stoichiometric multicomponent carbides. Consequently, the deposition process needed to be improved before studying other compositions. A study of gas flows and pressures determined that operating with a modest fixed argon pressure (5-10 mT) increased deposition rate and could reduce target poisoning and carbon precipitation. Additionally, the results indicated that most of the methane was being consumed by the growing carbide film; however, partial pressure control was not feasible with the chamber's configuration. As a result, the best carbon control strategy was determined to be a combination of carefully regulated methane (flow rate) and metal (sputter rate) fluxes. Conventional temperature and pressure based microstructural development strategies were not feasible for use with reactively sputtered high entropy carbides. Fortunately, tunable high energy ion bombardment was demonstrated to be a viable alternative, influencing the microstructure, stress, and crystallography of the growing carbide films. The increased plasma densities, fixed energetics, and consistent energetics of high power impulse magnetron sputtering (HiPIMS) produced carbide films which were more microstructurally and crystallographically consistent than conventionally sputtered films. Simultaneous power and voltage regulation of the HiPIMS process resulted in more consistent deposition rates than the power regulation of conventional sputtering processes. Furthermore, films deposited with HiPIMS exhibited a much more gradual onset of excess carbon precipitation than RF sputtered counterparts. Asynchronously patterned pulsed sputtering (APPS) was developed based on the flux and energetic decoupling of HiPIMS. Conventional co-sputtering is rife with tedious calibrations and changing energetics. With conventional sputtering techniques, flux is changed by power which changes the sputtering voltage and the energetics of the deposition, resulting in inconsistent film quality. During HiPIMS, the flux is controlled by the frequency, while the energetics are dominated by the pulsing parameters (width and voltage). Asynchronously patterned pulsed sputtering consists of two HiPIMS supplies operating at the same frequency but phase shifted so the plasmas don't interact. One supply skips a fraction of the pulses, changing the time average flux and thus controlling the stoichiometry independently of energetics. APPS was demonstrated to produce linear compositional trends, consistent deposition energetics, and uniform film qualities across the entire stoichiometry range. The development of APPS and reactive APPS enabled the rapid synthesis of ternary systems, facilitating the search for properties of interest such as ductility in (NbW)C.
Book Synopsis Thin Film Materials Technology by : Kiyotaka Wasa
Download or read book Thin Film Materials Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2004-05-10 with total page 533 pages. Available in PDF, EPUB and Kindle. Book excerpt: An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.
Book Synopsis Studies on Ion Scattering and Sputtering Processes Relevant to Ion Beam Sputter Deposition of Multicomponent Thin Films by :
Download or read book Studies on Ion Scattering and Sputtering Processes Relevant to Ion Beam Sputter Deposition of Multicomponent Thin Films written by and published by . This book was released on 1989 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt: Results from computer simulation and experiments on ion scattering and sputtering processes in ion beam sputter deposition of high Tc superconducting and ferroelectric thin films are presented. It is demonstrated that scattering of neutralized ions from the targets can result in undesirable erosion of, and inert gas incorporation in, the growing films, depending on the ion/target atom ass ratio and ion beam angle of incidence/target/substrate geometry. The studies indicate that sputtering Kr or Xe ions is preferable to the most commonly used Ar+ ions, since the undesirable phenomena mentioned above are minimized for the first two ions. These results are used to determine optimum sputter deposition geometry and ion beam parameters for growing multicomponent oxide thin films by ion beam sputter-deposition. 10 refs., 5 figs.
Book Synopsis Sputtering Materials for VLSI and Thin Film Devices by : Jaydeep Sarkar
Download or read book Sputtering Materials for VLSI and Thin Film Devices written by Jaydeep Sarkar and published by William Andrew. This book was released on 2010-12-13 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements Practical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. Practical case-studies on target performance and troubleshooting Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry
Book Synopsis Phase formation in multicomponent films based on 3d transition metals by : Smita Gangaprasad Rao
Download or read book Phase formation in multicomponent films based on 3d transition metals written by Smita Gangaprasad Rao and published by Linköping University Electronic Press. This book was released on 2021-03-18 with total page 28 pages. Available in PDF, EPUB and Kindle. Book excerpt: The need for materials that enhance life span, performance, and sustainability has propelled research in alloy design from binary alloys to more complex systems such as multicomponent alloys. The CoCrFeMnNi alloy, more commonly known as the Cantor alloy, is one of the most studied systems in bulk as well as thin film. The addition of light elements such as boron, carbon, nitrogen, and oxygen is a means to alter the properties of these materials. The challenge lies in understanding the process of phase formation and microstructure evolution on addition of these light elements. To address this challenge, I investigate multicomponent alloys based on a simplified version of the Cantor alloy. My thesis investigates the addition of nitrogen into a Cantor variant system as a step towards understanding the full Cantor alloy. Me1-yNy (Me = Cr + Fe + Co, 0.14 ≤ y ≤0.28 thin films were grown by reactive magnetron sputtering. The films showed a change in structure from fcc to mixed fcc+bcc and finally a bcc-dominant film with increasing nitrogen content. The change in phase and microstructure influenced the mechanical and electrical properties of the films. A maximum hardness of 11 ± 0.7 GPa and lowest electrical resistivity of 28 ± 5 μΩcm were recorded in the film with mixed phase (fcc+bcc) crystal structure. Copper was added as a fourth metallic alloying element into the film with the mixed fcc + bcc structure, resulting in stabilization of the bcc phase even though Cu has been reported to be a fcc stabilizer. The energy brought to the substrate increases on Cu addition which promotes surface diffusion of the ions and leads to small but randomly oriented grains. The maximum hardness recorded by nanoindentation was found to be 13.7 ± 0.2 GPa for the sample Cu0.05. While it is generally believed that large amounts of Cu can be detrimental to thin film properties due to segregation, this study shows that small amounts of Cu in the multicomponent matrix could be beneficial in stabilizing phases as well as for mechanical properties. This thesis thus provides insights into the phase formation of nitrogen-containing multicomponent alloys.
Book Synopsis Handbook of Sputter Deposition Technology by : Shigeru Hayakawa
Download or read book Handbook of Sputter Deposition Technology written by Shigeru Hayakawa and published by William Andrew Publishing. This book was released on 1992-01-01 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt: A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 1010 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Reactive Sputter Deposition by : Diederik Depla
Download or read book Reactive Sputter Deposition written by Diederik Depla and published by Springer Science & Business Media. This book was released on 2008-06-24 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.
Book Synopsis Glow Discharge Processes by : Brian Chapman
Download or read book Glow Discharge Processes written by Brian Chapman and published by Wiley-Interscience. This book was released on 1980 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
Book Synopsis A Review of Basic Phenomena and Techniques for Sputter-deposition of High Temperature Superconducting Films by : O. Auciello
Download or read book A Review of Basic Phenomena and Techniques for Sputter-deposition of High Temperature Superconducting Films written by O. Auciello and published by . This book was released on 1990 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Advanced Ceramics by : Shigeyuki Somiya
Download or read book Handbook of Advanced Ceramics written by Shigeyuki Somiya and published by Academic Press. This book was released on 2003-09-17 with total page 805 pages. Available in PDF, EPUB and Kindle. Book excerpt: A two-volume reference set for all ceramicists, both in research and working in industry The only definitive reference covering the entire field of advanced ceramics from fundamental science and processing to application Contributions from over 50 leading researchers from around the world This new Handbook will be an essential resource for ceramicists. It includes contributions from leading researchers around the world, and includes sections on: Basic Science of Advanced Ceramic, Functional Ceramics (electro-ceramics and optoelectro-ceramics) and engineering ceramics. Contributions from over 50 leading researchers from around the world
Book Synopsis Ion Assisted Deposition of Multicomponent Thin Films by : Chen-Chung Li
Download or read book Ion Assisted Deposition of Multicomponent Thin Films written by Chen-Chung Li and published by . This book was released on 1994 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt:
