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Author : S. Somiya
Publisher : Springer
ISBN 13 :
Total Pages : 192 pages
Book Rating : 4.3/5 (91 download)
Download or read book Silicon Nitride - 1 written by S. Somiya and published by Springer. This book was released on 1990-02-28 with total page 192 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : John T. Milek
Publisher : Springer Science & Business Media
ISBN 13 : 1468461621
Total Pages : 126 pages
Book Rating : 4.4/5 (684 download)
Download or read book Silicon Nitride for Microelectronic Applications written by John T. Milek and published by Springer Science & Business Media. This book was released on 2013-03-14 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: The large amount of literature on the technology of thin film silicon nitride indi cates the interest of the Department of Defense, NASA and the semiconductor industry in the development and full utilization of the material. This survey is concerned only with the thin film characteristics and properties of silicon nitride as currently utilized by the semiconductor or microelectronics industry. It also includes the various methods of preparation. Applications in microelectronic devices and circuits are to be provided in Part 2 of the survey. Some bulk silicon nitride property data is included for basic reference and comparison purposes. The survey specifically excludes references and information not within the public domain. ACKNOWLEDGEMENT This survey was generated under U.S. Air Force Contract F33615-70-C-1348, with Mr. B.R. Emrich (MAAM) Air Force Materials Laboratory, Wright-Patterson Air Force Base, Ohio acting as Project Engineer. The author would like to acknowledge the assis tance of Dr. Judd Q. Bartling, Litton Systems, Inc., Guidance and Control Systems Division, Woodland Hills, California and Dr. Thomas C. Hall, Hughes Aircraft Company, Culver City, California in reviewing the survey. v CONTENTS Preface. i Introduction 1 Literature Review. 1 Bulk Characteristics 1 Technology Overview. 2 References 4 Methods of Preparation • 5 Introduction • 5 Direct Nitridation Method 8 Evaporation Method • 9 Glow Discharge Method. 10 Ion Beam Method. 13 Sputtering Methods 13 Pyrolytic Methods. 15 Silane and Ammonia Reaction 15 Silicon Tetrachloride and Tetrafluoride Reaction. 24 Silane and Hydrazine Reaction 27 Production Operations. 28 Equipment.
Author : Raymond C. Sangster
Publisher : Trans Tech Publications Ltd
ISBN 13 : 3038269018
Total Pages : 1016 pages
Book Rating : 4.0/5 (382 download)
Download or read book Formation of Silicon Nitride from the 19th to the 21st Century written by Raymond C. Sangster and published by Trans Tech Publications Ltd. This book was released on 2015-05-06 with total page 1016 pages. Available in PDF, EPUB and Kindle. Book excerpt: The elements: Si, N, O, C and H, have strong chemical affinities for one another. Under the correct conditions, Si-N bonding will occur in almost any Si-N-(O/C/H), and many related, reaction systems; although Si-O and Si-C are formidable competitors to Si-N. The most favored Si-N compound is stoichiometric Si3N4. It comes in three common varieties. How they interrelate, how one finds them and (above all ) how one makes them - and how sometimes they just happen to form - are the subjects of this book, with due attention being paid to closely related matters. This revised second edition summarizes and integrates what is recorded in the world literature from 1857through 2014 as being known about the formation of silicon nitride Si3N4 and itsclose relatives. The book is the key to all that has been learned, over the past 150 years, about how silicon nitride comes to exist: in nature, in the laboratory or in the factory and in many reaction systems; together with how it is used in ceramics, electronic films, optical coatings and many other ways (including an introduction to closely related substances). It will aid the researcher in designing new projects, the supervisor in briefing new employees, the salesman in working with new customers, the patent attorney in assessing patents and the professor in designing graduate course assignments. This comprehensive reference gathers information published on the chemistry of silicon nitride and its products, uses, and markets. Separate chapters overview the manufacture of silicon nitride powder, the production of silicon nitride ceramics via the reaction bonding process, the intrinsic reactions between crystalline silicon surfaces and N2 for silicon wafers, nitridation of Si-O based materials, and chemical vapor deposition of Si-H compounds.
Author : Eberhard F. Krimmel
Publisher : Springer Science & Business Media
ISBN 13 : 3662099012
Total Pages : 417 pages
Book Rating : 4.6/5 (62 download)
Download or read book Si Silicon written by Eberhard F. Krimmel and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 417 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first of three Gmelin Handbook volumes in the silicon se ries that will cover silicon nitride, a normaUy solid material with the idealized formula Si N . This volume, 3 4 "Silicon" Supplement Volume B Sc, is devoted to applications of silicon nitride in microelec tronics and solar ceUs. The compendium is the product of a critical selection among more than 17600 publications on silicon nitride issued up to January 1990. Out of a total of 5900 publications dealing with the fabrication and use of microelectronic devices (including 2400 Japanese patent applications), about 4000 papers have been selected for this volume. The current volume is grouped into three parts. Chapters 2 to 8 deal with general, non specific microelectronic applications of silicon nitride, Chapters 9 to 31 cover applications of silicon nitride in specific devices and device components, and Chapter 32 is devoted exclusively to applications in solar ceUs, including information on our general understanding of the role of silicon nitride in photovoltaic devices. Experimental results on the preparation of silicon nitride layers for application in unspeci fied devices are in Chapter 2. Whenever the preparation is in connection with specific devices, the information is presented in the respective chapters. The general preparation of silicon nitride layers is not covered in this volume, but will appear in "Silicon" Supplement Volume B 5a. See also the Introductory Remarks, Chapter 1, p. 1.
Author : J. T. Milek
Publisher : Springer Science & Business Media
ISBN 13 : 1461596092
Total Pages : 124 pages
Book Rating : 4.4/5 (615 download)
Download or read book Silicon Nitride for Microelectronic Applications written by J. T. Milek and published by Springer Science & Business Media. This book was released on 2013-03-14 with total page 124 pages. Available in PDF, EPUB and Kindle. Book excerpt: This survey is concerned with the use of silicon nitride in the semi conductor and microelectronics industries. The Handbook of Electronic Materials, volume 3, comprises part 1 of this survey and includes preparation and properties information. This report was prepared by Hughes Aircraft Company, Culver City, California under Contract Number F336lS-70-C-1348. The work was admini stered under the direction of the Air Force Materials Laboratory, Air Force Systems Command, Wright-Patterson Air Force Base, Ohio, with Hr. B. Emrich, Project Engineer. The Electronic Properties Information Center (EPIC) is a designated Information Analysis Center of the Department of Defense, authorized to pro vide information to the entire DoD community. The purpose of the Center is to provide a highly competent source of information and data on the electronic, optical and magnetic properties of materials of value to the Department of Defense. Its major function is to evaluate, compile and publish the experi mental data from the world's unclassified literature concerned with the properties of materials. All materials relevant to the field of electronics are within the scope of EPIC: insulators, semiconductors, metals, super conductors, ferrites, ferroelectrics, ferromagnetics, electroluminescents, thermionic emitters and optical materials. The Center's scope includes information on over 100 basic properties of materials; information generally regarded as being in the area of devices and/or circuitry is excluded. v CONTENTS Foreword. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . v Introduction. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1 Diffusion Mask Applications . . . . . . . . . . . . . . . . . . . . . . . . . . . '" 11 Glass-to-Metal Seals . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 23 Passivation Applications . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 24 Isolation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 39 Memory Devices. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 41 Capacitors. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 76 Radiation Hardening Applications . . . . . . . . . . . . . . . •. . . . . . . . .
Author : Toshiyuki Nishimura
Publisher : Springer
ISBN 13 : 4431553843
Total Pages : 53 pages
Book Rating : 4.4/5 (315 download)
Download or read book Fabrication of Heat-Resistant and Plastic-Formable Silicon Nitride written by Toshiyuki Nishimura and published by Springer. This book was released on 2015-07-23 with total page 53 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this book, improvements in the heat resistance of silicon nitride (Si3N4) ceramics using grain boundary control and in plasticity at high temperatures using grain size control in order to reduce the cost of shaping Si3N4 are described. The heat resistance of Si3N4 is improved by mixing a slight amount of sintering additive as an impurity into the original material powder. The author presents his findings on the high heat resistance of Si3N4. The author also develops a new fabrication method for Si3N4 nano-ceramics that produces high plastic formability. The method developed offers two improved points in grinding and sintering processes. The author found that the plastic formability of Si3N4 nanoceramics is dependent on load stress; the results of his research are detailed in this book.
Author : Emiliano Jose Hierra
Publisher : Nova Science Publishers
ISBN 13 : 9781619428652
Total Pages : 0 pages
Book Rating : 4.4/5 (286 download)
Download or read book Silicon Nitride written by Emiliano Jose Hierra and published by Nova Science Publishers. This book was released on 2012 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon nitride (Si3N4) ceramic is used in numerous applications because of its superior properties, such as high-temperature strength, good oxidation resistance and low thermal expansion coefficient. In this book, the authors present current research in the study of the synthesis, properties and applications of silicon nitride. Topics include the optical and vibration properties of silicon rich nitride; high temperature oxidation of silicon nitride based ceramics; low temperature preparation of phosphate bonded silicon nitride ceramics with high mechanical strength; the SPS-sintering process and use of ceramics for high-temperature engineering applications; synthesis and properties of silicon nitride coatings; and the use of silicon nitride as biomaterial.
Download or read book Handbook of Electronic Materials written by and published by . This book was released on 1971 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Raymond C. Sangster
Publisher : Trans Tech Publications
ISBN 13 :
Total Pages : 968 pages
Book Rating : 4.3/5 (91 download)
Download or read book Formation of Silicon Nitride from the 19th to the 21st Century written by Raymond C. Sangster and published by Trans Tech Publications. This book was released on 2005 with total page 968 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive reference gathers information published on the chemistry of silicon nitride and its products, uses, and markets. Separate chapters overview the manufacture of silicon nitride powder, the production of silicon nitride ceramics via the reaction bonding process, the intrinsic reactions between crystalline silicon surfaces and N2 for silicon wafers, nitridation of Si-O based materials, and chemical vapor deposition of Si-H compounds. The author, who originally worked on a similar book for the Gmelin Institute, cites 4,000-plus source documents and points the researcher to relevant handbooks, papers, and review articles for further reading. Distributed in the U.S. by Enfield. Annotation : 2005 Book News, Inc., Portland, OR (booknews.com).
Author :
Publisher :
ISBN 13 :
Total Pages : 660 pages
Book Rating : 4.3/5 (91 download)
Download or read book Silicon Nitride and Silicon Dioxide Thin Insulating Films written by and published by . This book was released on 2003 with total page 660 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : J.T. Milek
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (841 download)
Download or read book Silicon Nitride for Microelectronic Applications. Pt. 1. Preparation and Properties written by J.T. Milek and published by . This book was released on 1971 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Electrochemical society. Meeting
Publisher : The Electrochemical Society
ISBN 13 : 1566778654
Total Pages : 950 pages
Book Rating : 4.5/5 (667 download)
Download or read book Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics 11 written by Electrochemical society. Meeting and published by The Electrochemical Society. This book was released on 2011 with total page 950 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue of ECS Transactions contains the peer-reviewed full length papers of the International Symposium on Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics held May 1-6, 2011 in Montreal as a part of the 219th Meeting of The Electrochemical Society. The papers address a very diverse range of topics. In addition to the deposition and characterization of the dielectrics, more specific topics addressed by the papers include applications, device characterization and reliability, interface states, interface traps, defects, transistor and gate oxide studies, and modeling.
Author : Todd Alan Brooks
Publisher :
ISBN 13 :
Total Pages : 286 pages
Book Rating : 4.:/5 (7 download)
Download or read book Plasma-enhanced Chemical Vapor Deposition of Silicon Nitride from 1,1,3,3,5,5,-hexamethylcyclotrisilazane written by Todd Alan Brooks and published by . This book was released on 1988 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Electrochemical Society. Meeting
Publisher : The Electrochemical Society
ISBN 13 : 9781566773478
Total Pages : 652 pages
Book Rating : 4.7/5 (734 download)
Download or read book Silicon Nitride and Silicon Dioxide Thin Insulating Films VII written by Electrochemical Society. Meeting and published by The Electrochemical Society. This book was released on 2003 with total page 652 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Mamoru Mitomo
Publisher :
ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.:/5 (832 download)
Download or read book Silicon Nitride written by Mamoru Mitomo and published by . This book was released on 1990 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Robert C. Johnson
Publisher :
ISBN 13 :
Total Pages : 34 pages
Book Rating : 4.3/5 (91 download)
Download or read book Synthesis and Some Properties of Fibrous Silicon Nitride written by Robert C. Johnson and published by . This book was released on 1964 with total page 34 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : R. Ekwal Sah
Publisher : The Electrochemical Society
ISBN 13 : 1566777100
Total Pages : 871 pages
Book Rating : 4.5/5 (667 download)
Download or read book Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics 10 written by R. Ekwal Sah and published by The Electrochemical Society. This book was released on 2009 with total page 871 pages. Available in PDF, EPUB and Kindle. Book excerpt: The issue of ECS Transactions contains papers presented at the Tenth International Symposium on Silicon Nitride, Silicon Dioxide, and Alternate Emerging Dielectrics held in San Francisco on May 24-29, 2009. The papers address a very wide range of fabrication and characterization techniques, and applications of thin dielectric films in microelectronic and optoelectronic devices. More specific topics addressed by the papers include reliability, interface states, gate oxides, passivation, and dielctric breakdown.
