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Author : Aseem Kumar Srivastava
Publisher :
ISBN 13 :
Total Pages : 364 pages
Book Rating : 4.3/5 (129 download)
Download or read book Properties of Electron Cyclotron Resonance Plasma Sources written by Aseem Kumar Srivastava and published by . This book was released on 1995 with total page 364 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : R Geller
Publisher : Routledge
ISBN 13 : 135145322X
Total Pages : 456 pages
Book Rating : 4.3/5 (514 download)
Download or read book Electron Cyclotron Resonance Ion Sources and ECR Plasmas written by R Geller and published by Routledge. This book was released on 2018-12-13 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt: Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour
Author : Jeffrey Alan Hopwood
Publisher :
ISBN 13 :
Total Pages : 538 pages
Book Rating : 4.3/5 (129 download)
Download or read book Macroscopic Properties of a Multipolar Electron Cyclotron Resonance Microwave-cavity Plasma Source for Anisotropic Silicon Etching written by Jeffrey Alan Hopwood and published by . This book was released on 1990 with total page 538 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Oleg A. Popov
Publisher : Elsevier
ISBN 13 : 0815517890
Total Pages : 467 pages
Book Rating : 4.8/5 (155 download)
Download or read book High Density Plasma Sources written by Oleg A. Popov and published by Elsevier. This book was released on 1996-12-31 with total page 467 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Author : Carlos M. Ferreira
Publisher : Springer Science & Business Media
ISBN 13 : 1489911308
Total Pages : 556 pages
Book Rating : 4.4/5 (899 download)
Download or read book Microwave Discharges written by Carlos M. Ferreira and published by Springer Science & Business Media. This book was released on 2013-11-21 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of a NATO ARW held in Vimeiro, Portugal, May 11-15, 1992
Author : Gerhard Franz
Publisher : Springer Science & Business Media
ISBN 13 : 3540858490
Total Pages : 743 pages
Book Rating : 4.5/5 (48 download)
Download or read book Low Pressure Plasmas and Microstructuring Technology written by Gerhard Franz and published by Springer Science & Business Media. This book was released on 2009-04-09 with total page 743 pages. Available in PDF, EPUB and Kindle. Book excerpt: Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]—no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].
Author : J. Leon Shohet
Publisher : CRC Press
ISBN 13 : 1351204939
Total Pages : 2883 pages
Book Rating : 4.3/5 (512 download)
Download or read book Encyclopedia of Plasma Technology - Two Volume Set written by J. Leon Shohet and published by CRC Press. This book was released on 2016-12-12 with total page 2883 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Author : Oleg A. Popov
Publisher :
ISBN 13 : 9786612253218
Total Pages : 445 pages
Book Rating : 4.2/5 (532 download)
Download or read book High Density Plasma Sources written by Oleg A. Popov and published by . This book was released on 1995 with total page 445 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing.
Author : Sudeep Bhattacharjee
Publisher : Taylor & Francis
ISBN 13 : 1466557923
Total Pages : 390 pages
Book Rating : 4.4/5 (665 download)
Download or read book Compact Plasma and Focused Ion Beams written by Sudeep Bhattacharjee and published by Taylor & Francis. This book was released on 2013-12-12 with total page 390 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent research has brought the application of microwaves from the classical fields of heating, communication, and generation of plasma discharges into the generation of compact plasmas that can be used for applications such as FIB and small plasma thrusters. However, these new applications bring with them a new set of challenges. With coverage ran
Author : Maurice H. Francombe
Publisher : Academic Press
ISBN 13 : 0080925138
Total Pages : 343 pages
Book Rating : 4.0/5 (89 download)
Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Academic Press. This book was released on 2013-10-22 with total page 343 pages. Available in PDF, EPUB and Kindle. Book excerpt: This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. - Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed - Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils - Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology - Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination
Author : Sendai "Plasma Forum"
Publisher : World Scientific
ISBN 13 : 9814545465
Total Pages : 460 pages
Book Rating : 4.8/5 (145 download)
Download or read book Double Layers: Potential Formation And Related Nonlinear Phenomena In Plasmas: Proceedings Of The 5th Symposium written by Sendai "Plasma Forum" and published by World Scientific. This book was released on 1998-02-06 with total page 460 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book deals with modern plasma physics and engineering, focusing on space, laboratory and fusion-oriented plasmas. It is topical and pedagogical in nature.
Author : Yue Kuo
Publisher : The Electrochemical Society
ISBN 13 : 9781566773850
Total Pages : 324 pages
Book Rating : 4.7/5 (738 download)
Download or read book Thin Film Transistor Technologies VI written by Yue Kuo and published by The Electrochemical Society. This book was released on 2003 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ian G. Brown
Publisher : John Wiley & Sons
ISBN 13 : 3527604545
Total Pages : 396 pages
Book Rating : 4.5/5 (276 download)
Download or read book The Physics and Technology of Ion Sources written by Ian G. Brown and published by John Wiley & Sons. This book was released on 2006-03-06 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.
Author : Bernhard Wolf
Publisher : CRC Press
ISBN 13 : 9780849325021
Total Pages : 558 pages
Book Rating : 4.3/5 (25 download)
Download or read book Handbook of Ion Sources written by Bernhard Wolf and published by CRC Press. This book was released on 1995-08-31 with total page 558 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
Author : David Mascali
Publisher : Frontiers Media SA
ISBN 13 : 2832510620
Total Pages : 137 pages
Book Rating : 4.8/5 (325 download)
Download or read book Nuclear Physics and Astrophysics in Plasma Traps written by David Mascali and published by Frontiers Media SA. This book was released on 2023-01-04 with total page 137 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 310 pages
Book Rating : 4.3/5 (91 download)
Download or read book Fusion Energy Update written by and published by . This book was released on 1978 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Mehrdad Mehdizadeh
Publisher : William Andrew
ISBN 13 : 9780815515920
Total Pages : 400 pages
Book Rating : 4.5/5 (159 download)
Download or read book Microwave/RF Applicators and Probes for Material Heating, Sensing, and Plasma Generation written by Mehrdad Mehdizadeh and published by William Andrew. This book was released on 2009-10-15 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: Interactions of electromagnetic fields with materials at high frequencies have given rise to a vast array of practical applications in industry, science, medicine, and consumer markets. Applicators or probes, which are the front end of these systems, provide the field that interacts with the material. This book takes an integrated approach to the area of high frequency applicators and probes for material interactions, providing a toolkit for those who design these devices. Particular attention is given to real-world applications and the latest developments in the area. Mathematical methods are provided as design tools, and are often simplified via curve-fitting techniques that are particularly usable by handheld calculators. Useful equations and numerically solved examples, using situations encountered in practice, are supplied. Above all, this volume is a comprehensive and useful reference where the reader can find design rules and principles of high frequency applicators and probes for material processing and sensing applications. Electronic and electrical R&D engineers, physicists, university professors and students will all find this book a valuable reference. Mehrdad Mehdizadeh is with the DuPont Company, Engineering Research & Technology Division in Wilmington, Delaware. His areas of expertise include high frequency hardware and electromagnetic methods of processing, sensing, and characterization of materials. His work and innovation in industrial, scientific, and medical applications of radio frequency and microwaves has resulted in 19 US patents and a number of publications. He earned his Ph.D. and M.S. from Marquette University (1983, 1980), and a B.S. from Sharif University of Technology (1977), all in electrical engineering. Dr. Mehdizadeh is a Senior Member of the Institute of Electrical and Electronic Engineers (IEEE ), Sigma Xi (Scientific Research Society), the International Microwave Power Institute (IMPI ), and a voting member of IEEE Standard Association. . Books in this area are usually theoretical; this book provides practical information for those who actually intend to design a system . Features real world and numerically solved examples, and curve-fitted simple equations to replace complex equations provided in typical texts . Author is a voting member of IEEE Standards Association
