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Publisher :
ISBN 13 :
Total Pages : 700 pages
Book Rating : 4.3/5 (91 download)
Download or read book Annual Symposium on Photomask Technology and Management written by and published by . This book was released on 1998 with total page 700 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 606 pages
Book Rating : 4.3/5 (91 download)
Download or read book Annual Symposium on Photomask Technology written by and published by . This book was released on 2002 with total page 606 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Syed Rizvi
Publisher : CRC Press
ISBN 13 : 1420028782
Total Pages : 728 pages
Book Rating : 4.4/5 (2 download)
Download or read book Handbook of Photomask Manufacturing Technology written by Syed Rizvi and published by CRC Press. This book was released on 2018-10-03 with total page 728 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
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ISBN 13 :
Total Pages : 494 pages
Book Rating : 4.F/5 ( download)
Download or read book Photomask and Next-generation Lithography Mask Technology XI. written by and published by . This book was released on 2004 with total page 494 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : P. Rai-Choudhury
Publisher : SPIE Press
ISBN 13 : 9780819423788
Total Pages : 780 pages
Book Rating : 4.4/5 (237 download)
Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography written by P. Rai-Choudhury and published by SPIE Press. This book was released on 1997 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt: The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.
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ISBN 13 :
Total Pages : 1104 pages
Book Rating : 4.3/5 (91 download)
Download or read book Photomask and Next-generation Lithography Mask Technology written by and published by . This book was released on 2003 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 328 pages
Book Rating : 4.3/5 (91 download)
Download or read book European Conference on Mask Technology for Integrated Circuits and Microcomponents written by and published by . This book was released on 2003 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 644 pages
Book Rating : 4.3/5 (91 download)
Download or read book Photomask and X-ray Mask Technology written by and published by . This book was released on 1998 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Semiconductor Metrology Program (U.S.)
Publisher :
ISBN 13 :
Total Pages : 120 pages
Book Rating : 4.3/5 ( download)
Download or read book National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and published by . This book was released on 1997 with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.F/5 ( download)
Download or read book National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000 written by and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 148 pages
Book Rating : 4.F/5 ( download)
Download or read book National Semiconductor Metrology Program, Semiconductor Electronics Division, NIST List Of Publications, LP 103, March 1999 written by and published by . This book was released on 1999 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Institute of Standards and Technology (U.S.)
Publisher :
ISBN 13 :
Total Pages : 148 pages
Book Rating : 4.0/5 ( download)
Download or read book National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1999 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Wynand Lambrechts
Publisher : CRC Press
ISBN 13 : 1351248669
Total Pages : 354 pages
Book Rating : 4.3/5 (512 download)
Download or read book Extending Moore's Law through Advanced Semiconductor Design and Processing Techniques written by Wynand Lambrechts and published by CRC Press. This book was released on 2018-09-13 with total page 354 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a methodological understanding of the theoretical and technical limitations to the longevity of Moore’s law. The book presents research on factors that have significant impact on the future of Moore’s law and those factors believed to sustain the trend of the last five decades. Research findings show that boundaries of Moore’s law primarily include physical restrictions of scaling electronic components to levels beyond that of ordinary manufacturing principles and approaching the bounds of physics. The research presented in this book provides essential background and knowledge to grasp the following principles: Traditional and modern photolithography, the primary limiting factor of Moore’s law Innovations in semiconductor manufacturing that makes current generation CMOS processing possible Multi-disciplinary technologies that could drive Moore's law forward significantly Design principles for microelectronic circuits and components that take advantage of technology miniaturization The semiconductor industry economic market trends and technical driving factors The complexity and cost associated with technology scaling have compelled researchers in the disciplines of engineering and physics to optimize previous generation nodes to improve system-on-chip performance. This is especially relevant to participate in the increased attractiveness of the Internet of Things (IoT). This book additionally provides scholarly and practical examples of principles in microelectronic circuit design and layout to mitigate technology limits of previous generation nodes. Readers are encouraged to intellectually apply the knowledge derived from this book to further research and innovation in prolonging Moore’s law and associated principles.
Author : David Huang
Publisher : The Electrochemical Society
ISBN 13 : 1566777038
Total Pages : 1124 pages
Book Rating : 4.5/5 (667 download)
Download or read book Istc/cstic 2009 (cistc) written by David Huang and published by The Electrochemical Society. This book was released on 2009-03 with total page 1124 pages. Available in PDF, EPUB and Kindle. Book excerpt: ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.
Author : Benjamin G. Eynon
Publisher : McGraw Hill Professional
ISBN 13 : 0071588914
Total Pages : 589 pages
Book Rating : 4.0/5 (715 download)
Download or read book Photomask Fabrication Technology written by Benjamin G. Eynon and published by McGraw Hill Professional. This book was released on 2005-08-11 with total page 589 pages. Available in PDF, EPUB and Kindle. Book excerpt: Photomasks, the printing masters for the fabrication of integrated circuits, have become a necessity of modern semiconductor manufacturing. This book details the science and technology of industrial photo mask production, including fundamental principles, industrial production flows, and technological evolution.
Author : Luigi Cocco
Publisher : BoD – Books on Demand
ISBN 13 : 1789844622
Total Pages : 108 pages
Book Rating : 4.7/5 (898 download)
Download or read book Standards, Methods and Solutions of Metrology written by Luigi Cocco and published by BoD – Books on Demand. This book was released on 2019-10-02 with total page 108 pages. Available in PDF, EPUB and Kindle. Book excerpt: The goal of acceptable quality, cost, and time is a decisive challenge in every engineering development process. To be familiar with metrology requires choosing the best combination of techniques, standards, and tools to control a project from advanced simulations to final performance measurements and periodic inspections. This book contains a cluster of chapters from international academic authors who provide a meticulous way to discover the impacts of metrology in both theoretical and application fields. The approach is to discuss the key aspects of a selection of untraditional metrological topics, covering the analysis procedures and set of solutions obtained from experimental studies.
Author : BACUS (Technical group)
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 194 pages
Book Rating : 4.F/5 ( download)
Download or read book 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 written by BACUS (Technical group) and published by SPIE-International Society for Optical Engineering. This book was released on 1999 with total page 194 pages. Available in PDF, EPUB and Kindle. Book excerpt:
