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Author :
Publisher :
ISBN 13 :
Total Pages : 644 pages
Book Rating : 4.3/5 (91 download)
Download or read book Photomask and X-ray Mask Technology written by and published by . This book was released on 1998 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Syed Rizvi
Publisher : CRC Press
ISBN 13 : 1420028782
Total Pages : 728 pages
Book Rating : 4.4/5 (2 download)
Download or read book Handbook of Photomask Manufacturing Technology written by Syed Rizvi and published by CRC Press. This book was released on 2018-10-03 with total page 728 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
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ISBN 13 :
Total Pages : 1104 pages
Book Rating : 4.3/5 (91 download)
Download or read book Photomask and Next-generation Lithography Mask Technology written by and published by . This book was released on 2003 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Semiconductor Metrology Program (U.S.)
Publisher :
ISBN 13 :
Total Pages : 120 pages
Book Rating : 4.F/5 ( download)
Download or read book National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and published by . This book was released on with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. Matlosz
Publisher : The Electrochemical Society
ISBN 13 : 9781566772563
Total Pages : 456 pages
Book Rating : 4.7/5 (725 download)
Download or read book Fundamental Aspects of Electrochemical Deposition and Dissolution written by M. Matlosz and published by The Electrochemical Society. This book was released on 2000 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Yue Kuo
Publisher : The Electrochemical Society
ISBN 13 : 9781566772983
Total Pages : 356 pages
Book Rating : 4.7/5 (729 download)
Download or read book Thin Film Transistor Technologies V written by Yue Kuo and published by The Electrochemical Society. This book was released on 2001 with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 732 pages
Book Rating : 4.3/5 (91 download)
Download or read book Laser Induced Damage in Optical Materials written by and published by . This book was released on 1998 with total page 732 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : P. Rai-Choudhury
Publisher : SPIE Press
ISBN 13 : 9780819423788
Total Pages : 780 pages
Book Rating : 4.4/5 (237 download)
Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography written by P. Rai-Choudhury and published by SPIE Press. This book was released on 1997 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt: The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.
Author : Naoaki Aizaki
Publisher : Society of Photo Optical
ISBN 13 : 9780819428646
Total Pages : 616 pages
Book Rating : 4.4/5 (286 download)
Download or read book Photomask and X-ray Mask Technology V written by Naoaki Aizaki and published by Society of Photo Optical. This book was released on 1998 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: An overview of photomask and X-ray mask technology. The papers are divided into sections which explore topics such as: device trends; equipment; X-ray masks; and advanced mask fabrication processes.
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Publisher :
ISBN 13 :
Total Pages : 1860 pages
Book Rating : 4.3/5 (243 download)
Download or read book Electrical & Electronics Abstracts written by and published by . This book was released on 1997 with total page 1860 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : G. Anner
Publisher : Springer Science & Business Media
ISBN 13 : 940090441X
Total Pages : 637 pages
Book Rating : 4.4/5 (9 download)
Download or read book Planar Processing Primer written by G. Anner and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 637 pages. Available in PDF, EPUB and Kindle. Book excerpt: Planar Processing Primer is based on lecture notes for a silicon planar process ing lecture/lab course offered at the University of Illinois-UC for over fifteen years. Directed primarily to electrical engineering upperclassmen and graduate students, the material also has been used successfully by graduate students in physics and ceramic and metallurgical engineering. It is suitable for self-study by engineers trained in other disciplines who are beginning work in the semiconductor fields, and it can make circuit design engineers aware of the processing limitations under which they must work. The text describes and explains, at an introductory level, the principal processing steps used to convert raw silicon into a semiconductor device or integrated circuit. First-order models are used for theoretical treatments (e.g., of diffusion and ion implantation), with reference made to more advanced treatments, to computer programs such as SUPREM that include higher order effects, and to interactions among sequential processes. In Chapters 8, 9, and to, the application of silicon processes to compound semiconductors is discussed briefly. Over the past several years, the size of transistors has decreased markedly, allowing more transistors per chip unit area, and chip size has increased.
Author :
Publisher :
ISBN 13 :
Total Pages : 700 pages
Book Rating : 4.3/5 (91 download)
Download or read book Annual Symposium on Photomask Technology and Management written by and published by . This book was released on 1998 with total page 700 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
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ISBN 13 :
Total Pages : 450 pages
Book Rating : 4.F/5 ( download)
Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 1999 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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ISBN 13 :
Total Pages : 246 pages
Book Rating : 4.3/5 (91 download)
Download or read book European Conference on Mask Technology for Integrated Circuits and Microcomponents written by and published by . This book was released on 2004 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Yoshio Nishi
Publisher : CRC Press
ISBN 13 : 1351829823
Total Pages : 3276 pages
Book Rating : 4.3/5 (518 download)
Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2017-12-19 with total page 3276 pages. Available in PDF, EPUB and Kindle. Book excerpt: Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Author : Yi Qin
Publisher : William Andrew
ISBN 13 : 081551980X
Total Pages : 429 pages
Book Rating : 4.8/5 (155 download)
Download or read book Micromanufacturing Engineering and Technology written by Yi Qin and published by William Andrew. This book was released on 2010-07-02 with total page 429 pages. Available in PDF, EPUB and Kindle. Book excerpt: Micromanufacturing Engineering and Technology presents applicable knowledge of technology, equipment and applications, and the core economic issues of micromanufacturing for anyone with a basic understanding of manufacturing, material, or product engineering. It explains micro-engineering issues (design, systems, materials, market and industrial development), technologies, facilities, organization, competitiveness, and innovation with an analysis of future potential. The machining, forming, and joining of miniature / micro-products are all covered in depth, covering: grinding/milling, laser applications, and photo chemical etching; embossing (hot & UV), injection molding and forming (bulk, sheet, hydro, laser); mechanical assembly, laser joining, soldering, and packaging. - Presents case studies, material and design considerations, working principles, process configurations, and information on tools, equipment, parameters and control - Explains the many facets of recently emerging additive / hybrid technologies and systems, incl: photo-electric-forming, liga, surface treatment, and thin film fabrication - Outlines system engineering issues pertaining to handling, metrology, testing, integration and software - Explains widely used micro parts in bio / medical industry, information technology and automotive engineering - Covers technologies in high demand, such as: micro-mechanical-cutting, lasermachining, micro-forming, micro-EDM, micro-joining, photo-chemical-etching, photo-electro-forming, and micro-packaging
Author : Luciano Lavagno
Publisher : CRC Press
ISBN 13 : 1351837583
Total Pages : 704 pages
Book Rating : 4.3/5 (518 download)
Download or read book EDA for IC Implementation, Circuit Design, and Process Technology written by Luciano Lavagno and published by CRC Press. This book was released on 2018-10-03 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presenting a comprehensive overview of the design automation algorithms, tools, and methodologies used to design integrated circuits, the Electronic Design Automation for Integrated Circuits Handbook is available in two volumes. The second volume, EDA for IC Implementation, Circuit Design, and Process Technology, thoroughly examines real-time logic to GDSII (a file format used to transfer data of semiconductor physical layout), analog/mixed signal design, physical verification, and technology CAD (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability at the nanoscale, power supply network design and analysis, design modeling, and much more. Save on the complete set.
