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Author : Vahid Vahedi
Publisher :
ISBN 13 :
Total Pages : 316 pages
Book Rating : 4.:/5 (33 download)
Download or read book Modeling and Simulation of RF Discharges Used for Plasma Processing written by Vahid Vahedi and published by . This book was released on 1993 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Manish Chandhok
Publisher :
ISBN 13 :
Total Pages : 570 pages
Book Rating : 4.3/5 (91 download)
Download or read book Phenomenological Modeling of Plasma Generation for the Real-time Control of RIE Systems written by Manish Chandhok and published by . This book was released on 1996 with total page 570 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 842 pages
Book Rating : 4.E/5 ( download)
Download or read book Journal of Research of the National Institute of Standards and Technology written by and published by . This book was released on 1995 with total page 842 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.
Author : G.A. Armstrong
Publisher : IET
ISBN 13 : 0863417434
Total Pages : 457 pages
Book Rating : 4.8/5 (634 download)
Download or read book Technology Computer Aided Design for Si, SiGe and GaAs Integrated Circuits written by G.A. Armstrong and published by IET. This book was released on 2007-11-30 with total page 457 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first book to deal with a broad spectrum of process and device design, and modeling issues related to semiconductor devices, bridging the gap between device modelling and process design using TCAD. Presents a comprehensive perspective of emerging fields and covers topics ranging from materials to fabrication, devices, modelling and applications. Aimed at research-and-development engineers and scientists involved in microelectronics technology and device design via Technology CAD, and TCAD engineers and developers.
Author : Michael A. Lieberman
Publisher : John Wiley & Sons
ISBN 13 : 0471724246
Total Pages : 795 pages
Book Rating : 4.4/5 (717 download)
Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2005-04-08 with total page 795 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.
Author : Justin David Bukowski
Publisher :
ISBN 13 :
Total Pages : 402 pages
Book Rating : 4.:/5 (34 download)
Download or read book Computer Simulation of Low Pressure Plasma Discharges written by Justin David Bukowski and published by . This book was released on 1996 with total page 402 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Maxim Yu Orlov
Publisher : Springer Nature
ISBN 13 : 9819718724
Total Pages : 383 pages
Book Rating : 4.8/5 (197 download)
Download or read book Proceedings of the XII All Russian Scientific Conference on Current Issues of Continuum Mechanics and Celestial Mechanics written by Maxim Yu Orlov and published by Springer Nature. This book was released on 2024 with total page 383 pages. Available in PDF, EPUB and Kindle. Book excerpt: Zusammenfassung: This book presents peer reviewed articles from The XII All Russian Scientific Conference on Current issues of Continuum Mechanics and Celestial Mechanics (XII CICMCM), held on 15-17 November 2023, at Toms in, Russia. It summarizes the latest studies on shock and explosive loading of promising materials, including functionally graded materials, porous materials, multilayer ceramic structures, advanced materials and etc. It provides a platform for researchers (and professionals) to exchange ideas and present the latest findings in these important and growing areas of applied physics and engineering
Author : James K. Olthoff
Publisher : DIANE Publishing
ISBN 13 : 078812708X
Total Pages : 181 pages
Book Rating : 4.7/5 (881 download)
Download or read book Gaseous Electronics Conference Radio-Frequency Reference Cell written by James K. Olthoff and published by DIANE Publishing. This book was released on 1996 with total page 181 pages. Available in PDF, EPUB and Kindle. Book excerpt: The GEC RF Reference Cell is a parallel plate, capacity-coupled, rf plasma reactor that, in principle, is suitable for studies of basic discharge phenomena, investigation of industrial-type plasmas, and theoretical modeling. This report contains 12 articles that review nearly all of the experiments and theoretical modeling efforts that have been performed over the last 5 years using GEC cells. Together, they serve as a "users' guide" to the operation and performance of the GEC cell.
Author : HENRY WILLIAM TROMBLEY
Publisher :
ISBN 13 :
Total Pages : 332 pages
Book Rating : 4.3/5 (91 download)
Download or read book MODELING RF GLOW DISCHARGES FOR MICROELECTRONICS MANUFACTURING PROCESSES. written by HENRY WILLIAM TROMBLEY and published by . This book was released on 1991 with total page 332 pages. Available in PDF, EPUB and Kindle. Book excerpt: and with experimental measurements.
Author : R.J. Shul
Publisher : Springer Science & Business Media
ISBN 13 : 3642569897
Total Pages : 664 pages
Book Rating : 4.6/5 (425 download)
Download or read book Handbook of Advanced Plasma Processing Techniques written by R.J. Shul and published by Springer Science & Business Media. This book was released on 2011-06-28 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author : Electrochemical Society. Dielectric Science and Technology Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566770774
Total Pages : 622 pages
Book Rating : 4.7/5 (77 download)
Download or read book Proceedings of the Tenth Symposium on Plasma Processing written by Electrochemical Society. Dielectric Science and Technology Division and published by The Electrochemical Society. This book was released on 1994 with total page 622 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. Meyyappan
Publisher : The Electrochemical Society
ISBN 13 : 9781566770965
Total Pages : 644 pages
Book Rating : 4.7/5 (79 download)
Download or read book Proceedings of the Symposium Om Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing written by M. Meyyappan and published by The Electrochemical Society. This book was released on 1995 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : University of Michigan. College of Engineering
Publisher : UM Libraries
ISBN 13 :
Total Pages : 624 pages
Book Rating : 4.3/5 (91 download)
Download or read book College of Engineering written by University of Michigan. College of Engineering and published by UM Libraries. This book was released on 1997 with total page 624 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : T. J. Chung
Publisher : Cambridge University Press
ISBN 13 : 1139493299
Total Pages : pages
Book Rating : 4.1/5 (394 download)
Download or read book Computational Fluid Dynamics written by T. J. Chung and published by Cambridge University Press. This book was released on 2010-09-27 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The second edition of Computational Fluid Dynamics represents a significant improvement from the first edition. However, the original idea of including all computational fluid dynamics methods (FDM, FEM, FVM); all mesh generation schemes; and physical applications to turbulence, combustion, acoustics, radiative heat transfer, multiphase flow, electromagnetic flow, and general relativity is still maintained. The second edition includes a new section on preconditioning for EBE-GMRES and a complete revision of the section on flowfield-dependent variation methods, which demonstrates more detailed computational processes and includes additional example problems. For those instructors desiring a textbook that contains homework assignments, a variety of problems for FDM, FEM and FVM are included in an appendix. To facilitate students and practitioners intending to develop a large-scale computer code, an example of FORTRAN code capable of solving compressible, incompressible, viscous, inviscid, 1D, 2D and 3D for all speed regimes using the flowfield-dependent variation method is made available.
Author : Terry R. Turner
Publisher :
ISBN 13 :
Total Pages : 710 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advanced Techniques for Integrated Circuit Processing written by Terry R. Turner and published by . This book was released on 1991 with total page 710 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. Meyyappan
Publisher : Artech House Publishers
ISBN 13 :
Total Pages : 384 pages
Book Rating : 4.3/5 (91 download)
Download or read book Computational Modeling in Semiconductor Processing written by M. Meyyappan and published by Artech House Publishers. This book was released on 1995 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides you with in-depth coverage of the models, governing equations, and numerical techniques suitable for process simulation -- so you can give your designs the competitive edge. You will understand the basic principles of transport phenomena, gas phase, and surface reactions in electronics material processing, and learn practical numerical techniques used in process simulations.
Author : John Lynn Reynolds
Publisher :
ISBN 13 :
Total Pages : 506 pages
Book Rating : 4.:/5 (29 download)
Download or read book Characterization of Plasma Etched Structures in I.C. Processing written by John Lynn Reynolds and published by . This book was released on 1983 with total page 506 pages. Available in PDF, EPUB and Kindle. Book excerpt:
