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Modeling Of Defect Propagation Growth For Yield Impact Prediction In Vlsi Manufacturing
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Book Synopsis Modeling of Defect Propagation/growth for Yield Impact Prediction in VLSI Manufacturing by : Xiaolei Li
Download or read book Modeling of Defect Propagation/growth for Yield Impact Prediction in VLSI Manufacturing written by Xiaolei Li and published by . This book was released on 1997 with total page 12 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "Particulate contamination deposited on silicon wafers is typically the dominant reason for yield loss in VLSI manufacturing. The transformation of contaminating particles into defects and then electrical faults is a very complex process which depends on the defect location, size, material and the underlying IC topography. A rigorous topography simulator, METROPOLE, has been developed to allow the prediction and correlation of the critical physical parameters (material, size and location) of contamination in the manufacturing process to device defects. The results for a large number of defect samples simulated using the above approach were compared with data gathered from the AMD-Sunnyvale fabline. A good match was obtained indicating the accuracy of this method which provided a framework for developing contamination to defect propagation/growth macromodels. We have demonstrated that the understanding of defect transformation can be applied to early yield impact prediction."
Book Synopsis Modeling of Defect Propagation/growth for Early Yield Impact Prediction in VLSI Fabrication by : Xiaolei Li
Download or read book Modeling of Defect Propagation/growth for Early Yield Impact Prediction in VLSI Fabrication written by Xiaolei Li and published by . This book was released on 1997 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "Particulate contamination deposited on silicon wafers is typically the dominant reason for yield loss in VLSI manufacturing. The transformation of contaminating particles into defects and then electrical faults is a very complex process which depends on the defect location, size, material and the underlying IC topography. A rigorous topography simulator, METROPOLE has been developed to allow the prediction and correlation of the critical physical parameters (material, size and location) of contamination in the manufacturing process to device defects. The results for a large number of defect samples simulated using the above approach were compared with data gathered from the AMD-Sunnyvale fabline. A good match was obtained indicating the accuracy of this method which provided a framework for developing contamination to defect propagation/growth macromodels. We have demonstrated that the understanding of defect transformation can be applied to early yield impact prediction."
Book Synopsis A Study of Defect Propagation/growth for VLSI Manufacturing Yield Impact Prediction by : Xiaolei Li
Download or read book A Study of Defect Propagation/growth for VLSI Manufacturing Yield Impact Prediction written by Xiaolei Li and published by . This book was released on 1997 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "The transformation of contaminating particles into defects and then electrical faults is a very complex process which depends on the defect location, size, material and the underlying IC topography. A rigorous topography simulator, METROPOLE has been developed to allow the prediction and correlation of the critical physical parameters (material, size and location) of contamination in the manufacturing process to device defects. The results for a large number of defect samples simulated using the above approach were compared with data gathered from the AMD-Sunnyvale fabline. A good match was obtained indicating the accuracy of this method which provided a framework for developing contamination to defect propagation/growth macromodels. We have demonstrated that the understanding of the defect transformation can be applied to early yield impact prediction."
Book Synopsis Modeling of Contamination to Defect Transformation for Yield Impact Prediction in VLSI Manufacturing by : Mahesh Reddy
Download or read book Modeling of Contamination to Defect Transformation for Yield Impact Prediction in VLSI Manufacturing written by Mahesh Reddy and published by . This book was released on 1996 with total page 33 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "This report presents a new methodology to develop macromodels for yield limiting defects that propagate from one process step to the next. This methodology includes the measurement and analyses of in-line inspection data, use of a topography simulator to simulate the defects, design of simulator experiments and the extraction of results in the form of macromodels. The methodology is then applied to numerous examples for which macromodels are developed as a function of critical particle attributes."
Book Synopsis Modeling of Defect Propagation/growth for In-line Defect Inspection Optimization in VLSI Fabrication by : Xiaolei Li
Download or read book Modeling of Defect Propagation/growth for In-line Defect Inspection Optimization in VLSI Fabrication written by Xiaolei Li and published by . This book was released on 1997 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "Particulate contamination deposited on silicon wafers is typically the dominant reason for yield loss in VLSI manufacturing. The transformation of contaminating particles into defects and then electrical faults is a very complex process which depends on the defect location, size, material and the underlying IC topography. A rigorous 2D topography simulator, METROPOLE, has been developed to allow the prediction and correlation of the critical physical parameters (material, size and location) of contamination in the manufacturing process to device defects. The results for a large number of defect samples simulated using the above approach were compared with data gathered from the AMD-Sunnyvale fabline. A good match was obtained indicating the accuracy of this method which provided a framework for developing contamination to defect propagation/growth macromodels. We have demonstrated that the understanding of defect transformation can be applied to optimizing wafer inspection sampling strategy."
Book Synopsis Microelectronic Manufacturing Yield, Reliability, and Failure Analysis by :
Download or read book Microelectronic Manufacturing Yield, Reliability, and Failure Analysis written by and published by . This book was released on 1997 with total page 218 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Efficient Macromodeling of Defect Propagation/growth Mechanisms in VLSI Fabrication by : Xiaolei Li
Download or read book Efficient Macromodeling of Defect Propagation/growth Mechanisms in VLSI Fabrication written by Xiaolei Li and published by . This book was released on 1999* with total page 38 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "Particulate contamination deposited on silicon wafers is typically the dominant reason for yield loss in VLSI manufacturing. The transformation of contaminating particles into defects and then electrical faults is a very complex process which depends on the defect location, size, material and the underlying IC topography. An efficient defect macromodeling methodology based on the rigorous 2D topography simulator METROPOLE, has been developed to allow the prediction and correlation of the critical physical parameters (material, size and location) of contamination in the manufacturing process to device defects. The results for a large number of defect samples simulated using the above approach were compared with the data gathered from the AMD-Sunnyvale fabline. A good match was obtained indicating the accuracy for our method of developing contamination to defect propagation/growth macromodels."
Book Synopsis Application of Rigorous Topography Simulation for Modeling of Defect Propagation/growth in VLSI Fabrication by : Xiaolei Li
Download or read book Application of Rigorous Topography Simulation for Modeling of Defect Propagation/growth in VLSI Fabrication written by Xiaolei Li and published by . This book was released on 1997 with total page 10 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "Particulate contamination deposited on silicon wafers is typically the dominant reason for yield loss in VLSI manufacturing. The transformation of contaminating particles into defects and then electrical faults is a very complex process which depends on the defect location, size, material and the underlying IC topography. A rigorous 2D topography simulator based on the photolithography simulator METROPOLE, has been developed to allow the prediction and correlation of the critical physical parameters (material, size and location) of contamination in the manufacturing process to device defects. The results of a large number of defect samples simulated using the above approach were compared with data gathered from the AMD-Sunnyvale fabline. A good match was obtained indicating the accuracy of this method which provided a framework for developing contamination to defect propagation/growth macromodels."
Book Synopsis IEICE Transactions on Electronics by :
Download or read book IEICE Transactions on Electronics written by and published by . This book was released on 1999 with total page 1116 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Abstracts written by and published by . This book was released on 2002 with total page 2540 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Rigorous Topography Simulation of Contamination to Defect Transformation by : Xiaolei Li
Download or read book Rigorous Topography Simulation of Contamination to Defect Transformation written by Xiaolei Li and published by . This book was released on 1997 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: "Particulate contamination deposited on silicon wafers is typically the dominant reason for yield loss in VLSI manufacturing. The transformation of contaminating particles into defects and then electrical faults is a very complex process which depends on the defect location, size, material and the underlying IC topography. Rigorous 2D and 3D topography simulators based on the waveguide method have been developed to allow the prediction and correlation of the critical physical parameters (material, size and location) of contamination in the manufacturing process to device defects. The results of a large number of defect samples simulated using the above approach were compared with data gathered from the AMD-Sunnyvale fabline. A good match was obtained indicating the accuracy of this method which provided a framework for developing contamination to defect propagation/growth macromodels."
Book Synopsis International Aerospace Abstracts by :
Download or read book International Aerospace Abstracts written by and published by . This book was released on 1998 with total page 980 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Springer Handbook of Engineering Statistics by : Hoang Pham
Download or read book Springer Handbook of Engineering Statistics written by Hoang Pham and published by Springer Science & Business Media. This book was released on 2006 with total page 1135 pages. Available in PDF, EPUB and Kindle. Book excerpt: In today’s global and highly competitive environment, continuous improvement in the processes and products of any field of engineering is essential for survival. This book gathers together the full range of statistical techniques required by engineers from all fields. It will assist them to gain sensible statistical feedback on how their processes or products are functioning and to give them realistic predictions of how these could be improved. The handbook will be essential reading for all engineers and engineering-connected managers who are serious about keeping their methods and products at the cutting edge of quality and competitiveness.
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Fundamentals of Semiconductor Manufacturing and Process Control by : Gary S. May
Download or read book Fundamentals of Semiconductor Manufacturing and Process Control written by Gary S. May and published by John Wiley & Sons. This book was released on 2006-05-26 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt: A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Download or read book Physics Briefs written by and published by . This book was released on 1988 with total page 1570 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Science Abstracts written by and published by . This book was released on 1995 with total page 1874 pages. Available in PDF, EPUB and Kindle. Book excerpt:
