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Author : Vahid Vahedi
Publisher :
ISBN 13 :
Total Pages : 316 pages
Book Rating : 4.:/5 (33 download)
Download or read book Modeling and Simulation of RF Discharges Used for Plasma Processing written by Vahid Vahedi and published by . This book was released on 1993 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Michael A. Lieberman
Publisher : John Wiley & Sons
ISBN 13 : 1394245378
Total Pages : 837 pages
Book Rating : 4.3/5 (942 download)
Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2024-10-15 with total page 837 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
Author : Jean-Marc Philibert
Publisher : EDP Sciences
ISBN 13 : 2759801721
Total Pages : 603 pages
Book Rating : 4.7/5 (598 download)
Download or read book Atom movements - Diffusion and mass transport in solids written by Jean-Marc Philibert and published by EDP Sciences. This book was released on 2013-01-02T00:00:00+01:00 with total page 603 pages. Available in PDF, EPUB and Kindle. Book excerpt: The present book is the result of diverse courses on diffusion. It is intended to give as complete an overview as possible of diffusion in solid media, while relating the process of diffusion to both their physical bases and their applications. A series of a real situations is covered in this account, from self-diffusion of radiotracers to the more complex cases of mass flow under chemical or thermal gradients or under electric fields, or diffusion in structures of lower dimensionality (surfaces and interfaces). In all these analyses, no category of materials was favored; metals, ionic crystals, oxydes, and semiconductors all had their turn. Only polymers were not specifically touched. One chapter is specifically devoted to techniques for studying diffusion, including methods of numerical simulation, and a last and long chapter gives a number of metallurgical phenomena in which diffusion plays a fundamental role.
Author : Rodrigo Martins
Publisher : Trans Tech Publications Ltd
ISBN 13 : 3035705666
Total Pages : 80 pages
Book Rating : 4.0/5 (357 download)
Download or read book Plasma Processing and Dusty Particles written by Rodrigo Martins and published by Trans Tech Publications Ltd. This book was released on 2001-11-30 with total page 80 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume is indexed by Thomson Reuters CPCI-S (WoS). These proceedings describe the most recent advances and trends in the fields of dusty and colloidal plasmas: a new discipline which is highly relevant to those working on nanostructured materials, nanotechnologies and devices which are processed using plasma and fusion tools. For instance, in the case of thin-film devices, the production of new materials such as polymorphous or quasi-morphous silicon or even silicon nanotubes is highly dependent upon the production of particles, in the plasma, which are suitable for incorporation into the films produced. Therefore, it is very important to know how dusty and colloidal plasmas behave, and how high-grade electronic films can be processed under such conditions.
Author : A. I. Morozov
Publisher : CRC Press
ISBN 13 : 1439881332
Total Pages : 828 pages
Book Rating : 4.4/5 (398 download)
Download or read book Introduction to Plasma Dynamics written by A. I. Morozov and published by CRC Press. This book was released on 2012-12-06 with total page 828 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the twenty-first century progresses, plasma technology will play an increasing role in our lives, providing new sources of energy, ion-plasma processing of materials, wave electromagnetic radiation sources, space plasma thrusters, and more. Studies of the plasma state of matter not only accelerate technological developments but also improve the
Author : Carlos M. Ferreira
Publisher : Springer Science & Business Media
ISBN 13 : 1489911308
Total Pages : 556 pages
Book Rating : 4.4/5 (899 download)
Download or read book Microwave Discharges written by Carlos M. Ferreira and published by Springer Science & Business Media. This book was released on 2013-11-21 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of a NATO ARW held in Vimeiro, Portugal, May 11-15, 1992
Author : Brian Chapman
Publisher : Wiley-Interscience
ISBN 13 :
Total Pages : 434 pages
Book Rating : 4.3/5 (91 download)
Download or read book Glow Discharge Processes written by Brian Chapman and published by Wiley-Interscience. This book was released on 1980 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
Author : Daniel Dale Wake
Publisher :
ISBN 13 :
Total Pages : 378 pages
Book Rating : 4.:/5 (59 download)
Download or read book The Simulation of Plasma Based Semiconductor Processing Using Block Structured Locally Refined Grids written by Daniel Dale Wake and published by . This book was released on 1998 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : R.W Hockney
Publisher : CRC Press
ISBN 13 : 9781439822050
Total Pages : 566 pages
Book Rating : 4.8/5 (22 download)
Download or read book Computer Simulation Using Particles written by R.W Hockney and published by CRC Press. This book was released on 2021-03-24 with total page 566 pages. Available in PDF, EPUB and Kindle. Book excerpt: Computer simulation of systems has become an important tool in scientific research and engineering design, including the simulation of systems through the motion of their constituent particles. Important examples of this are the motion of stars in galaxies, ions in hot gas plasmas, electrons in semiconductor devices, and atoms in solids and liquids. The behavior of the system is studied by programming into the computer a model of the system and then performing experiments with this model. New scientific insight is obtained by observing such computer experiments, often for controlled conditions that are not accessible in the laboratory. Computer Simulation using Particles deals with the simulation of systems by following the motion of their constituent particles. This book provides an introduction to simulation using particles based on the NGP, CIC, and P3M algorithms and the programming principles that assist with the preparations of large simulation programs based on the OLYMPUS methodology. It also includes case study examples in the fields of astrophysics, plasmas, semiconductors, and ionic solids as well as more detailed mathematical treatment of the models, such as their errors, dispersion, and optimization. This resource will help you understand how engineering design can be assisted by the ability to predict performance using the computer model before embarking on costly and time-consuming manufacture.
Author : National Research Council
Publisher : National Academies Press
ISBN 13 : 0309045975
Total Pages : 88 pages
Book Rating : 4.3/5 (9 download)
Download or read book Plasma Processing of Materials written by National Research Council and published by National Academies Press. This book was released on 1991-02-01 with total page 88 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author : Francis F. Chen
Publisher : Springer Science & Business Media
ISBN 13 : 1461501814
Total Pages : 213 pages
Book Rating : 4.4/5 (615 download)
Download or read book Lecture Notes on Principles of Plasma Processing written by Francis F. Chen and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Author : Jeremiah U. Brackbill
Publisher : Academic Press
ISBN 13 : 1483257568
Total Pages : 457 pages
Book Rating : 4.4/5 (832 download)
Download or read book Multiple Time Scales written by Jeremiah U. Brackbill and published by Academic Press. This book was released on 2014-05-10 with total page 457 pages. Available in PDF, EPUB and Kindle. Book excerpt: Multiple Time Scales presents various numerical methods for solving multiple-time-scale problems. The selection first elaborates on considerations on solving problems with multiple scales; problems with different time scales; and nonlinear normal-mode initialization of numerical weather prediction models. Discussions focus on analysis of observations, nonlinear analysis, systems of ordinary differential equations, and numerical methods for problems with multiple scales. The text then examines the diffusion-synthetic acceleration of transport iterations, with application to a radiation hydrodynamics problem and implicit methods in combustion and chemical kinetics modeling. The publication ponders on molecular dynamics and Monte Carlo simulations of rare events; direct implicit plasma simulation; orbit averaging and subcycling in particle simulation of plasmas; and hybrid and collisional implicit plasma simulation models. Topics include basic moment method, electron subcycling, gyroaveraged particle simulation, and the electromagnetic direct implicit method. The selection is a valuable reference for researchers interested in pursuing further research on the use of numerical methods in solving multiple-time-scale problems.
Author : Toshiaki Makabe
Publisher : CRC Press
ISBN 13 : 1420012274
Total Pages : 355 pages
Book Rating : 4.4/5 (2 download)
Download or read book Plasma Electronics written by Toshiaki Makabe and published by CRC Press. This book was released on 2006-03-27 with total page 355 pages. Available in PDF, EPUB and Kindle. Book excerpt: Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
Author : Annemie Bogaerts
Publisher : MDPI
ISBN 13 : 3038977500
Total Pages : 248 pages
Book Rating : 4.0/5 (389 download)
Download or read book Plasma Catalysis written by Annemie Bogaerts and published by MDPI. This book was released on 2019-04-02 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma catalysis is gaining increasing interest for various gas conversion applications, such as CO2 conversion into value-added chemicals and fuels, N2 fixation for the synthesis of NH3 or NOx, methane conversion into higher hydrocarbons or oxygenates. It is also widely used for air pollution control (e.g., VOC remediation). Plasma catalysis allows thermodynamically difficult reactions to proceed at ambient pressure and temperature, due to activation of the gas molecules by energetic electrons created in the plasma. However, plasma is very reactive but not selective, and thus a catalyst is needed to improve the selectivity. In spite of the growing interest in plasma catalysis, the underlying mechanisms of the (possible) synergy between plasma and catalyst are not yet fully understood. Indeed, plasma catalysis is quite complicated, as the plasma will affect the catalyst and vice versa. Moreover, due to the reactive plasma environment, the most suitable catalysts will probably be different from thermal catalysts. More research is needed to better understand the plasma–catalyst interactions, in order to further improve the applications.
Author : David H. Bailey
Publisher : SIAM
ISBN 13 : 9780898713442
Total Pages : 900 pages
Book Rating : 4.7/5 (134 download)
Download or read book Proceedings of the Seventh SIAM Conference on Parallel Processing for Scientific Computing written by David H. Bailey and published by SIAM. This book was released on 1995-01-01 with total page 900 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings -- Parallel Computing.
Author : Michael A. Lieberman
Publisher : John Wiley & Sons
ISBN 13 : 0471724246
Total Pages : 795 pages
Book Rating : 4.4/5 (717 download)
Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2005-04-08 with total page 795 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.
Author : Michael Keidar
Publisher : Academic Press
ISBN 13 : 0128137037
Total Pages : 587 pages
Book Rating : 4.1/5 (281 download)
Download or read book Plasma Engineering written by Michael Keidar and published by Academic Press. This book was released on 2018-08-06 with total page 587 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Engineering, Second Edition, applies the unique properties of plasmas (ionized gases) to improve processes and performance over many fields, such as materials processing, spacecraft propulsion and nanofabrication. The book considers this rapidly expanding discipline from a unified standpoint, addressing fundamentals of physics and modeling, as well as new and real-word applications in aerospace, nanotechnology and bioengineering. This updated edition covers the fundamentals of plasma physics at a level suitable for students using application examples and contains the widest variety of applications of any text on the market, spanning the areas of aerospace engineering, nanotechnology and nanobioengineering. This is highly useful for courses on plasma engineering or plasma physics in departments of Aerospace Engineering, Electrical Engineering and Physics. It is also useful as an introduction to plasma engineering and its applications for early career researchers and practicing engineers. - Features new material relevant to application, including emerging areas of plasma nanotechnology and medicine - Contains a new chapter on plasma-based control, as well as a description of RF and microwave-based plasma applications, plasma lighting, reforming and other most recent application areas - Provides a technical treatment of the fundamental and engineering principles used in plasma applications
