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Modeling And Design Of A Physical Vapor Deposition Process Assisted By Thermal Plasma Ps Pvd
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Book Synopsis Modeling and Design of a Physical Vapor Deposition Process Assisted by Thermal Plasma (PS-PVD) by : Dmitrii Ivchenko
Download or read book Modeling and Design of a Physical Vapor Deposition Process Assisted by Thermal Plasma (PS-PVD) written by Dmitrii Ivchenko and published by . This book was released on 2018 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Spray Physical Vapor Deposition (PS-PVD) aims to substantially evaporate material in powder form by means of a DC plasma jet to produce coatings with various microstructures built by vapor condensation and/or by deposition of nanoclusters. In the conventional PS-PVD process, all the material treatment takes place in a medium vacuum atmosphere, limiting the evaporation process or requiring very high-power torches. In the present work, an extension of conventional PS-PVD process as a two-chamber process is proposed and investigated by means of numerical modeling: the powder is vaporized in a high pressure chamber (105 Pa) connected to the low pressure (100 or 1,000 Pa) deposition chamber by an expansion nozzle, allowing more energetically efficient evaporation of coarse YSZ powders using relatively low power plasma torches. Expansion nozzle erosion and clogging can obstruct the feasibility of such a system. In the present work, through the use of computational fluid dynamics, kinetic nucleation theory and cluster growth equations it is shown through careful adjustment of system dimensions and operating parameters both problems can be avoided or minimized. Divergence angle of the expansion nozzle is optimized to decrease the clogging risk and to reach the most uniform coating and spray characteristics using the aforementioned approaches linked with a DSMC model of the rarefied plasma gas flow. Results show that for 100 Pa, the thermal barrier coating would be mainly built from vapor deposition unlike 1,000 Pa for which it is mainly built by cluster deposition.
Book Synopsis Ionized Physical Vapor Deposition by :
Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference. Key Features: The first comprehensive volume on ionized physical vapor deposition Combines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVD Emphasizes practical applications in the area of IC fabrication and interconnect technology Serves as a guide to select the most appropriate technology for any deposition application *This single source saves time and effort by including comprehensive information at one's finger tips *The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD *The numerous practical applications assist the working engineer to select and refine thin film processes
Book Synopsis Handbook of Physical Vapor Deposition (PVD) Processing by : D. M. Mattox
Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Book Synopsis Thermal Spray Fundamentals by : Maher I. Boulos
Download or read book Thermal Spray Fundamentals written by Maher I. Boulos and published by Springer Nature. This book was released on 2021-10-19 with total page 1147 pages. Available in PDF, EPUB and Kindle. Book excerpt: This fully revised, industry-standard resource offers practical details on every aspect of the fundamentals necessary for understanding thermal spray technology, from powder all the way to the final part. The second edition is presented in a reader-friendly format that is split into four parts. Part I presents a review of thermal spray coating and its position in the broad field of surface modification technologies. Highlights of combustion and thermal plasmas are given with an expanded treatment of in-flight plasma-particle interactions. The second and third parts deal respectively with an updated presentation of thermal spray technologies and coating formation, including solution and suspension plasma spraying. The last part of the book includes a comparative analysis of different thermal spray processes, which is essential for the optimal selection of the appropriate thermal spray process in a given application. Coverage of system integration has been expanded with the addition of a detailed discussion of online instrumentation and process diagnostics and numerous examples of industrial scale spray booth designs. Attention is also given to coating finishing and health and safety issues. An extensive review is presented of thermal spray applications grouped in terms of process objectives and present use in different industrial sectors. This book will serve as an invaluable resource as a textbook for graduate courses in the field and as an exhaustive reference for professionals involved in the thermal spray field.
Book Synopsis Encyclopedia of Plasma Technology - Two Volume Set by : J. Leon Shohet
Download or read book Encyclopedia of Plasma Technology - Two Volume Set written by J. Leon Shohet and published by CRC Press. This book was released on 2016-12-12 with total page 1654 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Book Synopsis Physical Vapor Deposition of Thin Films by : John E. Mahan
Download or read book Physical Vapor Deposition of Thin Films written by John E. Mahan and published by Wiley-Interscience. This book was released on 2000-02-01 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of: * Thermal evaporation, sputtering, and pulsed laser deposition techniques * Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges * Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets * Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam
Book Synopsis Deposition Mechanisms of Thermal Barrier Coatings (TBCs) Manufactured by Plasma Spray-physical Vapor Deposition (PS-PVD) by : Wenting He
Download or read book Deposition Mechanisms of Thermal Barrier Coatings (TBCs) Manufactured by Plasma Spray-physical Vapor Deposition (PS-PVD) written by Wenting He and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Modeling and Measurements of an Ionized Physical Vapor Deposition Device Plasma by : Daniel Rene Juliano
Download or read book Modeling and Measurements of an Ionized Physical Vapor Deposition Device Plasma written by Daniel Rene Juliano and published by . This book was released on 2000 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Design of Thermal Barrier Coatings by : Mohit Gupta
Download or read book Design of Thermal Barrier Coatings written by Mohit Gupta and published by Springer. This book was released on 2015-05-05 with total page 93 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book details the relationships between microstructure, interface roughness, and properties of thermal barrier coatings. The author proposes a method for the reduction of the thermal conductivity of the ceramic layer in order to increase the lifetime of thermal barrier coatings. He includes models for the optimization of ceramic layer microstructure and interface roughness.
Book Synopsis Modeling Plasma Equipment and Feature Profile in Ionized Metal Physical Vapor Deposition by : Junqing Lu
Download or read book Modeling Plasma Equipment and Feature Profile in Ionized Metal Physical Vapor Deposition written by Junqing Lu and published by . This book was released on 2001 with total page 294 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Inductive Plasma Physical Vapor Deposition for Shape Memory Alloys by :
Download or read book Inductive Plasma Physical Vapor Deposition for Shape Memory Alloys written by and published by . This book was released on 1999 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This work sought to use inductive thermal plasmas to deposit superelastic alloys from a wire source. It was found that unbiased sources could not be heated sufficiently at the tip to produce a measurable deposition rate. NiTi and Cu films were deposited at very low rates (on the order of 10 nm/min) using roughly 200 VDC applied to the wire relative to the substrate. Thermal modeling suggests that pulse biasing is necessary to achieve high deposition rates.
Book Synopsis Plasma and Ion Assistance in Physical Vapor Deposition by :
Download or read book Plasma and Ion Assistance in Physical Vapor Deposition written by and published by . This book was released on 2007 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Deposition of films using plasma or plasma-assist can betraced back surprisingly far, namely to the 18th century for arcs and tothe 19th century for sputtering. However, only since the 1960s thecoatings community considered other processes than evaporation for largescale commercial use. Ion Plating was perhaps the first importantprocess, introducing vapor ionization and substrate bias to generate abeam of ions arriving on the surface of the growing film. Ratherindependently, cathodic arc deposition was established as an energeticcondensation process, first in the former Soviet Union in the 1970s, andin the 1980s in the Western Hemisphere. About a dozen various ion-basedcoating technologies evolved in the last decades, all characterized byspecific plasma or ion generation processes. Gridded and gridless ionsources were taken from space propulsion and applied to thin filmdeposition. Modeling and simulation have helped to make plasma and ionseffects to be reasonably well understood. Yet--due to the complex, oftennon-linear and non-equilibrium nature of plasma and surfaceinteractions--there is still a place for the experience plasma"sourcerer."
Book Synopsis The Foundations of Vacuum Coating Technology by : Donald M. Mattox
Download or read book The Foundations of Vacuum Coating Technology written by Donald M. Mattox and published by William Andrew. This book was released on 2018-08-21 with total page 383 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. History and detailed descriptions of Vacuum Deposition Technologies Review of Enabling Technologies and their importance to current applications Extensively referenced text Patents are referenced as part of the history Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology Glossary of Terms for vacuum coating
Book Synopsis Physical Vapor Deposition (PVD) by : Robert Moran
Download or read book Physical Vapor Deposition (PVD) written by Robert Moran and published by . This book was released on 1990-01-01 with total page 346 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Thermal Barrier Coatings: Failure Theory and Evaluation Technology by : Yichun Zhou
Download or read book Thermal Barrier Coatings: Failure Theory and Evaluation Technology written by Yichun Zhou and published by Springer Nature. This book was released on 2022-10-08 with total page 943 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book highlights the failure theories and evaluation techniques of thermal barrier coatings, covering the thermal-mechanical–chemical coupling theories, performance and damage characterization techniques, and related evaluations. Thermal barrier coatings are the key thermal protection materials for high-temperature components in advanced aeroengines. Coating spallation is a major technical bottleneck faced by researchers. The extremely complex microstructure, diverse service environments, and failure behaviors bring challenges to the spallation analysis in terms of the selective use of mechanical theories, experimental methods, and testing platforms. In the book, the authors provide a systematic summary of the latest research and technological advances and present their insights and findings in the past couple of decades. This book is not only suitable for researchers and engineers in thermal barrier coatings and related fields but also a good reference for upper-undergraduate and postgraduate students of materials science and mechanics majors.
Book Synopsis Principles of Chemical Vapor Deposition by : Daniel Dobkin
Download or read book Principles of Chemical Vapor Deposition written by Daniel Dobkin and published by Springer Science & Business Media. This book was released on 2003-04-30 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Book Synopsis Principles of Vapor Deposition of Thin Films by : Professor K.S. K.S Sree Harsha
Download or read book Principles of Vapor Deposition of Thin Films written by Professor K.S. K.S Sree Harsha and published by Elsevier. This book was released on 2005-12-16 with total page 1173 pages. Available in PDF, EPUB and Kindle. Book excerpt: The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
