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Author : Xiaofeng Wang (Ph. D.)
Publisher :
ISBN 13 :
Total Pages : 134 pages
Book Rating : 4.:/5 (192 download)
Download or read book Microstructure and Electronic Structure Study of Hf-based High-K Thin Films written by Xiaofeng Wang (Ph. D.) and published by . This book was released on 2006 with total page 134 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Klaus Wetzig
Publisher : John Wiley & Sons
ISBN 13 : 3527606475
Total Pages : 388 pages
Book Rating : 4.5/5 (276 download)
Download or read book Metal Based Thin Films for Electronics written by Klaus Wetzig and published by John Wiley & Sons. This book was released on 2006-03-06 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: This up-to-date handbook covers the main topics of preparation, characterization and properties of complex metal-based layer systems. The authors -- an outstanding group of researchers -- discuss advanced methods for structure, chemical and electronic state characterization with reference to the properties of thin functional layers, such as metallization and barrier layers for microelectronics, magnetoresistive layers for GMR and TMR, sensor and resistance layers. As such, the book addresses materials specialists in industry, especially in microelectronics, as well as scientists, and can also be recommended for advanced studies in materials science, analytics, surface and solid state science.
Author : Jason Stephen Corneille
Publisher :
ISBN 13 :
Total Pages : 482 pages
Book Rating : 4.:/5 (349 download)
Download or read book Chemical and Electronic Structure Studies of Refractory and Dielectric Thin Films written by Jason Stephen Corneille and published by . This book was released on 1994 with total page 482 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Samares Kar
Publisher : The Electrochemical Society
ISBN 13 : 1566778220
Total Pages : 621 pages
Book Rating : 4.5/5 (667 download)
Download or read book Physics and Technology of High-k Materials 8 written by Samares Kar and published by The Electrochemical Society. This book was released on 2010-10 with total page 621 pages. Available in PDF, EPUB and Kindle. Book excerpt: The issue of ECS Transactions will cover comprehensively all the aspects of high-k material physics and technology: Diverse High Mobility Substrates, High-k Materials, Metal Gate Electrode Materials, Deposition Techniques, Bulk Material Properties, Flat-Band Voltage Issues and Control, Interfaces, Gate Stack Reliability, Electrical, Chemical, and Physical Chatracterization, Novel Applications, High-k and Diverse Insulators for Photonics, High-k Processing/ Manufacturing.
Author : Evgeni Gusev
Publisher : Springer Science & Business Media
ISBN 13 : 1402043678
Total Pages : 495 pages
Book Rating : 4.4/5 (2 download)
Download or read book Defects in HIgh-k Gate Dielectric Stacks written by Evgeni Gusev and published by Springer Science & Business Media. This book was released on 2006-02-15 with total page 495 pages. Available in PDF, EPUB and Kindle. Book excerpt: The goal of this NATO Advanced Research Workshop (ARW) entitled “Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices”, which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. The special feature of this workshop was focus on an important issue of defects in this novel class of materials. One of the key obstacles to high-k integration into Si nano-technology are the electronic defects in high-k materials. It has been established that defects do exist in high-k dielectrics and they play an important role in device operation. However, very little is known about the nature of the defects or about possible techniques to eliminate, or at least minimize them. Given the absence of a feasible alternative in the near future, well-focused scientific research and aggressive development programs on high-k gate dielectrics and related devices must continue for semiconductor electronics to remain a competitive income producing force in the global market.
Author : Achim Schöll
Publisher :
ISBN 13 :
Total Pages : 135 pages
Book Rating : 4.:/5 (217 download)
Download or read book High-resolution Investigation of the Electronic Structure of Organic Thin Films written by Achim Schöll and published by . This book was released on 2003 with total page 135 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Gang He
Publisher : John Wiley & Sons
ISBN 13 : 3527646361
Total Pages : 560 pages
Book Rating : 4.5/5 (276 download)
Download or read book High-k Gate Dielectrics for CMOS Technology written by Gang He and published by John Wiley & Sons. This book was released on 2012-08-10 with total page 560 pages. Available in PDF, EPUB and Kindle. Book excerpt: A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
Author : Young-Hee Kim
Publisher : Morgan & Claypool Publishers
ISBN 13 : 1598290053
Total Pages : 100 pages
Book Rating : 4.5/5 (982 download)
Download or read book Hf-Based High-k Dielectrics written by Young-Hee Kim and published by Morgan & Claypool Publishers. This book was released on 2006-01-01 with total page 100 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this work, the reliability of HfO2 (hafnium oxide) with poly gate and dual metal gate electrode (Ru–Ta alloy, Ru) was investigated. Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. Dynamic stressing has also been used. It was found that the combination of trapping and detrapping contributed to the enhancement of the projected lifetime. The results from the polarity dependence studies showed that the substrate injection exhibited a shorter projected lifetime and worse soft breakdown behavior, compared to the gate injection. The origin of soft breakdown (first breakdown) was studied and the results suggested that the soft breakdown may be due to one layer breakdown in the bilayer structure (HfO2/SiO2: 4 nm/4 nm). Low Weibull slope was in part attributed to the lower barrier height of HfO2 at the interface layer. Interface layer optimization was conducted in terms of mobility, swing, and short channel effect using deep submicron MOSFET devices.
Author : D. A. Buchanan
Publisher : Cambridge University Press
ISBN 13 : 9781107413320
Total Pages : 404 pages
Book Rating : 4.4/5 (133 download)
Download or read book Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: written by D. A. Buchanan and published by Cambridge University Press. This book was released on 2014-06-05 with total page 404 pages. Available in PDF, EPUB and Kindle. Book excerpt: With the ever-decreasing dimension, laterally and vertically, in CMOS and DRAM technology, the understanding of thin insulators and their interfaces with silicon have become of critical importance. As a result of this scaling of semiconductor devices, an increased interest from industrial, government, and university laboratories has become evident in this field of study. The book, first published in 2000, includes detailed theoretical studies of the nature of SiO2 and its interface with silicon, electron paramagnetic resonance for the study of defects, electron tunneling, and band alignment among others. There are also studies developing new techniques and advancing our understanding of these dielectrics and interfaces, including addressing the issue of dielectric breakdown. Aside from the work addressing SiO2, there are a number of papers regarding the application of the so-called 'high-k' dielectrics. The high-k materials addressed in the volume include such films as Ta2O5, HfO2, Bi2Ti2O7, CeO2, and ZrO2.
Author : Donald Anthony Telesca
Publisher :
ISBN 13 :
Total Pages : 630 pages
Book Rating : 4.:/5 (78 download)
Download or read book Local Electronic Structure of Magnetic and Superconducting Thin Films written by Donald Anthony Telesca and published by . This book was released on 2010 with total page 630 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Marco Malvestuto
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (14 download)
Download or read book Tructural and Electronic Study of High-k Dielectric Thin Films on Si(100) written by Marco Malvestuto and published by . This book was released on 2006 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Institute of Standards and Technology (U.S.)
Publisher :
ISBN 13 :
Total Pages : 464 pages
Book Rating : 4.3/5 (243 download)
Download or read book Publications of the National Institute of Standards and Technology ... Catalog written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1991 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Harry A. Atwater
Publisher : Mrs Proceedings
ISBN 13 :
Total Pages : 784 pages
Book Rating : 4.3/5 (91 download)
Download or read book Evolution of Surface and Thin Film Microstructure: Volume 280 written by Harry A. Atwater and published by Mrs Proceedings. This book was released on 1993-10-27 with total page 784 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : Patrick W. DeHaven
Publisher :
ISBN 13 :
Total Pages : 336 pages
Book Rating : 4.3/5 (91 download)
Download or read book Magnetic and Electronic Films - Microstructure, Texture and Application to Data Storage: Volume 721 written by Patrick W. DeHaven and published by . This book was released on 2002-08-02 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : Pui-fai Lee
Publisher :
ISBN 13 :
Total Pages : 148 pages
Book Rating : 4.:/5 (546 download)
Download or read book Study of HfO2 Based High-k Gate Dielectric Thin Films Grown by Pulsed Laser Deposition written by Pui-fai Lee and published by . This book was released on 2004 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Niladri Pratap Maity
Publisher : CRC Press
ISBN 13 : 1000527441
Total Pages : 248 pages
Book Rating : 4.0/5 (5 download)
Download or read book High-k Gate Dielectric Materials written by Niladri Pratap Maity and published by CRC Press. This book was released on 2020-12-18 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.
Author : Michel Houssa
Publisher : CRC Press
ISBN 13 : 9781420034141
Total Pages : 624 pages
Book Rating : 4.0/5 (341 download)
Download or read book High k Gate Dielectrics written by Michel Houssa and published by CRC Press. This book was released on 2003-12-01 with total page 624 pages. Available in PDF, EPUB and Kindle. Book excerpt: The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be requ
