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Mechanistic Studies Of The Chemical Vapor Deposition Of Ceramic And Metal Films From Organometallic Precursors
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Book Synopsis Mechanistic Studies of the Chemical Vapor Deposition of Ceramic and Metal Films from Organometallic Precursors by : Jinwoo Cheon
Download or read book Mechanistic Studies of the Chemical Vapor Deposition of Ceramic and Metal Films from Organometallic Precursors written by Jinwoo Cheon and published by . This book was released on 1993 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Mechanistic Studies of Organometallic Chemical Vapor Deposition of Metal Thin Films by : Michael Yingmin Wei
Download or read book Mechanistic Studies of Organometallic Chemical Vapor Deposition of Metal Thin Films written by Michael Yingmin Wei and published by . This book was released on 1992 with total page 132 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Chemistry of Metal CVD by : Toivo T. Kodas
Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Book Synopsis Kinetic and Mechanistic Studies of Chemical Vapor Deposition Processes on Metal Surfaces by : Elizabeth Larson Crane
Download or read book Kinetic and Mechanistic Studies of Chemical Vapor Deposition Processes on Metal Surfaces written by Elizabeth Larson Crane and published by . This book was released on 2000 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Metal-Organic Chemical Vapor Deposition of Electronic Ceramics II: Volume 415 by : Seshu B. Desu
Download or read book Metal-Organic Chemical Vapor Deposition of Electronic Ceramics II: Volume 415 written by Seshu B. Desu and published by . This book was released on 1996-02-28 with total page 290 pages. Available in PDF, EPUB and Kindle. Book excerpt: The use of high-performance ceramic materials in microelectronics holds the potential for the development of a wide range of novel, high-value products. For example, ferroelectric ceramic capacitors are key to the development of high-density ferroelectric nonvolatile memory (FRAM). High-dielectric constant para-electric capacitors are potentially useful for the production of high-density dynamic random access memory (DRAM) and for decoupling capacitors in high-speed microprocessors. Electro-optic materials are useful as waveguides, tunable filters and switches in advance communication applications. Researchers come together in this book to discuss both the application of metal-organic chemical vapor deposited (MOCVD) materials to microelectronics and the 'nuts and bolts' of the technique. A wide variety of opto-electronic, superconducting, ferroelectric and other advanced ceramic materials are discussed. Problems of dealing with low-volatility precursors, design of new precursors, and characterization of CVD processes are addressed. Topics include: nonoxide ceramics; precursor chemistry and delivery; process analysis and characterization; and oxide ceramics.
Book Synopsis Handbook of Chemical Vapor Deposition by : Hugh O. Pierson
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 2012-12-02 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Book Synopsis Inorganic Chemistry Seminar Abstracts by :
Download or read book Inorganic Chemistry Seminar Abstracts written by and published by . This book was released on 1992 with total page 510 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition by : Srinivasan Sivaram
Download or read book Chemical Vapor Deposition written by Srinivasan Sivaram and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition by : S Neralla
Download or read book Chemical Vapor Deposition written by S Neralla and published by BoD – Books on Demand. This book was released on 2016-08-31 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Book Synopsis Chemical Vapor Deposition by : Jong-Hee Park
Download or read book Chemical Vapor Deposition written by Jong-Hee Park and published by ASM International. This book was released on 2001 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Studies of Low Pressure Chemical Vapor Deposition of AIN and SiC Films Using Organometallic Precursors by : Wei Lee
Download or read book Studies of Low Pressure Chemical Vapor Deposition of AIN and SiC Films Using Organometallic Precursors written by Wei Lee and published by . This book was released on 1988 with total page 76 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Metal-organic Chemical Vapor Deposition of Electronic Ceramics by :
Download or read book Metal-organic Chemical Vapor Deposition of Electronic Ceramics written by and published by . This book was released on 1996 with total page 288 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition of Refractory Metals and Ceramics: Volume 168 by : Theodore M. Besmann
Download or read book Chemical Vapor Deposition of Refractory Metals and Ceramics: Volume 168 written by Theodore M. Besmann and published by . This book was released on 1990-04-11 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Papers originally presented at the symposium on [title] held in Boston, November/December 1989. The contributions are organized into six sections, covering fundamentals/modeling, diagnostics, process- microstructure relationships, microstructure-mechanical property relationships, novel/large-scale technologies, and metal-organic chemical vapor deposition. Acidic paper. Annotation copyrighted by Book News, Inc., Portland, OR
Book Synopsis Dissertation Abstracts International by :
Download or read book Dissertation Abstracts International written by and published by . This book was released on 1997 with total page 806 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :Electrochemical Society. High Temperature Materials Division Publisher :The Electrochemical Society ISBN 13 :9781566771788 Total Pages :1686 pages Book Rating :4.7/5 (717 download)
Book Synopsis Chemical Vapor Deposition by : Electrochemical Society. High Temperature Materials Division
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition of Refractory Metals and Ceramics 2. Materials Research Society Symposium Proceedings Held in Boston, Massachusetts on December 4-6, 1991 by :
Download or read book Chemical Vapor Deposition of Refractory Metals and Ceramics 2. Materials Research Society Symposium Proceedings Held in Boston, Massachusetts on December 4-6, 1991 written by and published by . This book was released on 1993 with total page 375 pages. Available in PDF, EPUB and Kindle. Book excerpt: The production of thin or thin films of metals or ceramics by chemical vapor deposition has often been achieved by the use of halide gas precursors. In certain cases, this choice was made purely for reasons of simplicity: gas cylinder, gas species already used in another field, etc. Experience has subsequently shown, however, that this choice can give rise to significant changes in the nature and proportions of deposited phases. These are highly dependent upon: the value of the oxidiser: reducer ratio in the gas phase, the degree of metal oxidation in the halide considered, and possible competition between two reducing agents designed to reduce the halide. These factors, among others, strongly influence the thermochemistry of the deposition reaction. Their roles must therefore be clearly understood, interpreted and predicted by the thermochemical analysis. Based on examples relating to silicide, nitride and boride deposits, an attempt will be made to determine sensitive parameters and deduce selection criteria.
