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Author : Gary L. Allman
Publisher :
ISBN 13 :
Total Pages : 46 pages
Book Rating : 4.:/5 (216 download)
Download or read book Low Pressure Chemical Vapor Deposition System for Polysilicon written by Gary L. Allman and published by . This book was released on 1977 with total page 46 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Jianwen Zhu
Publisher :
ISBN 13 :
Total Pages : 172 pages
Book Rating : 4.:/5 (285 download)
Download or read book Design and Implementation of a Low Pressure Chemical Vapor Deposition System for Polysilicon and Silicon Nitride written by Jianwen Zhu and published by . This book was released on 1992 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : George Henry Prueger
Publisher :
ISBN 13 :
Total Pages : 91 pages
Book Rating : 4.:/5 (227 download)
Download or read book Equipment Model for the Low Pressure Chemical Vapor Deposition of Polysilicon written by George Henry Prueger and published by . This book was released on 1988 with total page 91 pages. Available in PDF, EPUB and Kindle. Book excerpt: An equipment model has been developed for the low pressure chemical vapor deposition (LPCVD) of polycrystalline silicon in a horizontal tube furnace. The model predicts the wafer-to-wafer deposition rate down the length of the tube. Inputs to the model include: silane flow rates from three injectors, injector locations, locations of and temperatures at three thermocouples, operating pressure, the number of wafers, wafer diameter, the location of the wafer load, and other physical dimensions of the furnace such as tube length and inner diameter. The model is intended to aid the process engineer in the operation of equipment, including the selection of optimum process parameters and process control based on measured deposition thickness. The model is also flexible enough to aid in the design of new equipment. The one dimensional finite difference model encompasses the convective and diffusive fluxes of silane and hydrogen in the annular space between the wafer load and tube walls. The reaction of silane is modeled with full account taken of the generation and transport of hydrogen. Kinetic and injection parameters in the model were calibrated using a series of nine statistically designed experiments which varied four parameters over three levels. The model accurately predicts the axial deposition profile over the full range of experimentation and demonstrates good extrapolation beyond the range of experimental calibration. The model was used to predict a set of process parameters that would result in the least variation of deposition rate down the tube. Keywords: Semiconductors.
Author : Sabine Le Marquis
Publisher :
ISBN 13 :
Total Pages : 234 pages
Book Rating : 4.:/5 (238 download)
Download or read book Low Pressure Chemical Vapor Deposition of Polycrystalline Silicon and Silicon Nitride written by Sabine Le Marquis and published by . This book was released on 1990 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Arthur Sherman
Publisher : William Andrew
ISBN 13 :
Total Pages : 240 pages
Book Rating : 4.3/5 (91 download)
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Author : Michael Trainor
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (599 download)
Download or read book Studies of Low Pressure Chemical Vapour Deposition (LPCVD) of Polysilicon written by Michael Trainor and published by . This book was released on 1990 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hemlock Semiconductor Corporation
Publisher :
ISBN 13 :
Total Pages : 60 pages
Book Rating : 4.3/5 (91 download)
Download or read book Development of a Polysilicon Process Based on Chemical Vapor Deposition (phase 1) written by Hemlock Semiconductor Corporation and published by . This book was released on 1980 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Thomas O. Sedgwick
Publisher :
ISBN 13 :
Total Pages : 696 pages
Book Rating : 4.E/5 ( download)
Download or read book Proceedings of the Seventh International Conference on Chemical Vapor Deposition, 1979 written by Thomas O. Sedgwick and published by . This book was released on 1979 with total page 696 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ted Kamins
Publisher : Springer Science & Business Media
ISBN 13 : 1461555779
Total Pages : 391 pages
Book Rating : 4.4/5 (615 download)
Download or read book Polycrystalline Silicon for Integrated Circuits and Displays written by Ted Kamins and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 391 pages. Available in PDF, EPUB and Kindle. Book excerpt: Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition presents much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon. By properly understanding the properties of polycrystalline silicon and their relation to the deposition conditions, polysilicon can be designed to ensure optimum device and integrated-circuit performance. Polycrystalline silicon has played an important role in integrated-circuit technology for two decades. It was first used in self-aligned, silicon-gate, MOS ICs to reduce capacitance and improve circuit speed. In addition to this dominant use, polysilicon is now also included in virtually all modern bipolar ICs, where it improves the basic physics of device operation. The compatibility of polycrystalline silicon with subsequent high-temperature processing allows its efficient integration into advanced IC processes. This compatibility also permits polysilicon to be used early in the fabrication process for trench isolation and dynamic random-access-memory (DRAM) storage capacitors. In addition to its integrated-circuit applications, polysilicon is becoming vital as the active layer in the channel of thin-film transistors in place of amorphous silicon. When polysilicon thin-film transistors are used in advanced active-matrix displays, the peripheral circuitry can be integrated into the same substrate as the pixel transistors. Recently, polysilicon has been used in the emerging field of microelectromechanical systems (MEMS), especially for microsensors and microactuators. In these devices, the mechanical properties, especially the stress in the polysilicon film, are critical to successful device fabrication. Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition is an invaluable reference for professionals and technicians working with polycrystalline silicon in the integrated circuit and display industries.
Author : Karl Frederick Roenigk
Publisher :
ISBN 13 :
Total Pages : 726 pages
Book Rating : 4.:/5 (319 download)
Download or read book Analysis of Low Pressure Chemical Vapor Deposition Processes written by Karl Frederick Roenigk and published by . This book was released on 1987 with total page 726 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Xiaodong Wang
Publisher :
ISBN 13 :
Total Pages : 106 pages
Book Rating : 4.:/5 (221 download)
Download or read book Process and System Considerations for Low Temperature Oxide Low Pressure Chemical Vapor Deposition written by Xiaodong Wang and published by . This book was released on 1989 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ted Kamins
Publisher : Springer Science & Business Media
ISBN 13 : 1461316812
Total Pages : 302 pages
Book Rating : 4.4/5 (613 download)
Download or read book Polycrystalline Silicon for Integrated Circuit Applications written by Ted Kamins and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent years have seen silicon integrated circuits enter into an increasing number of technical and consumer applications, until they now affect everyday life, as well as technical areas. Polycrystalline silicon has been an important component of silicon technology for nearly two decades, being used first in MOS integrated circuits and now becoming pervasive in bipolar circuits, as well. During this time a great deal of informa tion has been published about polysilicon. A wide range of deposition conditions has been used to form films exhibiting markedly different properties. Seemingly contradictory results can often be explained by considering the details of the structure formed. This monograph is an attempt to synthesize much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon so that it can be used most effectively to enhance device and integrated-circuit perfor mance. As device performance improves, however, some of the proper ties of polysilicon are beginning to restrict the overall performance of integrated circuits, and the basic limitations of the properties of polysili con also need to be better understood to minimize potential degradation of circuit behavior.
Author : M. L. Hitchman
Publisher : Academic Press
ISBN 13 :
Total Pages : 692 pages
Book Rating : 4.:/5 (2 download)
Download or read book Chemical Vapor Deposition written by M. L. Hitchman and published by Academic Press. This book was released on 1993-04-13 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt: This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Author : Ara Philipossian
Publisher :
ISBN 13 :
Total Pages : 236 pages
Book Rating : 4.:/5 (141 download)
Download or read book Low Pressure Chemical Vapor Deposition (LPCVD) of Silicon Dioxide at High Temperatures written by Ara Philipossian and published by . This book was released on 1985 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Konstantinos Zekentes
Publisher : Materials Research Forum LLC
ISBN 13 : 1945291842
Total Pages : 250 pages
Book Rating : 4.9/5 (452 download)
Download or read book Advancing Silicon Carbide Electronics Technology I written by Konstantinos Zekentes and published by Materials Research Forum LLC. This book was released on 2018-09-25 with total page 250 pages. Available in PDF, EPUB and Kindle. Book excerpt: The rapidly advancing Silicon Carbide technology has a great potential in high temperature and high frequency electronics. High thermal stability and outstanding chemical inertness make SiC an excellent material for high-power, low-loss semiconductor devices. The present volume presents the state of the art of SiC device fabrication and characterization. Topics covered include: SiC surface cleaning and etching techniques; electrical characterization methods and processing of ohmic contacts to silicon carbide; analysis of contact resistivity dependence on material properties; limitations and accuracy of contact resistivity measurements; ohmic contact fabrication and test structure design; overview of different metallization schemes and processing technologies; thermal stability of ohmic contacts to SiC, their protection and compatibility with device processing; Schottky contacts to SiC; Schottky barrier formation; Schottky barrier inhomogeneity in SiC materials; technology and design of 4H-SiC Schottky and Junction Barrier Schottky diodes; Si/SiC heterojunction diodes; applications of SiC Schottky diodes in power electronics and temperature/light sensors; high power SiC unipolar and bipolar switching devices; different types of SiC devices including material and technology constraints on device performance; applications in the area of metal contacts to silicon carbide; status and prospects of SiC power devices.
Author : C. P. Wong
Publisher : Elsevier
ISBN 13 : 1483289397
Total Pages : 676 pages
Book Rating : 4.4/5 (832 download)
Download or read book Polymers for Electronic & Photonic Application written by C. P. Wong and published by Elsevier. This book was released on 2013-10-22 with total page 676 pages. Available in PDF, EPUB and Kindle. Book excerpt: The most recent advances in the use of polymeric materials by the electronic industry can be found in Polymers for Electronic and Photonic Applications. This bookprovides in-depth coverage of photoresis for micro-lithography, microelectronic encapsulants and packaging, insulators, dielectrics for multichip packaging,electronic and photonic applications of polymeric materials, among many other topics. Intended for engineers and scientists who design, process, and manufacturemicroelectronic components, this book will also prove useful for hybrid and systems packaging managers who want to be informed of the very latest developments inthis field. * Presents most recent advances in the use of polymeric materials by the electronic industry* Contributions by foremost experts in the field
Author : Thomas P. Wendling
Publisher :
ISBN 13 :
Total Pages : 158 pages
Book Rating : 4.:/5 (256 download)
Download or read book Selective Low Pressure Chemical Vapor Deposition of TaSi 2 on Silicon written by Thomas P. Wendling and published by . This book was released on 1990 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt:
