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Author : American Ceramic Society
Publisher :
ISBN 13 :
Total Pages : 1058 pages
Book Rating : 4.E/5 ( download)
Download or read book Ceramic Abstracts written by American Ceramic Society and published by . This book was released on 1997 with total page 1058 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Duward F. Shriver
Publisher : John Wiley & Sons
ISBN 13 : 9780471867739
Total Pages : 340 pages
Book Rating : 4.8/5 (677 download)
Download or read book The Manipulation of Air-Sensitive Compounds written by Duward F. Shriver and published by John Wiley & Sons. This book was released on 1986-11-05 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt: Revised to reflect the continuing and growing importance of research and development within this field, The Manipulation of Air-Sensitive Compounds, 2nd Edition offers state-of-the-art methods used in handling air-sensitive compounds, including gases. Part One covers inert atmosphere techniques, while Part Two treats vacuum line techniques. Appendixes provide safety data, information on materials used to construct apparatus, and a table of vapor pressures of common volatile substances.
Author : Cary Y. Yang
Publisher : Springer Science & Business Media
ISBN 13 : 3642848044
Total Pages : 439 pages
Book Rating : 4.6/5 (428 download)
Download or read book Amorphous and Crystalline Silicon Carbide IV written by Cary Y. Yang and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 439 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon carbide and other group IV-IV materials in their amorphous, microcrystalline, and crystalline forms have a wide variety of applications.The contributions to this volume report recent developments and trends in the field. The purpose is to make available the current state of understanding of the materials and their potential applications. Eachcontribution focuses on a particular topic, such as preparation methods, characterization, and models explaining experimental findings. The volume also contains the latest results in the exciting field of SiGe/Si heterojunction bipolar transistors. The reader will find this book valuable as a reference source, an up-to-date and in-depth overview of this field, and, most importantly, as a window into the immense range of reading potential applications of silicon carbide. It is essential for scientists, engineers and students interested in electronic materials, high-speed heterojunction devices, and high-temperature optoelectronics.
Author : William C. O'Mara
Publisher : William Andrew
ISBN 13 :
Total Pages : 826 pages
Book Rating : 4.3/5 (91 download)
Download or read book Handbook of Semiconductor Silicon Technology written by William C. O'Mara and published by William Andrew. This book was released on 1990-12-31 with total page 826 pages. Available in PDF, EPUB and Kindle. Book excerpt: A summary of the science, technology, and manufacturing of semiconductor silicon materials. Properties of silicon are detailed, and a set of silicon binary phase diagrams is included. Other aspects such as materials handling, safety, impurity, and defect reduction are also discussed.
Author : Richard B. Fair
Publisher : Academic Press
ISBN 13 : 0323139809
Total Pages : 441 pages
Book Rating : 4.3/5 (231 download)
Download or read book Rapid Thermal Processing written by Richard B. Fair and published by Academic Press. This book was released on 2012-12-02 with total page 441 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
Author : Ion I. Geru
Publisher : Springer
ISBN 13 : 3030012107
Total Pages : 372 pages
Book Rating : 4.0/5 (3 download)
Download or read book Time-Reversal Symmetry written by Ion I. Geru and published by Springer. This book was released on 2018-12-31 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book introduces new developments in the field of Time-Reversal Symmetry presenting, for the first time, the Wigner time-reversal operator in the form of a product of two- or three time-reversal operators of lower symmetry. The action of these operators leads to the sign change of only one or two angular momentum components, not of all of them. It demonstrates that there are six modes of time-reversal symmetry breaking that do not lead to the complete disappearance of the symmetry but to its lowering. The full restoration of the time-reversal symmetry in the six cases mentioned is possible by introducing six types of metaparticles. The book also confirms the presence of six additional time-reversal operators using a group-theoretical method. The problem is only where to seek these metaparticles. The book discusses time-reversal symmetry in classical mechanics, classical and relativistic electrodynamics, quantum mechanics and theory of quantized fields, including dynamical reversibility and statistical irreversibility of the time, Wigner’s and Herring’s criteria, Kramers theorem, selection rules due to time-reversal symmetry, Onsager’s relations, Poincaré recurrence theorem, and CPT theorem. It particularly focuses attention on time-reversal symmetry violation. It is proposed a new method of testing the time-reversal symmetry, which is confirmed experimentally by EPR spectroscopy data. It shows that the traditional black-white point groups of magnetic symmetry are not applicable to magnetic systems with Kramers degeneration of energy levels and that magnetic groups of four-color symmetry are adequate for them. Further, it addresses the predicted structural distortions in Kramers three-homonuclear magnetic clusters due to time-reversal symmetry that have been identified experimentally. Lastly, it proposes a method of synthesis of two-nuclear coordination compounds with predictable magnetic properties, based on the application of the time-reversal transformation that was confirmed experimentally.
Author : Sorin Cristoloveanu
Publisher : Elsevier
ISBN 13 : 0128196432
Total Pages : 384 pages
Book Rating : 4.1/5 (281 download)
Download or read book Fully Depleted Silicon-On-Insulator written by Sorin Cristoloveanu and published by Elsevier. This book was released on 2021-08-06 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt: Fully Depleted Silicon-On-Insulator provides an in-depth presentation of the fundamental and pragmatic concepts of this increasingly important technology. There are two main technologies in the marketplace of advanced CMOS circuits: FinFETs and fully depleted silicon-on-insulators (FD-SOI). The latter is unchallenged in the field of low-power, high-frequency, and Internet-of-Things (IOT) circuits. The topic is very timely at research and development levels. Compared to existing books on SOI materials and devices, this book covers exhaustively the FD-SOI domain. Fully Depleted Silicon-On-Insulator is based on the expertise of one of the most eminent individuals in the community, Dr. Sorin Cristoloveanu, an IEEE Andrew Grove 2017 award recipient "For contributions to silicon-on-insulator technology and thin body devices." In the book, he shares key insights on the technological aspects, operation mechanisms, characterization techniques, and most promising emerging applications. Early praise for Fully Depleted Silicon-On-Insulator "It is an excellent written guide for everyone who would like to study SOI deeply, specially focusing on FD-SOI." --Dr. Katsu Izumi, Formerly at NTT Laboratories and then at Osaka Prefecture University, Japan "FDSOI technology is poised to catch an increasingly large portion of the semiconductor market. This book fits perfectly in this new paradigm [...] It covers many SOI topics which have never been described in a book before." --Professor Jean-Pierre Colinge, Formerly at TSMC and then at CEA-LETI, Grenoble, France "This book, written by one of the true experts and pioneers in the silicon-on-insulator field, is extremely timely because of the growing footprint of FD-SOI in modern silicon technology, especially in IoT applications. Written in a delightfully informal style yet comprehensive in its coverage, the book describes both the device physics underpinning FD-SOI technology and the cutting-edge, perhaps even futuristic devices enabled by it." --Professor Alexander Zaslavsky, Brown University, USA "A superbly written book on SOI technology by a master in the field." --Professor Yuan Taur, University of California, San Diego, USA "The author is a world-top researcher of SOI device/process technology. This book is his masterpiece and important for the FD-SOI archive. The reader will learn much from the book." --Professor Hiroshi Iwai, National Yang Ming Chiao Tung University, Taiwan From the author "It is during our global war against the terrifying coalition of corona and insidious computer viruses that this book has been put together. Continuous enlightenment from FD-SOI helped me cross this black and gray period. I shared a lot of myself in this book. The rule of the game was to keep the text light despite the heavy technical content. There are even tentative FD-SOI hieroglyphs on the front cover, composed of curves discussed in the book." Written by a top expert in the silicon-on-insulator community and IEEE Andrew Grove 2017 award recipient Comprehensively addresses the technology aspects, operation mechanisms and electrical characterization techniques for FD-SOI devices Discusses FD-SOI's most promising device structures for memory, sensing and emerging applications
Author : Peng Zhang
Publisher : William Andrew
ISBN 13 : 1437778089
Total Pages : 866 pages
Book Rating : 4.4/5 (377 download)
Download or read book Advanced Industrial Control Technology written by Peng Zhang and published by William Andrew. This book was released on 2010-08-26 with total page 866 pages. Available in PDF, EPUB and Kindle. Book excerpt: Control engineering seeks to understand physical systems, using mathematical modeling, in terms of inputs, outputs and various components with different behaviors. It has an essential role in a wide range of control systems, from household appliances to space flight. This book provides an in-depth view of the technologies that are implemented in most varieties of modern industrial control engineering. A solid grounding is provided in traditional control techniques, followed by detailed examination of modern control techniques such as real-time, distributed, robotic, embedded, computer and wireless control technologies. For each technology, the book discusses its full profile, from the field layer and the control layer to the operator layer. It also includes all the interfaces in industrial control systems: between controllers and systems; between different layers; and between operators and systems. It not only describes the details of both real-time operating systems and distributed operating systems, but also provides coverage of the microprocessor boot code, which other books lack. In addition to working principles and operation mechanisms, this book emphasizes the practical issues of components, devices and hardware circuits, giving the specification parameters, install procedures, calibration and configuration methodologies needed for engineers to put the theory into practice. - Documents all the key technologies of a wide range of industrial control systems - Emphasizes practical application and methods alongside theory and principles - An ideal reference for practicing engineers needing to further their understanding of the latest industrial control concepts and techniques
Author : Munir H. Nayfeh
Publisher : Elsevier
ISBN 13 : 0323480586
Total Pages : 604 pages
Book Rating : 4.3/5 (234 download)
Download or read book Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines written by Munir H. Nayfeh and published by Elsevier. This book was released on 2018-06-29 with total page 604 pages. Available in PDF, EPUB and Kindle. Book excerpt: Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines: Current and Future Trends addresses current and future trends in the application and commercialization of nanosilicon. The book presents current, innovative and prospective applications and products based on nanosilicon and their binary system in the fields of energy harvesting and storage, lighting (solar cells and nano-capacitor and fuel cell devices and nanoLEDs), electronics (nanotransistors and nanomemory, quantum computing, photodetectors for space applications; biomedicine (substance detection, plasmonic treatment of disease, skin and hair care, implantable glucose sensor, capsules for drug delivery and underground water and oil exploration), and art (glass and pottery). Moreover, the book includes material on the use of advanced laser and proximal probes for imaging and manipulation of nanoparticles and atoms. In addition, coverage is given to carbon and how it contrasts and integrates with silicon with additional related applications. This is a valuable resource to all those seeking to learn more about the commercialization of nanosilicon, and to researchers wanting to learn more about emerging nanosilicon applications. - Features a variety of designs and operation of nano-devices, helping engineers to make the best use of nanosilicon - Contains underlying principles of how nanomaterials work and the variety of applications they provide, giving those new to nanosilicon a fundamental understanding - Assesses the viability of various nanoslicon devices for mass production and commercialization, thereby providing an important source of information for engineers
Author : Charles P. Marsden
Publisher :
ISBN 13 :
Total Pages : 472 pages
Book Rating : 4.3/5 (91 download)
Download or read book Silicon Device Processing written by Charles P. Marsden and published by . This book was released on 1970 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: The objective of the Symposium was to provide an opportunity for engineers and applied scientists actively engaged in the silicon device technology field to discuss the most advanced measurement methods for process control and materials characterization.The basic theme of the meeting was to stress the interdependence of measurements techniques, facilities, and materials as they relate to the overall problems of improving and advancing silicon device sciences and technologies.(Author).
Author : Hugh O. Pierson
Publisher : William Andrew
ISBN 13 : 1437744885
Total Pages : 459 pages
Book Rating : 4.4/5 (377 download)
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 2012-12-02 with total page 459 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Author : D.M. Dobkin
Publisher : Springer Science & Business Media
ISBN 13 : 9401703698
Total Pages : 277 pages
Book Rating : 4.4/5 (17 download)
Download or read book Principles of Chemical Vapor Deposition written by D.M. Dobkin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author : Masakazu Anpo
Publisher : John Wiley & Sons
ISBN 13 :
Total Pages : 200 pages
Book Rating : 4.3/5 (91 download)
Download or read book Surface Photochemistry written by Masakazu Anpo and published by John Wiley & Sons. This book was released on 1996-10-21 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: This first volume in the series brings together the latest developments in solid surface photochemistry, providing insights into the most up to date research activities on light-initiated chemical reactions. The book offers a comprehensive study of the photochemical and photophysical properties of molecules on various surfaces like zeolites, metals and metal oxides. Chapter 1 discusses the nature of the photochemical and photophysical reactions occurring on solid surfaces. Subsequent chapters deal with a description of the dynamical aspects of surface photohemistry, a study of the specific nature of photochemistry of molecules included within zeolite cavities and a comprehensive study of the reactivities of photo-generated electron-hole pair states involved in photo-induced and photocatalytic reactions. The book also investigates many possible and actual key applications of solid surface photochemistry, such as molecular photo-devices, photo-chemical vapour deposition of thin layered semiconductors, sensitive optical media and control of photochemical reaction paths as well as efficient photocatalytic reaction processes which will be indispensable for ecologically clean and safe chemical systems. Surface Photochemistry will be of interest to researchers in surface science and also to graduate students interested in catalysis or photo-chemistry. It will be valuable as a reference book for academics in many aspects of materials science.
Author : Ronald Breslow
Publisher :
ISBN 13 : 9780897663373
Total Pages : 344 pages
Book Rating : 4.6/5 (633 download)
Download or read book Annals of the New York Academy of Sciences written by Ronald Breslow and published by . This book was released on 1986 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Electrochemical Society. High Temperature Materials Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566771788
Total Pages : 1686 pages
Book Rating : 4.7/5 (717 download)
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Theodore M. Besmann
Publisher : The Electrochemical Society
ISBN 13 : 9781566771559
Total Pages : 922 pages
Book Rating : 4.7/5 (715 download)
Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:
![Download Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII PDF Online Free](https://books.google.com/books/content/images/frontcover/wUnw2OLLYf4C?fife=w200-h370)
Author : Ram Ekwal Sah
Publisher : The Electrochemical Society
ISBN 13 : 9781566774598
Total Pages : 606 pages
Book Rating : 4.7/5 (745 download)
Download or read book Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII written by Ram Ekwal Sah and published by The Electrochemical Society. This book was released on 2005 with total page 606 pages. Available in PDF, EPUB and Kindle. Book excerpt:
