Lithography Hotspot Detection

Download Lithography Hotspot Detection full books in PDF, epub, and Kindle. Read online Lithography Hotspot Detection ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!

Lithography Hotspot Detection

Author :
Publisher :
ISBN 13 :
Total Pages : 129 pages
Book Rating : 4.:/5 (13 download)

DOWNLOAD NOW!

Book Synopsis Lithography Hotspot Detection by :

Download or read book Lithography Hotspot Detection written by and published by . This book was released on 2017 with total page 129 pages. Available in PDF, EPUB and Kindle. Book excerpt: The lithography process for chip manufacturing has been playing a critical role in keeping Moor's law alive. Even though the wavelength used for the process is bigger than actual device feature size, which makes it difficult to transfer layout patterns from the mask to wafer, lithographers have developed a various technique such as Resolution Enhancement Techniques (RETs), Multi-patterning, and Optical Proximity Correction (OPC) to overcome the sub-wavelength lithography gap. However, as feature size in chip design scales down further to a point where manufacturing constraints must be applied to early design phase before generating physical design layout. Design for Manufacturing (DFM) is not optional anymore these days. In terms of the lithography process, circuit designer should consider making their design as litho-friendly as possible. Lithography hotspot is a place where it is susceptible to have fatal pinching (open circuit) or bridging (short circuit) error due to poor printability of certain patterns in a design layout. To avoid undesirable patterns in layout, it is mandatory to find hotspots in early design stage. One way to find hotspots is to run lithography simulation on a layout. However, lithography simulation is too computationally expensive for full-chip design. Therefore, there have been suggestions such as pattern matching and machine learning (ML) technique for an alternative and practical hotspot detection method. Pattern matching is fast and accurate. Large hotspot pattern library is utilized to find hotspots. Its drawback is that it can not detect hotspots that are unseen before. On contrast, ML is effective to find previously unseen hotspots, but it may produce false positives. This research presents a novel geometric pattern matching methodology using edge driven dissected rectangles and litho award machine learning for hotspot detection.

Enhanced Data Sampling and Feature Generation for Machine Learning-based Lithography Hotspot Detection

Author : Mohamed Ismail
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (138 download)

DOWNLOAD NOW!

Book Synopsis Enhanced Data Sampling and Feature Generation for Machine Learning-based Lithography Hotspot Detection by : Mohamed Ismail

Download or read book Enhanced Data Sampling and Feature Generation for Machine Learning-based Lithography Hotspot Detection written by Mohamed Ismail and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: Technology scaling has increased the complexity of integrated circuit design. It has also led to more challenges in the field of Design for Manufacturing (DFM). One of these challenges is lithography hotspot detection. Hotspots (HS) are design patterns that negatively affect the output yield. Identifying these patterns early in the design phase is crucial for high yield fabrication. Machine Learning-based (ML) hotspot detection techniques are promising since they have shown superior results to other methods such as pattern matching. Training ML models is a challenging task due two main reasons. Firstly, industrial training designs contain millions of unique patterns. It is impractical to train models using this large number of patterns due to limited computational and memory resources. Secondly, the HS detection problem has an imbalanced nature; datasets typically have a limited number of HS and a large number of nonhotspots. This requires the use of data sampling techniques to choose the best representative dataset for training. In this thesis, we explore the problem of hotspot detection using machine learning. Specifically, we tackle the problem of data sampling where we introduce a method for dataset selection that enables the reduction of the training dataset size and improves the data balance between hotspot and non-hotspot patterns. In addition, we explore feature engineering using image gradients as a method of improving ML HS detection models.

A Fuzzy Matching Model with Dimensionality Reduction for Lithography Hotspot Detection

Author : 陳靜怡
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (866 download)

DOWNLOAD NOW!

Book Synopsis A Fuzzy Matching Model with Dimensionality Reduction for Lithography Hotspot Detection by : 陳靜怡

Download or read book A Fuzzy Matching Model with Dimensionality Reduction for Lithography Hotspot Detection written by 陳靜怡 and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Model Assist Hotspot Detection Via Object Detection Approach with Lithography Simulator

Author :
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (139 download)

DOWNLOAD NOW!

Book Synopsis Model Assist Hotspot Detection Via Object Detection Approach with Lithography Simulator by :

Download or read book Model Assist Hotspot Detection Via Object Detection Approach with Lithography Simulator written by and published by . This book was released on 2023 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Machine Learning-Based Hotspot Detection

Author : Gaurav Rajavendra Reddy
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (134 download)

DOWNLOAD NOW!

Book Synopsis Machine Learning-Based Hotspot Detection by : Gaurav Rajavendra Reddy

Download or read book Machine Learning-Based Hotspot Detection written by Gaurav Rajavendra Reddy and published by . This book was released on 2020 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Extensive technology scaling has not only increased the complexity of Integrated Circuit (IC) fabrication but also multiplied the challenges in the Design For Manufacturability (DFM) space. Among these challenges, detection of design weak-points, popularly known as Lithographic Hotspots, has attracted substantial attention. Hotspots are certain patterns which exhibit a higher probability of causing defects due to complex design-process interactions. Identifying such patterns and fixing them in the design stage itself is imperative towards ensuring high yield. In the early days of hotspot detection, Pattern Matching (PM) based methods were proposed. While effective in identifying previously known patterns, these methods failed to identify Never-Seen-Before (NSB) hotspots. To address this drawback, Machine Learning (ML) based solutions were introduced. Over the last decade, we have witnessed a plethora of ML-based hotspot detection methods being developed, each slightly outperforming its predecessors in accuracy and false-alarm rates. In this work, we critically analyze the ML-based hotspot detection literature and we highlight common fallacies which are found therein. We pinpoint the pitfalls in the ICCAD-2012 benchmarks that have led to these fallacies. We propose an enhanced version of this benchmark dataset, titled ICCAD-2019 benchmarks, which we deem more appropriate for accurately assessing hotspot detection methods. We offer our best recommendations /marching orders to improve the effectiveness of ML-based hotspot detection methods and experimentally demonstrate the effectiveness of the proposed methods in comparison to the stateof-the-art. Furthermore, we perform the first ever silicon validation of hotspots, wherein, we fabricate several hotspot patterns on silicon, study their electrical characteristics and propose a methodology to rank them. Through Early Design Space Exploration (EDSE), we also perform the first quantitative demonstration of early hotspot detection and TrulyNever-Seen-Before (TNSB) hotspot detection.

Machine Learning Applications in Electronic Design Automation

Author : Haoxing Ren
Publisher : Springer Nature
ISBN 13 : 303113074X
Total Pages : 585 pages
Book Rating : 4.0/5 (311 download)

DOWNLOAD NOW!

Book Synopsis Machine Learning Applications in Electronic Design Automation by : Haoxing Ren

Download or read book Machine Learning Applications in Electronic Design Automation written by Haoxing Ren and published by Springer Nature. This book was released on 2023-01-01 with total page 585 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book serves as a single-source reference to key machine learning (ML) applications and methods in digital and analog design and verification. Experts from academia and industry cover a wide range of the latest research on ML applications in electronic design automation (EDA), including analysis and optimization of digital design, analysis and optimization of analog design, as well as functional verification, FPGA and system level designs, design for manufacturing (DFM), and design space exploration. The authors also cover key ML methods such as classical ML, deep learning models such as convolutional neural networks (CNNs), graph neural networks (GNNs), generative adversarial networks (GANs) and optimization methods such as reinforcement learning (RL) and Bayesian optimization (BO). All of these topics are valuable to chip designers and EDA developers and researchers working in digital and analog designs and verification.

Machine Learning Techniques for VLSI Chip Design

Author : Abhishek Kumar
Publisher : John Wiley & Sons
ISBN 13 : 1119910471
Total Pages : 244 pages
Book Rating : 4.1/5 (199 download)

DOWNLOAD NOW!

Book Synopsis Machine Learning Techniques for VLSI Chip Design by : Abhishek Kumar

Download or read book Machine Learning Techniques for VLSI Chip Design written by Abhishek Kumar and published by John Wiley & Sons. This book was released on 2023-06-26 with total page 244 pages. Available in PDF, EPUB and Kindle. Book excerpt: MACHINE LEARNING TECHNIQUES FOR VLSI CHIP DESIGN This cutting-edge new volume covers the hardware architecture implementation, the software implementation approach, the efficient hardware of machine learning applications with FPGA or CMOS circuits, and many other aspects and applications of machine learning techniques for VLSI chip design. Artificial intelligence (AI) and machine learning (ML) have, or will have, an impact on almost every aspect of our lives and every device that we own. AI has benefitted every industry in terms of computational speeds, accurate decision prediction, efficient machine learning (ML), and deep learning (DL) algorithms. The VLSI industry uses the electronic design automation tool (EDA), and the integration with ML helps in reducing design time and cost of production. Finding defects, bugs, and hardware Trojans in the design with ML or DL can save losses during production. Constraints to ML-DL arise when having to deal with a large set of training datasets. This book covers the learning algorithm for floor planning, routing, mask fabrication, and implementation of the computational architecture for ML-DL. The future aspect of the ML-DL algorithm is to be available in the format of an integrated circuit (IC). A user can upgrade to the new algorithm by replacing an IC. This new book mainly deals with the adaption of computation blocks like hardware accelerators and novel nano-material for them based upon their application and to create a smart solution. This exciting new volume is an invaluable reference for beginners as well as engineers, scientists, researchers, and other professionals working in the area of VLSI architecture development.

Machine Learning in VLSI Computer-Aided Design

Author : Ibrahim (Abe) M. Elfadel
Publisher : Springer
ISBN 13 : 3030046664
Total Pages : 694 pages
Book Rating : 4.0/5 (3 download)

DOWNLOAD NOW!

Book Synopsis Machine Learning in VLSI Computer-Aided Design by : Ibrahim (Abe) M. Elfadel

Download or read book Machine Learning in VLSI Computer-Aided Design written by Ibrahim (Abe) M. Elfadel and published by Springer. This book was released on 2019-03-15 with total page 694 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides readers with an up-to-date account of the use of machine learning frameworks, methodologies, algorithms and techniques in the context of computer-aided design (CAD) for very-large-scale integrated circuits (VLSI). Coverage includes the various machine learning methods used in lithography, physical design, yield prediction, post-silicon performance analysis, reliability and failure analysis, power and thermal analysis, analog design, logic synthesis, verification, and neuromorphic design. Provides up-to-date information on machine learning in VLSI CAD for device modeling, layout verifications, yield prediction, post-silicon validation, and reliability; Discusses the use of machine learning techniques in the context of analog and digital synthesis; Demonstrates how to formulate VLSI CAD objectives as machine learning problems and provides a comprehensive treatment of their efficient solutions; Discusses the tradeoff between the cost of collecting data and prediction accuracy and provides a methodology for using prior data to reduce cost of data collection in the design, testing and validation of both analog and digital VLSI designs. From the Foreword As the semiconductor industry embraces the rising swell of cognitive systems and edge intelligence, this book could serve as a harbinger and example of the osmosis that will exist between our cognitive structures and methods, on the one hand, and the hardware architectures and technologies that will support them, on the other....As we transition from the computing era to the cognitive one, it behooves us to remember the success story of VLSI CAD and to earnestly seek the help of the invisible hand so that our future cognitive systems are used to design more powerful cognitive systems. This book is very much aligned with this on-going transition from computing to cognition, and it is with deep pleasure that I recommend it to all those who are actively engaged in this exciting transformation. Dr. Ruchir Puri, IBM Fellow, IBM Watson CTO & Chief Architect, IBM T. J. Watson Research Center

Microlithography

Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1439876762
Total Pages : 838 pages
Book Rating : 4.4/5 (398 download)

DOWNLOAD NOW!

Book Synopsis Microlithography by : Bruce W. Smith

Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 838 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.

Security, Privacy and Data Analytics

Author : Udai Pratap Rao
Publisher : Springer Nature
ISBN 13 : 9819935695
Total Pages : 424 pages
Book Rating : 4.8/5 (199 download)

DOWNLOAD NOW!

Book Synopsis Security, Privacy and Data Analytics by : Udai Pratap Rao

Download or read book Security, Privacy and Data Analytics written by Udai Pratap Rao and published by Springer Nature. This book was released on 2023-09-19 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book constitutes refereed proceedings of the International Conference on Security, Privacy and Data Analytics, ISPDA 2022. The volume covers topics, including big data and analytics, cloud security and privacy, data intelligence, hardware security, network security, blockchain technology and distributed ledger, machine learning for security, and many others. The volume includes novel contributions and the latest developments from researchers across industry and academia working in security, privacy, and data analytics from technological and social perspectives. This book will emerge as a valuable reference for researchers, instructors, students, scientists, engineers, managers, and industry practitioners across the globe.

Dependable Embedded Systems

Author : Jörg Henkel
Publisher : Springer Nature
ISBN 13 : 303052017X
Total Pages : 606 pages
Book Rating : 4.0/5 (35 download)

DOWNLOAD NOW!

Book Synopsis Dependable Embedded Systems by : Jörg Henkel

Download or read book Dependable Embedded Systems written by Jörg Henkel and published by Springer Nature. This book was released on 2020-12-09 with total page 606 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Open Access book introduces readers to many new techniques for enhancing and optimizing reliability in embedded systems, which have emerged particularly within the last five years. This book introduces the most prominent reliability concerns from today’s points of view and roughly recapitulates the progress in the community so far. Unlike other books that focus on a single abstraction level such circuit level or system level alone, the focus of this book is to deal with the different reliability challenges across different levels starting from the physical level all the way to the system level (cross-layer approaches). The book aims at demonstrating how new hardware/software co-design solution can be proposed to ef-fectively mitigate reliability degradation such as transistor aging, processor variation, temperature effects, soft errors, etc. Provides readers with latest insights into novel, cross-layer methods and models with respect to dependability of embedded systems; Describes cross-layer approaches that can leverage reliability through techniques that are pro-actively designed with respect to techniques at other layers; Explains run-time adaptation and concepts/means of self-organization, in order to achieve error resiliency in complex, future many core systems.

Using Real-Time Data and AI for Thrust Manufacturing

Author : Satishkumar, D.
Publisher : IGI Global
ISBN 13 :
Total Pages : 368 pages
Book Rating : 4.3/5 (693 download)

DOWNLOAD NOW!

Book Synopsis Using Real-Time Data and AI for Thrust Manufacturing by : Satishkumar, D.

Download or read book Using Real-Time Data and AI for Thrust Manufacturing written by Satishkumar, D. and published by IGI Global. This book was released on 2024-03-28 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the dynamic world of manufacturing, the industry has grappled with ongoing issues such as expensive machine maintenance, operational inefficiencies, and the production of defective products. The need for informed decision-making to maintain quality, meet deadlines, and prevent disruptions is more crucial than ever. Enter Using Real-Time Data and AI for Thrust Manufacturing, a groundbreaking book that addresses these challenges head-on. As Industry 4.0 transforms the manufacturing sector through the integration of the Internet of Things (IoT) and artificial intelligence (AI), this book serves as a beacon for academic scholars and industry professionals alike, offering profound insights into the world of AI-driven industry solutions. The objective of this book is clearto revolutionize the manufacturing sector by leveraging human expertise and AI-driven data technologies. By delving into the realms of Industry 4.0, IoT, and AI, the book systematically tackles issues such as costly downtime, inefficient processes, and the production of substandard products. With a focus on turning raw data into meaningful insights, the book explores AI applications like machine learning and deep learning, natural language processing, and machine vision. From predictive maintenance to improved demand forecasting, quality assurance, inspection, and warehouse automation, the book positions AI as the linchpin of "Industry 4.0," ensuring not only cost savings but also safety improvements and supply-chain efficiencies.

Nano-CMOS Design for Manufacturability

Author : Ban P. Wong
Publisher : John Wiley & Sons
ISBN 13 : 0470382813
Total Pages : 408 pages
Book Rating : 4.4/5 (73 download)

DOWNLOAD NOW!

Book Synopsis Nano-CMOS Design for Manufacturability by : Ban P. Wong

Download or read book Nano-CMOS Design for Manufacturability written by Ban P. Wong and published by John Wiley & Sons. This book was released on 2008-12-29 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt: Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions. This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts: Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.

Design for Manufacturability and Yield for Nano-Scale CMOS

Author : Charles Chiang
Publisher : Springer Science & Business Media
ISBN 13 : 1402051883
Total Pages : 277 pages
Book Rating : 4.4/5 (2 download)

DOWNLOAD NOW!

Book Synopsis Design for Manufacturability and Yield for Nano-Scale CMOS by : Charles Chiang

Download or read book Design for Manufacturability and Yield for Nano-Scale CMOS written by Charles Chiang and published by Springer Science & Business Media. This book was released on 2007-06-15 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.

Handbook of Integrated Circuit Industry

Author : Yangyuan Wang
Publisher : Springer Nature
ISBN 13 : 9819928362
Total Pages : 2006 pages
Book Rating : 4.8/5 (199 download)

DOWNLOAD NOW!

Book Synopsis Handbook of Integrated Circuit Industry by : Yangyuan Wang

Download or read book Handbook of Integrated Circuit Industry written by Yangyuan Wang and published by Springer Nature. This book was released on 2023-12-29 with total page 2006 pages. Available in PDF, EPUB and Kindle. Book excerpt: Written by hundreds experts who have made contributions to both enterprise and academics research, these excellent reference books provide all necessary knowledge of the whole industrial chain of integrated circuits, and cover topics related to the technology evolution trends, fabrication, applications, new materials, equipment, economy, investment, and industrial developments of integrated circuits. Especially, the coverage is broad in scope and deep enough for all kind of readers being interested in integrated circuit industry. Remarkable data collection, update marketing evaluation, enough working knowledge of integrated circuit fabrication, clear and accessible category of integrated circuit products, and good equipment insight explanation, etc. can make general readers build up a clear overview about the whole integrated circuit industry. This encyclopedia is designed as a reference book for scientists and engineers actively involved in integrated circuit research and development field. In addition, this book provides enough guide lines and knowledges to benefit enterprisers being interested in integrated circuit industry.

Automatic IC Hotspot Classification and Detection Using Pattern-based Clustering

Author : Ning Ma
Publisher :
ISBN 13 :
Total Pages : 220 pages
Book Rating : 4.:/5 (35 download)

DOWNLOAD NOW!

Book Synopsis Automatic IC Hotspot Classification and Detection Using Pattern-based Clustering by : Ning Ma

Download or read book Automatic IC Hotspot Classification and Detection Using Pattern-based Clustering written by Ning Ma and published by . This book was released on 2009 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Istc/cstic 2009 (cistc)

Author : David Huang
Publisher : The Electrochemical Society
ISBN 13 : 1566777038
Total Pages : 1124 pages
Book Rating : 4.5/5 (667 download)

DOWNLOAD NOW!

Book Synopsis Istc/cstic 2009 (cistc) by : David Huang

Download or read book Istc/cstic 2009 (cistc) written by David Huang and published by The Electrochemical Society. This book was released on 2009-03 with total page 1124 pages. Available in PDF, EPUB and Kindle. Book excerpt: ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.