Ion Implantation In Microelectronics

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Ion Implantation: Basics to Device Fabrication

Author : Emanuele Rimini
Publisher : Springer Science & Business Media
ISBN 13 : 1461522595
Total Pages : 400 pages
Book Rating : 4.4/5 (615 download)

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Book Synopsis Ion Implantation: Basics to Device Fabrication by : Emanuele Rimini

Download or read book Ion Implantation: Basics to Device Fabrication written by Emanuele Rimini and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.

Ion Implantation in Microelectronics

Author : A. H. Agajanian
Publisher : Springer
ISBN 13 :
Total Pages : 282 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Ion Implantation in Microelectronics by : A. H. Agajanian

Download or read book Ion Implantation in Microelectronics written by A. H. Agajanian and published by Springer. This book was released on 1981-09-30 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt: During the past ten years the use of ion implantation for doping semiconductors has become an active area of research and new device development. This doping technique has recently reached a level of maturity such that it is an integral step in the manu facturing of discrete semiconductor devices and integrated circuits. Ion implantation has significant advantages over diffusion such as: precision, purity, versatility, and automation; all of which are important for VLSI purposes. Ion implantation has also found new applications in magnetic bubble domain materials, superconductors, and materials synthesis. This book is a comprehensive bibliography of 2467 references of the world's literature on ion implantation as applied to micro electronics. This compilation will easily enable researchers to compare their work with that of others. For easy access to the needed references, the contents are divided into fifty-two subject headings. The main categories are: bibliographies, books and symposia, review articles, theory, materials, device applications, and equipment. An author index and a subject index are also given to provide easy access to the references. The literature from January 1976 to December 1980 is covered. The literature prior to 1976 is the subject, in part, of a previous book by the author (1). The main sources searched were: Physics Abstracts (PA) , Electrical and Electronics Abstracts (EEA) , Chemical Abstracts (CA) , Nuclear Science Abstracts (NSA) , and Engineering Index. The volumes and numbers of the abstracts are given to pro vide access to the abstracts.

Ion Implantation and Synthesis of Materials

Author : Michael Nastasi
Publisher : Springer Science & Business Media
ISBN 13 : 3540452982
Total Pages : 271 pages
Book Rating : 4.5/5 (44 download)

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Book Synopsis Ion Implantation and Synthesis of Materials by : Michael Nastasi

Download or read book Ion Implantation and Synthesis of Materials written by Michael Nastasi and published by Springer Science & Business Media. This book was released on 2007-05-16 with total page 271 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.

Ion Implantation - Research and Application

Author :
Publisher :
ISBN 13 : 9789535132387
Total Pages : pages
Book Rating : 4.1/5 (323 download)

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Book Synopsis Ion Implantation - Research and Application by :

Download or read book Ion Implantation - Research and Application written by and published by . This book was released on 19?? with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Optical Effects of Ion Implantation

Author : P. D. Townsend
Publisher : Cambridge University Press
ISBN 13 : 9780521394307
Total Pages : 296 pages
Book Rating : 4.3/5 (943 download)

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Book Synopsis Optical Effects of Ion Implantation by : P. D. Townsend

Download or read book Optical Effects of Ion Implantation written by P. D. Townsend and published by Cambridge University Press. This book was released on 1994-06-23 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is the first to give a detailed description of the factors and processes that govern the optical properties of ion implanted materials, as well as an overview of the variety of devices that can be produced in this way. Beginning with an overview of the basic physics and practical methods involved in ion implantation, the topics of optical absorption and luminescence are then discussed. A chapter on waveguide analysis then provides the background for a description of particular optical devices, such as waveguide lasers, mirrors, and novel nonlinear materials. The book concludes with a survey of the exciting range of potential applications.

Ion-Solid Interactions

Author : Michael Nastasi
Publisher : Cambridge University Press
ISBN 13 : 052137376X
Total Pages : 572 pages
Book Rating : 4.5/5 (213 download)

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Book Synopsis Ion-Solid Interactions by : Michael Nastasi

Download or read book Ion-Solid Interactions written by Michael Nastasi and published by Cambridge University Press. This book was released on 1996-03-29 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: Comprehensive guide to an important materials science technique for students and researchers.

Introduction to Microelectronic Fabrication

Author : Richard C. Jaeger
Publisher : Pearson
ISBN 13 : 9780201444940
Total Pages : 0 pages
Book Rating : 4.4/5 (449 download)

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Book Synopsis Introduction to Microelectronic Fabrication by : Richard C. Jaeger

Download or read book Introduction to Microelectronic Fabrication written by Richard C. Jaeger and published by Pearson. This book was released on 2002 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: For courses in Theory and Fabrication of Integrated Circuits. The author's goal in writing this text was to present a concise survey of the most up-to-date techniques in the field. It is devoted exclusively to processing, and is highlighted by careful explanations, clear, simple language, and numerous fully-solved example problems. This work assumes a minimal knowledge of integrated circuits and of terminal behavior of electronic components such as resistors, diodes, and MOS and bipolar transistors.

The Science and Engineering of Microelectronic Fabrication

Author : Stephen A. Campbell
Publisher : Oxford University Press, USA
ISBN 13 :
Total Pages : 572 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis The Science and Engineering of Microelectronic Fabrication by : Stephen A. Campbell

Download or read book The Science and Engineering of Microelectronic Fabrication written by Stephen A. Campbell and published by Oxford University Press, USA. This book was released on 1996 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Science and Engineering of Microelectronic Fabrication provides an introduction to microelectronic processing. Geared towards a wide audience, it may be used as a textbook for both first year graduate and upper level undergraduate courses and as a handy reference for professionals. The text covers all the basic unit processes used to fabricate integrated circuits including photolithography, plasma and reactive ion etching, ion implantation, diffusion, oxidation, evaporation, vapor phase epitaxial growth, sputtering and chemical vapor deposition. Advanced processing topics such as rapid thermal processing, nonoptical lithography, molecular beam epitaxy, and metal organic chemical vapor deposition are also presented. The physics and chemistry of each process is introduced along with descriptions of the equipment used for the manufacturing of integrated circuits. The text also discusses the integration of these processes into common technologies such as CMOS, double poly bipolar, and GaAs MESFETs. Complexity/performance tradeoffs are evaluated along with a description of the current state-of-the-art devices. Each chapter includes sample problems with solutions. The book also makes use of the process simulation package SUPREM to demonstrate impurity profiles of practical interest.

Ion Beam Treatment of Polymers

Author : Alexey Kondyurin
Publisher : Elsevier
ISBN 13 : 0080556744
Total Pages : 327 pages
Book Rating : 4.0/5 (85 download)

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Book Synopsis Ion Beam Treatment of Polymers by : Alexey Kondyurin

Download or read book Ion Beam Treatment of Polymers written by Alexey Kondyurin and published by Elsevier. This book was released on 2010-07-07 with total page 327 pages. Available in PDF, EPUB and Kindle. Book excerpt: Polymer materials are used in different fields of industries, from microelectronice to medicine. Ion beam implantation is method of surface modification when surface properties must be significantly changed and bulk properties of material must be saved. Ion Beam Treatment of Polymers contains results of polymer investigations and techniques development in the field of polymer modification by high energy ion beams. This book is intended for specialists in polymer science who have interest to use an ion beam treatment for improvement of polymer properties, for specialists in physics who search a new application of ion beam and plasma equipment and also for students who look for future fields of high technology.Chapter 1-3 are devoted to overview of the basic processes at high energy ion penetration into solid target. The historical aspects and main physical aspects are covered. A basic equipment principles and main producers of equipment for ion beam treatment are considered.Chapter 4 contains chemical transformations in polymers during and after high energy ion penetration. The modern methods and results of experimental and theoretical investigation are described.Chapters 5-10 are devoted to properties of polymers after ion beam treatment, regimes of treatment, available applications, in particular: increase of adhesion of polymers and a mechanism of an adhesion increase, wetting angle of polymer by water and its stability, adhesion of cells on polymer surface, drug release regulation from polymer coating and others.Chapter 11 contains our last results on polymerisation processes in liquid oligomer composition under high vacuum, plasma and ion beam conditions as simulation of free space environment.* By scientists working in polymer chemistry, physics of ion beam implantation and in development and production of ion beam equipment * Covering industrial and scientific applications of ion beam implanted polymers* Also for students with an interest in future fields of high technology

Microelectronics, Microsystems and Nanotechnology

Author : Androula G. Nassiopoulou
Publisher : World Scientific
ISBN 13 : 9810247699
Total Pages : 409 pages
Book Rating : 4.8/5 (12 download)

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Book Synopsis Microelectronics, Microsystems and Nanotechnology by : Androula G. Nassiopoulou

Download or read book Microelectronics, Microsystems and Nanotechnology written by Androula G. Nassiopoulou and published by World Scientific. This book was released on 2001 with total page 409 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume contains papers on the following: CMOS devices and devices based on compound semiconductors; processing; silicon integrated technology and integrated circuit design; quantum physics; nanotechnology; nanodevices, sensors and microsystems. The latest news and future challenges in these fields are presented in invited papers.

The Physics of Micro/Nano-Fabrication

Author : Ivor Brodie
Publisher : Springer Science & Business Media
ISBN 13 : 1475767757
Total Pages : 661 pages
Book Rating : 4.4/5 (757 download)

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Book Synopsis The Physics of Micro/Nano-Fabrication by : Ivor Brodie

Download or read book The Physics of Micro/Nano-Fabrication written by Ivor Brodie and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 661 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.

Industrial Accelerators and Their Applications

Author : Robert Wray Hamm
Publisher : World Scientific
ISBN 13 : 9814307041
Total Pages : 436 pages
Book Rating : 4.8/5 (143 download)

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Book Synopsis Industrial Accelerators and Their Applications by : Robert Wray Hamm

Download or read book Industrial Accelerators and Their Applications written by Robert Wray Hamm and published by World Scientific. This book was released on 2012 with total page 436 pages. Available in PDF, EPUB and Kindle. Book excerpt: This unique new book is a comprehensive review of the many current industrial applications of particle accelerators, written by experts in each of these fields. Readers will gain a broad understanding of the principles of these applications, the extent to which they are employed, and the accelerator technology utilized. The book also serves as a thorough introduction to these fields for non-experts and laymen. Due to the increased interest in industrial applications, there is a growing interest among accelerator physicists and many other scientists worldwide in understanding how accelerators are used in various applications. The government agencies that fund scientific research with accelerators are also seeking more information on the many commercial applications that have been or can be developed with the technology developments they are funding. Many industries are also doing more research on how they can improve their products or processes using particle beams

Ion Implantation and Beam Processing

Author : J. S. Williams
Publisher : Academic Press
ISBN 13 : 1483220648
Total Pages : 432 pages
Book Rating : 4.4/5 (832 download)

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Book Synopsis Ion Implantation and Beam Processing by : J. S. Williams

Download or read book Ion Implantation and Beam Processing written by J. S. Williams and published by Academic Press. This book was released on 2014-06-28 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.

Ion Implantation Science and Technology

Author : J.F. Ziegler
Publisher : Elsevier
ISBN 13 : 0323144012
Total Pages : 649 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Ion Implantation Science and Technology by : J.F. Ziegler

Download or read book Ion Implantation Science and Technology written by J.F. Ziegler and published by Elsevier. This book was released on 2012-12-02 with total page 649 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.

ULSI Semiconductor Technology Atlas

Author : Chih-Hang Tung
Publisher : John Wiley & Sons
ISBN 13 : 9780471457725
Total Pages : 688 pages
Book Rating : 4.4/5 (577 download)

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Book Synopsis ULSI Semiconductor Technology Atlas by : Chih-Hang Tung

Download or read book ULSI Semiconductor Technology Atlas written by Chih-Hang Tung and published by John Wiley & Sons. This book was released on 2003-10-06 with total page 688 pages. Available in PDF, EPUB and Kindle. Book excerpt: More than 1,100 TEM images illustrate the science of ULSI The natural outgrowth of VLSI (Very Large Scale Integration), Ultra Large Scale Integration (ULSI) refers to semiconductor chips with more than 10 million devices per chip. Written by three renowned pioneers in their field, ULSI Semiconductor Technology Atlas uses examples and TEM (Transmission Electron Microscopy) micrographs to explain and illustrate ULSI process technologies and their associated problems. The first book available on the subject to be illustrated using TEM images, ULSI Semiconductor Technology Atlas is logically divided into four parts: * Part I includes basic introductions to the ULSI process, device construction analysis, and TEM sample preparation * Part II focuses on key ULSI modules--ion implantation and defects, dielectrics and isolation structures, silicides/salicides, and metallization * Part III examines integrated devices, including complete planar DRAM, stacked cell DRAM, and trench cell DRAM, as well as SRAM as examples for process integration and development * Part IV emphasizes special applications, including TEM in advanced failure analysis, TEM in advanced packaging development and UBM (Under Bump Metallization) studies, and high-resolution TEM in microelectronics This innovative guide also provides engineers and managers in the microelectronics industry, as well as graduate students, with: * More than 1,100 TEM images to illustrate the science of ULSI * A historical introduction to the technology as well as coverage of the evolution of basic ULSI process problems and issues * Discussion of TEM in other advanced microelectronics devices and materials, such as flash memories, SOI, SiGe devices, MEMS, and CD-ROMs

Process Technology for Silicon Carbide Devices

Author : Carl-Mikael Zetterling
Publisher : IET
ISBN 13 : 9780852969984
Total Pages : 202 pages
Book Rating : 4.9/5 (699 download)

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Book Synopsis Process Technology for Silicon Carbide Devices by : Carl-Mikael Zetterling

Download or read book Process Technology for Silicon Carbide Devices written by Carl-Mikael Zetterling and published by IET. This book was released on 2002 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book explains why SiC is so useful in electronics, gives clear guidance on the various processing steps (growth, doping, etching, contact formation, dielectrics etc) and describes how these are integrated in device manufacture.

Chemistry in Microelectronics

Author : Yannick Le Tiec
Publisher : John Wiley & Sons
ISBN 13 : 1118578120
Total Pages : 261 pages
Book Rating : 4.1/5 (185 download)

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Book Synopsis Chemistry in Microelectronics by : Yannick Le Tiec

Download or read book Chemistry in Microelectronics written by Yannick Le Tiec and published by John Wiley & Sons. This book was released on 2013-02-28 with total page 261 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microelectronics is a complex world where many sciences need to collaborate to create nano-objects: we need expertise in electronics, microelectronics, physics, optics and mechanics also crossing into chemistry, electrochemistry, as well as biology, biochemistry and medicine. Chemistry is involved in many fields from materials, chemicals, gases, liquids or salts, the basics of reactions and equilibrium, to the optimized cleaning of surfaces and selective etching of specific layers. In addition, over recent decades, the size of the transistors has been drastically reduced while the functionality of circuits has increased. This book consists of five chapters covering the chemicals and sequences used in processing, from cleaning to etching, the role and impact of their purity, along with the materials used in “Front End Of the Line” which corresponds to the heart and performance of individual transistors, then moving on to the “Back End Of the Line” which is related to the interconnection of all the transistors. Finally, the need for specific functionalization also requires key knowledge on surface treatments and chemical management to allow new applications. Contents 1. Chemistry in the “Front End of the Line” (FEOL): Deposits, Gate Stacks, Epitaxy and Contacts, François Martin, Jean-Michel Hartmann, Véronique Carron and Yannick Le Tiec. 2. Chemistry in Interconnects, Vincent Jousseaume, Paul-Henri Haumesser, Carole Pernel, Jeffery Butterbaugh, Sylvain Maîtrejean and Didier Louis. 3. The Chemistry of Wet Surface Preparation: Cleaning, Etching and Drying, Yannick Le Tiec and Martin Knotter. 4. The Use and Management of Chemical Fluids in Microelectronics, Christiane Gottschalk, Kevin Mclaughlin, Julie Cren, Catherine Peyne and Patrick Valenti. 5. Surface Functionalization for Micro- and Nanosystems: Application to Biosensors, Antoine Hoang, Gilles Marchand, Guillaume Nonglaton, Isabelle Texier-Nogues and Francoise Vinet. About the Authors Yannick Le Tiec is a technical expert at CEA-Leti, Minatec since 2002. He is a CEA-Leti assignee at IBM, Albany (NY) to develop the advanced 14 nm CMOS node and the FDSOI technology. He held different technical positions from the advanced 300 mm SOI CMOS pilot line to different assignments within SOITEC for advanced wafer development and later within INES to optimize solar cell ramp-up and yield. He has been part of the ITRS Front End technical working group at ITRS since 2008.