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Ion Beam Deposition Of Nbta2o5 Sio2 Multilayers For High Efficiency Dielectric Gratings For High Average Power Laser Systems Operating At 800 Nm Central Wavelength
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Book Synopsis Ion Beam Deposition of (NbTa)2O5/SiO2 Multilayers for High-Efficiency Dielectric Gratings for High Average Power Laser Systems Operating at 800 Nm Central Wavelength by : H. T. Nguyen
Download or read book Ion Beam Deposition of (NbTa)2O5/SiO2 Multilayers for High-Efficiency Dielectric Gratings for High Average Power Laser Systems Operating at 800 Nm Central Wavelength written by H. T. Nguyen and published by . This book was released on 2006 with total page 3 pages. Available in PDF, EPUB and Kindle. Book excerpt: The ion beam deposition of (NbTa)2O5 has been investigated for realizing high reflectance multilayer stacks of high damage threshold for applications in the engineering of dielectric gratings for use at 800 nm. Deposition conditions were optimized to yield fully oxidized films as determined from x-ray photoelectron spectroscopy (XPS). The film properties were also investigated using spectroscopic ellipsometry, and spectrophotometry to determine their refractive index and thickness respectively. Damage threshold testing was performed on single films using an amplified Ti:Sapphire laser producing a train of 170 ps pulses at a wavelength of 800 nm with an average energy of 100 mJ. The laser output was focused at the surface of the samples via a 0.5 m focal length lens to generate fluences ranging from 0 to 9 J/cm{sup 2}. At the optimum deposition conditions for highest optical quality and damage threshold, high reflector stacks of (NbTa){sub 2}O{sub 5}/SiO2 were fabricated. These stacks were employed to fabricate dielectric gratings with 1740 l/mm for use with 800 nm light. At an input angle of 8{sup o} from Littrow and a wavelength from 770 to 830 nm,>90% diffraction efficiency is achieved, with peak diffraction efficiency of>97%. The demonstration of dielectric gratings at 800 nm is opening the pathway to significantly increase the power handling capabilities of grating compressors for picosecond and femtosecond chirped pulse amplifications systems.
Book Synopsis High-power Ion Beam Deposition of Nanocomposite, Multilayer and Single-layer Metal Coatings by :
Download or read book High-power Ion Beam Deposition of Nanocomposite, Multilayer and Single-layer Metal Coatings written by and published by . This book was released on 2010 with total page 22 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ion Beam Assisted Deposition of SiO2 by : J. R. McNeil
Download or read book Ion Beam Assisted Deposition of SiO2 written by J. R. McNeil and published by . This book was released on 1983 with total page 33 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Kaufman ion source was modified to produce a low energy (30 eV) high current density (3 mA/sq cm) 0(+) and 02(+) (0(+)/2(+)) ion beam at an optical surface being coated with Si02. Films of Si02 were deposited with 0(+)/02(+) ion bombardment at low energy (30 eV) and at high energy (500 eV). Application of the ion-assist technique has the following features: (1) Durable coatings can be produced at low substrate temperature; (2) Film stoichiometry is improved, particularly for low energy bombardment; (3) Hydrogen content of the film is reduced under certain conditions of bombardment; and (4) Stress and structure of Si02 films are not greatly affected by ion bombardment. (Author).
