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Author : Chen-Chung Li
Publisher :
ISBN 13 :
Total Pages : 248 pages
Book Rating : 4.:/5 (38 download)
Download or read book Ion Assisted Deposition of Multicomponent Thin Films written by Chen-Chung Li and published by . This book was released on 1994 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Agustin Gonzalez-elipe
Publisher : World Scientific
ISBN 13 : 1783261048
Total Pages : 299 pages
Book Rating : 4.7/5 (832 download)
Download or read book Low Energy Ion Assisted Film Growth written by Agustin Gonzalez-elipe and published by World Scientific. This book was released on 2003-03-21 with total page 299 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.
Author : James D. Targove
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (83 download)
Download or read book The Ion-assisted Deposition of Optical Thin Films written by James D. Targove and published by . This book was released on 1989 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : O. Auciello
Publisher : Springer Science & Business Media
ISBN 13 : 9401117276
Total Pages : 625 pages
Book Rating : 4.4/5 (11 download)
Download or read book Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices written by O. Auciello and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 625 pages. Available in PDF, EPUB and Kindle. Book excerpt: The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.
Author : Forrest Lee Williams
Publisher :
ISBN 13 :
Total Pages : 230 pages
Book Rating : 4.:/5 (27 download)
Download or read book Low Temperature Deposition of Thin Films Using Ion Assisted Deposition written by Forrest Lee Williams and published by . This book was released on 1989 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : GJ. Exarhos
Publisher :
ISBN 13 :
Total Pages : 1 pages
Book Rating : 4.:/5 (125 download)
Download or read book Ion Assisted Deposition of Optical Thin Films at Reduced Substrate Temperature written by GJ. Exarhos and published by . This book was released on 1988 with total page 1 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion assisted deposition (IAD) involves bombarding a thin film with low energy ions (Ei
Author :
Publisher :
ISBN 13 :
Total Pages : 68 pages
Book Rating : 4.:/5 (924 download)
Download or read book Use of Ion Beam Assisted Deposition to Modify Microscructure and Properties of Thin Films written by and published by . This book was released on 1990 with total page 68 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 78 pages
Book Rating : 4.:/5 (227 download)
Download or read book The Deposition of Multicomponent Films for Electrooptic Applications Via a Computer Controlled Dual Ion Beam Sputtering System written by and published by . This book was released on 1991 with total page 78 pages. Available in PDF, EPUB and Kindle. Book excerpt: Contents: Deposition of Electrooptic Thin Films; High Resolution Imaging of Twin and Antiphase Domain Boundaries in Perovskite KNbO3 Thin Films; Microstructural Characterization of the Epitaxial (111) KNbO3 on (0001) Sapphire; Electro-optic Characterization of Ion Beam Sputter-Deposited KNbO3 Thin Films; Optical Characterization of Potassium Niobate Thin Film Planar Waveguides.
Author : Tejaswini Miryala
Publisher :
ISBN 13 :
Total Pages : 88 pages
Book Rating : 4.:/5 (12 download)
Download or read book Deposition of Silicon Thin Films by Ion Beam Assisted Deposition written by Tejaswini Miryala and published by . This book was released on 2017 with total page 88 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 10 pages
Book Rating : 4.:/5 (227 download)
Download or read book Ion-Assisted Deposition of Optical Thin Films at Different Ion Beam Energies written by and published by . This book was released on 1995 with total page 10 pages. Available in PDF, EPUB and Kindle. Book excerpt: This article, using TiO2 thin films as examples, studied and analyzed the optical properties, laser damage threshold values, and microstructures of thin films associated with ion assisted sedimentation at different energies. jg.
Author : Alan Curtin Barron
Publisher :
ISBN 13 :
Total Pages : 114 pages
Book Rating : 4.:/5 (116 download)
Download or read book Ion-assisted Deposition of Optical Thin Films written by Alan Curtin Barron and published by . This book was released on 1984 with total page 114 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : D Glocker
Publisher : CRC Press
ISBN 13 : 1351089692
Total Pages : 322 pages
Book Rating : 4.3/5 (51 download)
Download or read book Handbook of Thin Film Process Technology written by D Glocker and published by CRC Press. This book was released on 2018-01-18 with total page 322 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume presents additional recipe-type information (i.e. important deposition system details and process parameters) for optical materials.
Author : Michael S. Jin
Publisher :
ISBN 13 :
Total Pages : 158 pages
Book Rating : 4.:/5 (974 download)
Download or read book The Effects of Ion-assisted Deposition on the Surface Roughness of Evaporated Thin Films written by Michael S. Jin and published by . This book was released on 1988 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The effects of ion-assisted deposition (IAD) on the surface roughness of electron-beam evaporated films were studied. The experimental study was conducted with an 8 cm Kaufman type ion source in a 28 inch coating chamber. The investigated film materials were Ta2O5, ZrO2, and TiO2. In order to investigate the effects of the IAD process on the surface quality of the films, the surface statistics of the resulting film samples were examined. The rms roughness of the film surfaces was assessed with a Talystep mechanical profilometer and a total integrated scattering (TIS) apparatus. The profilometric data from the Talystep measurements were used to calculate the characteristic functions of the film surfaces. The height distribution, the autocovariance, and the power spectral density of the surface profile functions were evaluated numerically. The thin film nucleation and growth phenomena was reviewed in order to identify the physical interactions between the ions and the depositing molecules which lead to the changes in the physical and optical properties of the IAD processed films. The ion-assisted film samples were prepared at ion energies and arrival rates which led to the observed changes in other IAD study reports. The changes induced in the films were initially verified with a wideband optical transmission monitor which gave information on the transmission characteristics and the environmental stability of the deposited films. The changes in the microstructure of the film samples were examined by transmission electron microscopy and by x-ray and electron diffraction methods. The results of the analyses were compared to determine the effects of each set of IAD parameters on the overall quality of the resulting films"--Page ii.
Download or read book ECR Assisted Deposition of Tin And Si3N4 Thin Films For Microelectronic Applications written by and published by . This book was released on 2000 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The broad theme of the present research investigation is Ion Assisted Deposition of thin films and its effect on the properties of thin films. Though this activity has been of interest to researchers for more than a decade, the development of different types of ion sources with control over the ion flux and energy, makes it a current topic of interest. Ion assisted deposition was successful in depositing thin films of many material with desired qualities, however, there are certain class of materials whose deposition has been rather difficult. This has mainly been attributed to higher energies and low ion flux of conventional ion sources. The advent of ECR ion sources for thin film deposition has given impetus to the deposition of such materials. This is due to the low energy high-density plasma generated in this type of sources. Hitherto, these sources were widely used in PECVD techniques and only recently the importance of ECR sources in PVD techniques has been realized. This thesis is on the development of ECR plasma source for ion assisted deposition of thin films using PVD techniques. This thesis is organized into six chapters. The first chapter gives an introduction on the ion assisted growth of thin films and the importance of ECR plasma. A detailed discussion on various aspects of ECR sources has been included. The design details on the development of ECR source have been discussed in the second chapter. The performance of ECR source as analyzed by the Langmuir probe are also discussed. Variation of plasma parameters like ion density, electron temperature, plasma potential and floating potential as a function of pressure and microwave power have been studied using Langmuir probe analysis. An ion density of the order of 1011/cm3 was measured at a distance of 8 cm from the plasma source with a microwave power of 400 watts. This was comparable to the ion density reported in downstream plasma of ECR sources. The behavior of plasma parameters with variation in mi.
Author : Katherine Dodds Stonnington
Publisher :
ISBN 13 :
Total Pages : 338 pages
Book Rating : 4.:/5 (39 download)
Download or read book Metallorganic Chemical Vapor Deposition and Chemical Beam Deposition of Single and Multicomponent Oxide Thin Films written by Katherine Dodds Stonnington and published by . This book was released on 1993 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : S. B. Krupanidhi
Publisher :
ISBN 13 :
Total Pages : 20 pages
Book Rating : 4.:/5 (228 download)
Download or read book Recent Advances in the Deposition of Ferroelectric Thin Films written by S. B. Krupanidhi and published by . This book was released on 1991 with total page 20 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent developments in ferroelectric thin film deposition involving plasma based approaches, are described, which include (a) multi-magnetron. sputter deposition, (b) Multi-ion-beam reactive sputter (MIBERS) deposition, (c) Pulsed excimer laser ablation and (d) ECR (Electron cyclotron resonance) plasma assisted deposition. These methods commonly prevailed intrinsic low energy ion bombardment during the growth process, which may be used for the control over composition, crystallization temperature and microstructure. A low energy (60 - 75 eV) ion bombardment of the ferroelectric Pb(Zr, Ti)03 thin films indicated a reduction in the phase formation/crystallization temperature, improved the electrical properties, microstructure and the surface smoothness. Discussion is presented emphasizing the effects of low energy bombardment in different deposition processes. Recent findings using rapid thermal annealing process are also described.
Author : Rointan Framroze Bunshah
Publisher : William Andrew
ISBN 13 : 0815513372
Total Pages : 888 pages
Book Rating : 4.8/5 (155 download)
Download or read book Handbook of Deposition Technologies for Films and Coatings written by Rointan Framroze Bunshah and published by William Andrew. This book was released on 1994 with total page 888 pages. Available in PDF, EPUB and Kindle. Book excerpt: This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
